JPS62136745A - Secondary ion mass spectrometer - Google Patents

Secondary ion mass spectrometer

Info

Publication number
JPS62136745A
JPS62136745A JP60274997A JP27499785A JPS62136745A JP S62136745 A JPS62136745 A JP S62136745A JP 60274997 A JP60274997 A JP 60274997A JP 27499785 A JP27499785 A JP 27499785A JP S62136745 A JPS62136745 A JP S62136745A
Authority
JP
Japan
Prior art keywords
sample
power source
electron beam
mass spectrometer
potential
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60274997A
Other languages
Japanese (ja)
Other versions
JPH061683B2 (en
Inventor
Kazutoshi Nagai
Hiroki Kuwano
Fusao Shimokawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP60274997A priority Critical patent/JPH061683B2/en
Publication of JPS62136745A publication Critical patent/JPS62136745A/en
Publication of JPH061683B2 publication Critical patent/JPH061683B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE: To maintain the potential on the surface of a sample constant and to improve the accuracy of quantitative performance by detecting the deflecting quantity of an electron beam from an electron gun and then controlling the potential on the surface of a sample to be analyzed by means of a D.C. power source on the basis of a detected output signal.
CONSTITUTION: A sample 12 to be analyzed being held in a sample holder 13 is arranged in a vacuum container 15 of an analyzer, then an electron beam is emitted in parallel to the vicinity of the surface of the sample 12 from an electron gun 17. An electron beam detector 18 for detecting the deflecting quan tity of the electron beam 23 is arranged opposing to said electron gun 17 and then a detected signal from said detector 18 is amplified 19 to control a D.C. power source and regulate the output from the power source 20. The primary ions 21 are irradiated from an ion source 11 onto the sample 12 and the mass spectrometry of the secondary ions 22 from the sample 12 is executed by means of a mass spectrometer 14. Here, the potential on the surface of the sample 12 is maintained constant by means of the power source 20 and the accuracy of quantitative performance of the mass spectrometer 14 is improved.
COPYRIGHT: (C)1987,JPO&Japio
JP60274997A 1985-12-09 1985-12-09 Secondary ion mass spectrometer Expired - Lifetime JPH061683B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60274997A JPH061683B2 (en) 1985-12-09 1985-12-09 Secondary ion mass spectrometer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60274997A JPH061683B2 (en) 1985-12-09 1985-12-09 Secondary ion mass spectrometer

Publications (2)

Publication Number Publication Date
JPS62136745A true JPS62136745A (en) 1987-06-19
JPH061683B2 JPH061683B2 (en) 1994-01-05

Family

ID=17549455

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60274997A Expired - Lifetime JPH061683B2 (en) 1985-12-09 1985-12-09 Secondary ion mass spectrometer

Country Status (1)

Country Link
JP (1) JPH061683B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009187851A (en) * 2008-02-08 2009-08-20 Hitachi High-Technologies Corp Charged particle beam device and method of knowing electrostatic charge condition in surface of sample
CN112649648A (en) * 2019-10-12 2021-04-13 中国科学院国家空间科学中心 Device and method for measuring satellite surface potential by using electronic deflection method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009187851A (en) * 2008-02-08 2009-08-20 Hitachi High-Technologies Corp Charged particle beam device and method of knowing electrostatic charge condition in surface of sample
CN112649648A (en) * 2019-10-12 2021-04-13 中国科学院国家空间科学中心 Device and method for measuring satellite surface potential by using electronic deflection method

Also Published As

Publication number Publication date
JPH061683B2 (en) 1994-01-05

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