JPS62262049A - Diazo photosensitive lithographic printing plate - Google Patents
Diazo photosensitive lithographic printing plateInfo
- Publication number
- JPS62262049A JPS62262049A JP10380086A JP10380086A JPS62262049A JP S62262049 A JPS62262049 A JP S62262049A JP 10380086 A JP10380086 A JP 10380086A JP 10380086 A JP10380086 A JP 10380086A JP S62262049 A JPS62262049 A JP S62262049A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive
- acid
- printing plate
- diazo
- lithographic printing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 title claims abstract description 29
- 229920005989 resin Polymers 0.000 claims abstract description 25
- 239000011347 resin Substances 0.000 claims abstract description 25
- 229920000642 polymer Polymers 0.000 claims abstract description 16
- 239000010936 titanium Substances 0.000 claims abstract description 12
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 10
- 239000007822 coupling agent Substances 0.000 claims abstract description 10
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 10
- 239000000203 mixture Substances 0.000 claims description 20
- 150000001875 compounds Chemical class 0.000 claims description 11
- 239000000126 substance Substances 0.000 abstract description 16
- 238000012545 processing Methods 0.000 abstract description 3
- 239000007787 solid Substances 0.000 abstract description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 29
- 229910052782 aluminium Inorganic materials 0.000 description 19
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 19
- 238000000034 method Methods 0.000 description 16
- 239000003795 chemical substances by application Substances 0.000 description 14
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 12
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 12
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- 239000003960 organic solvent Substances 0.000 description 12
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 11
- 229910052751 metal Inorganic materials 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- 239000007864 aqueous solution Substances 0.000 description 10
- -1 aromatic sulfonic acids Chemical class 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 10
- 238000000576 coating method Methods 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- 239000002253 acid Substances 0.000 description 8
- 239000004115 Sodium Silicate Substances 0.000 description 7
- 229920001577 copolymer Polymers 0.000 description 7
- 238000005498 polishing Methods 0.000 description 7
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 7
- 229910052911 sodium silicate Inorganic materials 0.000 description 7
- 238000003860 storage Methods 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000002244 precipitate Substances 0.000 description 6
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 5
- 150000007513 acids Chemical class 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 239000000975 dye Substances 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
- 150000001298 alcohols Chemical class 0.000 description 4
- 125000003545 alkoxy group Chemical group 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000000866 electrolytic etching Methods 0.000 description 4
- 150000002576 ketones Chemical class 0.000 description 4
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 239000000123 paper Substances 0.000 description 4
- 229920003023 plastic Polymers 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- 229910052708 sodium Inorganic materials 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 239000012190 activator Substances 0.000 description 3
- 150000001450 anions Chemical class 0.000 description 3
- 150000001735 carboxylic acids Chemical class 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 235000019795 sodium metasilicate Nutrition 0.000 description 3
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 3
- HMLSBRLVTDLLOI-UHFFFAOYSA-N 1-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)C(C)OC(=O)C(C)=C HMLSBRLVTDLLOI-UHFFFAOYSA-N 0.000 description 2
- NFTVTXIQFYRSHF-UHFFFAOYSA-N 1-(dimethylamino)ethyl prop-2-enoate Chemical compound CN(C)C(C)OC(=O)C=C NFTVTXIQFYRSHF-UHFFFAOYSA-N 0.000 description 2
- UZKWTJUDCOPSNM-UHFFFAOYSA-N 1-ethenoxybutane Chemical compound CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 2
- JLIDVCMBCGBIEY-UHFFFAOYSA-N 1-penten-3-one Chemical compound CCC(=O)C=C JLIDVCMBCGBIEY-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 description 2
- LRFVTYWOQMYALW-UHFFFAOYSA-N 9H-xanthine Chemical compound O=C1NC(=O)NC2=C1NC=N2 LRFVTYWOQMYALW-UHFFFAOYSA-N 0.000 description 2
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000004342 Benzoyl peroxide Substances 0.000 description 2
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- KCXZNSGUUQJJTR-UHFFFAOYSA-N Di-n-hexyl phthalate Chemical compound CCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCC KCXZNSGUUQJJTR-UHFFFAOYSA-N 0.000 description 2
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229930040373 Paraformaldehyde Natural products 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 2
- ZFOZVQLOBQUTQQ-UHFFFAOYSA-N Tributyl citrate Chemical compound CCCCOC(=O)CC(O)(C(=O)OCCCC)CC(=O)OCCCC ZFOZVQLOBQUTQQ-UHFFFAOYSA-N 0.000 description 2
- 150000001299 aldehydes Chemical class 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 235000019400 benzoyl peroxide Nutrition 0.000 description 2
- QUKGYYKBILRGFE-UHFFFAOYSA-N benzyl acetate Chemical compound CC(=O)OCC1=CC=CC=C1 QUKGYYKBILRGFE-UHFFFAOYSA-N 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- FUSUHKVFWTUUBE-UHFFFAOYSA-N buten-2-one Chemical compound CC(=O)C=C FUSUHKVFWTUUBE-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 150000008049 diazo compounds Chemical class 0.000 description 2
- 239000012954 diazonium Substances 0.000 description 2
- 150000001989 diazonium salts Chemical class 0.000 description 2
- FLKPEMZONWLCSK-UHFFFAOYSA-N diethyl phthalate Chemical compound CCOC(=O)C1=CC=CC=C1C(=O)OCC FLKPEMZONWLCSK-UHFFFAOYSA-N 0.000 description 2
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 2
- CZZYITDELCSZES-UHFFFAOYSA-N diphenylmethane Chemical compound C=1C=CC=CC=1CC1=CC=CC=C1 CZZYITDELCSZES-UHFFFAOYSA-N 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 2
- JTHNLKXLWOXOQK-UHFFFAOYSA-N hex-1-en-3-one Chemical compound CCCC(=O)C=C JTHNLKXLWOXOQK-UHFFFAOYSA-N 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 2
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 2
- 229920002866 paraformaldehyde Polymers 0.000 description 2
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 2
- 229960005323 phenoxyethanol Drugs 0.000 description 2
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 description 2
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- PNGLEYLFMHGIQO-UHFFFAOYSA-M sodium;3-(n-ethyl-3-methoxyanilino)-2-hydroxypropane-1-sulfonate;dihydrate Chemical compound O.O.[Na+].[O-]S(=O)(=O)CC(O)CN(CC)C1=CC=CC(OC)=C1 PNGLEYLFMHGIQO-UHFFFAOYSA-M 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 2
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- GYSCBCSGKXNZRH-UHFFFAOYSA-N 1-benzothiophene-2-carboxamide Chemical compound C1=CC=C2SC(C(=O)N)=CC2=C1 GYSCBCSGKXNZRH-UHFFFAOYSA-N 0.000 description 1
- LHORZPMPPHTXFQ-UHFFFAOYSA-N 1-chloroethanesulfonic acid Chemical compound CC(Cl)S(O)(=O)=O LHORZPMPPHTXFQ-UHFFFAOYSA-N 0.000 description 1
- LDMOEFOXLIZJOW-UHFFFAOYSA-N 1-dodecanesulfonic acid Chemical compound CCCCCCCCCCCCS(O)(=O)=O LDMOEFOXLIZJOW-UHFFFAOYSA-N 0.000 description 1
- XXCVIFJHBFNFBO-UHFFFAOYSA-N 1-ethenoxyoctane Chemical compound CCCCCCCCOC=C XXCVIFJHBFNFBO-UHFFFAOYSA-N 0.000 description 1
- OVGRCEFMXPHEBL-UHFFFAOYSA-N 1-ethenoxypropane Chemical compound CCCOC=C OVGRCEFMXPHEBL-UHFFFAOYSA-N 0.000 description 1
- HMNZROFMBSUMAB-UHFFFAOYSA-N 1-ethoxybutan-1-ol Chemical compound CCCC(O)OCC HMNZROFMBSUMAB-UHFFFAOYSA-N 0.000 description 1
- RUFPHBVGCFYCNW-UHFFFAOYSA-N 1-naphthylamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1 RUFPHBVGCFYCNW-UHFFFAOYSA-N 0.000 description 1
- WAPNOHKVXSQRPX-UHFFFAOYSA-N 1-phenylethanol Chemical compound CC(O)C1=CC=CC=C1 WAPNOHKVXSQRPX-UHFFFAOYSA-N 0.000 description 1
- KUIZKZHDMPERHR-UHFFFAOYSA-N 1-phenylprop-2-en-1-one Chemical compound C=CC(=O)C1=CC=CC=C1 KUIZKZHDMPERHR-UHFFFAOYSA-N 0.000 description 1
- AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 description 1
- LXFQSRIDYRFTJW-UHFFFAOYSA-N 2,4,6-trimethylbenzenesulfonic acid Chemical compound CC1=CC(C)=C(S(O)(=O)=O)C(C)=C1 LXFQSRIDYRFTJW-UHFFFAOYSA-N 0.000 description 1
- IKQCSJBQLWJEPU-UHFFFAOYSA-N 2,5-dihydroxybenzenesulfonic acid Chemical compound OC1=CC=C(O)C(S(O)(=O)=O)=C1 IKQCSJBQLWJEPU-UHFFFAOYSA-N 0.000 description 1
- YEVQZPWSVWZAOB-UHFFFAOYSA-N 2-(bromomethyl)-1-iodo-4-(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=C(I)C(CBr)=C1 YEVQZPWSVWZAOB-UHFFFAOYSA-N 0.000 description 1
- OYWHFEOXRNUWDQ-UHFFFAOYSA-N 2-(diethylamino)-3-phenyliminonaphthalene-1,4-dione Chemical compound CCN(CC)C1C(=O)C2=CC=CC=C2C(=O)C1=NC1=CC=CC=C1 OYWHFEOXRNUWDQ-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- 125000001340 2-chloroethyl group Chemical group [H]C([H])(Cl)C([H])([H])* 0.000 description 1
- DKHZGIKPBFMBBY-UHFFFAOYSA-N 2-cyano-n-[4-(diethylamino)phenyl]-2-phenylacetamide Chemical compound C1=CC(N(CC)CC)=CC=C1NC(=O)C(C#N)C1=CC=CC=C1 DKHZGIKPBFMBBY-UHFFFAOYSA-N 0.000 description 1
- VUIWJRYTWUGOOF-UHFFFAOYSA-N 2-ethenoxyethanol Chemical compound OCCOC=C VUIWJRYTWUGOOF-UHFFFAOYSA-N 0.000 description 1
- CWBAMDVCIHSKNW-UHFFFAOYSA-N 2-iminonaphthalene-1,4-dione Chemical compound C1=CC=C2C(=O)C(=N)CC(=O)C2=C1 CWBAMDVCIHSKNW-UHFFFAOYSA-N 0.000 description 1
- CUZKCNWZBXLAJX-UHFFFAOYSA-N 2-phenylmethoxyethanol Chemical compound OCCOCC1=CC=CC=C1 CUZKCNWZBXLAJX-UHFFFAOYSA-N 0.000 description 1
- BCHZICNRHXRCHY-UHFFFAOYSA-N 2h-oxazine Chemical compound N1OC=CC=C1 BCHZICNRHXRCHY-UHFFFAOYSA-N 0.000 description 1
- HTXMGVTWXZBZNC-UHFFFAOYSA-N 3,5-bis(methoxycarbonyl)benzenesulfonic acid Chemical compound COC(=O)C1=CC(C(=O)OC)=CC(S(O)(=O)=O)=C1 HTXMGVTWXZBZNC-UHFFFAOYSA-N 0.000 description 1
- REEBWSYYNPPSKV-UHFFFAOYSA-N 3-[(4-formylphenoxy)methyl]thiophene-2-carbonitrile Chemical compound C1=CC(C=O)=CC=C1OCC1=C(C#N)SC=C1 REEBWSYYNPPSKV-UHFFFAOYSA-N 0.000 description 1
- IWTYTFSSTWXZFU-UHFFFAOYSA-N 3-chloroprop-1-enylbenzene Chemical compound ClCC=CC1=CC=CC=C1 IWTYTFSSTWXZFU-UHFFFAOYSA-N 0.000 description 1
- JSGVZVOGOQILFM-UHFFFAOYSA-N 3-methoxy-1-butanol Chemical compound COC(C)CCO JSGVZVOGOQILFM-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- OLQIKGSZDTXODA-UHFFFAOYSA-N 4-[3-(4-hydroxy-2-methylphenyl)-1,1-dioxo-2,1$l^{6}-benzoxathiol-3-yl]-3-methylphenol Chemical compound CC1=CC(O)=CC=C1C1(C=2C(=CC(O)=CC=2)C)C2=CC=CC=C2S(=O)(=O)O1 OLQIKGSZDTXODA-UHFFFAOYSA-N 0.000 description 1
- ACPXHHDRVABPNY-UHFFFAOYSA-N 4-acetylbenzenesulfonic acid Chemical compound CC(=O)C1=CC=C(S(O)(=O)=O)C=C1 ACPXHHDRVABPNY-UHFFFAOYSA-N 0.000 description 1
- FSWHSYHYMTVSEL-UHFFFAOYSA-N 4-methoxypentan-1-ol Chemical compound COC(C)CCCO FSWHSYHYMTVSEL-UHFFFAOYSA-N 0.000 description 1
- JAJIPIAHCFBEPI-UHFFFAOYSA-N 9,10-dioxoanthracene-1-sulfonic acid Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2S(=O)(=O)O JAJIPIAHCFBEPI-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical compound C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- MRABAEUHTLLEML-UHFFFAOYSA-N Butyl lactate Chemical compound CCCCOC(=O)C(C)O MRABAEUHTLLEML-UHFFFAOYSA-N 0.000 description 1
- ISBWNEKJSSLXOD-UHFFFAOYSA-N Butyl levulinate Chemical compound CCCCOC(=O)CCC(C)=O ISBWNEKJSSLXOD-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- GHVNFZFCNZKVNT-UHFFFAOYSA-N Decanoic acid Natural products CCCCCCCCCC(O)=O GHVNFZFCNZKVNT-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- MQIUGAXCHLFZKX-UHFFFAOYSA-N Di-n-octyl phthalate Natural products CCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC MQIUGAXCHLFZKX-UHFFFAOYSA-N 0.000 description 1
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- PWLXTFFHCFWCGG-UHFFFAOYSA-N Heneicosanedioic acid Chemical compound OC(=O)CCCCCCCCCCCCCCCCCCCC(O)=O PWLXTFFHCFWCGG-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 1
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 240000007320 Pinus strobus Species 0.000 description 1
- RVGRUAULSDPKGF-UHFFFAOYSA-N Poloxamer Chemical compound C1CO1.CC1CO1 RVGRUAULSDPKGF-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004111 Potassium silicate Substances 0.000 description 1
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- YSMRWXYRXBRSND-UHFFFAOYSA-N TOTP Chemical compound CC1=CC=CC=C1OP(=O)(OC=1C(=CC=CC=1)C)OC1=CC=CC=C1C YSMRWXYRXBRSND-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000003926 acrylamides Chemical class 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000005250 alkyl acrylate group Chemical group 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- XPNGNIFUDRPBFJ-UHFFFAOYSA-N alpha-methylbenzylalcohol Natural products CC1=CC=CC=C1CO XPNGNIFUDRPBFJ-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 229940072049 amyl acetate Drugs 0.000 description 1
- PGMYKACGEOXYJE-UHFFFAOYSA-N anhydrous amyl acetate Natural products CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 150000004982 aromatic amines Chemical group 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- JPIYZTWMUGTEHX-UHFFFAOYSA-N auramine O free base Chemical compound C1=CC(N(C)C)=CC=C1C(=N)C1=CC=C(N(C)C)C=C1 JPIYZTWMUGTEHX-UHFFFAOYSA-N 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 229940007550 benzyl acetate Drugs 0.000 description 1
- 235000019445 benzyl alcohol Nutrition 0.000 description 1
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
- 229960001506 brilliant green Drugs 0.000 description 1
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 1
- 239000001191 butyl (2R)-2-hydroxypropanoate Substances 0.000 description 1
- 229940043232 butyl acetate Drugs 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 229940005460 butyl levulinate Drugs 0.000 description 1
- JIJAYWGYIDJVJI-UHFFFAOYSA-N butyl naphthalene-1-sulfonate Chemical compound C1=CC=C2C(S(=O)(=O)OCCCC)=CC=CC2=C1 JIJAYWGYIDJVJI-UHFFFAOYSA-N 0.000 description 1
- UDHMTPILEWBIQI-UHFFFAOYSA-N butyl naphthalene-1-sulfonate;sodium Chemical compound [Na].C1=CC=C2C(S(=O)(=O)OCCCC)=CC=CC2=C1 UDHMTPILEWBIQI-UHFFFAOYSA-N 0.000 description 1
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001728 carbonyl compounds Chemical class 0.000 description 1
- 150000001733 carboxylic acid esters Chemical class 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- ZXJXZNDDNMQXFV-UHFFFAOYSA-M crystal violet Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1[C+](C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 ZXJXZNDDNMQXFV-UHFFFAOYSA-M 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- BBLSYMNDKUHQAG-UHFFFAOYSA-L dilithium;sulfite Chemical compound [Li+].[Li+].[O-]S([O-])=O BBLSYMNDKUHQAG-UHFFFAOYSA-L 0.000 description 1
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical class C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002848 electrochemical method Methods 0.000 description 1
- IINNWAYUJNWZRM-UHFFFAOYSA-L erythrosin B Chemical compound [Na+].[Na+].[O-]C(=O)C1=CC=CC=C1C1=C2C=C(I)C(=O)C(I)=C2OC2=C(I)C([O-])=C(I)C=C21 IINNWAYUJNWZRM-UHFFFAOYSA-L 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- NHOGGUYTANYCGQ-UHFFFAOYSA-N ethenoxybenzene Chemical compound C=COC1=CC=CC=C1 NHOGGUYTANYCGQ-UHFFFAOYSA-N 0.000 description 1
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical class CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 1
- XJELOQYISYPGDX-UHFFFAOYSA-N ethenyl 2-chloroacetate Chemical compound ClCC(=O)OC=C XJELOQYISYPGDX-UHFFFAOYSA-N 0.000 description 1
- MEGHWIAOTJPCHQ-UHFFFAOYSA-N ethenyl butanoate Chemical compound CCCC(=O)OC=C MEGHWIAOTJPCHQ-UHFFFAOYSA-N 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 229940093499 ethyl acetate Drugs 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229940093476 ethylene glycol Drugs 0.000 description 1
- 125000005313 fatty acid group Chemical group 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 230000005802 health problem Effects 0.000 description 1
- NGAZZOYFWWSOGK-UHFFFAOYSA-N heptan-3-one Chemical compound CCCCC(=O)CC NGAZZOYFWWSOGK-UHFFFAOYSA-N 0.000 description 1
- MNWFXJYAOYHMED-UHFFFAOYSA-M heptanoate Chemical compound CCCCCCC([O-])=O MNWFXJYAOYHMED-UHFFFAOYSA-M 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
- LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000002757 inflammatory effect Effects 0.000 description 1
- 229910017053 inorganic salt Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- JESHZQPNPCJVNG-UHFFFAOYSA-L magnesium;sulfite Chemical compound [Mg+2].[O-]S([O-])=O JESHZQPNPCJVNG-UHFFFAOYSA-L 0.000 description 1
- 229940107698 malachite green Drugs 0.000 description 1
- FDZZZRQASAIRJF-UHFFFAOYSA-M malachite green Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](C)C)C=C1 FDZZZRQASAIRJF-UHFFFAOYSA-M 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- RUAIJHHRCIHFEV-UHFFFAOYSA-N methyl 4-amino-5-chlorothiophene-2-carboxylate Chemical compound COC(=O)C1=CC(N)=C(Cl)S1 RUAIJHHRCIHFEV-UHFFFAOYSA-N 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- DWCZIOOZPIDHAB-UHFFFAOYSA-L methyl green Chemical compound [Cl-].[Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)[N+](C)(C)C)=C1C=CC(=[N+](C)C)C=C1 DWCZIOOZPIDHAB-UHFFFAOYSA-L 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 235000010981 methylcellulose Nutrition 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- VUAAUVMKUNKSNE-UHFFFAOYSA-N n,n'-diphenylethene-1,2-diamine Chemical group C=1C=CC=CC=1NC=CNC1=CC=CC=C1 VUAAUVMKUNKSNE-UHFFFAOYSA-N 0.000 description 1
