JPS6215826A - Annealing method - Google Patents

Annealing method

Info

Publication number
JPS6215826A
JPS6215826A JP15411985A JP15411985A JPS6215826A JP S6215826 A JPS6215826 A JP S6215826A JP 15411985 A JP15411985 A JP 15411985A JP 15411985 A JP15411985 A JP 15411985A JP S6215826 A JPS6215826 A JP S6215826A
Authority
JP
Grant status
Application
Patent type
Prior art keywords
region
thermal
thermal neutron
reaction
neutron flux
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15411985A
Inventor
Hiroshi Matsumoto
Original Assignee
Nec Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

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Abstract

PURPOSE: To make it possible to heat an arbitrary positions of various solid state samples such as a silicon substrate and an SOI substrate, by forming a region, which includes an element having a large reaction cross sectional area characterized by (n, α) reaction with respect to thermal neutrons, on the surface or inside of the sample, and projecting thermal neutron rays on the sample.
CONSTITUTION: As an element yielding (n, α) reaction with thermal neutrons, 10 5B is used. A region including 10 5B is formed by an ion implantation method. Thus, a converged ion beam 8 of 10 5B++ ions is implanted at an accelerating voltage of about 5MV, and a high concentration region 9 of 10 5B is formed. Then the irradiation intensity of the flux of the thermal neutrons 2 is set at 1×1016cm-2sec-1. When the thermal neutron flux 11 having said intensity is projected on a silicon substrate 7, the thermal neutron flux 11 is transmitted through the silicon substrate 7 with almost no attenuation since the attenuation length is as long as about 12cm. When the thermal neutrons hit 10 5B atoms 1 when the thermal neutron flux 11 is transmitted through the high concentration region 9 of 10 5B, the (n, α) reaction occurs at a certain probability. Therefore, a heating region 10 can be set at an arbitrary position in a sample. The heating value is accurately proportional only to the concentration of 10 5B in the high concentration region 9 of 10 5B and the irradiation intensity of the projected thermal neutron flux 11. Thus very excellent controllability is obtained.
COPYRIGHT: (C)1987,JPO&Japio
JP15411985A 1985-07-15 1985-07-15 Annealing method Pending JPS6215826A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15411985A JPS6215826A (en) 1985-07-15 1985-07-15 Annealing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15411985A JPS6215826A (en) 1985-07-15 1985-07-15 Annealing method

Publications (1)

Publication Number Publication Date
JPS6215826A true true JPS6215826A (en) 1987-01-24

Family

ID=15577337

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15411985A Pending JPS6215826A (en) 1985-07-15 1985-07-15 Annealing method

Country Status (1)

Country Link
JP (1) JPS6215826A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8005351B2 (en) 2007-05-01 2011-08-23 Mattson Technology Canada, Inc. Irradiance pulse heat-treating methods and apparatus
US9279727B2 (en) 2010-10-15 2016-03-08 Mattson Technology, Inc. Methods, apparatus and media for determining a shape of an irradiance pulse to which a workpiece is to be exposed
US9482468B2 (en) 2005-09-14 2016-11-01 Mattson Technology, Inc. Repeatable heat-treating methods and apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9482468B2 (en) 2005-09-14 2016-11-01 Mattson Technology, Inc. Repeatable heat-treating methods and apparatus
US8005351B2 (en) 2007-05-01 2011-08-23 Mattson Technology Canada, Inc. Irradiance pulse heat-treating methods and apparatus
US8693857B2 (en) 2007-05-01 2014-04-08 Mattson Technology, Inc. Irradiance pulse heat-treating methods and apparatus
US9279727B2 (en) 2010-10-15 2016-03-08 Mattson Technology, Inc. Methods, apparatus and media for determining a shape of an irradiance pulse to which a workpiece is to be exposed

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