JPS62128426A - Secondary ion mass analyzer - Google Patents
Secondary ion mass analyzerInfo
- Publication number
- JPS62128426A JPS62128426A JP60267538A JP26753885A JPS62128426A JP S62128426 A JPS62128426 A JP S62128426A JP 60267538 A JP60267538 A JP 60267538A JP 26753885 A JP26753885 A JP 26753885A JP S62128426 A JPS62128426 A JP S62128426A
- Authority
- JP
- Japan
- Prior art keywords
- ion
- magnetic field
- ions
- sample
- electrons
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
本発明は正電荷二次イオンと負電荷二次イオンを同時に
測定する二次イオン質量分析計に関する。DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a secondary ion mass spectrometer that simultaneously measures positively charged secondary ions and negatively charged secondary ions.
〈背景技術〉
第3図に本発明者らが既に特許出願(特願昭60−17
1195号)した二次イオン質量分析計を示す。同図中
において、lはイオン源、2は一次イオンビーム、3は
分析試料、4は二次イオン、5は入射スリット、6は円
柱電極、7は出射スリット、12はイオン共振場、13
は電源、21.22は二次電子増倍管、23,24,2
5,26は直流高圧電源、27,28は負荷抵抗、29
.30は直流高電圧阻止用コンデンサー、31.32は
増幅器、33.34はそれぞれ正・負電荷の二次イオン
である。5,6,7,12で四電極型質量分析計のイオ
ン分析系を構成している。同図(blは同図(a)にお
けるA −A’での断面図である。動作は次のとおり。<Background Art> Figure 3 shows that the present inventors have already filed a patent application (Japanese Patent Application
1195) is shown. In the figure, l is an ion source, 2 is a primary ion beam, 3 is an analysis sample, 4 is a secondary ion, 5 is an entrance slit, 6 is a cylindrical electrode, 7 is an exit slit, 12 is an ion resonance field, 13
is the power supply, 21.22 is the secondary electron multiplier, 23, 24, 2
5, 26 are DC high voltage power supplies, 27, 28 are load resistors, 29
.. 30 is a DC high voltage blocking capacitor, 31 and 32 are amplifiers, and 33 and 34 are positively and negatively charged secondary ions, respectively. 5, 6, 7, and 12 constitute an ion analysis system of a four-electrode mass spectrometer. The figure (bl is a sectional view taken along line A-A' in figure (a)).The operation is as follows.
イオン源1から放出した5〜10 KeVのイオン(こ
れが−次イオンビーム2である)が分析試料3を衝撃す
ると分析試料3から正電荷及び負電荷の二次イオン4が
放出する。この二次イオン4ば四電極型質量分析計に入
射して分析されることになる。即ち、入射スリット5を
通過して、4本の円柱電極6て囲まれたイオン共振場1
2に入射した二次イオン4は、電源13で印加される直
流電界と交流電界の重畳した高周波電界によって、電界
の強さ、周波数、イオンの質量で定まる共振条件に適す
る質量を有するもののみが安定軌道を描いて飛行して、
出射スリット7から出射することとなる。一方、上記共
振条件に適さない質量の二次イオンは、イオン共振場1
2を飛行中に雲散霧消する。When 5 to 10 KeV ions (this is the -order ion beam 2) emitted from the ion source 1 bombard the analysis sample 3, positively and negatively charged secondary ions 4 are emitted from the analysis sample 3. These secondary ions enter a four-electrode mass spectrometer and are analyzed. That is, the ion resonance field 1 passing through the entrance slit 5 and surrounded by the four cylindrical electrodes 6
The secondary ions 4 that are incident on the secondary ions 2 are caused by a high-frequency electric field in which a DC electric field and an AC electric field are superimposed, which is applied by a power source 13, and only those having masses suitable for the resonance conditions determined by the electric field strength, frequency, and mass of the ions are Fly in a stable orbit,
The light will be emitted from the emission slit 7. On the other hand, secondary ions with a mass that is not suitable for the above resonance conditions are in the ion resonance field 1.
Dissipate cloud dissipation while flying 2.
出射スリット7を通過した二次イオンのうち、正電荷の
二次イオン33は直流高圧電源25によって加速され、
二次電子増倍管21に入射して電気信号となって負荷抵
抗27に現われ、コンデンサー29を介して増幅器31
で増幅される。また出射スリット7を通過した二次イオ
ンのうち負電荷の二次イオン34は直流高圧電源26に
よって加速され、二次電子増倍管22に入射して電気信
号となって負荷抵抗28に現われ、コンデンサー30を
介して増幅器32で増幅される。電R23゜24はそれ
ぞれ二次電子増倍管21,22の駆動用電源である。Among the secondary ions that have passed through the exit slit 7, the positively charged secondary ions 33 are accelerated by the DC high voltage power supply 25.
