JPS6147440A - 酢酸パラジウムの調製法 - Google Patents
酢酸パラジウムの調製法Info
- Publication number
- JPS6147440A JPS6147440A JP16976084A JP16976084A JPS6147440A JP S6147440 A JPS6147440 A JP S6147440A JP 16976084 A JP16976084 A JP 16976084A JP 16976084 A JP16976084 A JP 16976084A JP S6147440 A JPS6147440 A JP S6147440A
- Authority
- JP
- Japan
- Prior art keywords
- palladium acetate
- palladium
- preparation
- nitrogen
- acetic acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- YJVFFLUZDVXJQI-UHFFFAOYSA-L palladium(ii) acetate Chemical compound [Pd+2].CC([O-])=O.CC([O-])=O YJVFFLUZDVXJQI-UHFFFAOYSA-L 0.000 title claims description 20
- 238000002360 preparation method Methods 0.000 title claims description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 27
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 16
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 8
- 239000000203 mixture Substances 0.000 claims description 8
- 229910017604 nitric acid Inorganic materials 0.000 claims description 8
- 239000011261 inert gas Substances 0.000 claims description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 21
- 229910052757 nitrogen Inorganic materials 0.000 description 10
- 239000013078 crystal Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 7
- 229910052763 palladium Inorganic materials 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 5
- 239000003054 catalyst Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- MLIREBYILWEBDM-UHFFFAOYSA-M 2-cyanoacetate Chemical compound [O-]C(=O)CC#N MLIREBYILWEBDM-UHFFFAOYSA-M 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000007800 oxidant agent Substances 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910002651 NO3 Inorganic materials 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- -1 nitrate radicals Chemical compound 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16976084A JPS6147440A (ja) | 1984-08-14 | 1984-08-14 | 酢酸パラジウムの調製法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16976084A JPS6147440A (ja) | 1984-08-14 | 1984-08-14 | 酢酸パラジウムの調製法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6147440A true JPS6147440A (ja) | 1986-03-07 |
| JPH0522691B2 JPH0522691B2 (enrdf_load_stackoverflow) | 1993-03-30 |
Family
ID=15892341
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16976084A Granted JPS6147440A (ja) | 1984-08-14 | 1984-08-14 | 酢酸パラジウムの調製法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6147440A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008031104A (ja) * | 2006-07-28 | 2008-02-14 | Seiko Epson Corp | ギ酸銅の製造方法、銅粒子の製造方法および配線基板の製造方法 |
| CN102320951A (zh) * | 2011-06-13 | 2012-01-18 | 陕西瑞科新材料股份有限公司 | 一种醋酸钯三聚体的制备方法 |
| KR20170045202A (ko) * | 2014-08-19 | 2017-04-26 | 헤레우스 도이칠란트 게엠베하 운트 코. 카게 | 활성 팔라듐(0) 분말을 제조하기 위한 방법 |
-
1984
- 1984-08-14 JP JP16976084A patent/JPS6147440A/ja active Granted
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008031104A (ja) * | 2006-07-28 | 2008-02-14 | Seiko Epson Corp | ギ酸銅の製造方法、銅粒子の製造方法および配線基板の製造方法 |
| CN102320951A (zh) * | 2011-06-13 | 2012-01-18 | 陕西瑞科新材料股份有限公司 | 一种醋酸钯三聚体的制备方法 |
| KR20170045202A (ko) * | 2014-08-19 | 2017-04-26 | 헤레우스 도이칠란트 게엠베하 운트 코. 카게 | 활성 팔라듐(0) 분말을 제조하기 위한 방법 |
| JP2017532435A (ja) * | 2014-08-19 | 2017-11-02 | ヘレウス ドイチェラント ゲーエムベーハー ウント カンパニー カーゲー | 活性パラジウム（０）粉末の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0522691B2 (enrdf_load_stackoverflow) | 1993-03-30 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |