JPS62148943A - Treatment with silane coupling agent - Google Patents
Treatment with silane coupling agentInfo
- Publication number
- JPS62148943A JPS62148943A JP29111485A JP29111485A JPS62148943A JP S62148943 A JPS62148943 A JP S62148943A JP 29111485 A JP29111485 A JP 29111485A JP 29111485 A JP29111485 A JP 29111485A JP S62148943 A JPS62148943 A JP S62148943A
- Authority
- JP
- Japan
- Prior art keywords
- silane coupling
- coupling agent
- pressure
- vessel
- treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はシランカップリング剤処理方法、特にシランカ
ップリング剤蒸気により基板を処理する方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for treating a silane coupling agent, and more particularly to a method for treating a substrate with a silane coupling agent vapor.
、
〔技術環境〕
近年の7オトレジストによるパターン形成は微細化が進
み、そのためフォトレジストと基板との密着力即ち接着
力を強化する必要が生じている。[Technical Environment] In recent years, pattern formation using photoresists has become increasingly finer, and as a result, it has become necessary to strengthen the adhesion, that is, the adhesion, between the photoresist and the substrate.
特にノボラック系のポジ型フォトレジストは高い解像度
を有することにより広く用いられているが、基板の表面
がガラスあるいは二酸化珪*などの酸化物の場合には、
フォトレジストと基板表面の接着力が小さく、その強化
が必要であった。In particular, novolak-based positive photoresists are widely used due to their high resolution, but when the substrate surface is glass or an oxide such as silicon dioxide*,
The adhesion between the photoresist and the substrate surface was weak and needed to be strengthened.
一般に、フォトレジストなどの樹脂とガラス等の接着力
強化のために、前処理としてシランカップリング剤をガ
ラス等の表161にコーティングすることが知られてい
る。例えば米国特許3,549,368号(RoHlC
ollins and F、T、Deverse″Pr
ocessfor Improving Photor
esist Adhesion”)に示されているよう
に7オトレジストの塗布前にヘキサメチルジシラザンな
どのヘキサアルキルジシラザンをスピンコードする前処
理を行うことがこのシランカップリング剤による前処理
は、親水性である基板表面をカップリングにより疎水性
に変換し、疎水性の樹脂例えば、フォトレジストとの親
和性を高めることによって接着力を強化するものである
。Generally, it is known to coat a surface 161 of glass or the like with a silane coupling agent as a pretreatment in order to strengthen the adhesion between a resin such as a photoresist and glass or the like. For example, US Pat. No. 3,549,368 (RoHlC
ollins and F.T., Diverse"Pr.
Occessfor Improving Photor
7 Before applying the photoresist, spin-coding hexaalkyldisilazane such as hexamethyldisilazane is performed as shown in ``Pretreatment with a silane coupling agent, which is hydrophilic. The surface of a certain substrate is made hydrophobic through coupling, and the adhesive force is strengthened by increasing the affinity with a hydrophobic resin such as a photoresist.
従来のシランカップリング剤処理方法としては前述した
ようにスピナーによる塗布あるいは浸漬による塗布方法
が知られていた。As described above, coating methods using a spinner or coating methods using dipping have been known as conventional silane coupling agent treatment methods.
あるいは、第2図に示すようにシランカップリング剤工
0を収容した密閉容器20の中に基板5を所定時間静置
することによって、シランカップリング剤蒸気中での処
理を行っていた。Alternatively, as shown in FIG. 2, the substrate 5 is left standing in a closed container 20 containing the silane coupling agent 0 for a predetermined period of time, thereby performing the treatment in the silane coupling agent vapor.
上述した従来の処理方法の中では、シランカップリング
剤蒸気を用いた処理がシランカップリング剤中のゴミや
不純物の影響がなく、塗布や浸漬による処理よりも有利
である。Among the conventional treatment methods described above, treatment using silane coupling agent vapor is free from the influence of dust and impurities in the silane coupling agent, and is more advantageous than treatment by coating or dipping.
ところが、この蒸気による処理では密閉容器に基板を収
容する時、あ1.るいは取り出す時に密閉容器を開放す
るため、密閉容器内のシランカップリング剤蒸気の濃度
が低下する。基板収容時の開放時間あるいは収容前の保
持時間によってシランカップリング剤蒸気の初期濃度が
変動するだけでなく、処理中も濃度が変化するため、シ
ランカップリング剤処理条件の制御が困難であるという
欠点があった。However, in this steam treatment, when the substrate is placed in a sealed container, a. Since the sealed container is opened when taking out the silane coupling agent, the concentration of silane coupling agent vapor in the sealed container decreases. Not only does the initial concentration of the silane coupling agent vapor vary depending on the opening time during substrate storage or the holding time before storage, but the concentration also changes during processing, making it difficult to control the silane coupling agent processing conditions. There were drawbacks.