- UUORTJUPDJJXST-UHFFFAOYSA-N n-(2-hydroxyethyl)prop-2-enamide Chemical compound OCCNC(=O)C=C UUORTJUPDJJXST-UHFFFAOYSA-N 0.000 description 1
- XZSZONUJSGDIFI-UHFFFAOYSA-N n-(4-hydroxyphenyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NC1=CC=C(O)C=C1 XZSZONUJSGDIFI-UHFFFAOYSA-N 0.000 description 1
- POVITWJTUUJBNK-UHFFFAOYSA-N n-(4-hydroxyphenyl)prop-2-enamide Chemical compound OC1=CC=C(NC(=O)C=C)C=C1 POVITWJTUUJBNK-UHFFFAOYSA-N 0.000 description 1
- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 description 1
- OPBAOMCCUSNABO-UHFFFAOYSA-N n-(naphthalen-1-ylmethyl)aniline Chemical compound C=1C=CC2=CC=CC=C2C=1CNC1=CC=CC=C1 OPBAOMCCUSNABO-UHFFFAOYSA-N 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- PMJFVKWBSWWAKT-UHFFFAOYSA-N n-cyclohexylprop-2-enamide Chemical compound C=CC(=O)NC1CCCCC1 PMJFVKWBSWWAKT-UHFFFAOYSA-N 0.000 description 1
- BNTUIAFSOCHRHV-UHFFFAOYSA-N n-ethyl-n-phenylprop-2-enamide Chemical compound C=CC(=O)N(CC)C1=CC=CC=C1 BNTUIAFSOCHRHV-UHFFFAOYSA-N 0.000 description 1
- SWPMNMYLORDLJE-UHFFFAOYSA-N n-ethylprop-2-enamide Chemical compound CCNC(=O)C=C SWPMNMYLORDLJE-UHFFFAOYSA-N 0.000 description 1
- FYCBGURDLIKBDA-UHFFFAOYSA-N n-hexyl-2-methylprop-2-enamide Chemical compound CCCCCCNC(=O)C(C)=C FYCBGURDLIKBDA-UHFFFAOYSA-N 0.000 description 1
- NXURUGRQBBVNNM-UHFFFAOYSA-N n-nitro-2-phenylprop-2-enamide Chemical compound [O-][N+](=O)NC(=O)C(=C)C1=CC=CC=C1 NXURUGRQBBVNNM-UHFFFAOYSA-N 0.000 description 1
- BPCNEKWROYSOLT-UHFFFAOYSA-N n-phenylprop-2-enamide Chemical compound C=CC(=O)NC1=CC=CC=C1 BPCNEKWROYSOLT-UHFFFAOYSA-N 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
- 239000000025 natural resin Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 229940065472 octyl acrylate Drugs 0.000 description 1
- ANISOHQJBAQUQP-UHFFFAOYSA-N octyl prop-2-enoate Chemical compound CCCCCCCCOC(=O)C=C ANISOHQJBAQUQP-UHFFFAOYSA-N 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- GIPDEPRRXIBGNF-KTKRTIGZSA-N oxolan-2-ylmethyl (z)-octadec-9-enoate Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)OCC1CCCO1 GIPDEPRRXIBGNF-KTKRTIGZSA-N 0.000 description 1
- UCUUFSAXZMGPGH-UHFFFAOYSA-N penta-1,4-dien-3-one Chemical class C=CC(=O)C=C UCUUFSAXZMGPGH-UHFFFAOYSA-N 0.000 description 1
- GYDSPAVLTMAXHT-UHFFFAOYSA-N pentyl 2-methylprop-2-enoate Chemical compound CCCCCOC(=O)C(C)=C GYDSPAVLTMAXHT-UHFFFAOYSA-N 0.000 description 1
- ULDDEWDFUNBUCM-UHFFFAOYSA-N pentyl prop-2-enoate Chemical compound CCCCCOC(=O)C=C ULDDEWDFUNBUCM-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- CMPQUABWPXYYSH-UHFFFAOYSA-N phenyl phosphate Chemical compound OP(O)(=O)OC1=CC=CC=C1 CMPQUABWPXYYSH-UHFFFAOYSA-N 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 150000003016 phosphoric acids Chemical class 0.000 description 1
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical group OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 1
- 235000019252 potassium sulphite Nutrition 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000000176 sodium gluconate Substances 0.000 description 1
- 235000012207 sodium gluconate Nutrition 0.000 description 1
- 229940005574 sodium gluconate Drugs 0.000 description 1
- 235000019333 sodium laurylsulphate Nutrition 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- CXVGEDCSTKKODG-UHFFFAOYSA-N sulisobenzone Chemical compound C1=C(S(O)(=O)=O)C(OC)=CC(O)=C1C(=O)C1=CC=CC=C1 CXVGEDCSTKKODG-UHFFFAOYSA-N 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229940072958 tetrahydrofurfuryl oleate Drugs 0.000 description 1
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 229940075420 xanthine Drugs 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、ジアゾ感光性平版印刷版に関し、更に詳しく
は、保存安定性と、印刷工程において使用される処理薬
品に対する安定性即ち耐薬品性が改良されたジアゾ感光
性平版印刷版に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a diazo-sensitive lithographic printing plate, and more particularly, to storage stability and stability against processing chemicals used in the printing process, that is, chemical resistance. This invention relates to an improved diazo-sensitive lithographic printing plate.
平版印刷は、平版印刷版に水とインキを用い、画像部に
インキを、非画像部に水を供給して印刷する方式である
が、多数枚の印刷物を得るためには、平版印刷版におけ
る画像部と支持体とが強固に接着されていることが必要
である。また平版印刷版材料を露光した後現像処理等を
施して平版印刷版を得る製版工程、並びに印刷工程にお
いて使用される各種薬品に対する画像部の安定性(耐薬
品性)が良好であることが必要である。更には印刷工程
において非画像部に汚れが生じないことも要請される。Planographic printing is a printing method that uses water and ink on a planographic printing plate, supplying ink to image areas and water to non-image areas. It is necessary that the image area and the support are firmly adhered. In addition, the image area must have good stability (chemical resistance) to various chemicals used in the plate-making process where the lithographic printing plate material is exposed and then subjected to development treatment to obtain the lithographic printing plate, as well as the various chemicals used in the printing process. It is. Furthermore, it is also required that no stains occur in non-image areas during the printing process.
以上のような要求に応える手段として、従来においては
、支持体上に感光層を有してなる平版印刷版材料におい
て、支持体と感光層との間に、シランカップリング剤を
含有する非感光性中間層を当該支持体に隣接して設ける
方法が知られている(特開昭59−192250号公叩
)、シかしこの方法においては、斯かる平版印刷版を長
期間あるいは高温多湿の条件下で保存したときには、印
刷工程において非画像部に汚れが発生したり、耐刷力や
耐薬品性が著しく低下するなど、保存安定性が十分でな
いという欠点が生じ、またこの平版印刷版を工業的に製
造するためには中間層を設けるための追加の設備を必要
とするため、経済的にも好ましくない。As a means to meet the above requirements, conventionally, in lithographic printing plate materials having a photosensitive layer on a support, a non-photosensitive material containing a silane coupling agent between the support and the photosensitive layer has been used. A method is known (Japanese Unexamined Patent Publication No. 59-192250) in which a neutral intermediate layer is provided adjacent to the support. If the lithographic printing plates are stored under low temperature, there are disadvantages such as insufficient storage stability, such as stains occurring in non-image areas during the printing process and a significant decrease in printing durability and chemical resistance. In order to manufacture the intermediate layer, additional equipment is required to provide the intermediate layer, which is not economically preferable.
本発明の目的は、上記の如き問題点を解決し、保存安定
性に優れ、しかも使用される処理薬品に対する安定性即
ち耐薬品性の改良されたジアゾ感光性平版印刷版を提供
することにある。An object of the present invention is to solve the above-mentioned problems and provide a diazo-sensitive lithographic printing plate which has excellent storage stability and improved stability against processing chemicals used, that is, chemical resistance. .
本発明の上記目的は、支持体上に、感光性ジアゾ樹脂と
親油性高分子化合物を含有し、更にチタンカップリング
剤を含有する組成物よりなる感光層を有するジアゾ感光
性平版印刷版により達成される。The above object of the present invention is achieved by a diazo-sensitive lithographic printing plate having, on a support, a photosensitive layer made of a composition containing a photosensitive diazo resin, a lipophilic polymer compound, and further containing a titanium coupling agent. be done.
本発明において感光層の成分とされるチタンカップリン
グ剤としては、次の一般式で示されるものが好適に使用
される。As the titanium coupling agent used as a component of the photosensitive layer in the present invention, those represented by the following general formula are preferably used.
(RO)、Ti−X。(RO), Ti-X.
式中、ROはアルコキシ基、mはl乃至4の数、Xは脂
肪酸基、アルコキシ基、フェノール基、フェノキシ基、
ホスファイト基、ホスフェート基等を表わし、nは1乃
至5の数であり、nが2以上のときはXは互いに同一で
あっても異なるものであってもよい。In the formula, RO is an alkoxy group, m is a number from 1 to 4, X is a fatty acid group, an alkoxy group, a phenol group, a phenoxy group,
It represents a phosphite group, a phosphate group, etc., n is a number from 1 to 5, and when n is 2 or more, X may be the same or different.
斯かるチタンカップリング剤の具体的化合物の例として
は次のものを挙げることができる。Specific examples of such titanium coupling agents include the following.
CH30
11]
CH3CHOTi+OCCrvH3s) xCH300
1II II
CH,−CH−0−Ti+O−P −0−P−(0−C
,8,7)2) 3CH
CH。CH30 11] CH3CHOTi+OCCrvH3s) xCH300 1II II CH, -CH-0-Ti+O-P -0-P-(0-C
,8,7)2) 3CH CH.
ば
(CHi CHO÷4Ti・(Pro CaH+Jz
OH) z(C,H,、−0−)、Tt・CPro
C+3Hzt)zOH) zCProC+xHzフ)z
OH)!
CHI ○
CHx CHO’rt+o CC7H+s) 1C
Hs ○−C,11hsCH3C)I
OTi
双o−c〜C−CHJ z
:11
CHl
C1h 0−C−C+tH3sl
/
CH,0
:11
CH3CH0−Ti+o−p+〇−CsH+Jz):I
C1(3
□
CHlCHOTi+OCtHa NH−CzH7NH
z):1CH。(CHi CHO÷4Ti・(Pro CaH+Jz
OH) z(C,H,, -0-), Tt・CPro
C+3Hzt)zOH) zCProC+xHzfu)z
OH)! CHI ○ CHx CHO'rt+o CC7H+s) 1C
Hs ○-C, 11hsCH3C)I
OTi double o-c~C-CHJ z :11 CHl C1h 0-C-C+tH3sl
/ CH, 0 :11 CH3CH0-Ti+o-p+〇-CsH+Jz):I
C1(3 □ CHlCHOTi+OCtHa NH-CzH7NH
z): 1CH.
しり、 0CHs
CH,u
CHs
:1
本発明において、チタンカップリング剤は、感光層を構
成する感光性組成物中に通常0.01〜5重量%、特に
0.1〜1.5重量%の割合で含有させるのが好ましい
。0 CHs CH, u CHs : 1 In the present invention, the titanium coupling agent is generally 0.01 to 5% by weight, particularly 0.1 to 1.5% by weight, in the photosensitive composition constituting the photosensitive layer. It is preferable to contain it in a proportion.
本発明において感光層の成分とされる感光性ジアゾ樹脂
としては、例えばフォトグラフィック・サイエンス・ア
ンド・エンジニアリング(Photo。Examples of the photosensitive diazo resin used as a component of the photosensitive layer in the present invention include those manufactured by Photographic Science and Engineering (Photo).
