JPS62214507A - Thin film magnetic head - Google Patents

Thin film magnetic head

Info

Publication number
JPS62214507A
JPS62214507A JP5740586A JP5740586A JPS62214507A JP S62214507 A JPS62214507 A JP S62214507A JP 5740586 A JP5740586 A JP 5740586A JP 5740586 A JP5740586 A JP 5740586A JP S62214507 A JPS62214507 A JP S62214507A
Authority
JP
Japan
Prior art keywords
layer
slider
substrate
magnetic pole
magnetic head
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5740586A
Other languages
Japanese (ja)
Inventor
Hitoshi Kanai
均 金井
Yoshio Koshikawa
越川 誉生
Hitoshi Takagi
均 高木
Yoshio Takahashi
良夫 高橋
Akira Kakehi
筧 朗
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP5740586A priority Critical patent/JPS62214507A/en
Publication of JPS62214507A publication Critical patent/JPS62214507A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3103Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing

Abstract

PURPOSE:To obtain a slider surface which generates no recess phenomenon and has a high flat accuracy, by forming a substrate for forming a slider and a protective layer of a magnetic pole layer by using the same material. CONSTITUTION:On a substrate 21 for forming a floating slider, the upper magnetic pole layer 7, the lower magnetic pole layer 3, etc., are provided by pinching a gap layer, an interlayer insulation layer and a coil, and they are covered with a protective film 8. The film 8 is formed by the same material as that of the substrate 21, and at the time of grinding a medium opposed surface 21, a recess phenomenon generated by a recessed part, etc. is eliminated from a boundary part, etc. of a heterogeneous material, and a slider whose flat accuracy is high is obtained.

Description

【発明の詳細な説明】 〔概 要〕 本発明は磁気ディスク装置に用いられる、スライダを構
成する基板上にヘッド構成要素を設けた薄膜磁気ヘッド
において、スライダを構成する基板とヘッド構成要素に
おける保護膜とを同一材料で構成することにより、平面
研磨加工により形成された媒体対向面におけるスライダ
面と磁極先端面との間に発生するリセス現象を解消して
、平坦精度を高め、記録・再生特性の向上を図ったもの
である。
[Detailed Description of the Invention] [Summary] The present invention relates to a thin film magnetic head used in a magnetic disk drive in which head components are provided on a substrate that constitutes a slider, and in which protection is provided for the substrate that constitutes the slider and the head components. By using the same material as the film, it eliminates the recess phenomenon that occurs between the slider surface and the magnetic pole tip surface on the medium facing surface formed by surface polishing, improving flatness accuracy and improving recording and reproducing characteristics. The aim is to improve the

〔産業上の利用分野〕[Industrial application field]

本発明は磁気ディスク装置に用いられる薄膜磁気ヘッド
に係り、特に磁気ディスク媒体と対向する薄膜磁気ヘッ
ドのスライダ面と磁極先端面とを同一平面に精度良(構
成し得る記録・再生特性の良いヘッド構造に関するもの
である。
The present invention relates to a thin-film magnetic head used in a magnetic disk drive, and more particularly, the present invention relates to a thin-film magnetic head used in a magnetic disk device, and in particular, a head with good recording and reproducing characteristics that can be configured with a slider surface and a magnetic pole tip surface facing a magnetic disk medium on the same plane with good accuracy. It's about structure.

薄膜磁気ヘッドは薄膜加工技法により磁極及びコイル形
状が小型化でき、記録磁界分布の急峻化等の利点を有し
、高密度記録に好適なものとして既に種々のタイプのも
のが提案されている。
Thin-film magnetic heads have advantages such as miniaturization of magnetic poles and coil shapes through thin-film processing techniques and steeper recording magnetic field distribution, and various types of thin-film magnetic heads have already been proposed as suitable for high-density recording.

近来、高記録密度化及び高効率化に伴って磁気ディスク
媒体に対する薄膜磁気ヘッドの浮上量も益々低浮上化の
傾向にあり、このため媒体対向面となるヘッドスライダ
面と磁極先端面の同一平面性が極めて重要となり、その
高精度化が要求される。
In recent years, with the increase in recording density and efficiency, the flying height of thin-film magnetic heads relative to magnetic disk media has tended to become lower. accuracy is extremely important, and high precision is required.

