JPS6226443Y2 - - Google Patents

Info

Publication number
JPS6226443Y2
JPS6226443Y2 JP14249582U JP14249582U JPS6226443Y2 JP S6226443 Y2 JPS6226443 Y2 JP S6226443Y2 JP 14249582 U JP14249582 U JP 14249582U JP 14249582 U JP14249582 U JP 14249582U JP S6226443 Y2 JPS6226443 Y2 JP S6226443Y2
Authority
JP
Japan
Prior art keywords
liquid
processing
chamber
treatment
gutter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP14249582U
Other languages
Japanese (ja)
Other versions
JPS5947655U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP14249582U priority Critical patent/JPS5947655U/en
Publication of JPS5947655U publication Critical patent/JPS5947655U/en
Application granted granted Critical
Publication of JPS6226443Y2 publication Critical patent/JPS6226443Y2/ja
Granted legal-status Critical Current

Links

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  • Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
  • Chemical Treatment Of Metals (AREA)

Description

【考案の詳細な説明】 本案は被塗装物をコンベアに吊下げ連続的に室
内に送入して塗装の前処理工程における湯洗、水
洗、脱脂、化成処理あるいは電着塗装における水
洗等の液処理操作を経済的に行ない得る液処理装
置に関するものである。
[Detailed explanation of the invention] The present invention involves suspending the object to be painted on a conveyor and continuously feeding it into the room. The present invention relates to a liquid processing device that can perform processing operations economically.

一般に塗装の前処理工程では湯洗、水洗、脱
脂、燐酸塩水溶液による化成処理等があり、また
電着塗装工程においては電着塗装後の余剰塗料の
洗浄除去等があるが、従来これ等の液処理の工程
では第1図に示す如く液処理室1の上方に設けた
コンベア室8にコンベア9を備えて被塗装物10
を吊下げて搬送し、液処理室1の下方に処理液槽
11を設けて処理液を貯溜し、ポンプp、ノズル
12を備えたスプレーヘツダー13および導管1
4により被塗装物10に処理液を噴射するスプレ
ー方式が行なわれており、多数のノズル12より
2〜3Kg/cm2の圧力で処理液をスプレーにより被
塗装物10に吹付けるため多大の動力を要する欠
点があつた。
In general, pre-treatment processes for painting include washing with hot water, washing with water, degreasing, and chemical conversion treatment with an aqueous phosphate solution, and in the electrodeposition painting process, cleaning and removal of excess paint after electrodeposition coating, etc. In the liquid treatment process, as shown in FIG.
A processing liquid tank 11 is provided below the liquid processing chamber 1 to store the processing liquid, and a spray header 13 equipped with a pump p and a nozzle 12 and a conduit
4 uses a spray method in which the treatment liquid is injected onto the object 10 to be coated, and a large amount of power is required to spray the treatment liquid onto the object 10 to be coated at a pressure of 2 to 3 kg/cm 2 from a large number of nozzles 12. There were some drawbacks that required it.

本案は上記の欠点を除去するもので、実施例を
図面について説明すれば、第2図に示す如く液処
理室1の上方に設けたコンベア室8にコンベア9
を備え被塗装物10を吊下げて搬送するように
し、液処理室1の下方には処理液槽11を設けて
処理液を貯溜し、液処理室1の上方、コンベア室
8の下面に底面をパンチングメタル2で構成した
処理液溜3を形成し、液処理室1内の被塗装物1
0の通過空間の側面に適宜数のはね返り板4,4
を設けてなる液処理装置である。尚処理液槽11
より処理液溜3へ導管14およびポンプpにより
処理液を循環するようにし、図中15は処理液の
流れを均一化するためのパンチング板、16はは
ね返り板、17は調整弁である。
The present invention is intended to eliminate the above-mentioned drawbacks, and an embodiment thereof will be described with reference to the drawings.As shown in FIG.
A processing liquid tank 11 is provided below the liquid processing chamber 1 to store the processing liquid. A processing liquid reservoir 3 is formed by punching metal 2, and the object to be coated 1 in the liquid processing chamber 1 is
An appropriate number of rebound plates 4, 4 are placed on the side of the passage space of 0.
This is a liquid processing device equipped with a. Additionally, processing liquid tank 11
The processing liquid is circulated to the processing liquid reservoir 3 by a conduit 14 and a pump p, and in the figure, 15 is a punching plate for making the flow of the processing liquid uniform, 16 is a repelling plate, and 17 is a regulating valve.

本案は上記の如く構成したので、処理液溜3内
の処理液はパンチングメタル底板2の孔より滴下
し、はね返り板4によりはね返つて移送中の被塗
装物10に当り、洗浄、化成処理等の操作を確実
に行ない、かつポンプpの動力を著しく減少し得
る効果を有するものである。
Since the present invention is configured as described above, the processing solution in the processing solution reservoir 3 drips from the hole in the punching metal bottom plate 2, is bounced off by the repelling plate 4, and hits the object to be coated 10 being transferred, thereby causing cleaning and chemical conversion treatment. This has the effect of reliably performing operations such as the above, and significantly reducing the power of the pump p.

尚液処理室1の内壁下端近くに樋5を設け、第
3図6に明示する如く樋5の一部を切欠き、空気
吹込み用ノズル7を該欠截部6の下面に斜上方に
向けて取付け、液処理室1側壁を流下する処理液
を樋5で受け、圧縮空気管18に連結したノズル
7より空気を吹込んで該処理液を被塗装物10に
当てるようにすれば一層効果的である。
A gutter 5 is provided near the lower end of the inner wall of the liquid processing chamber 1, a part of the gutter 5 is cut out as shown in FIG. It is even more effective if the treatment liquid flowing down the side wall of the liquid treatment chamber 1 is received by the gutter 5, and air is blown through the nozzle 7 connected to the compressed air pipe 18 to hit the object 10 with the treatment liquid. It is true.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の液処理装置の垂直断面説明図、
第2図は本案の液処理装置の一例を示す垂直断面
説明図、第3図はその一部を示す斜視説明図であ
る。 図中2は処理液溜3のパンチング板製底板、4
ははね返り板、5は樋、6はその欠截部、7は空
気吹込み用ノズルを示す。
Figure 1 is a vertical cross-sectional explanatory diagram of a conventional liquid processing device.
FIG. 2 is a vertical cross-sectional explanatory view showing an example of the liquid processing apparatus of the present invention, and FIG. 3 is a perspective explanatory view showing a part thereof. In the figure, 2 is the bottom plate made of a punched plate of the processing liquid reservoir 3, and 4
5 is a gutter, 6 is a cutout thereof, and 7 is an air blowing nozzle.

Claims (1)

【実用新案登録請求の範囲】 1 液処理室1の上方部に底2をパンチング板で
形成した処理液溜3を設け、処理液の落下する
個所に適宜数のはね返り板4を設けてなる液処
理装置。 2 液処理室1の側壁下方部に一部を欠截した樋
5を沿わせ、該欠截部6に斜上方に向けて空気
吹出口7を設けてなる実用新案登録請求の範囲
第1項記載の液処理装置。
[Claims for Utility Model Registration] 1. A liquid treatment chamber 1 in which a processing liquid reservoir 3 whose bottom 2 is formed by a punching plate is provided in the upper part of the liquid processing chamber 1, and an appropriate number of repelling plates 4 are provided at locations where the processing liquid falls. Processing equipment. 2. Utility model registration claim 1, in which a gutter 5 with a part cut out is placed along the lower part of the side wall of the liquid processing chamber 1, and an air outlet 7 is provided in the cut out part 6 diagonally upward. The liquid processing device described.
JP14249582U 1982-09-18 1982-09-18 Liquid processing equipment Granted JPS5947655U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14249582U JPS5947655U (en) 1982-09-18 1982-09-18 Liquid processing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14249582U JPS5947655U (en) 1982-09-18 1982-09-18 Liquid processing equipment

Publications (2)

Publication Number Publication Date
JPS5947655U JPS5947655U (en) 1984-03-29
JPS6226443Y2 true JPS6226443Y2 (en) 1987-07-07

Family

ID=30318378

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14249582U Granted JPS5947655U (en) 1982-09-18 1982-09-18 Liquid processing equipment

Country Status (1)

Country Link
JP (1) JPS5947655U (en)

Also Published As

Publication number Publication date
JPS5947655U (en) 1984-03-29

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