JPS6193515A - Surface treatment for insulator - Google Patents

Surface treatment for insulator

Info

Publication number
JPS6193515A
JPS6193515A JP21486884A JP21486884A JPS6193515A JP S6193515 A JPS6193515 A JP S6193515A JP 21486884 A JP21486884 A JP 21486884A JP 21486884 A JP21486884 A JP 21486884A JP S6193515 A JPS6193515 A JP S6193515A
Authority
JP
Japan
Prior art keywords
glaze
insulator
fired
laser
glaze layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21486884A
Other languages
Japanese (ja)
Inventor
続 馨
幹雄 石川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NGK Insulators Ltd
Original Assignee
NGK Insulators Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NGK Insulators Ltd filed Critical NGK Insulators Ltd
Priority to JP21486884A priority Critical patent/JPS6193515A/en
Publication of JPS6193515A publication Critical patent/JPS6193515A/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 発明の目的 (産業上の利用分野) 本発明は琶1子の表面処理方法に係わり、さらに詳しく
は碍子の表面一部に釉薬を焼付ける方法に関゛するもの
である。
[Detailed Description of the Invention] Purpose of the Invention (Field of Industrial Application) The present invention relates to a method for treating the surface of an insulator, and more specifically to a method of baking a glaze onto a part of the surface of an insulator. be.

(従来の技術) 磁器製の碍子の表面に釉薬を焼付ける方法としては、焼
成前の碍子本体の表面に釉薬を塗iji したものを炉
の中で焼成して焼付けていた。そして、製品の表面に局
部的に釉薬の施されない部分や若干の異物のために変色
した部分が生ずると、その製品を廃却するか、又は欠陥
部分に釉薬を施して全体に2反目の焼成を行う°必要が
あった。
(Prior Art) A method of baking a glaze on the surface of a porcelain insulator is to apply a glaze to the surface of the insulator body before firing, and then fire it in a furnace. If the surface of the product is partially unglazed or discolored due to some foreign matter, the product is either discarded or the defective areas are glazed and the entire product is fired for a second time. It was necessary to do this.

(発明が解決しようとする問題点) 前述したように製品を2回焼成処理する作業は、非常に
煩わしいばかりでなく、経費も高くなり品のコストダウ
ンを図ることができないという問題がある。本発明は碍
子表面に部分的に釉薬を焼付ける作業を極めて簡単に行
うことを、その解決課題とするものである。
(Problems to be Solved by the Invention) As described above, the work of firing a product twice is not only extremely troublesome, but also increases costs, making it impossible to reduce the cost of the product. An object of the present invention is to extremely easily perform the work of partially baking glaze onto the surface of an insulator.

発明の構成 (問題点を解決するための手段) 本発明は前記問題点を解潤するため、碍子表面、焼成釉
薬層の一部を削除して間部を洗浄してから未焼成釉薬を
塗布し、同釉薬にレーザ、高周波等の電磁波を局部的に
照射して前記焼成釉薬層に焼付けるという方法を採って
いる。
Structure of the Invention (Means for Solving the Problems) In order to solve the above-mentioned problems, the present invention removes a part of the insulator surface and fired glaze layer, cleans the intervening area, and then applies unfired glaze. However, a method is adopted in which the glaze is locally irradiated with electromagnetic waves such as a laser or high frequency to bake the fired glaze layer.

(作用) 本発明は上記手段を採用したことにより、局部的に塗布
された未焼成釉薬に電磁波が照射されると、同釉薬は高
温に熱せられて焼成凝固し、焼成釉薬層と未焼成釉薬と
の境界部に電磁波が波及すると、焼成釉薬層も溶解され
、溶融された未焼成釉薬と溶融し合いガラス賀状に凝固
される。本発明は間予表面の一部にレーリ“、高周波等
の電磁波を局部的に照射して釉薬を碍子表面に焼付ける
のて、焼付(プに必要な”Fネルギーが最小限に限定さ
れ、焼例は作業が至極簡単となる。
(Function) By employing the above means, the present invention employs the above means, so that when the locally applied unfired glaze is irradiated with electromagnetic waves, the glaze is heated to a high temperature and fired to solidify, thereby forming a fired glaze layer and an unfired glaze layer. When the electromagnetic waves spread to the boundary between the glaze and the glaze, the fired glaze layer is also melted, and the molten unfired glaze and the fused unfired glaze intersect and solidify into a glass shape. In the present invention, the glaze is baked onto the insulator surface by locally irradiating electromagnetic waves such as Rayleigh and high frequency waves to a part of the pre-prepared surface, thereby minimizing the F energy required for baking. Baked examples are extremely easy to work with.