〔従来の技術〕[Conventional technology]

従来のS膜磁気ヘッドは、第7図の平面図及び第7図に
示すA−A”切断線に沿った第8図の要部断面図によっ
て示されるようにスライダとなる、例えばAl2O3・
Ticからなる基板1上にAl2O3等からなる絶縁層
2を介して、Ni−Feからなる下部磁極層3、A72
03等からなるギャップ層4、層間絶縁層5で被包され
たスパイラル状の2重コイル眉6、上部磁極層7及びA
l2O3等からなる数10μ情程度の厚い保護膜8が順
に積層されている。
The conventional S-film magnetic head is made of, for example, Al2O3.
A lower magnetic pole layer 3 made of Ni-Fe is formed on a substrate 1 made of Tic through an insulating layer 2 made of Al2O3 or the like.
03, a spiral double coil eyebrow 6 covered with an interlayer insulating layer 5, an upper magnetic pole layer 7 and A.
A protective film 8 made of l2O3 or the like and having a thickness of several tens of microns is sequentially laminated.

そして前記ギャップ層4を挟んで対向する下部磁極層3
と上部磁極層7の先端部は、下部磁極層配設された基板
1面と直交する面に露出され、この面が平坦化されて磁
気ディスク媒体に対する媒体対向面9としている。
and a lower magnetic pole layer 3 facing opposite to each other with the gap layer 4 in between.
The tip of the upper magnetic pole layer 7 is exposed on a surface perpendicular to the surface of the substrate 1 on which the lower magnetic pole layer is provided, and this surface is flattened to serve as a medium facing surface 9 for the magnetic disk medium.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

ところで、このような従来の薄膜磁気ヘッドの構成にあ
っては、第8図に示すように前記上部及び下部磁極層7
,3の先端面が露出する媒体対向面9が、該上部及び下
部磁極層7.3の先端部を取巻(絶縁層2及び保護層8
のAl2O3等からなる面と、その他の大部分を占める
基板1、部ちスライダのAl2O,・TiC等からなる
面によって構成されているため、これらの材質の違いか
ら硬度が異なる。
By the way, in the structure of such a conventional thin film magnetic head, as shown in FIG.
, 3 surrounds the tips of the upper and lower magnetic pole layers 7.3 (including the insulating layer 2 and the protective layer 8).
The substrate 1, which occupies most of the other surfaces, consists of a surface made of Al2O3, etc., and a surface made of Al2O, .TiC, etc. of the slider. Therefore, the hardness differs due to the difference in these materials.

このように材質、硬度の異なる面が混在する面を研磨仕
上げ工程により平坦な媒体対向面9に形成する際に、研
磨速度の大きな差に起因して第9図に示されるように前
記基板1面よりも絶縁層2及び保護膜8の面が過度に研
磨され、例えば0.05μm程度凹んだ形状に仕上がる
といった、所謂「リセス(recessed) Jが発
生する欠点があった。
When forming a flat medium-facing surface 9 by a polishing finishing process on a surface in which surfaces having different materials and hardnesses coexist, the substrate 1 has a large difference in polishing speed as shown in FIG. There was a drawback that the surfaces of the insulating layer 2 and the protective film 8 were polished more than the surface, resulting in a recessed shape of, for example, about 0.05 μm, that is, a so-called "recessed J" occurred.

この際、前記絶縁層2及び保護IIW8により取り囲ま
れている上部及び下部磁極層7,3の先端部も同様に凹
んだ形状に仕上がることになる。
At this time, the tips of the upper and lower magnetic pole layers 7 and 3 surrounded by the insulating layer 2 and the protection IIW 8 are also finished in a concave shape.