It enters the secondary electron multiplier tube 21, becomes an electric signal, appears at the load resistor 27, and passes through the capacitor 29 to the amplifier 31.
is amplified. Among the secondary ions that have passed through the exit slit 7, negatively charged secondary ions 34 are accelerated by the DC high voltage power supply 26, enter the secondary electron multiplier 22, become an electrical signal, and appear on the load resistor 28. The signal is amplified by an amplifier 32 via a capacitor 30. Power supplies R23 and R24 are power supplies for driving the secondary electron multiplier tubes 21 and 22, respectively.
〈発明が解決しようとする問題点〉
上述した二次イオン質量分析計では、−次イオンビーム
2によって衝撃をうけた分析試料3からは、二次イオン
4のほかに多量の二次電子が放出し、これが二次イオン
4に混入してイオン共振場12に入射する。そのために
イオン共振場12に密度の濃い空rIRTi荷が形成さ
れて二次イオンの分離能が低下する問題点があった。<Problems to be Solved by the Invention> In the secondary ion mass spectrometer described above, a large amount of secondary electrons are emitted from the analysis sample 3 that has been bombarded by the -order ion beam 2, in addition to the secondary ions 4. However, this mixes with the secondary ions 4 and enters the ion resonance field 12. Therefore, a problem arises in that dense empty rIRTi charges are formed in the ion resonance field 12, resulting in a decrease in the separation ability of secondary ions.
本発明は二次電子の混入による二次イオン分離能の低下
を防ぐために、磁界を用いた二次電子除去法を提供する
ことを目的とするものである。An object of the present invention is to provide a method for removing secondary electrons using a magnetic field in order to prevent deterioration of secondary ion separation ability due to contamination of secondary electrons.
く問題点を解決するための手段〉
斯かる目的を達成する本発明の構成は二次イオンビーム
放出用のイオン源、分析試料、及び質量分析計を具える
と共に質量分析計イオン検出部として正電荷二次イオン
を加速する電源及びこれを検出する二次電子増倍管なら
びに負電荷二次イオンを加速する電源及びこれを検出す
る二次電子増倍管を備え、正・負電荷の二次イオンを同
時に測定する二次イオン質量分析計において、前記試料
の表面に対して略平行な磁界を発生する磁場発生手段を
設け、前記イオン検出部への電子の入射を防ぐことを特
徴とする。Means for Solving the Problems〉 The configuration of the present invention to achieve the above object includes an ion source for emitting a secondary ion beam, an analysis sample, and a mass spectrometer, and also has a configuration that can be used as an ion detection section of the mass spectrometer. Equipped with a power source for accelerating charged secondary ions and a secondary electron multiplier for detecting the same, and a power source for accelerating negatively charged secondary ions and a secondary electron multiplier for detecting the same, the secondary electron multiplier for positive and negative charges is provided. A secondary ion mass spectrometer that simultaneously measures ions is characterized in that a magnetic field generating means for generating a magnetic field substantially parallel to the surface of the sample is provided to prevent electrons from entering the ion detection section.
く作 用〉
本発明は分析試料の表面に平行な磁界を附加することに
よって、分析試料から放出する二次電子の飛行軌道を曲
げ、四電極型質量分析計への入射を防ぐことを最も主要
な特徴とするものであって、磁界発生手段を備えている
ことが従来技術と異なる点である。The main purpose of the present invention is to apply a magnetic field parallel to the surface of the analysis sample to bend the flight trajectory of secondary electrons emitted from the analysis sample and prevent them from entering the four-electrode mass spectrometer. The present invention is different from the conventional technology in that it includes a magnetic field generating means.
〈実 施 例〉
以下、本発明の一実施例について第1図を参照して詳細
に説明する。<Example> Hereinafter, an example of the present invention will be described in detail with reference to FIG.
第1図に示されるように、分析試料3の表面に対して平
行な磁界41が図示しなし1磁場発生手段により発生さ
れており、その他については前述した第3図の二次イオ
ン質料分析計と同様な構成となっている。動作は次の通
り。As shown in FIG. 1, a magnetic field 41 parallel to the surface of the analysis sample 3 is generated by a magnetic field generating means 1 (not shown), and the rest is performed using the secondary ion material analyzer shown in FIG. It has a similar configuration. The operation is as follows.