Sci、 Eng、)第17巻、第33頁(1973)
、米国特許第2.063,631号、同2,679,
498号、同3,050,502号各明細書、特開昭5
9−78340号公報等にその製造方法が記載されてい
るジアゾ化合物と活性力ルボニル化合物、例えばホルム
アルデヒド、アセトアルデヒドあるいはベンズアルデヒ
ド等とを、硫酸、リン酸、塩酸等の酸性媒体中で縮合さ
せて得られるジアゾ樹脂、特公昭49−4001号公報
にその製造方法が記載されているジアゾ化合物とジフェ
ニルエーテル誘導体を縮合反応させて得られるジアゾ樹
脂、その他を挙げることができる。Sci, Eng,) Volume 17, Page 33 (1973)
, U.S. Patent No. 2,063,631, U.S. Patent No. 2,679,
No. 498, specifications of No. 3,050,502, JP-A-5
It is obtained by condensing a diazo compound whose manufacturing method is described in Publication No. 9-78340 etc. with an active carbonyl compound such as formaldehyde, acetaldehyde or benzaldehyde in an acidic medium such as sulfuric acid, phosphoric acid or hydrochloric acid. Diazo resins, diazo resins obtained by condensation reaction of diazo compounds and diphenyl ether derivatives whose production method is described in Japanese Patent Publication No. 49-4001, and others can be mentioned.
最終的に得られる感光層の感度、保存安定性並びに膜強
度を考慮すると、本発明においては、下記一般式(+)
で示される感光性ジアゾ樹脂、特に当該一般式(1)に
おけるnが5以上である樹脂を20モル%以上、特に好
ましくは20〜60モル%の割合で含有する感光性ジア
ゾ樹脂を使用することが好ましい。Considering the sensitivity, storage stability, and film strength of the finally obtained photosensitive layer, in the present invention, the following general formula (+)
Use a photosensitive diazo resin represented by, especially a photosensitive diazo resin containing a resin in which n in the general formula (1) is 5 or more in a proportion of 20 mol% or more, particularly preferably 20 to 60 mol%. is preferred.
一般式(1)
式中、R1−RZおよびR1は各々同一または異なる、
水素原子、アルキル基またはアルコキシ基を示し、Rは
水素原子、アルキル基またはフェニル基を示し、Xは対
アニオンを示し、nは1〜200の数を示す。そしてR
,、R,およびR1のアルキル基およびアルコキシ基と
しては、例えば炭素数1〜5のアルキル基および炭素数
1〜5のアルコキシ基を挙げることができ、またRのア
ルキル基としては、炭素数1〜5のアルキル基を挙げる
ことができる。General formula (1) In the formula, R1-RZ and R1 are each the same or different,
A hydrogen atom, an alkyl group or an alkoxy group, R represents a hydrogen atom, an alkyl group or a phenyl group, X represents a counter anion, and n represents a number from 1 to 200. and R
, , R, and R1 include, for example, an alkyl group having 1 to 5 carbon atoms and an alkoxy group having 1 to 5 carbon atoms. -5 alkyl groups may be mentioned.
斯かる感光性ジアゾ樹脂は、公知の方法、例えばフォト
グラフィック・サイエンス・アンド・エンジニアリング
(Photo、 Sci、 Eng、)第17巻、第3
4頁(1973)、米国特許第2,063,631号、
同2,679.498号各明11書に記載された方法に
従い、硫酸やリン酸あるいは塩酸中でジアゾニウム塩と
アルデヒド類例えばパラホルムアルデヒド、アセトアル
デヒド、ベンズアルデヒドとを重縮合させることによっ
て得ることができる。Such photosensitive diazo resins can be prepared by known methods such as Photographic Science and Engineering (Photo, Sci, Eng.) Vol. 17, No. 3.
4 pages (1973), U.S. Patent No. 2,063,631;
It can be obtained by polycondensing a diazonium salt with an aldehyde such as paraformaldehyde, acetaldehyde, or benzaldehyde in sulfuric acid, phosphoric acid, or hydrochloric acid according to the method described in No. 2,679.498.
そして通常の場合、ジアゾニウム塩とアルデヒド類とを
モル比でt:o、6〜l:2、好ましくはt+o、7〜
t:t、Sの割合で仕込み、低温で短時間、例えば温度
10°C以下で3時間程度反応させることにより、高怒
度の感光性ジアゾ樹脂を得ることができる。In normal cases, the molar ratio of diazonium salt and aldehyde is t:o, 6 to 1:2, preferably t+o, 7 to 1:2.
A photosensitive diazo resin with a high degree of anger can be obtained by charging at a ratio of t:t, S and reacting at a low temperature for a short time, for example, at a temperature of 10° C. or less for about 3 hours.
上記のジアゾ樹脂の対アニオンは、当該ジアゾ樹脂と安
定な塩を形成し、かつ当該樹脂を有機溶媒に可溶化する
アニオンを含む。これらには、デカン酸および安息香酸
等の有機カルボン酸、フェニルリン酸等の有段リン酸お
よびスルホン酸が含まれ、典型的な例としては、メタン
スルホン酸、クロロエタンスルホン酸、ドデカンスルホ
ン酸、ベンゼンスルホン酸、トルエンスルホン酸、メシ
チレンスル゛ホン酸およびアントラキノンスルホン酸、
2−ヒドロキシ−4−メトキシベンゾフェノン−5−ス
ルホン酸、ヒドロキノンスルホン酸、4−アセチルベン
ゼンスルホン酸、ジメチル−5−スルホイソフタレート
等の脂肪族並びに芳香族スルホン酸、2,2°、4,4
°−テトラヒドロキジヘンシフエノン、1,2.3−ト
リヒドロキシへンゾフエノン、2.2°、4−トリヒド
ロキシへンヅフェノン等の水酸基含有芳香族化合物、ヘ
キサフルオロリン酸、テトラフルオロホウ酸等のハロゲ
ン化ルイス酸、C10い 104等の過ハロゲン酸等を
挙げることができるが、これらに限られるものではない
。The counter anion of the diazo resin described above includes an anion that forms a stable salt with the diazo resin and solubilizes the resin in an organic solvent. These include organic carboxylic acids such as decanoic acid and benzoic acid, stepped phosphoric and sulfonic acids such as phenyl phosphoric acid, and typical examples include methanesulfonic acid, chloroethanesulfonic acid, dodecanesulfonic acid, benzenesulfonic acid, toluenesulfonic acid, mesitylenesulfonic acid and anthraquinonesulfonic acid,
Aliphatic and aromatic sulfonic acids such as 2-hydroxy-4-methoxybenzophenone-5-sulfonic acid, hydroquinonesulfonic acid, 4-acetylbenzenesulfonic acid, dimethyl-5-sulfoisophthalate, 2,2°, 4,4
Hydroxyl group-containing aromatic compounds such as °-tetrahydroxyhenzophenone, 1,2.3-trihydroxyhenzophenone, 2.2°,4-trihydroxyhenzophenone, and halogens such as hexafluorophosphoric acid and tetrafluoroboric acid. Examples include, but are not limited to, perhalogen acids such as C10-104 and C10-104.
これらの中で特に好ましいものは、ヘキサフルオロリン
酸である。Particularly preferred among these is hexafluorophosphoric acid.
本発明において、感光層の成分とされる親油性高分子化
合物としては、ポリアミド、ポリエーテル、ポリエステ
ル、ポリカーボネート、ポリスチレン、ポリウレタン、
ポリビニクロライドおよびそのコポリマー、ポリビニル
ブチラール樹脂、ポリビニルホルマール樹脂、シュラツ
ク、エポキシ樹脂、フェノール樹脂、アクリル樹脂、そ
の他を挙げることができる。In the present invention, the lipophilic polymer compound used as a component of the photosensitive layer includes polyamide, polyether, polyester, polycarbonate, polystyrene, polyurethane,
Examples include polyvinychloride and its copolymers, polyvinyl butyral resins, polyvinyl formal resins, shrinks, epoxy resins, phenolic resins, acrylic resins, and others.
更に好ましいものとして、下記(1)〜(12)に示す
七ツマ−から得られる、通常2〜20万の分子量を有す
る共重合体を挙げることができる。More preferable examples include copolymers having a molecular weight of usually 20,000 to 200,000, which are obtained from the seven polymers shown in (1) to (12) below.
(1)芳香族水酸基を有するモノマー、例えばN−(4
−ヒドロキシフェニル)アクリルアミドまたはN−(4
−ヒドロキシフェニル)メタクリルアミド、0−1m−
1p−ヒドロキシスチレン、o −。(1) Monomers having aromatic hydroxyl groups, such as N-(4
-hydroxyphenyl)acrylamide or N-(4
-Hydroxyphenyl) methacrylamide, 0-1m-
1p-hydroxystyrene, o-.
