JPS6151824A - X-ray exposure method and apparatus thereof - Google Patents

X-ray exposure method and apparatus thereof

Info

Publication number
JPS6151824A
JPS6151824A JP59172384A JP17238484A JPS6151824A JP S6151824 A JPS6151824 A JP S6151824A JP 59172384 A JP59172384 A JP 59172384A JP 17238484 A JP17238484 A JP 17238484A JP S6151824 A JPS6151824 A JP S6151824A
Authority
JP
Japan
Prior art keywords
mask
diaphragm
rays
shot
ray source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP59172384A
Other languages
Japanese (ja)
Inventor
Yukio Kenbo
Tomohiro Kuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP59172384A priority Critical patent/JPS6151824A/en
Publication of JPS6151824A publication Critical patent/JPS6151824A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70058Mask illumination systems

Abstract

PURPOSE:To intercept X-rays transmitting through outside of necessary areas on each shot and to prevent a contrast in the neighboring areas from decreasing, by mounting a diaphragm for X-rays between the X-ray source and a substrate. CONSTITUTION:Using X-rays 2 from the X-ray source 1, a pattern 10 on a mask 3' is transferred onto a resist 6 of a wafer 5. An irradiating region Ex of the X-rays 2 arriving the mask 3' is defined with a diaphragm 11 on the mask 3' so that each shot 12 does not become overlapped exposure even with a step and repeat exposing method. The diaphragm 11 is being mounted integrally with the mask chuck 20 and the relative position of the mask chuck 20 relating to detecting optical axes 22 of an alignment pattern 21 is being secured. The diaphragm 11 is positioned against scribing lines at the same time when the alignment pattern 21 is detected.
JP59172384A 1984-08-21 1984-08-21 X-ray exposure method and apparatus thereof Pending JPS6151824A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59172384A JPS6151824A (en) 1984-08-21 1984-08-21 X-ray exposure method and apparatus thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59172384A JPS6151824A (en) 1984-08-21 1984-08-21 X-ray exposure method and apparatus thereof

Publications (1)

Publication Number Publication Date
JPS6151824A true JPS6151824A (en) 1986-03-14

Family

ID=15940913

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59172384A Pending JPS6151824A (en) 1984-08-21 1984-08-21 X-ray exposure method and apparatus thereof

Country Status (1)

Country Link
JP (1) JPS6151824A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0358521A2 (en) * 1988-09-09 1990-03-14 Canon Kabushiki Kaisha An exposure apparatus
JPH0311613A (en) * 1989-06-08 1991-01-18 Nippon Telegr & Teleph Corp <Ntt> Blind device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0358521A2 (en) * 1988-09-09 1990-03-14 Canon Kabushiki Kaisha An exposure apparatus
JPH0311613A (en) * 1989-06-08 1991-01-18 Nippon Telegr & Teleph Corp <Ntt> Blind device
JPH0670960B2 (en) * 1989-06-08 1994-09-07 日本電信電話株式会社 Blind device

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