従って、近来、磁気ディスク装置において、磁気ディス
ク媒体10に対する磁気ヘッドの浮上量が、0.2〜0
.3μmと極低浮上化が図られている中で、このような
リセスの発生は実効的に磁気ヘッドの浮上量を数10%
も高めていることに等しく、記録・再生特性を大きく劣
化させる不都合があった。
Therefore, in recent years, in magnetic disk devices, the flying height of the magnetic head with respect to the magnetic disk medium 10 is 0.2 to 0.
.. While efforts are being made to achieve an extremely low flying height of 3 μm, the occurrence of such a recess effectively reduces the flying height of the magnetic head by several tens of percent.
This also has the disadvantage of greatly deteriorating the recording/reproducing characteristics.

本発明はこのような従来の欠点に鑑み、リセス現象のな
い平坦精度の良いスライダ面を有する新規な薄膜磁気ヘ
ッドを提供することを目的とするものである。
SUMMARY OF THE INVENTION In view of these conventional drawbacks, it is an object of the present invention to provide a novel thin film magnetic head having a slider surface with good flatness and no recess phenomenon.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は上記目的を達成するため、磁気ヘッドの上部磁
極層等を保護する保護膜と、スライダを構成する基板と
を同一材料で構成した構造とする。
In order to achieve the above object, the present invention has a structure in which a protective film that protects the upper magnetic pole layer of a magnetic head and a substrate constituting a slider are made of the same material.

〔作 用〕[For production]

本発明の薄膜磁気ヘッドは、ヘッド構成要素が配設され
たスライダを構成する基板が、上部磁極層を被包する保
護膜と同一材料で構成されているため、該保護膜等の面
とスライダを構成する基板面からなる媒体対向面となる
面を研磨仕上げ工程により平坦に加工する際の研磨速度
が、全面にわたって均等になり、従来、発生していたリ
セス現象が解消される。
In the thin film magnetic head of the present invention, since the substrate constituting the slider on which the head components are arranged is made of the same material as the protective film covering the upper magnetic pole layer, the surface of the protective film etc. and the slider The polishing rate when flattening the medium-facing surface made of the substrate surface forming the substrate by the polishing finishing process becomes uniform over the entire surface, and the recess phenomenon that has conventionally occurred is eliminated.

その結果、磁極先端面が露出する媒体対向面の平坦精度
が向上する。
As a result, the flatness accuracy of the medium facing surface where the magnetic pole tip surface is exposed is improved.

〔実施例〕〔Example〕

以下図面を用いて本発明の実施例について詳細に説明す
る。
Embodiments of the present invention will be described in detail below with reference to the drawings.

第1図は本発明に係る薄膜磁気ヘッドの一実施例を示す
要部断面図である。
FIG. 1 is a sectional view of a main part of an embodiment of a thin film magnetic head according to the present invention.

図において、21はスライダとなる基板であり、該基板
21は、例えばスパッタリング法等により数mmの厚さ
に形成された、保護膜8と同材質のAl2O。
In the figure, 21 is a substrate that becomes a slider, and the substrate 21 is made of Al2O, which is made of the same material as the protective film 8, and is formed to a thickness of several mm by, for example, sputtering.

からなる。該基板21上には従来と同様にNi−Feか
らなる下部磁極層3、Al2O3等からなるギャップ層
4、層間絶縁層5で被包されたスパイラル状の2重コイ
ル層6、上部磁極層7及びAl2O3からなる厚い(数
10μm程度)保護膜8が順に積層されている。
Consisting of On the substrate 21 are a lower magnetic pole layer 3 made of Ni--Fe, a gap layer 4 made of Al2O3, etc., a spiral double coil layer 6 covered with an interlayer insulating layer 5, and an upper magnetic pole layer 7, as in the conventional case. A thick (approximately several tens of micrometers) protective film 8 made of Al2O3 and Al2O3 are laminated in this order.

なお、基板21と保護膜8とは同じ材料を同一製法で形
成するなどして、硬度などの耐摩耗性を同じにする。
Note that the substrate 21 and the protective film 8 are made of the same material and formed by the same manufacturing method, so that they have the same wear resistance such as hardness.

