JPS6214952B2 - - Google Patents
Info
- Publication number
- JPS6214952B2 JPS6214952B2 JP53139526A JP13952678A JPS6214952B2 JP S6214952 B2 JPS6214952 B2 JP S6214952B2 JP 53139526 A JP53139526 A JP 53139526A JP 13952678 A JP13952678 A JP 13952678A JP S6214952 B2 JPS6214952 B2 JP S6214952B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- type
- resistance
- source
- diffusion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
- H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
- H10D84/85—Complementary IGFETs, e.g. CMOS
Landscapes
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Semiconductor Integrated Circuits (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13952678A JPS5565470A (en) | 1978-11-13 | 1978-11-13 | Mos integrated circuit |
| US06/093,201 US4318117A (en) | 1978-11-13 | 1979-11-13 | MOS Integrated circuit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13952678A JPS5565470A (en) | 1978-11-13 | 1978-11-13 | Mos integrated circuit |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5565470A JPS5565470A (en) | 1980-05-16 |
| JPS6214952B2 true JPS6214952B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1987-04-04 |
Family
ID=15247329
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13952678A Granted JPS5565470A (en) | 1978-11-13 | 1978-11-13 | Mos integrated circuit |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US4318117A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
| JP (1) | JPS5565470A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2773220B2 (ja) * | 1989-04-13 | 1998-07-09 | セイコーエプソン株式会社 | 半導体装置 |
| JP2773221B2 (ja) * | 1989-04-13 | 1998-07-09 | セイコーエプソン株式会社 | 半導体装置 |
| DE102005002739B4 (de) * | 2005-01-20 | 2010-11-25 | Infineon Technologies Ag | Verfahren zum Herstellen eines Feldeffekttransistors, Tunnel-Feldeffekttransistor und integrierte Schaltungsanordnung mit mindestens einem Feldeffekttransistor |
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1978
- 1978-11-13 JP JP13952678A patent/JPS5565470A/ja active Granted
-
1979
- 1979-11-13 US US06/093,201 patent/US4318117A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5565470A (en) | 1980-05-16 |
| US4318117A (en) | 1982-03-02 |