また、シランカップリング剤は空気中の水分と反応し、
劣化する。例えばヘキザメチルジシラザンでは空気中の
水分と反応して、アンモニアを生成する。In addition, silane coupling agents react with moisture in the air,
to degrade. For example, hexamethyldisilazane reacts with moisture in the air to produce ammonia.
従って、シランカップリング剤は水分のない雰囲気で保
管や使用することが必要であるが、従来の方法では操作
上空気中でしか処理できな(・という欠点もあった。Therefore, it is necessary to store and use the silane coupling agent in a moisture-free atmosphere, but conventional methods also have the disadvantage that they can only be processed in air.
本発明のシランカップリング剤処理方法は、シランカッ
プリング剤を収容した第1の減圧容器内を減圧してシラ
ンカップリング剤を気化せしめたし、基板を収容し減圧
した第2の減圧容器内に前記不活性ガスと共に前記シラ
ンカップリング剤蒸気を所定時間導入して、前記基板表
面を処理する。The silane coupling agent processing method of the present invention involves reducing the pressure in a first vacuum container containing the silane coupling agent to vaporize the silane coupling agent, and then vaporizing the silane coupling agent in a second vacuum container containing the substrate and reducing the pressure. The silane coupling agent vapor is introduced together with the inert gas for a predetermined period of time to treat the substrate surface.
次に、本発明の実施例について、図面を参照して詳細に
説明する。Next, embodiments of the present invention will be described in detail with reference to the drawings.
第1の実施例
第1図に示すように、容器11に入れたシランカップリ
ング剤10を収容した第1の減圧容器lを所定圧力まで
真空ポンプ(図示せず)で減圧し、シランカップリング
剤を気化させる。First Example As shown in FIG. 1, a first vacuum container l containing a silane coupling agent 10 placed in a container 11 is depressurized to a predetermined pressure with a vacuum pump (not shown), and the silane coupling vaporize the agent.
次にガラス基板5を収容した第2の減圧容器2を所定圧
力まで減圧する。第1の減圧容器内でシランカップリン
グ剤の気化が進み、所定圧力まで上昇した後、第1の減
圧容器内が大気圧となるまで窒素ガスを導入する(窒素
ガス導入口およびバルブは図示せず)。次に第1の減圧
容器lど第2の減圧容器2とを接続する配管3に設けら
れているバルブ4を開き第1の減圧容器内の窒素ガスと
に導入して、所定時間ガラス基板50表面を処理する。Next, the pressure of the second vacuum container 2 containing the glass substrate 5 is reduced to a predetermined pressure. After the silane coupling agent vaporizes in the first reduced pressure container and rises to a predetermined pressure, nitrogen gas is introduced until the inside of the first reduced pressure container reaches atmospheric pressure (nitrogen gas inlet and valve are not shown). figure). Next, the valve 4 provided in the piping 3 connecting the first reduced pressure container l and the second reduced pressure container 2 is opened, and the nitrogen gas in the first reduced pressure container is introduced into the glass substrate 50 for a predetermined period of time. Treat the surface.
所定時間経過後バルブ4を閉じ、ガラス基板5を第2の
減圧容器から取り出してシランカップリング剤処理が完
了する。After a predetermined period of time has elapsed, the valve 4 is closed, the glass substrate 5 is taken out from the second vacuum container, and the silane coupling agent treatment is completed.
第2の実施例
第1の減圧容器内でシランカップリング剤を気化させ、
基板5を収容した第2の減圧容器を減圧するまでは実施
例1と同様に行なう。第1の減圧容器内が所定圧力まで
上昇した後、第1の減圧容器内に窒素ガスを導入すると
同時にバルブ4を開き、窒素ガスとともにシランカップ
リング剤蒸気を第2の減圧容器に導入し、2つの減圧容
器が大気圧になった時点で、第1の減圧容器への窒素ガ
ス導入を停止するとともにバルブ4を閉じる。Second Example: Vaporizing the silane coupling agent in the first vacuum container,
The same procedure as in Example 1 is carried out until the second vacuum container containing the substrate 5 is depressurized. After the pressure inside the first reduced pressure container rises to a predetermined pressure, nitrogen gas is introduced into the first reduced pressure container, and at the same time, the valve 4 is opened, and silane coupling agent vapor is introduced into the second reduced pressure container together with the nitrogen gas, When the two pressure reduction containers reach atmospheric pressure, the introduction of nitrogen gas to the first pressure reduction container is stopped and the valve 4 is closed.
第2の減圧容器内のガラス基板表面を導入されたシラン
カップリング剤により所定時間処理する。The surface of the glass substrate in the second vacuum container is treated with the introduced silane coupling agent for a predetermined period of time.
本発明のシランカップリング剤処理方法は、処理前にシ
ランカップリング剤を収容した減圧容器グ剤を気化させ
ることにより、初期のシランカップリング剤蒸気の量を
一定にして処理することができる。即ち、シランカップ
リング剤処理が一定の条件のもとて安定に行えるという
効果がある。In the silane coupling agent treatment method of the present invention, the initial amount of silane coupling agent vapor can be kept constant during treatment by vaporizing the agent in a vacuum container containing the silane coupling agent before treatment. That is, there is an effect that the silane coupling agent treatment can be performed very stably under certain conditions.