二次イオンビーム2の衝撃を受けた分析試料3からは、
二次イオン4と同時に多量の二次電子が放出する。磁界
41は試料3の表面に平行であるので二次電子は入射ス
リット5への入射方向からそれろ向きに偏向をうけてイ
オン共振場12に入射しない。当然二次イオン4も磁界
41によって偏向されるが、電子に比較して質量が非常
に大きいため(こ、偏向の程度が微小であって、磁界4
1の影VJlよ無視できる程小さい。定量的に考察する
と次の様になる。From the analysis sample 3 that has been bombarded by the secondary ion beam 2,
A large amount of secondary electrons are emitted simultaneously with the secondary ions 4. Since the magnetic field 41 is parallel to the surface of the sample 3, the secondary electrons are deflected away from the direction of incidence into the entrance slit 5 and do not enter the ion resonance field 12. Naturally, the secondary ions 4 are also deflected by the magnetic field 41, but since their mass is extremely large compared to electrons (the degree of deflection is minute and the magnetic field 41
1's shadow VJl is so small that it can be ignored. When considered quantitatively, the results are as follows.
第2図は磁界中における荷電粒子の円形軌道半径(ラマ
ー半径)を示したものである。FIG. 2 shows the circular orbit radius (Lamar radius) of charged particles in a magnetic field.
第1図の分析試料3から放出する二次イオン二次電子は
ともに50eV程度の運動エネルギーUを有している。The secondary ions and secondary electrons emitted from the analysis sample 3 in FIG. 1 both have a kinetic energy U of about 50 eV.
第2図によれば、例えば質量数に=1の水素イオンの場
合、100erの磁界で軌道半径r、−=100cm程
度であるのに対し、電子の質lは水素イオンの約172
000であるから軌道半径は水素イオンの軌道半径の1
74((r、 =2.5 am )となる。よって10
0erの磁界によって二次電子が質量分析計に入射する
のを防ぐことができる一方、水素イオンより質量の大き
な他のイオンCよ軌道半径が水素イオンよりさらに大き
くなるので問題はない。According to Figure 2, for example, in the case of a hydrogen ion with a mass number of 1, the orbital radius r, -=100 cm in a 100er magnetic field, while the electron quality l is about 172 cm for the hydrogen ion.
000, so the orbital radius is 1 of the hydrogen ion orbital radius.
74 ((r, = 2.5 am). Therefore, 10
While the 0er magnetic field can prevent secondary electrons from entering the mass spectrometer, there is no problem because the orbital radius of other ions C, which have a larger mass than the hydrogen ions, is even larger than that of the hydrogen ions.
尚、上記実施例では磁界41は分析試料3の表面に対し
て平行であったが、必ずしも完全に平行でなくてもよ(
、略平行であれば良い。つまり、分析試料3の表面に対
し平行な成分のある磁界であれば良い。In the above embodiment, the magnetic field 41 was parallel to the surface of the analysis sample 3, but it does not necessarily have to be completely parallel (
, as long as they are approximately parallel. In other words, any magnetic field that has a component parallel to the surface of the analysis sample 3 is sufficient.
〈発明の効果〉
以上実施例に基づいて具体的に説明したように磁界の付
加により、分析試料から放出する二次電子の質量分析計
への入射を阻止することができるから二次イオン質量分
析の分解能の低下を防ぎうる利点がある。<Effects of the Invention> As specifically explained based on the embodiments above, by applying a magnetic field, it is possible to prevent secondary electrons emitted from an analysis sample from entering the mass spectrometer, so secondary ion mass spectrometry is possible. This has the advantage of preventing a decrease in resolution.