更に、前記ギャップ層4を挟んで対向する下部及び上部
磁極層3.7の先端部は、下部磁極層が配設された基板
21面と直交するスライダ面と同一面に露出されるよう
に平面研磨仕上げ工程によって平坦化され、磁気ディス
ク媒体に対する媒体対向面22としている。
Furthermore, the tips of the lower and upper magnetic pole layers 3.7, which face each other with the gap layer 4 in between, are flat so that they are exposed on the same surface as the slider surface that is orthogonal to the surface of the substrate 21 on which the lower magnetic pole layer is disposed. It is flattened by a polishing process and serves as a medium facing surface 22 for the magnetic disk medium.

従って、第2図に示すように本実施例のヘッド構成にお
いては、スライダを構成する基板21と上部磁極層7を
被包する保護膜8とが同材質であるため、これら面で構
成される媒体対向面22にリセスの発生がな(、平坦精
度が向上する。
Therefore, as shown in FIG. 2, in the head configuration of this embodiment, since the substrate 21 constituting the slider and the protective film 8 covering the upper magnetic pole layer 7 are made of the same material, the structure is composed of these surfaces. There is no recess on the medium facing surface 22 (and the flatness accuracy is improved).

なお、このような構造の薄膜磁気ヘッドを得る方法とし
ては、先ず第3図に示すように、例えばStからなる無
機質材料、或いは金属材料等からなる基材31上に、保
護膜8と同材質のAl2O3からなるスライダとなる基
板層32をスパッタリング法等により数mmの厚さに形
成する。
As a method for obtaining a thin-film magnetic head having such a structure, first, as shown in FIG. A substrate layer 32, which will become a slider and is made of Al2O3, is formed to a thickness of several mm by sputtering or the like.

次にそのAl2O3層32上に、従来と同様にNi−F
eからなる下部磁極層3、Al2O3等からなるギャッ
プ層4、層間絶縁層5で被包されたスパイラル状の2重
コイル層6、上部磁極層7及びAl2O3等からなる厚
い(数10μm程度)保護層8を順に積層形成する。
Next, on the Al2O3 layer 32, Ni-F is applied as before.
A lower magnetic pole layer 3 made of e, a gap layer 4 made of Al2O3 etc., a spiral double coil layer 6 covered with an interlayer insulating layer 5, an upper magnetic pole layer 7, and a thick (about several tens of μm) protection made of Al2O3 etc. Layers 8 are laminated in sequence.

しかる後、第4図に示すように前記ヘッド構造要素が形
成された基材31を研磨加工工程によって除去する。こ
の際、該基材31が金属材料等からなる場合には、選択
的なエツチング工程を用いて除去すればよい。
Thereafter, as shown in FIG. 4, the base material 31 on which the head structural elements are formed is removed by a polishing process. At this time, if the base material 31 is made of a metal material or the like, it may be removed using a selective etching process.

引続き、切削・研磨加工工程により図中の一点鎖線Bで
示す部位を切断し、平坦に研磨仕上げを行うと共に、ス
ライダチップ形状に形成することにより、リセスの発生
がない、平坦精度の良い媒体対向面22を備えた薄膜磁
気ヘッドを容易に得ることができる。
Subsequently, the area indicated by the dashed line B in the figure is cut through the cutting/polishing process, and polished to a flat finish.The media is then formed into a slider chip shape with no recesses and high flatness accuracy. A thin film magnetic head having the surface 22 can be easily obtained.

更にこのような薄膜磁気ヘッドの形状方法の他の方法と
して、例えば第5図に示すようにSiからなる無機質材
料、或いは金属材料等からなる基材31上に、保護膜8
と同材質のAl2O3からなる中間絶縁層41をスパッ
タリング法等により数10μmの厚さに形成し、その上
面に従来と同様にNi−Feからなる下部磁極層3、A
l2O3等からなるギャップ層4、層間絶縁層5で被包
されたスパイラル状の2重コイル層6、上部磁極層7及
びAl2O3等からなる厚い(数10μm程度)保護層
8を順に積層形成する。
Furthermore, as another method for shaping such a thin film magnetic head, for example, as shown in FIG.
An intermediate insulating layer 41 made of the same material Al2O3 is formed to a thickness of several tens of micrometers by sputtering or the like, and a lower magnetic pole layer 3 made of Ni-Fe, A
A gap layer 4 made of l2O3 or the like, a spiral double coil layer 6 covered with an interlayer insulating layer 5, an upper magnetic pole layer 7, and a thick (about several tens of μm) protective layer 8 made of Al2O3 or the like are laminated in this order.

次に第6図に示すように前記ヘッド構造要素が形成され
た基材31のみを研磨加工工程によって一旦除去し、(
この際、該基材31が金属材料等からなる場合には、選
択的なエツチング工程により除去すればよい)その除去
された前記中間絶縁層41上に前記保護膜8と同材質の
Al2O3からなるスライダとなる基板層42をスパッ
タリング法等により数mmの厚さに形成する。なお、本
実施例では前記中間絶縁層41はスライダの一部構成部
材とする。
Next, as shown in FIG. 6, only the base material 31 on which the head structural elements are formed is once removed by a polishing process.
At this time, if the base material 31 is made of a metal material, etc., it may be removed by a selective etching process. A substrate layer 42 that will become a slider is formed to a thickness of several mm by sputtering or the like. In this embodiment, the intermediate insulating layer 41 is a part of the slider.

その後、切削・研磨加工工程により図中の一点鎖線Bで
示す部位を切断し、平坦に研磨仕上げを行うと共に、ス
ライダチップ形状に形成することにより、前述の形成例
と同様にリセスの発生がなく、平坦精度の良い媒体対向
面22を備えた薄膜磁気ヘッドを容易に得ることができ
る。
After that, the part shown by the dashed line B in the figure is cut through the cutting and polishing process, and polished to a flat finish. By forming it into a slider chip shape, there is no recess as in the above-mentioned formation example. , a thin film magnetic head having a medium facing surface 22 with high flatness accuracy can be easily obtained.

〔発明の効果〕〔Effect of the invention〕

以上の説明から明らかなように、本発明に係る薄膜磁気
ヘッドによれば、媒体対向面を構成するスライダ面と上
部、下部磁極層の先端面以外の面が全て同一耐摩耗性の
同一材料面からなるため、リセスの発生が解消され、媒
体対向面の平面仕上げ精度が著しく向上する。
As is clear from the above description, in the thin film magnetic head according to the present invention, all surfaces other than the slider surface and the tip surfaces of the upper and lower pole layers constituting the medium facing surface are made of the same material with the same wear resistance. As a result, the occurrence of recesses is eliminated and the flat finishing accuracy of the medium facing surface is significantly improved.

従って、記録・再生特性の優れた高性能な薄膜磁気ヘッ
ドを容易に得ることが可能となり、この種の薄膜磁気ヘ
ッドに通用して極めて有利である。
Therefore, it is possible to easily obtain a high-performance thin film magnetic head with excellent recording and reproducing characteristics, and the present invention is extremely advantageous for use in this type of thin film magnetic head.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明に係る薄膜磁気ヘッドの一実施例を示す
、要部断面図、 第2図は本発明に係る薄膜磁気へ・ノドの媒体対向面を
説明するための概略要部断面図、第3図乃至第4図は本
発明に係る薄膜磁気ヘッドの形成法の一実施例を工程順
に説明 するための要部断面図、 第5図乃至第6図は本発明に係る薄膜磁気ヘッドの形成
法の他の実施例を工程順に説 明するための要部断面図、 第7図は従来の薄膜磁気ヘッドを説明するための平面図
、 第8図は第7図に示すA−A’切断線に沿った要部断面
図、 第9図は従来の薄膜磁気ヘッドの媒体対向面を説明する
ための要部断面図である。 第1図乃至第6図において、 3は下部磁極層、4はギャップ層、5は層間絶縁層、6
は2重コイル層、7は上部磁極層、8は保護膜、21は
基板、22は媒体対向面、31は基材、32.42は基
板層、41は中間絶縁層をそれぞれ示す。 第3凶
FIG. 1 is a cross-sectional view of a main part showing an embodiment of a thin film magnetic head according to the present invention. FIG. 2 is a schematic cross-sectional view of a main part for explaining a medium facing surface of a thin film magnetic throat according to the present invention. , FIGS. 3 to 4 are cross-sectional views of essential parts for explaining step-by-step an embodiment of a method for forming a thin film magnetic head according to the present invention, and FIGS. 5 to 6 are cross-sectional views of a thin film magnetic head according to the present invention. 7 is a plan view for explaining a conventional thin film magnetic head, and FIG. 8 is a line AA' shown in FIG. 7. FIG. 9 is a cross-sectional view of the main part taken along the cutting line. FIG. 9 is a cross-sectional view of the main part for explaining the medium facing surface of a conventional thin film magnetic head. 1 to 6, 3 is a bottom pole layer, 4 is a gap layer, 5 is an interlayer insulating layer, and 6 is a bottom pole layer.
1 is a double coil layer, 7 is an upper magnetic pole layer, 8 is a protective film, 21 is a substrate, 22 is a medium facing surface, 31 is a base material, 32 and 42 are a substrate layer, and 41 is an intermediate insulating layer. Third evil