(実施例) 以下、本発明を具体化した一天施例を図面に従って説明
する。第3図により碍子の表面処理方法に使用されるシ
ー11発生装置について説明すると、密閉容器1内には
前後一対の放電電極2,3が配置され、外部のi流電源
4に接続されている。同密閉容器1の前後両端部には全
反射鏡5及び出力VL6が対向配量され、密閉容器1の
側部にはヒータ7及びガスブロア8が収容され、同容器
1内に封入したC (h、 N2. I」eの混合ガス
を加熱するとともに密閉容器1内で循環させるようにな
っている。このようにして構成されたレーザ発振機の出
力鏡6から出力されたレーザは導波管9内を通って照射
用のノズル10へ導かれ、碍子支持台11上の碍子12
に向かって照射されるようにしている。
(Example) Hereinafter, an example embodying the present invention will be described with reference to the drawings. Referring to FIG. 3, the sheath 11 generator used in the insulator surface treatment method will be explained. A pair of front and rear discharge electrodes 2 and 3 are arranged in a closed container 1, and are connected to an external i-current power source 4. . A total reflection mirror 5 and an output VL 6 are arranged opposite to each other at both the front and rear ends of the sealed container 1, and a heater 7 and a gas blower 8 are housed in the sides of the sealed container 1. , N2. The insulator 12 on the insulator support stand 11 is guided through the inside to the irradiation nozzle 10.
It is designed so that it is irradiated towards the target.

次に、前述したレーザ発生装置を使用して、碍子12の
表面に局部的に生じた釉薬欠損部の補修方法を第1図(
a )〜<e >及び第2図に基づいて説明する。
Next, using the laser generator described above, a method for repairing a locally-produced glaze defect on the surface of the insulator 12 is shown in FIG.
This will be explained based on a) to <e> and FIG. 2.

第1図(a )は碍子12の表層部を拡大して示し、磁
器製の碍子本体13の表面には釉薬14が焼成凝固(以
下焼成釉薬層14という)され、両者の間には混合層1
5が形成され、碍子本体13に焼成釉薬層14が強固に
溶融焼成結合されている。16は焼成釉薬層14に局部
的に生じた欠損部を示す。この欠損部16の補修方法に
ついて述べると、グラインダ等により前記欠損部16の
内面を研削して第1図(b ’)に示すように整形し、
該欠損部16をトリクロルエタンあるいはベンジン等の
溶剤により洗浄する。その後第1図(C)に示り−よう
に欠損部16内に未焼成の釉薬17を補1a L、た後
、同図(d )に示すようにノズル10からレーザRを
照射し、溶融状態の釉薬17を焼成釉薬層14に焼付は
凝固させる。この時、焼成釉薬層14と溶融状態の釉薬
17との境界部は高温に熱せられて焼成釉薬層14の表
面すなわち欠損部16の内面も溶融されて未焼成釉薬1
7と一体に焼付凝固され、第1図(e )に示すように
焼成釉薬層14の欠損部16が完全に補修される。
FIG. 1(a) shows an enlarged view of the surface layer of the insulator 12. A glaze 14 is fired and solidified (hereinafter referred to as fired glaze layer 14) on the surface of the insulator body 13 made of porcelain, and a mixed layer is formed between the two. 1
5 is formed, and a fired glaze layer 14 is firmly bonded to the insulator body 13 by melting and firing. Reference numeral 16 indicates a locally generated defect in the fired glaze layer 14. A method for repairing the defective portion 16 is to grind the inner surface of the defective portion 16 using a grinder or the like and shape it as shown in FIG. 1(b').
The defect portion 16 is cleaned with a solvent such as trichloroethane or benzine. After that, as shown in FIG. 1(C), unfired glaze 17 is added into the defective part 16 (1aL), and as shown in FIG. 1(d), laser R is irradiated from the nozzle 10 to melt it. The glaze 17 in the state is baked into the fired glaze layer 14 to solidify it. At this time, the boundary between the fired glaze layer 14 and the molten glaze 17 is heated to a high temperature, and the surface of the fired glaze layer 14, that is, the inner surface of the defective part 16, is also melted and the unfired glaze 1
As shown in FIG. 1(e), the defective portion 16 of the fired glaze layer 14 is completely repaired.

なお、レーザRは未焼成釉薬17を一度に焼成すること
はでさないので、ノズル10又は支持台11を左右に移
動させて表面全体に均一に照射する。
Note that since the laser R cannot fire the unfired glaze 17 at once, the nozzle 10 or the support base 11 is moved left and right to uniformly irradiate the entire surface.

第2図は横軸にレー1fRの出力(ワット/cm”)を
どり、縦軸に照射時間(秒)をとり、碍子の表面処理を
複数同行なった実験結果を示したものである。これによ
れば、○印で示す正常に表面処理のできた場合と、X印
で示Jように亀裂の入った場合との2つの領域に区分さ
れるので、これを区分する境界線りよりも下側の領域内
の条件でレーザRを照射すればよいことになる。
Figure 2 shows the experimental results of multiple insulator surface treatments, with the horizontal axis representing the output of the ray 1fR (watts/cm'') and the vertical axis representing the irradiation time (seconds). According to the above, the area is divided into two areas: the case where the surface treatment has been successfully completed as shown by the circle mark, and the case where there are cracks as shown by the mark X. It is sufficient to irradiate the laser R under the conditions within the side region.

なお、本発明は次のような実施例で具体化することもで
きる。
Note that the present invention can also be embodied in the following embodiments.