第1図(alは本発明の一実施例に係る二次イオン質量
分析計の概略構成図、第1図(blは同図tati
中のB−B′14.%断面図、第2図は磁界中を運動す
る荷電粒子の軌道半径と粒子の運動エネルギーの関係を
示すグラフ、第3図(alは先頭の二次イオン質量分析
計の概略構成図、第3図fb)は同図(文中のA −A
’線断面図である。
図面中、
1はイオン源、2は二次イオンビーム、3は分析試料、
4は二次イオン、5は入射スリット、6は円柱電極、7
は出射スリット、12はイオン共振場、15は電源、2
1.22は二次電子増倍管、23,24,25,26は
直流高圧電源、27,28は負荷抵抗、29.30は直
流高電圧阻止用コンデンサー、31.32は増幅器、3
3は正電荷二次イオン、34は負電荷二次イオン、41
は磁界である。Figure 1 (al is a schematic configuration diagram of a secondary ion mass spectrometer according to an embodiment of the present invention, Figure 1 (bl is the same figure)
B-B'14. % cross-sectional view, Figure 2 is a graph showing the relationship between the orbital radius of a charged particle moving in a magnetic field and the kinetic energy of the particle, Figure 3 (al is a schematic diagram of the top secondary ion mass spectrometer, Figure fb) is the same figure (A-A in the text
'It is a line cross-sectional view. In the drawing, 1 is an ion source, 2 is a secondary ion beam, 3 is an analysis sample,
4 is a secondary ion, 5 is an entrance slit, 6 is a cylindrical electrode, 7
is an exit slit, 12 is an ion resonance field, 15 is a power source, 2
1.22 is a secondary electron multiplier, 23, 24, 25, 26 is a DC high voltage power supply, 27, 28 is a load resistor, 29.30 is a DC high voltage blocking capacitor, 31.32 is an amplifier, 3
3 is a positively charged secondary ion, 34 is a negatively charged secondary ion, 41
is the magnetic field.
Claims (1)
量分析計を具えると共に質量分析計イオン検出部として
正電荷二次イオンを加速する電源及びこれを検出する二
次電子増倍管ならびに負電荷二次イオンを加速する電源
及びこれを検出する二次電子増倍管を備え、正・負電荷
の二次イオンを同時に測定する二次イオン質量分析計に
おいて、前記試料の表面に対して略平行な磁界を発生す
る磁場発生手段を設け、前記イオン検出部への電子の入
射を防ぐことを特徴とする二次イオン質量分析計。Equipped with an ion source for emitting a primary ion beam, an analysis sample, and a mass spectrometer, a power source for accelerating positively charged secondary ions as an ion detection part of the mass spectrometer, a secondary electron multiplier for detecting the same, and a negative charge In a secondary ion mass spectrometer that is equipped with a power source that accelerates secondary ions and a secondary electron multiplier that detects them, and that measures positively and negatively charged secondary ions at the same time, it is approximately parallel to the surface of the sample. 1. A secondary ion mass spectrometer, comprising a magnetic field generating means for generating a magnetic field to prevent electrons from entering the ion detection section.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60267538A JPS62128426A (en) | 1985-11-29 | 1985-11-29 | Secondary ion mass analyzer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60267538A JPS62128426A (en) | 1985-11-29 | 1985-11-29 | Secondary ion mass analyzer |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62128426A true JPS62128426A (en) | 1987-06-10 |
Family
ID=17446213
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60267538A Pending JPS62128426A (en) | 1985-11-29 | 1985-11-29 | Secondary ion mass analyzer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62128426A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007194094A (en) * | 2006-01-20 | 2007-08-02 | Shimadzu Corp | Mass spectroscope |
-
1985
- 1985-11-29 JP JP60267538A patent/JPS62128426A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007194094A (en) * | 2006-01-20 | 2007-08-02 | Shimadzu Corp | Mass spectroscope |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5202561A (en) | Device and method for analyzing ions of high mass | |
JPS62264546A (en) | Mass spectrograph | |
JPH0544133B2 (en) | ||
US5665967A (en) | Apparatus and method for surface analysis | |
US5401965A (en) | Secondary ion mass spectrometer for analyzing positive and negative ions | |
JPS5958749A (en) | Composite objective and radiation lens | |
JPH10188878A (en) | Ion detector | |
US4227087A (en) | Beam detector | |
JPS62128426A (en) | Secondary ion mass analyzer | |
JP3830344B2 (en) | Vertical acceleration time-of-flight mass spectrometer | |
JP2990321B2 (en) | Induction plasma mass spectrometer | |
US5034605A (en) | Secondary ion mass spectrometer with independently variable extraction field | |
JP3967694B2 (en) | Time-of-flight mass spectrometer | |
WO1999035668A3 (en) | Charged particle energy analysers | |
JP2545940B2 (en) | Mass spectrometer | |
JP2904460B2 (en) | Charge suppression device for particle beam irradiation equipment | |
US3284628A (en) | Mass filter having an ion source structure with preselected relative potentials applied thereto | |
JPH059899B2 (en) | ||
JPH0982274A (en) | Quadrupole mass spectrometry device | |
JP2001210267A (en) | Particle detector and mass spectrograph using it | |
JPS58142285A (en) | Charged particle detector | |
JPH0665200B2 (en) | High-speed atomic beam source device | |
JPS60100349A (en) | Secondary electron detector | |
JPH0622109B2 (en) | Secondary ion mass spectrometer | |
JPH0475622B2 (en) |