JPS614573A - Coating apparatus - Google Patents

Abstract

PURPOSE:To prevent the swirling up of air during rotary coating and to form a thin film of a solvent having uniform thickness by arranging a rotry disk, which revolves in synchronization with the revolution of a material to be coated, above the material to be coated. CONSTITUTION:A rotary disk 10 is detached from an adsorption head 2 before the start of operation, and a nozzle 6 is positioned on the adsorption head 2. A solvent 4 is dripped onto a material 1 to be coated by a solvent control system 5 through a nozzle 6. When the nozzle 6 is moved to the outermost periphery of the material 1 to be coated by a control system 7 for controlling the movement of the nozzle, the rotary disk 10 is arranged above the material 1 to be coated by a control system 11 for controlling the movement of the rotary disk while keeping a specified clearance 9. The adsorption head 2 and the rotary disk 10 are subsequently rotted in synchronization with each other by control systems 3 and 12, and the solvent 4 on the material 1 to be treated is uniformly dried without being affected by the swirling of air during revolution. Consequently, a uniform thin film is obtained.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a coating device that drips a solvent onto an object to be coated and rotates the object to apply the solvent by rotation.

[Background of the invention]

Conventionally, as a coating device that evens out the film thickness distribution of a solvent such as a photosensitive resin dropped onto an object to be coated such as a semiconductor substrate, for example, as shown in JP-A-56-87471,
A closed space forming plate is disposed to form a closed space region on the object to be coated, and the evaporation rate of the solvent is controlled.

However, in this apparatus, the thickness of the solvent film and the coating become uneven due to changes in the wind flow caused by the rotation of the object to be applied between the closed space forming plate and the object to be applied and changes in 11i1+.

[Purpose of the invention]

The purpose of the present invention is to prevent wind from blowing up on the object to be coated during spin coating, and to uniformly dry the solvent applied to the object, thereby making the film thickness of the solvent uniform. [Summary of the Invention] In order to achieve the above-mentioned object, the present invention provides a coating device that can reduce striation and striation. A coating apparatus that rotates and applies a solvent by rotating a solvent, a rotating disk provided above the object to be coated, a rotating disk control system that rotates the rotating disk in synchronization with the object to be coated, and a rotating disk that rotates the rotating disk in synchronization with the object to be coated. A rotary disk movement control system that moves the rotary disk to above the object to be coated and to a retracted position.

[Embodiments of the invention]

Hereinafter, one embodiment of the present invention will be described with reference to the drawings.

A suction head 2 holding an object 1 to be coated, such as a semiconductor substrate, is rotated by a suction rotation control system 3. A nozzle 6 equipped with a solvent control system 5 that controls the dripping of a solvent 4 such as a photosensitive resin is arranged above the suction head 2, and the nozzle 6 is moved along a guide 8 by a nozzle movement control system 7. Can be moved horizontally. Further, a rotating disk IO is arranged above the suction head 2 while maintaining a gap 9 with the object 1 to be coated, and the rotating disk 10 is connected to a rotating disk movement control system 11.
It is horizontally moved by the suction head rotation control system 3 and rotated by the rotary disk rotation control system 12 which rotates in synchronization with the suction head rotation control system 3.

Next, the effect will be explained. Before starting, the rotating disk 10 is located away from the suction-\rad 2, and the nozzle 6 is located above the suction-\rad 2. In this state, the suction head 2 holds the object 1 to be coated, and the solvent 4 is dripped onto the object 1 from the solvent control system 51 through the nozzle 6. Thereafter, the nozzle 6 is moved to the outermost periphery of the object 1 by the nozzle movement control system 7. This movement of the nozzle 6 is carried out because the rotating disk 10 is then placed above the object 1 to be coated.
This is to create an extra space above the object 1 to be coated.

Next, the rotating disk movement control system 11 positions the rotating disk 10 above the object 1 with a gap 9 maintained therebetween. after that,
At the same time as the suction head rotation control system 3 starts rotating the object 1 to be coated, the rotating disk rotation control system 12 causes the rotating disk 10 to rotate in synchronization with the rotation of the object 1 to be coated. As a result, a thin film of the bath agent 4 is formed on the object 1 to be coated.

In this way, since the rotary disk 10 that rotates in synchronization with the rotation of the object 1 to be coated is arranged above the object 1 to be coated, wind is not generated on the object 1 to be coated during rotational coating. - The drying state of the solvent 4 can be made uniform. This makes the film thickness of the solvent 4 uniform and eliminates striations and thatch, thereby increasing the yield.

〔Effect of the invention〕

As is clear from the above description, according to the present invention, a rotary disk that rotates in synchronization with the rotation of the object to be coated is arranged above the object to be coated, so that rotational coating and wind blowing can be avoided. This prevents the drying of the solvent, which results in a uniform solvent film thickness (no curling or striations), and improves yield.

[Brief explanation of the drawing]

The figure is a configuration diagram showing an embodiment of the coating device according to the present invention. 1...Object to be coated, 2...Suction head, 3.
... Suction head rotation control system, 4... Solvent, 6.
...Nozzle, 9...Gap, 10...
Rotating disk, 11...Rotating disk movement control system, 12
...Rotating disk rotation control system.

Claims (1)

[Claims] A coating apparatus that drips a solvent onto an object to be coated and rotates the object to apply the solvent by rotation includes a rotating disk provided above the object to be coated, and a rotating disk that connects the rotating disk to the object to be coated. A coating device comprising: a rotating disk rotation control system that rotates synchronously; and a rotating disk movement control system that moves the rotating disk above an object to be coated and to a retracted position.