(1)前記実施例ではCOxレーザを使用したが、これ
以外に次表に示すようにHe−Neレーザ、Arイオン
・レーザあるいは金属蒸気レーザ等を使用したり、固体
レーザあるいは半導体レーザ等表 レーザの種類 (2)レーザ以外に焼成釉薬層14に釉薩17を焼成結
合し得る凸周波等の電磁波を使用すること。
(1) In the above embodiment, a COx laser was used, but in addition to this, a He-Ne laser, an Ar ion laser, a metal vapor laser, etc., as shown in the following table, or a solid state laser, a semiconductor laser, etc. Type (2) Use of electromagnetic waves such as convex frequency waves capable of firing and bonding the glaze 17 to the fired glaze layer 14 in addition to a laser.

なお、本発明の応用分野として、非常に細かい小さな部
品の場合には、−々炉に入れるまでもな(、レーザで焼
成することも考えられる。この場合、まず素焼品を作り
、その必要な部分に釉薬を塗り、この部分のみにレーザ
を照射して焼成覆る。
In addition, in the field of application of the present invention, in the case of very fine and small parts, firing them with a laser can be considered. A glaze is applied to the area, a laser is irradiated to only this area, and the area is fired and covered.

こうして得られた磁器製品は、炉内で焼成づる方法と比
較して焼成釉薬層の厚さを位胃に応じて任意に変えるこ
とができる。
In the porcelain products obtained in this way, the thickness of the fired glaze layer can be changed arbitrarily depending on the pottery, compared to the method of firing in a furnace.

発明の効果 以上詳述したように、本発明は碍子に部分的に釉薬を焼
(=lけるので、必要なエネルギーを最小限に限定する
ことができるとともに、焼付作業を簡単かつ迅速に行う
ことができ、製品のコストダウンを図ることができる効
果がある。
Effects of the Invention As detailed above, the present invention allows the insulator to be partially fired with glaze, so the required energy can be limited to a minimum, and the firing work can be performed easily and quickly. This has the effect of reducing product costs.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図(a )〜(e)はそれぞれ碍子表面の一部に生
じた欠損部の補修方法を説明するための断面図、第2図
は実験結果を示すグラフ、第3図はレーザ発生装置を示
づ路体正面図である。 10・・・ノズル、11・・・支持台、12・・・碍子
、13・・・碍子器本体、14・・・焼成釉薬層、16
・・・欠損部、17・・・未焼成釉薬、R・・・レーザ
。 特 許 出 願 人  日本碍子株式会社代 理 人 
   弁理士  恩1)博宣第1図 と ぐ (e)
Figures 1 (a) to (e) are cross-sectional views for explaining the method of repairing a defect that occurs on a part of the insulator surface, Figure 2 is a graph showing the experimental results, and Figure 3 is a laser generator. It is a front view of a road body showing. DESCRIPTION OF SYMBOLS 10... Nozzle, 11... Support stand, 12... Insulator, 13... Insulator main body, 14... Fired glaze layer, 16
...Defected part, 17...Unfired glaze, R...Laser. Patent applicant: Agent of Nippon Insulator Co., Ltd.
Patent Attorney On 1) Hironobu Figure 1 Togu (e)

Claims (1)

【特許請求の範囲】 1、碍子表面の焼成釉薬層の一部を削除して同部を洗浄
してから未焼成釉薬を塗布し、同釉薬にレーザ、高周波
等の電磁波を局部的に照射して前記焼成釉薬層に焼付け
ることを特徴とする碍子の表面処理方法。 2、碍子又は電磁波の照射用ノズルを移動することによ
り、釉薬全体に電磁波を均等に照射する特許請求の範囲
第1項記載の碍子の表面処理方法。
[Scope of Claims] 1. A part of the fired glaze layer on the surface of the insulator is removed, the part is cleaned, an unfired glaze is applied, and the glaze is locally irradiated with electromagnetic waves such as a laser or high frequency. A method for surface treatment of an insulator, characterized in that the fired glaze layer is baked on the fired glaze layer. 2. The method for surface treatment of an insulator according to claim 1, wherein the entire glaze is uniformly irradiated with electromagnetic waves by moving the insulator or an electromagnetic wave irradiation nozzle.
JP21486884A 1984-10-13 1984-10-13 Surface treatment for insulator Pending JPS6193515A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21486884A JPS6193515A (en) 1984-10-13 1984-10-13 Surface treatment for insulator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21486884A JPS6193515A (en) 1984-10-13 1984-10-13 Surface treatment for insulator

Publications (1)

Publication Number Publication Date
JPS6193515A true JPS6193515A (en) 1986-05-12

Family

ID=16662888

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21486884A Pending JPS6193515A (en) 1984-10-13 1984-10-13 Surface treatment for insulator

Country Status (1)

Country Link
JP (1) JPS6193515A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0610556A1 (en) * 1993-02-09 1994-08-17 Rutgers, The State University Localized surface glazing of ceramic articles

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4943252A (en) * 1972-09-01 1974-04-23

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4943252A (en) * 1972-09-01 1974-04-23

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0610556A1 (en) * 1993-02-09 1994-08-17 Rutgers, The State University Localized surface glazing of ceramic articles

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