また乾燥不活性ガスを導入することにより、基板を収容
した第2の減圧容器へのシランカップリング剤蒸気の導
入がスムーズになり、処理時間の短縮の他、シランカッ
プリング剤の保存や使用が乾燥不活性ガス雰囲気となる
ので、水分による劣化が防止できるという効果がある。In addition, by introducing a dry inert gas, the silane coupling agent vapor can be smoothly introduced into the second vacuum container containing the substrate, which not only shortens processing time but also facilitates the storage and use of the silane coupling agent. Since it is a dry inert gas atmosphere, it has the effect of preventing deterioration due to moisture.
第1図は本発明の一実施例を示す説明図、g4″J2図
は従来の方法を示す説明図である。
1・−・・・・第lの減圧容器、2・・・・・・第2の
減圧容器、3・・・・・・配管、4・・・・・・バルブ
、5・・・・・・基板、lO・・・・・・シランカップ
リング剤、11・・・・・・シランカップリング剤容器
。
こ\
−7−″
躬1図
第Z図Fig. 1 is an explanatory diagram showing an embodiment of the present invention, and Fig. g4''J2 is an explanatory diagram showing a conventional method. Second reduced pressure container, 3... Piping, 4... Valve, 5... Substrate, lO... Silane coupling agent, 11... ... Silane coupling agent container. -7-'' Figure 1 Figure Z
Claims (1)
圧してシランカップリング剤を気化せしめた後、該第1
の減圧容器内に乾燥不活性ガスを導入し、基板を収容し
減圧した第2の減圧容器内に前記乾燥不活性ガスと共に
、前記シランカップリング剤蒸気を所定時間導入して、
前記基板表面を処理することを特徴とするシランカップ
リング剤処理方法。After reducing the pressure in the first vacuum container containing the silane coupling agent and vaporizing the silane coupling agent, the first vacuum container containing the silane coupling agent is vaporized.
introducing a dry inert gas into a reduced pressure container, and introducing the silane coupling agent vapor together with the dry inert gas into a second reduced pressure container containing the substrate and reducing the pressure for a predetermined time;
A method for treating a silane coupling agent, which comprises treating the surface of the substrate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29111485A JPS62148943A (en) | 1985-12-23 | 1985-12-23 | Treatment with silane coupling agent |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29111485A JPS62148943A (en) | 1985-12-23 | 1985-12-23 | Treatment with silane coupling agent |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62148943A true JPS62148943A (en) | 1987-07-02 |
Family
ID=17764636
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP29111485A Pending JPS62148943A (en) | 1985-12-23 | 1985-12-23 | Treatment with silane coupling agent |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62148943A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63255568A (en) * | 1987-04-10 | 1988-10-21 | Mazda Motor Corp | Idle revolution speed controller for engine |
US5024925A (en) * | 1988-07-21 | 1991-06-18 | Fuji Photo Film Co., Ltd. | Method of forming color image from a color reversal photographic material comprising a specified iodide content and spectral distribution |
WO2004033393A3 (en) * | 2002-10-11 | 2004-06-03 | Amersham Biosciences Sv Corp | Vapor phase method for producing silane coatings |
JP2011063760A (en) * | 2009-09-18 | 2011-03-31 | Seiko Epson Corp | Substrate joining method |
JP2011119735A (en) * | 2009-12-03 | 2011-06-16 | Asml Netherlands Bv | Lithographic apparatus, and method of forming lyophobic coating on surface |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5685825A (en) * | 1979-12-17 | 1981-07-13 | Nec Corp | Thin film coating device of semiconductor wafer |
-
1985
- 1985-12-23 JP JP29111485A patent/JPS62148943A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5685825A (en) * | 1979-12-17 | 1981-07-13 | Nec Corp | Thin film coating device of semiconductor wafer |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63255568A (en) * | 1987-04-10 | 1988-10-21 | Mazda Motor Corp | Idle revolution speed controller for engine |
US5024925A (en) * | 1988-07-21 | 1991-06-18 | Fuji Photo Film Co., Ltd. | Method of forming color image from a color reversal photographic material comprising a specified iodide content and spectral distribution |
WO2004033393A3 (en) * | 2002-10-11 | 2004-06-03 | Amersham Biosciences Sv Corp | Vapor phase method for producing silane coatings |
JP2011063760A (en) * | 2009-09-18 | 2011-03-31 | Seiko Epson Corp | Substrate joining method |
JP2011119735A (en) * | 2009-12-03 | 2011-06-16 | Asml Netherlands Bv | Lithographic apparatus, and method of forming lyophobic coating on surface |
US8512817B2 (en) | 2009-12-03 | 2013-08-20 | Asml Netherlands B.V. | Lithographic apparatus and a method of forming a lyophobic coating on a surface |
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