JPS62156958U - - Google Patents
Info
- Publication number
- JPS62156958U JPS62156958U JP1986045772U JP4577286U JPS62156958U JP S62156958 U JPS62156958 U JP S62156958U JP 1986045772 U JP1986045772 U JP 1986045772U JP 4577286 U JP4577286 U JP 4577286U JP S62156958 U JPS62156958 U JP S62156958U
- Authority
- JP
- Japan
- Prior art keywords
- ion beam
- objective lens
- sample surface
- scanning
- axis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010884 ion-beam technique Methods 0.000 claims description 4
- 230000003287 optical effect Effects 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000002994 raw material Substances 0.000 claims 1
- 239000007921 spray Substances 0.000 claims 1
- 201000009310 astigmatism Diseases 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986045772U JPH0121307Y2 (US06826419-20041130-M00005.png) | 1986-03-28 | 1986-03-28 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986045772U JPH0121307Y2 (US06826419-20041130-M00005.png) | 1986-03-28 | 1986-03-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62156958U true JPS62156958U (US06826419-20041130-M00005.png) | 1987-10-05 |
| JPH0121307Y2 JPH0121307Y2 (US06826419-20041130-M00005.png) | 1989-06-26 |
Family
ID=30864812
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986045772U Expired JPH0121307Y2 (US06826419-20041130-M00005.png) | 1986-03-28 | 1986-03-28 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0121307Y2 (US06826419-20041130-M00005.png) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55150225A (en) * | 1979-05-11 | 1980-11-22 | Hitachi Ltd | Method of correcting white spot fault of photomask |
| JPS561532A (en) * | 1979-06-18 | 1981-01-09 | Hitachi Ltd | Method and device for correcting white spot defect of photomask |
| JPS56162748A (en) * | 1980-05-21 | 1981-12-14 | Hitachi Ltd | Defect correcting method for photomask |
-
1986
- 1986-03-28 JP JP1986045772U patent/JPH0121307Y2/ja not_active Expired
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55150225A (en) * | 1979-05-11 | 1980-11-22 | Hitachi Ltd | Method of correcting white spot fault of photomask |
| JPS561532A (en) * | 1979-06-18 | 1981-01-09 | Hitachi Ltd | Method and device for correcting white spot defect of photomask |
| JPS56162748A (en) * | 1980-05-21 | 1981-12-14 | Hitachi Ltd | Defect correcting method for photomask |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0121307Y2 (US06826419-20041130-M00005.png) | 1989-06-26 |