m−1p−ヒドロキシフェニル−アクリレートまたは一
メタクリレート
(2)脂肪族水酸基を有するモノマー、例えば2−ヒド
ロキシエチルアクリレートまたは2−ヒドロキシエチル
メタクリレート
(3)アクリル酸、メタクリル酸、無水マレイン酸等の
α、β−不飽和カルボン酸
(4)アクリル酸メチル、アクリル酸エチル、アクリル
酸プロピル、アクリル酸ブチル、アクリル酸アミル、ア
クリル酸ヘキシル、アクリル酸オクチル、アクリル酸−
2−クロロエチル、2−ヒドロキシエチルアクリレート
、グリシジルアクリレート、N−ジメチルアミノエチル
アクリレート等の(置換)アルキルアクリレート
(5)メチルメタクリレート、エチルメタクリレート、
プロピルメタクリレート、ブチルメタクリレート、アミ
ルメタクリレート、シクロへキシルメタクリレート、2
−ヒドロキシエチルメタクリレート、4−ヒドロキシエ
チルアクリレート、グリシジルメタクリレート、N−ジ
メチルアミノエチルメタクリレート等の(置換)アルキ
ルメタクリレート
(6)アクリルアミド、メタクリルアミド、N−メチロ
ールアクリルアミド、N−メチロールメタクリルアミド
、N−エチルアクリルアミド、N−1へキシルメタクリ
ルアミド、N−シクロヘキシルアクリルアミド、N−ヒ
ドロキシエチルアクリルアミド、N−フェニルアクリル
アミド、N−ニトロフェニルアクリルアミド、N−エチ
ル−N−フェニルアクリルアミド等のアクリルアミド若
しくはメタクリルアミド類
(7)エチルビニルエーテル、2−クロロエチルビニル
エーテル、ヒドロキシエチルビニルエーテル、プロピル
ビニルエーテル、ブチルビニルエーテル、オクチルビニ
ルエーテル、フェニルビニルエーテル−等のビニルエー
テル類
(8)ビニルアセテート、ビニルクロロアセテート、ビ
ニルブチレート、安息香酸ビニル等のビニルエステル類
(9)スチレン、α−メチルスチレン、メチルスチレン
、クロロメチルスチレン等のスチレン類(10)メチル
ビニルケトン、エチルビニルケトン、プロピルビニルケ
トン、フェニルビニルケトン等のビニルケトン類
(11)エチレン、プロピレン、イソブチレン、ブタジ
ェン、イソプレン等のオレフィン類(12) N−ビニ
ルピロリドン、N−ビニルカルバゾール、4−ビニルピ
リジン、アクリロニトリル、メタクリロニトリル等
更に、上記モノマーと共重合し得る七ツマ−を共重合さ
せて得られる共重合体であってもよい。m-1p-hydroxyphenyl-acrylate or monomethacrylate (2) Monomers having aliphatic hydroxyl groups, such as 2-hydroxyethyl acrylate or 2-hydroxyethyl methacrylate (3) α, β of acrylic acid, methacrylic acid, maleic anhydride, etc. -Unsaturated carboxylic acids (4) methyl acrylate, ethyl acrylate, propyl acrylate, butyl acrylate, amyl acrylate, hexyl acrylate, octyl acrylate, acrylic acid-
(Substituted) alkyl acrylates such as 2-chloroethyl, 2-hydroxyethyl acrylate, glycidyl acrylate, N-dimethylaminoethyl acrylate (5) Methyl methacrylate, ethyl methacrylate,
Propyl methacrylate, butyl methacrylate, amyl methacrylate, cyclohexyl methacrylate, 2
- (Substituted) alkyl methacrylates such as hydroxyethyl methacrylate, 4-hydroxyethyl acrylate, glycidyl methacrylate, and N-dimethylaminoethyl methacrylate (6) Acrylamide, methacrylamide, N-methylolacrylamide, N-methylolmethacrylamide, N-ethylacrylamide , N-1 hexyl methacrylamide, N-cyclohexyl acrylamide, N-hydroxyethylacrylamide, N-phenylacrylamide, N-nitrophenylacrylamide, N-ethyl-N-phenylacrylamide and other acrylamides or methacrylamides (7) Ethyl Vinyl ethers such as vinyl ether, 2-chloroethyl vinyl ether, hydroxyethyl vinyl ether, propyl vinyl ether, butyl vinyl ether, octyl vinyl ether, phenyl vinyl ether, etc. (8) Vinyl esters such as vinyl acetate, vinyl chloroacetate, vinyl butyrate, vinyl benzoate, etc. (9) Styrenes such as styrene, α-methylstyrene, methylstyrene, chloromethylstyrene, etc. (10) Vinyl ketones such as methyl vinyl ketone, ethyl vinyl ketone, propyl vinyl ketone, phenyl vinyl ketone, etc. (11) Ethylene, propylene, isobutylene , butadiene, isoprene and other olefins (12). It may also be a copolymer.
また上記モノマーを共重合させて得られる共重合体を例
えば、グリシジルメタクリレート、グリシジルアクリレ
ート等によって更に修飾したものも含まれる力゛(これ
らに限られるものではない。It also includes (but is not limited to) copolymers obtained by copolymerizing the above monomers and further modified with, for example, glycidyl methacrylate, glycidyl acrylate, etc.
更に具体的には、上記(1)、(2)に掲げたモノマー
等より得られ、水酸基を有する共重合体が好ましく、芳
香族性水酸基を有する共重合体が更に好ましい。More specifically, a copolymer obtained from the monomers listed in (1) and (2) above and having a hydroxyl group is preferable, and a copolymer having an aromatic hydroxyl group is more preferable.
また上記共重合体には、必要に応じて、ポリビニルブチ
ラール樹脂、ポリウレタン樹脂、ポリアミド樹脂、エポ
キシ樹脂、ノポラフク樹脂、天然樹脂等を添加してもよ
い。Further, polyvinyl butyral resin, polyurethane resin, polyamide resin, epoxy resin, noporafuku resin, natural resin, etc. may be added to the above copolymer, if necessary.
本発明において、親油性高分子化合物は、怒光性組成物
の固形分中【通常40〜99重量%、好ましくは50〜
95重量%の割合で含有させる。また(8光性ジ了ゾ…
脂は通常1〜60重世%、好ましくは3〜30重里%の
割合で含有させる。In the present invention, the lipophilic polymer compound is contained in the solid content of the photogenic composition [usually 40 to 99% by weight, preferably 50 to 99% by weight].
The content is 95% by weight. Also (8 light-related direzo...
The fat content is usually 1 to 60%, preferably 3 to 30%.
本発明において、怒光層を形成するための忌光性組成物
には、さらにフリーラジカルまたは酸と反応して色調を
変化する変色剤(色素)全含有させることができる。当
該変色剤は、露光による可視画像(露光可視画像)また
は現像後の可視画像を得ることを目的として使用される
。In the present invention, the photophobic composition for forming the photosensitive layer may further contain a color change agent (pigment) that changes color tone by reacting with free radicals or acids. The color change agent is used for the purpose of obtaining a visible image by exposure (exposed visible image) or a visible image after development.
斯かる変色剤としては、フリーラジカルまたは酸と反応
して色調が変化するものであればいずれのものも使用す
ることができる。ここに「色調が変化する」とは、無色
から有色の色調への変化、並びに有色から無色あるいは
異なる有色の色調への変化のいずれをも包含する。好ま
しい変色剤は酸と塩を形成して色調を変化するものであ
る。As such a color change agent, any color change agent can be used as long as it reacts with free radicals or acids to change color tone. Here, "change in tone" includes both a change from colorless to a colored tone and a change from colored to colorless or a different colored tone. Preferred color changing agents are those that change color tone by forming a salt with an acid.
かかる変色剤としては、例えば、ビクトリアピュアブル
ーBol+(保土谷化学社!!り、オイルブルー160
3(オリエント化学工業社製)、パテントビニアブルー
(住友三国化学社製)、クリスタルバイオレット、ブリ
リアントグリーン、エチルバイオレフト、メチルバイオ
レット、メチルグリーン、エリスロシンB1ベイシノク
フクシン、マラカイトグリーン、オイルレッド、m−ク
レゾールパープル、ローダミンB1オーラミン、4−p
−ジエチルアミノフヱニルイミノナフトキノン、シアノ
−p−ジエチルアミノフェニルアセトアニリド等に代表
されるトリフェニルメタン系、ジフェニルメタン系、オ
キサジン系、キサンチン系、イミノナフトキノン系、ア
ゾメチン系またはアントラキノン系の色素を、有色から
無色あるいは異なる有色の色調へ変化する変色剤の例と
して挙げることができる。Examples of such a color change agent include Victoria Pure Blue Bol+ (Hodogaya Chemical Co., Ltd., Oil Blue 160).
3 (manufactured by Orient Chemical Industry Co., Ltd.), patent vinyl blue (manufactured by Sumitomo Mikuni Chemical Co., Ltd.), crystal violet, brilliant green, ethyl bioleft, methyl violet, methyl green, erythrosin B1 basinokufuchsin, malachite green, oil red, m -Cresol purple, rhodamine B1 auramine, 4-p
- Triphenylmethane-based, diphenylmethane-based, oxazine-based, xanthine-based, iminonaphthoquinone-based, azomethine-based, or anthraquinone-based dyes such as diethylaminophenyliminonaphthoquinone, cyano-p-diethylaminophenyl acetanilide, etc., ranging from colored to colorless. Alternatively, it can be cited as an example of a color change agent that changes to a different colored tone.
一方、無色から有色に変化する変色剤の例としては、ロ
イコ色素および、例えばトリフェニルアミン、ジフェニ
ルアミン、0−クロロアニリン、1.2.3− )リフ
ェニルグアニジン、ナフチルアミン、ジアミノジフェニ
ルメタン、p、p”−ビス−ジメチルアミノジフェニル
アミン、1.2−ジアニリノエチレン、p、ρ°、ρ”
−トリス−ジメチルアミノトリフェニルメタン、p、p
’−とスージメチルアミノジフェニルメチルイミン、p
、p’、p”−トリアミノ−0−メチルトリフェニルメ
タン、p、p−ビス−ジメチルアミノジフェニル−4−
アニリノナフチルメタン、p、ρ゛、p”−トリアミノ
トリフェニルメタンに代表される第1級または第2級ア
リールアミン系色素を挙げることができる。On the other hand, examples of color changing agents that change from colorless to colored include leuco dyes and, for example, triphenylamine, diphenylamine, 0-chloroaniline, 1.2.3-) liphenylguanidine, naphthylamine, diaminodiphenylmethane, p, p "-bis-dimethylaminodiphenylamine, 1,2-dianilinoethylene, p, ρ°, ρ"
-tris-dimethylaminotriphenylmethane, p, p
'- and sudimethylaminodiphenylmethylimine, p
, p', p''-triamino-0-methyltriphenylmethane, p, p-bis-dimethylaminodiphenyl-4-
Examples include primary or secondary arylamine dyes typified by anilinonaphthylmethane and p, ρ゛, p''-triaminotriphenylmethane.
特に好ましくはトリフェニルメタン系、ジフェニルメタ
ン系色素が有効に用いられ、さらに好ましくはトリフェ
ニルメタン系色素であり、特にビクトリアピュアブルー
BOHが好ましい。Particularly preferably, triphenylmethane and diphenylmethane dyes are effectively used, more preferably triphenylmethane dyes, and Victoria Pure Blue BOH is particularly preferred.
上記変色剤は、感光性組成物中に通常約0.5〜約10
重量%の割合で含有させることが好ましく、より好まし
くは約1〜5重量%含有させる。The above-mentioned color changing agent is usually added in the photosensitive composition from about 0.5 to about 10
It is preferably contained in a proportion of 1% to 5% by weight, more preferably about 1 to 5% by weight.
本発明において、感光層を形成するための感光性組成物
には、更に種々の添加物を加えることができる。In the present invention, various additives can be further added to the photosensitive composition for forming the photosensitive layer.