Claims (1)

【特許請求の範囲】[Claims] スライダを構成する基板(21)上に、一対の磁極層(
3、7)をギャップ層(4)と層間絶縁層(5)とコイ
ル層(6)とを挟んだ形で設け、その上面を保護膜(8
)で被包してなる磁気ヘッド構成において、上記基板(
21)と保護膜(8)とを同一材料で構成したことを特
徴とする薄膜磁気ヘッド。
A pair of magnetic pole layers (
3, 7) are provided sandwiching the gap layer (4), interlayer insulating layer (5), and coil layer (6), and the upper surface is covered with a protective film (8).
), the above-mentioned substrate (
21) and a protective film (8) made of the same material.
JP5740586A 1986-03-14 1986-03-14 Thin film magnetic head Pending JPS62214507A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5740586A JPS62214507A (en) 1986-03-14 1986-03-14 Thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5740586A JPS62214507A (en) 1986-03-14 1986-03-14 Thin film magnetic head

Publications (1)

Publication Number Publication Date
JPS62214507A true JPS62214507A (en) 1987-09-21

Family

ID=13054728

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5740586A Pending JPS62214507A (en) 1986-03-14 1986-03-14 Thin film magnetic head

Country Status (1)

Country Link
JP (1) JPS62214507A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6075679A (en) * 1997-07-10 2000-06-13 Nec Corporation Magneto-resistive head accommodating a narrow gap

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57176524A (en) * 1981-04-20 1982-10-29 Matsushita Electric Ind Co Ltd Thin-film magnetic head
JPS57183623A (en) * 1981-05-08 1982-11-12 Nec Corp Thin film head
JPS60193114A (en) * 1984-03-14 1985-10-01 Hitachi Ltd Production of thin film magnetic head
JPS60229216A (en) * 1984-04-25 1985-11-14 Fujitsu Ltd Manufacture for thin film magnetic head
JPS61145718A (en) * 1984-12-19 1986-07-03 Nec Corp Composite thin film magnetic head

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57176524A (en) * 1981-04-20 1982-10-29 Matsushita Electric Ind Co Ltd Thin-film magnetic head
JPS57183623A (en) * 1981-05-08 1982-11-12 Nec Corp Thin film head
JPS60193114A (en) * 1984-03-14 1985-10-01 Hitachi Ltd Production of thin film magnetic head
JPS60229216A (en) * 1984-04-25 1985-11-14 Fujitsu Ltd Manufacture for thin film magnetic head
JPS61145718A (en) * 1984-12-19 1986-07-03 Nec Corp Composite thin film magnetic head

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6075679A (en) * 1997-07-10 2000-06-13 Nec Corporation Magneto-resistive head accommodating a narrow gap
US6251231B1 (en) 1997-07-10 2001-06-26 Nec Corporation Manufacturing process for a magneto-resistive head accommodating a narrow gap

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