JPS622107A - Thin film inspection and its apparatus - Google Patents
Thin film inspection and its apparatusInfo
- Publication number
- JPS622107A JPS622107A JP14053485A JP14053485A JPS622107A JP S622107 A JPS622107 A JP S622107A JP 14053485 A JP14053485 A JP 14053485A JP 14053485 A JP14053485 A JP 14053485A JP S622107 A JPS622107 A JP S622107A
- Authority
- JP
- Japan
- Prior art keywords
- light
- wafer
- observation
- operator
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007689 inspection Methods 0.000 title abstract 3
- 239000010409 thin film Substances 0.000 title abstract 3
- 239000010408 film Substances 0.000 abstract 2
- 230000004313 glare Effects 0.000 abstract 1
- 230000001012 protector Effects 0.000 abstract 1
Abstract
PURPOSE: To enable accurate and rapid inspection, by detecting a recessed part of a thin film by reflecting scattering light and by detecting ununiform film thicknesses by intensities of their positive reflected beams of light by projecting scattering light of narrow band wave length.
CONSTITUTION: A beam of observation light 4 is projected onto the surface of a wafer 1 obliquely downward for observation of scattering light beams 8 by the beam of observation light 4. If a recessed part 18 is found on the surface of the wafer 1 due to misaligned focus, etc., the observation light is scattered and an operator 10 can detect it as a local bright point and ununiform glare. Next, in case of inspection by a positive reflected beam a beam of the narrow bond wave length is emitted from the No.2 protector 3 to be scattered by a reflecting diffusing surface 12 and the beam is projected onto the wafer 1 as the No.2 observation beam to be observed by the operator 10 after positive reflection. If the positive reflected beam 16 causes 'ununiformity' of thickness on a resist film on the wafer 1 by interference of the thin film on the wafer 1, brightness of the interference light is observed in a different, enabling the operator to detect 'ununiformity of resist'.
COPYRIGHT: (C)1987,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14053485A JPS622107A (en) | 1985-06-28 | 1985-06-28 | Thin film inspection and its apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14053485A JPS622107A (en) | 1985-06-28 | 1985-06-28 | Thin film inspection and its apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS622107A true JPS622107A (en) | 1987-01-08 |
Family
ID=15270905
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14053485A Pending JPS622107A (en) | 1985-06-28 | 1985-06-28 | Thin film inspection and its apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS622107A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02189447A (en) * | 1989-01-18 | 1990-07-25 | Nippon Columbia Co Ltd | Inspecting method of defect of substrate surface and illuminating device |
JPH04137050U (en) * | 1991-06-18 | 1992-12-21 | ||
US5729343A (en) * | 1995-11-16 | 1998-03-17 | Nikon Precision Inc. | Film thickness measurement apparatus with tilting stage and method of operation |
JPH11351830A (en) * | 1998-06-05 | 1999-12-24 | Dainippon Printing Co Ltd | Method for inspecting film thickness unevenness of coating material |
-
1985
- 1985-06-28 JP JP14053485A patent/JPS622107A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02189447A (en) * | 1989-01-18 | 1990-07-25 | Nippon Columbia Co Ltd | Inspecting method of defect of substrate surface and illuminating device |
JPH04137050U (en) * | 1991-06-18 | 1992-12-21 | ||
US5729343A (en) * | 1995-11-16 | 1998-03-17 | Nikon Precision Inc. | Film thickness measurement apparatus with tilting stage and method of operation |
JPH11351830A (en) * | 1998-06-05 | 1999-12-24 | Dainippon Printing Co Ltd | Method for inspecting film thickness unevenness of coating material |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPH02228505A (en) | Interferometer | |
JPS5870150A (en) | Illuminator for optical inspection apparatus | |
CA2426188A1 (en) | Process and device for measuring distances on bright metal strips | |
JPS622107A (en) | Thin film inspection and its apparatus | |
JPH0477653A (en) | Surface state inspection apparatus and exposure apparatus equipped therewith | |
JPH0290645A (en) | Inspection of image sensor and inspecting device which is used for that | |
JPH02216408A (en) | Substrate inspection device | |
JPH03115844A (en) | Detection of surface defect | |
JPS6329238A (en) | Method and device for inspecting surface defect of plate type body | |
JPH01201200A (en) | Irradiation position indicator in x-ray irradiation device | |
JPH01143904A (en) | Thin film inspecting device | |
JPH04103145A (en) | Component inspecting device | |
JPS55115001A (en) | Aiming mirror plate | |
JPH03137502A (en) | Inspecting apparatus | |
JPS57186106A (en) | Inspection device for surface | |
JPS57135065A (en) | Applying machine | |
JPS5966115A (en) | Inspecting device for defect of thin film | |
JPH04231852A (en) | Apparatus for inspecting surface flaw | |
JPS63156332A (en) | Surface roughness evaluation of semiconductor crystal | |
JPS56126745A (en) | Automatic inspecting device for surface of plate material | |
JPH0344504A (en) | Method and apparatus for measuring three-dimensional shape of surface | |
JPH03276049A (en) | Optical head for optical surface inspecting machine | |
JPH03231143A (en) | Method and apparatus for judging and measuring brightness of diamond | |
JPS5497469A (en) | Laser speed measuring apparatus | |
JPH03130603A (en) | Inspection of molding die for roof reflecting mirror |