添加物の例としては、例えば、塗布性を改良するための
アルキルエーテル類(例えばエチルセルロース、メチル
セルロース)、フッ素系界面活性剤類や、ノニオン系界
面活性剤〔例えば、プルロニックL−64(旭電化株式
会社製)〕、塗膜の柔軟性、耐Y耗性を付与するための
可塑剤(例えばブチルフタリル、ポリエチレングリコー
ル、クエン酸トリブチル、フタル酸ジエチル、フタル酸
ジプチル、フタル酸ジヘキシル、フタル酸ジオクチル、
リン酸トリクレジル、リン酸トリブチル、リン酸トリオ
クチル、オレイン酸テトラヒドロフルフリル、アクリル
酸またはメタクリル酸のオリゴマーおよびポリマー)、
画像部の怒脂性を向上させるための感脂化剤(例えば、
特開昭55−527号公報記載のスチレン−無水マレイ
ン酸共重合体のアルコールによるハーフェステル化物等
)、安定剤〔例えば、リン酸、亜リン酸、有機a(クエ
ン酸、ンユウ酸、ヘンゼンスルホン酸、ナフタレンスル
ホン酸、4−メトキシ−2−ヒドロキシベンゾフェノン
−5−スルホン酸、酒石酸等)〕等を挙げることができ
る。これらの添加剤の添加量はその使用対象の組成や目
的によっても異なるが、−113に8光性組成物の全固
形分に対して、0.01〜30重量%である。Examples of additives include alkyl ethers (e.g., ethyl cellulose, methyl cellulose), fluorine-based surfactants, and nonionic surfactants (e.g., Pluronic L-64 (Asahi Denka Co., Ltd.) to improve coating properties. company)], plasticizers to impart flexibility and wear resistance to the coating film (e.g., butyl phthalyl, polyethylene glycol, tributyl citrate, diethyl phthalate, diptyl phthalate, dihexyl phthalate, dioctyl phthalate,
tricresyl phosphate, tributyl phosphate, trioctyl phosphate, tetrahydrofurfuryl oleate, oligomers and polymers of acrylic or methacrylic acid),
Lipid-sensitizing agents to improve the greasiness of the image area (for example,
Stabilizers [e.g., phosphoric acid, phosphorous acid, organic a (citric acid, phosphoric acid, henzensulfone, etc.), stabilizers [e.g., phosphoric acid, phosphorous acid, organic a acid, naphthalenesulfonic acid, 4-methoxy-2-hydroxybenzophenone-5-sulfonic acid, tartaric acid, etc.). The amount of these additives added varies depending on the composition and purpose of use, but is 0.01 to 30% by weight based on the total solid content of the -113 to 8 photosensitive composition.
このような感光性組成物を用いて支持体上に感光層を設
けるためにiよ、上記怒光性ジアヅ樹脂、現油性高分子
化合物およびチタンカップリング剤並びに必要に応じて
添加される種々の添加剤の各所定量を、適当な溶媒(メ
チルセロソルブ、エチルセロソルブ、メチルセロソルブ
アセテート、アセトン、メチルエチルケトン、メタノー
ル、ジメチルホルムアミド、ジメチルスルホキシド、水
またはこれらの混合物等)中に溶解させて感光性組成物
の塗布液を調製し、これを支持体上に塗布し乾燥すれば
よい、塗布する際の塗布液における感光性組成物の濃度
は1〜50重量%の範囲とすることが望ましい、そして
この場合に感光性組成物の塗布量は、おおむね0.2〜
10g/m程度とすればよい。In order to form a photosensitive layer on a support using such a photosensitive composition, the above-mentioned photosensitive diazure resin, oil-based polymer compound, titanium coupling agent, and various additives added as necessary are added. A photosensitive composition is prepared by dissolving a predetermined amount of each additive in a suitable solvent (such as methyl cellosolve, ethyl cellosolve, methyl cellosolve acetate, acetone, methyl ethyl ketone, methanol, dimethyl formamide, dimethyl sulfoxide, water, or a mixture thereof). It is sufficient to prepare a coating solution, apply it onto a support, and dry it. It is desirable that the concentration of the photosensitive composition in the coating solution at the time of coating is in the range of 1 to 50% by weight, and in this case, The coating amount of the photosensitive composition is approximately 0.2~
It may be about 10 g/m.
本発明において、支持体としては、例えば紙、プラスチ
ック、金属等を用いることができる。金属の例としては
例えば、アルミニウム、マグネシウム、亜鉛、クロム、
鉄、ニッケル、およびこれらの金属の合金、その他を挙
げることができる。In the present invention, as the support, for example, paper, plastic, metal, etc. can be used. Examples of metals include aluminum, magnesium, zinc, chromium,
Mention may be made of iron, nickel, and alloys of these metals, among others.
支持体は少なくともその表面がこれらの材料で構成され
たものであることが望ましい。It is desirable that at least the surface of the support is made of these materials.
即ち、当該支持体の裏面に他の基材を組み合わせたもの
、例えば、薄い金属板の裏面に紙、プラスチック、他の
金属基材を貼り合わせたもの、紙、プラスチックの片面
または両面に金属を蒸着若しくはめっきしたもの、また
は金属箔を貼り合わせたもの、金属板の上に他の金属を
めっきしたものであってもよい。In other words, the back side of the support is combined with other base materials, such as paper, plastic, or other metal base materials pasted on the back side of a thin metal plate, or paper or plastic with metal on one or both sides. It may be vapor-deposited or plated, a metal foil pasted together, or a metal plate plated with another metal.
更に支持体は、その表面が粗面化されたものであること
が好ましい。Furthermore, the surface of the support is preferably roughened.
金属支持体の表面を粗面化する方法としては、従来知ら
れた種々の方法を利用することができ、例えばボール研
磨法、ブラシ研磨法のような機械的方法、酸あるいはア
ルカリを含む溶液でエツチングする方法のような化学的
方法、電解によりエツチングする方法のような電気化学
的方法を挙げることができる。Various conventionally known methods can be used to roughen the surface of the metal support, including mechanical methods such as ball polishing and brush polishing, and solutions containing acids or alkalis. Examples include chemical methods such as etching methods and electrochemical methods such as electrolytic etching methods.
本発明において好ましい支持体としては、アル・ミニラ
ム支持体を挙げることができ、更に表面が粗面化された
アルミニウム支持体が好ましく、特に粗面化された表面
を陽極酸化処理および親水化処理したものが好ましい。Preferred supports in the present invention include aluminum minilum supports, and more preferably aluminum supports with roughened surfaces, particularly those whose roughened surfaces have been anodized and hydrophilized. Preferably.
本発明において支持体として使用するアルミニウム板(
アルミニウムと他の金属、紙、プラスチックなどとの積
層体を含む、以下において同じ、)の粗面化には、表面
を脱脂した後、例えばブラシ研磨法、ボール研磨法、ホ
ーニング研磨法、化学研磨法、電解エツチング法あるい
はこれらのうちの2つ以上の研磨法を組み合わせた研磨
法が適用される。陽極酸化処理は、例えばリン酸、クロ
ム酸、ホウ酸、硫酸等の無機塩若しくはシュウ酸等の有
ja酸の単独水溶液、あるいはこれらの酸の2種以上に
よる混合水溶液中において、そして好ましくは硫酸水?
8液中において、アルミニウム板を陽極として電流を通
じることによって行われる。Aluminum plate used as a support in the present invention (
To roughen the surface of aluminum (including laminates of other metals, paper, plastic, etc.), the same applies below), for example, brush polishing, ball polishing, honing, chemical polishing after degreasing the surface. Polishing method, electrolytic etching method, or a combination of two or more of these polishing methods can be applied. The anodizing treatment is performed, for example, in a single aqueous solution of an inorganic salt such as phosphoric acid, chromic acid, boric acid, or sulfuric acid or a japonic acid such as oxalic acid, or in a mixed aqueous solution of two or more of these acids, and preferably in sulfuric acid. water?
This is done by passing an electric current through an aluminum plate as an anode in 8 liquid.
陽極酸化被膜量は5〜60■/dlSzであることが好
ましく、更に好ましくは5〜30■/dI112である
。The amount of anodized film is preferably 5 to 60 .mu./dlSz, more preferably 5 to 30 .mu./dI112.
親水化処理としては熱水封孔処理やケイ酸ソーダ処理を
挙げることができるが、良好な接着性や保存安定性が得
られる点から、ケイ酸ソーダ処理が好ましい、ケイ酸ソ
ーダ処理は、通常濃度0.1〜5%のメタケイ酸ソーダ
7容7夜中に、被処理物を温度50℃〜95℃で10秒
間〜5分間浸漬することによって行われる。好ましくは
、その後60℃〜100℃の水に10秒間〜5分間浸漬
して処理される。Examples of hydrophilic treatment include hot water sealing treatment and sodium silicate treatment, but sodium silicate treatment is preferred because it provides good adhesion and storage stability. The treatment is carried out by immersing the object to be treated overnight in 7 volumes of sodium metasilicate having a concentration of 0.1 to 5% at a temperature of 50 to 95°C for 10 seconds to 5 minutes. Preferably, it is then treated by immersion in water at 60°C to 100°C for 10 seconds to 5 minutes.
支持体上に形成された感光層には、従来の常法が通用さ
れて平版印刷版が製造される。即ち、線画像、網点画像
等による透明原画を通して感光層を感光させ、次いで水
性現像液で現像することにより、原画に対してネガのレ
リーフ像が形成される。露光に好適な光源としては、カ
ーボンアーク灯、水銀灯、キセノンランプ、メタルハラ
イドランプ、ストロボ等を挙げることができる。The photosensitive layer formed on the support is subjected to conventional methods to produce a lithographic printing plate. That is, a negative relief image is formed on the original image by exposing the photosensitive layer to light through a transparent original image such as a line image or halftone image, and then developing with an aqueous developer. Light sources suitable for exposure include carbon arc lamps, mercury lamps, xenon lamps, metal halide lamps, strobes, and the like.
本発明に係るジアゾ感光性平版印刷版の現像処理に用い
られる現像液は、公知のいずれのものであってもよいが
、好ましくは以下のものである。The developer used in the development of the diazo-sensitive lithographic printing plate according to the present invention may be any known developer, but the following are preferred.
即ち本発明に係るジアゾ感光性平版印刷版を現像するた
めに好適な現像液は、特定の有機溶媒と、アルカリ剤と
、水とを必須成分として含有するものである。That is, a developer suitable for developing the diazo-sensitive lithographic printing plate according to the present invention contains a specific organic solvent, an alkaline agent, and water as essential components.
ここに、特定の有機溶媒とは、現像液中に含有させたと
きに上述の感光性組成物よりなる感光層の非露光部(非
画像部)を溶解または膨潤することができ、しかも常温
(20℃)において水に対する溶解度が10重量%以下
の有機溶媒をいう、上記のような特性を有する有機溶媒
であれば特に制限されることはない。従って用いられる
有機溶媒を限定するものではないが、これらを例示する
ならば、例えば酢酸エチル、酢酸プロピル、酢酸ブチル
、酢酸アミル、酢酸ベンジル、エチレングリコールモツ
プチルアセテート、乳酸ブチル、レブリン酸ブチルのよ
うなカルボン酸エステル;エチルブチルケトン、メチル
イソブチルケトン、シクロヘキサノンのようなケトン類
;エチレングリコールモノブチルエーテル、エチレング
リコールベンジルエーテル、エチレングリコールモノフ
ェニルエーテル、ベンジルアルコール、メチルフェニル
カルビノール、n−アミルアルコール、メチルアミルア
ルコールのようなアルコール類;キシレンのようなアル
キル置換芳香族炭化水素;メチレンジクロライド、エチ
レンジクロライド、モノクロロベンゼンのようなハロゲ
ン化炭化水素などかある。これら有機溶媒は一種以上用
いてもよい。これら有機溶媒の中では、エチレングリコ
ールモノフェニルエーテルとベンジルアルコールが特に
有効である。またこれら有機溶媒の現像液中における含
有量は、おおむね1〜20重量%とされ、特に2〜10
重量%のときにより好ましい結果を得ることができる。Here, the specific organic solvent is one that can dissolve or swell the non-exposed area (non-image area) of the photosensitive layer made of the above-mentioned photosensitive composition when it is contained in the developer, and that can be used at room temperature ( The organic solvent is not particularly limited as long as it is an organic solvent having the above-mentioned characteristics, which refers to an organic solvent having a solubility in water of 10% by weight or less at 20° C.). Therefore, the organic solvent to be used is not limited, but examples thereof include ethyl acetate, propyl acetate, butyl acetate, amyl acetate, benzyl acetate, ethylene glycol motuptylacetate, butyl lactate, and butyl levulinate. carboxylic acid esters; ketones such as ethyl butyl ketone, methyl isobutyl ketone, and cyclohexanone; ethylene glycol monobutyl ether, ethylene glycol benzyl ether, ethylene glycol monophenyl ether, benzyl alcohol, methylphenyl carbinol, n-amyl alcohol, methyl These include alcohols such as amyl alcohol; alkyl-substituted aromatic hydrocarbons such as xylene; and halogenated hydrocarbons such as methylene dichloride, ethylene dichloride, and monochlorobenzene. One or more of these organic solvents may be used. Among these organic solvents, ethylene glycol monophenyl ether and benzyl alcohol are particularly effective. The content of these organic solvents in the developer is generally 1 to 20% by weight, particularly 2 to 10% by weight.
