JPS6141130B2 - - Google Patents
Info
- Publication number
- JPS6141130B2 JPS6141130B2 JP14674079A JP14674079A JPS6141130B2 JP S6141130 B2 JPS6141130 B2 JP S6141130B2 JP 14674079 A JP14674079 A JP 14674079A JP 14674079 A JP14674079 A JP 14674079A JP S6141130 B2 JPS6141130 B2 JP S6141130B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- melting point
- substrate
- point metal
- insulating film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14674079A JPS5670646A (en) | 1979-11-13 | 1979-11-13 | Manufacture of semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14674079A JPS5670646A (en) | 1979-11-13 | 1979-11-13 | Manufacture of semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5670646A JPS5670646A (en) | 1981-06-12 |
| JPS6141130B2 true JPS6141130B2 (cs) | 1986-09-12 |
Family
ID=15414515
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14674079A Granted JPS5670646A (en) | 1979-11-13 | 1979-11-13 | Manufacture of semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5670646A (cs) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0272232U (cs) * | 1988-11-18 | 1990-06-01 | ||
| DE102022118209A1 (de) | 2021-07-27 | 2023-02-02 | Mitsubishi Electric Corporation | Verfahren zum Herstellen einer Halbleitervorrichtung und Halbleiterherstellungseinrichtung |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5931065A (ja) * | 1982-08-16 | 1984-02-18 | Nippon Telegr & Teleph Corp <Ntt> | 半導体装置の製造方法 |
| JPS6083373A (ja) * | 1983-10-14 | 1985-05-11 | Nec Corp | 薄膜トランジスタアレイとその製造方法 |
-
1979
- 1979-11-13 JP JP14674079A patent/JPS5670646A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0272232U (cs) * | 1988-11-18 | 1990-06-01 | ||
| DE102022118209A1 (de) | 2021-07-27 | 2023-02-02 | Mitsubishi Electric Corporation | Verfahren zum Herstellen einer Halbleitervorrichtung und Halbleiterherstellungseinrichtung |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5670646A (en) | 1981-06-12 |
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