JPS6143442A - Orientation device of wafer - Google Patents

Orientation device of wafer

Info

Publication number
JPS6143442A
JPS6143442A JP16483684A JP16483684A JPS6143442A JP S6143442 A JPS6143442 A JP S6143442A JP 16483684 A JP16483684 A JP 16483684A JP 16483684 A JP16483684 A JP 16483684A JP S6143442 A JPS6143442 A JP S6143442A
Authority
JP
Japan
Prior art keywords
light
light flux
wafer
peripheral plane
rotating angle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16483684A
Other languages
Japanese (ja)
Inventor
Masaharu Ninomiya
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP16483684A priority Critical patent/JPS6143442A/en
Publication of JPS6143442A publication Critical patent/JPS6143442A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/04Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes
    • H01L29/045Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes by their particular orientation of crystalline planes

Abstract

PURPOSE:To perform orientation of any wafers with different diameters without adjustment and contact with periphery thereof by a method wherein peripheral plane of wafer is irradiated with the light flux from a projector to change the light quantity entering into a light receiver by means of changing the reflecting directions corresponding to the angle of optical axis meeting the peripheral plane of wafer. CONSTITUTION:A projector 8 projects light flux into an almost central point on almost level surface of a wafer 2. Then the light flux hitting the peripheral plane 15 through a halfmirror 9 is reflected by the plane 15 back to the mirror 9 by which the light flux is further reflected in a light receiver 10. At this time, a motor 16 is driven to make a controller 17 process a received light quantity related to the rotating angle for detecting the relation between the direction of orientation flat and the rotating angle of motor 16 to be stopped at any specified rotating angle. Now assuming the applicable light flux to be parallel beams, any wafer with different nominal dimention of diameter may be assured of equivalent light quantity received without any adjustment or alteration of mechanism at all. Besides, the orientation flat for peripheral plane 15 may be detected with no contact therewith by means of utilizing the light flux.
JP16483684A 1984-08-08 1984-08-08 Orientation device of wafer Pending JPS6143442A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16483684A JPS6143442A (en) 1984-08-08 1984-08-08 Orientation device of wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16483684A JPS6143442A (en) 1984-08-08 1984-08-08 Orientation device of wafer

Publications (1)

Publication Number Publication Date
JPS6143442A true JPS6143442A (en) 1986-03-03

Family

ID=15800847

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16483684A Pending JPS6143442A (en) 1984-08-08 1984-08-08 Orientation device of wafer

Country Status (1)

Country Link
JP (1) JPS6143442A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63227034A (en) * 1987-03-17 1988-09-21 Fujitsu Ltd Positioning method for wafer
JPH01166455A (en) * 1987-12-23 1989-06-30 Teru Barian Kk Ion implantation device
JPH06511409A (en) * 1992-05-11 1994-12-22

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63227034A (en) * 1987-03-17 1988-09-21 Fujitsu Ltd Positioning method for wafer
JPH01166455A (en) * 1987-12-23 1989-06-30 Teru Barian Kk Ion implantation device
JPH06511409A (en) * 1992-05-11 1994-12-22

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