More preferable results can be obtained when the amount is % by weight.
他方、現像液中に必須成分として含有されるアルカリ剤
としては、
(A)ケイ酸ナトリウム、ケイ酸カリウム、水酸化カリ
ウム、水酸化ナトリウム、水酸化リチウム、第二または
第三リン酸のナトリウムまたはアンモニウム塩、メタケ
イ酸ナトリウム、炭酸ナトリウム、アンモニア等の無機
アルカリ剤、
(B)モノ、ジまたはトリメチルアミン、モノ、ジまた
はトリエチルアミン、モノまたはシイツブ・ロピルアミ
ン、n−ブチルアミン、モノ、ジまたはトリエタノール
アミン、モノ、ジまたはトリイソプロパツールアミン、
エチレンイミン、エチレンジアミン等の有機アミン化合
物等を挙げることができる。On the other hand, alkaline agents contained as essential components in the developer include (A) sodium silicate, potassium silicate, potassium hydroxide, sodium hydroxide, lithium hydroxide, sodium dibasic or tertiary phosphate, or Inorganic alkaline agents such as ammonium salts, sodium metasilicate, sodium carbonate, ammonia, etc.; (B) mono-, di- or trimethylamine, mono-, di- or triethylamine, mono- or triethylamine, n-butylamine, mono-, di- or triethanolamine; mono-, di- or tri-isopropanolamines,
Examples include organic amine compounds such as ethyleneimine and ethylenediamine.
これらアルカリ剤の現像液中における含有量は通常0.
05〜4重量%であり、好ましくは0.5〜2重量%で
ある。The content of these alkaline agents in the developer is usually 0.
05 to 4% by weight, preferably 0.5 to 2% by weight.
また、最終的に得られる印刷版の保存安定性、耐剛性等
を一層高めるためには、水溶性亜硫酸塩を現像液中に含
有させることが好ましい。このような水溶性亜硫酸塩と
しては、亜硫酸のアルカリ金属塩またはアルカリ土類金
属塩が好ましく、例えば亜硫酸ナトリウム、亜硫酸カリ
ウム、亜硫酸リチウム、亜硫酸マグネシウム、その他を
挙げることができる。これらの亜硫酸塩の現像液組成物
における含有量は通常0.05〜4重量%であり、好ま
しくは0.1〜1重量%である。Furthermore, in order to further improve the storage stability, rigidity resistance, etc. of the printing plate finally obtained, it is preferable to include a water-soluble sulfite in the developer. Such water-soluble sulfites are preferably alkali metal salts or alkaline earth metal salts of sulfite, such as sodium sulfite, potassium sulfite, lithium sulfite, magnesium sulfite, and others. The content of these sulfites in the developer composition is usually 0.05 to 4% by weight, preferably 0.1 to 1% by weight.
また、上述の有機溶媒の水への溶解を助けるために一定
の可溶化剤を含有させることもできる。Certain solubilizers may also be included to aid in the dissolution of the organic solvents mentioned above in water.
このような可溶化剤としては、本発明の所期の効果を実
現するため、用いる有機溶媒より水易溶性で低分子のア
ルコールやケトン類を用いるのがよい、またアニオン活
性剤や両性活性剤等をも用いることができる。このよう
な低分子のアルコールおよびケトン類としては、例えば
メタノール、エタノール、プロパツール、ブタノール、
アセトン、メチルエチルケトン、エチレングリコールモ
ノメチルエーテル、エチレングリコールモノエチルエー
テル、メトキシブタノール、エトキシブタノール、4−
メトキシ−4−メチルブタノール、N−メチルピロリド
ン等を好ましく用いることができる。また活性剤として
は、例えばイソプロビルナフクレンスルホン酸ナトリウ
ム、n−ブチルナフタレンスルホン酸ナトリウム、N−
メチル−N−ペンタデンルアミノ酢酸ナトリウム、ラウ
リルサルフェートナトリウム塩等が好ましい。これらア
ルコール、ケトン類等による可溶化剤の使用量について
は特に制限はないが、一般に現像液全体における約30
重量%以下とすることが好ましい。As such a solubilizing agent, in order to achieve the desired effect of the present invention, it is preferable to use alcohols and ketones that are more easily soluble in water and have lower molecular weight than the organic solvent used, and also include anionic activators and amphoteric activators. etc. can also be used. Examples of such low-molecular alcohols and ketones include methanol, ethanol, propatool, butanol,
Acetone, methyl ethyl ketone, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methoxybutanol, ethoxybutanol, 4-
Methoxy-4-methylbutanol, N-methylpyrrolidone, etc. can be preferably used. Examples of the activator include sodium isoprobylnaphthalenesulfonate, sodium n-butylnaphthalenesulfonate, and sodium N-butylnaphthalenesulfonate.
Sodium methyl-N-pentadenylaminoacetate, sodium lauryl sulfate and the like are preferred. There is no particular restriction on the amount of solubilizing agents such as alcohols and ketones used, but generally about 30% of the total developer solution is used.
It is preferable that the amount is less than % by weight.
本発明に係るジアゾ怒光性平版印刷版は、像様露光した
後、おおむね常温〜40℃の温度において上述のような
現像液に接触させ、あるいは更にこすったりすることに
より、10〜60秒間経過後においては、感光層の露光
部に悪影響を及ぼすことなく、感光層の非露光部を完全
に除去することができ、優れた現像性が得られる。また
斯くして得られる印刷版は、経時現像性(保存安定性)
並びに耐剛性にも優れており、更に仕上り悪化等も生ず
ることがなく、加えて公害および労働衛生面からも問題
はない。After the diazophotographic lithographic printing plate according to the present invention has been imagewise exposed, it can be brought into contact with the above-mentioned developer at a temperature of approximately room temperature to 40°C, or further rubbed for 10 to 60 seconds. Later, the unexposed areas of the photosensitive layer can be completely removed without adversely affecting the exposed areas of the photosensitive layer, resulting in excellent developability. In addition, the printing plate obtained in this way has good developability over time (storage stability).
It also has excellent rigidity resistance, does not cause any deterioration in finish, and is free from pollution and occupational health problems.
以下、本発明の実施に用いられる親油性高分子化合物お
よび感光性ジアゾ樹脂並びに支持体の製造例を示す。Examples of producing lipophilic polymer compounds, photosensitive diazo resins, and supports used in the practice of the present invention are shown below.
S A aの八
N−(4−ヒドロキシフェニル)メタクリルアミド10
.0g、アクリロニトリル25g、エチルアクリレート
60g1メタクリル酸5gおよびアゾビスイソブチロニ
トリル1.642 gをアセトンとメタノールの1:1
の混合溶媒112mJに溶解し、窒素置換した後温度6
0℃で8時間加熱した。S A a's 8N-(4-hydroxyphenyl) methacrylamide 10
.. 0 g, acrylonitrile 25 g, ethyl acrylate 60 g 1 methacrylic acid 5 g and azobisisobutyronitrile 1.642 g in acetone and methanol 1:1
After dissolving in 112 mJ of mixed solvent and purging with nitrogen, the temperature was 6.
Heated at 0°C for 8 hours.
反応終了後、反応液を水51に攪拌下に注ぎ、生じた白
色沈澱を濾取乾燥して、90gの親油性高分子化合物a
を得た。After the reaction was completed, the reaction solution was poured into water 51 with stirring, and the resulting white precipitate was filtered and dried to obtain 90 g of lipophilic polymer compound a.
I got it.
この親油性高分子化合物aの分子量をゲルパーミェーシ
ョンクロマトグラフィー(以下rGPcJと略記する)
により測定したところ、重量平均分子量は8.5万であ
った。The molecular weight of this lipophilic polymer compound a was determined by gel permeation chromatography (hereinafter abbreviated as rGPcJ).
As a result of measurement, the weight average molecular weight was 85,000.
油 ヒム bのム 2−ヒドロキシエチルメタクリレート50.0g。Oil Him b no mu 50.0 g of 2-hydroxyethyl methacrylate.
アクリロニトリル20g、メチルメタクリレート25g
、メタクリル酸5gおよび過酸化ベンゾイル1.2gの
混合液を、温度100℃に加熱したエチレングリコール
モノメチルエーテル300gに2時間かけて滴下した0
滴下終了後、エチレングリコールモノメチルエーテル3
00 gと過酸化ベンゾイル0.3gを加えてそのまま
4時間反応させた6反応終了後、メタノールで稀釈して
水57!中に攪拌下に注ぎ、生じた白色沈澱を濾取乾燥
して、90gの親油性高分子化合物すを得た。Acrylonitrile 20g, methyl methacrylate 25g
A mixture of 5 g of methacrylic acid and 1.2 g of benzoyl peroxide was added dropwise over 2 hours to 300 g of ethylene glycol monomethyl ether heated to 100°C.
After dropping, add ethylene glycol monomethyl ether 3
0.00 g and benzoyl peroxide 0.3 g were added and allowed to react for 4 hours.After the reaction was completed, diluted with methanol and water 57.0 g. The resulting white precipitate was collected by filtration and dried to obtain 90 g of a lipophilic polymer compound.
この親油性高分子化合物すの分子量をGPCにより測定
をしたところ、重量平均分子量は6.5万であった。When the molecular weight of this lipophilic polymer compound was measured by GPC, the weight average molecular weight was 65,000.
、 ジアゾ aの4
p−ジアゾジフェニルアミン硫酸塩14.5 g (5
0ミリモル)を、水冷下で40.9gの濃硫酸に溶解し
た。この液に1.5g (50ミリモル)のパラホルム
アルデヒドをゆっくり滴下した。この際反応温度が10
℃を超えないようした。その後2時間の間水冷下で攪拌
を続けた。, Diazo a 4p-diazodiphenylamine sulfate 14.5 g (5
0 mmol) was dissolved in 40.9 g of concentrated sulfuric acid under water cooling. 1.5 g (50 mmol) of paraformaldehyde was slowly added dropwise to this solution. At this time, the reaction temperature was 10
I made sure not to exceed ℃. After that, stirring was continued for 2 hours under water cooling.
この反応混合物を水冷下、500I111のエタノール
に滴下し、生じた沈澱を濾別した。エタノールで洗浄後
、この沈澱物を100+mfの純水に溶解し、この液に
、6.8gの塩化亜鉛を溶解した冷濃厚水溶液を加えた
。生じた沈澱を濾別した後エタノールで洗浄し、これを
150m1の純水に溶解した。This reaction mixture was added dropwise to 500I111 ethanol under water cooling, and the resulting precipitate was filtered off. After washing with ethanol, this precipitate was dissolved in 100+mf pure water, and to this solution was added a cold concentrated aqueous solution in which 6.8 g of zinc chloride was dissolved. The resulting precipitate was filtered, washed with ethanol, and dissolved in 150 ml of pure water.
この液に、8gのへキサフルオロリン酸アンモニウムを
溶解した冷濃厚水溶液を加えた。生じた沈澱を濾取し水
洗した後、温度30℃で1昼夜乾燥して感光性ジアゾ樹
脂aを得た。To this liquid was added a cold concentrated aqueous solution in which 8 g of ammonium hexafluorophosphate was dissolved. The resulting precipitate was collected by filtration, washed with water, and then dried at a temperature of 30° C. for one day and night to obtain photosensitive diazo resin a.
この感光性ジアゾ樹脂aの分子量をcpcにより測定し
たところ、6量体以上のものが約50モル%含まれるも
のであった。When the molecular weight of this photosensitive diazo resin a was measured by CPC, it was found that it contained about 50 mol% of hexamers or more.
アルミニウム板aの1+□&
厚さ0.2鰭のアルミニウム板を3%水酸化ナトリウム
水溶液に浸漬して脱脂し、水洗した後、塩i2濃度1%
およびホウ酸濃度1%の水溶液中において温度25℃で
3A/da”の条件で5分間電解エツチングを行い、水
洗後40%硫酸水溶液中において温度30℃で1.5A
/dm”の条件で2分間陽極酸化を行い、水洗し、1%
メタケイ酸ナトリウム水溶液に温度85℃で37秒間浸
7Aシ、更に温度90℃の水(pH8,5)に25秒間
浸漬し、水洗、乾燥して、アルミニウム板aを得た。Aluminum plate a 1 + □ & 0.2 fin thickness aluminum plate is immersed in a 3% sodium hydroxide aqueous solution to degrease it, washed with water, and then treated with a salt i2 concentration of 1%.
Then, electrolytic etching was performed for 5 minutes at 3 A/da'' at 25°C in an aqueous solution with a boric acid concentration of 1%, and after washing with water, electrolytic etching was performed at 1.5 A at 30°C in a 40% sulfuric acid aqueous solution.
/dm” for 2 minutes, washed with water, and 1%
It was immersed in an aqueous solution of sodium metasilicate for 37 seconds at a temperature of 85° C., then immersed in water (pH 8.5) at a temperature of 90° C. for 25 seconds, washed with water, and dried to obtain an aluminum plate a.
アルミニウム bの一1□1に
厚さ0.24鶴のアルミニウム板を回転ドラムに取付け
、これを12m/分の周速度で回転させながら250メ
ツシユのアルミナ研磨剤20部と水80部(容量比)と
の混合物を遠心型噴射機を用いて噴きつけた。水洗後、
2000メツシユのアルミナ研磨剤25部と水75部(
容量比)との混合物を上記と同様の方法により噴きつけ
た。水洗後、1%水酸化ナトリウム水溶液中に温度50
℃で9秒間浸泊した後、アルミニウム板aと同様に陽極
酸化処理し、ケイ酸ソーダ処理を行ない、水洗、乾燥し
てアルミニウム普及すを得た。Attach an aluminum plate with a thickness of 0.24 mm to a rotating drum and rotate it at a circumferential speed of 12 m/min. ) was sprayed using a centrifugal sprayer. After washing with water,
25 parts of 2000 mesh alumina abrasive and 75 parts of water (
(volume ratio) was sprayed in the same manner as above. After washing with water, place in a 1% aqueous sodium hydroxide solution at a temperature of 50°C.
After soaking at 90° C. for 9 seconds, it was anodized in the same manner as aluminum plate a, treated with sodium silicate, washed with water, and dried to obtain an aluminum plate.
アルミニウム板Cの製造
厚さ0.3−のアルミニウム板を粒度1000メツシユ
のアランダム研磨剤で15分間ボール研磨加工し、次い
で水洗後、水酸化ナトリウム濃度2%およびグルコン酸
ナトリウム濃度0.5%の水溶液を用いて温度60℃で
2分間化学エツチングを行い、水洗した後、アルミニウ
ム板aと同様にして陽極酸化処理し、ケイ酸ソーダ処理
を行い、水洗、乾燥してアルシミニウム牟反Cを得た。Production of Aluminum Plate C An aluminum plate with a thickness of 0.3 mm was ball-polished for 15 minutes with an alundum abrasive having a grain size of 1000 mesh, and then washed with water, with a sodium hydroxide concentration of 2% and a sodium gluconate concentration of 0.5%. After chemical etching at a temperature of 60°C for 2 minutes with an aqueous solution of Ta.
アルミニウム板dの製造
アルミニウム板aと同様にして作製したアルミニウム板
を、さらに特開昭59−192250号公報の実施例1
の方法に従って、シランカップリング剤N11□(CH
z)JH(C1(z)isi(OCII+)zの0.2
%水溶液に温度25°Cで60秒間浸漬し、被膜量0.
10■/dm”の中間層を設けて、アルミニウム板dを
得た。Production of aluminum plate d An aluminum plate produced in the same manner as aluminum plate a was further prepared in Example 1 of JP-A-59-192250.
Silane coupling agent N11□ (CH
z) JH(C1(z)isi(OCII+)z's 0.2
% aqueous solution for 60 seconds at a temperature of 25°C, and the coating amount was 0.
An aluminum plate d was obtained by providing an intermediate layer of 10 .mu./dm''.
怒 性組成物の調製
第1表に示された種類の親油性高分子化合物の10gと
、第1表に示された種類および量のチタンカップリング
剤と、下記の物質とをメチルセロソルブ180mj+に
溶解して、合計5種の感光性組成物A−Eの各々による
感光層形成用の塗布液を調製した。Preparation of inflammatory composition 10 g of the lipophilic polymer compound of the type shown in Table 1, the titanium coupling agent of the type and amount shown in Table 1, and the following substances were added to methyl cellosolve 180mj+. A coating solution for forming a photosensitive layer was prepared by dissolving each of the five types of photosensitive compositions A to E.
感光性ジアゾ樹脂a Ig「ビクト
リアピュアブルーBOHJ
〔保土谷化学■製) 0.2 gジュリ
マーAC−1OL
〔日木純薬■製ポリアクリル酸) 0.6g第
1 表
以上のようにして得た塗布液を、第2表に示したところ
に従い、アルミニウム15. a −dの各々の上にホ
ワラーを用いて、乾燥重量が1.5 g / mとなる
塗布看で塗布し、その後温度85°Cで3分間乾燥して
感光層を形成し、これによって合計10種のジアゾ感光
性平版印刷版を得た。これらを試料1〜試料lOとする
。Photosensitive diazo resin a Ig “Victoria Pure Blue BOHJ [Manufactured by Hodogaya Chemical ■] 0.2 g Jurimer AC-1OL [Polyacrylic acid manufactured by Niki Pure Chemical ■] 0.6 g
1. The coating solution obtained as shown in Table 2 was coated with aluminum 15. A photosensitive layer was formed by coating each of a - d using a whirler with a dry weight of 1.5 g/m and then drying at a temperature of 85 °C for 3 minutes to form a photosensitive layer. Ten types of diazo-sensitive lithographic printing plates were obtained. These are designated as samples 1 to 10.
そして試料l−試料IOの各々を、温度40℃、相対湿
度80%の条件下において7日間保存した後、消費電力
3に誓の超高圧水銀灯によって60cjnの距離から3
0秒間露光し、下記に示す組成の現像液Aに温度25℃
で45秒間浸漬して現像することにより、平版印刷版を
作製し、これを印刷機に取付け、印刷テストを実行して
汚れの有無を観察し、さらに耐薬品性と耐刷力を同時に
テストすることを目的として、2000枚ごとにウルト
ラプレートクリーナ(ABCChemical Co、
、 Ltd、製)にて版を洗浄しながら印刷を続け、画
像部分に欠を員が生して印刷物が不完全となるまでの印
刷枚数を耐剛力として求めた。After storing each of sample 1 to sample IO for 7 days at a temperature of 40°C and a relative humidity of 80%, they were exposed to heat from a distance of 60 cjn using an ultra-high pressure mercury lamp with a power consumption of 3.
Exposure for 0 seconds, and apply developer A having the composition shown below at a temperature of 25°C.
A lithographic printing plate is prepared by immersing it in water for 45 seconds and developing it, which is then installed on a printing press, and a printing test is performed to observe the presence or absence of contamination, and the chemical resistance and printing durability are simultaneously tested. For this purpose, use Ultra Plate Cleaner (ABC Chemical Co., Ltd.) every 2000 sheets.
Printing was continued while the plate was washed using a printing press (manufactured by Co., Ltd., Ltd.), and the number of prints until defects appeared in the image area and the printed matter became incomplete was determined as the stiffness resistance.
現イ象で・C2p。In the current phenomenon, C2p.
Claims (1)
版において、該感光層が、a)感光性ジアゾ樹脂、b)
親油性高分子化合物およびc)チタンカップリング剤を
含有する組成物よりなることを特徴とするジアゾ感光性
平版印刷版。(1) In a diazo-sensitive lithographic printing plate having a photosensitive layer on a support, the photosensitive layer comprises a) a photosensitive diazo resin, b)
A diazo-sensitive lithographic printing plate comprising a composition containing a lipophilic polymer compound and c) a titanium coupling agent.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10380086A JPS62262049A (en) | 1986-05-08 | 1986-05-08 | Diazo photosensitive lithographic printing plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10380086A JPS62262049A (en) | 1986-05-08 | 1986-05-08 | Diazo photosensitive lithographic printing plate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62262049A true JPS62262049A (en) | 1987-11-14 |
Family
ID=14363470
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10380086A Pending JPS62262049A (en) | 1986-05-08 | 1986-05-08 | Diazo photosensitive lithographic printing plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62262049A (en) |
-
1986
- 1986-05-08 JP JP10380086A patent/JPS62262049A/en active Pending
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