JPS6128573A - Abrasive pad and production thereof - Google Patents

Abrasive pad and production thereof

Info

Publication number
JPS6128573A
JPS6128573A JP14904984A JP14904984A JPS6128573A JP S6128573 A JPS6128573 A JP S6128573A JP 14904984 A JP14904984 A JP 14904984A JP 14904984 A JP14904984 A JP 14904984A JP S6128573 A JPS6128573 A JP S6128573A
Authority
JP
Japan
Prior art keywords
abraded
resin
material
abrasive particles
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14904984A
Inventor
Yasuo Fukatsu
Takeo Sasaki
Hiroharu Takei
Kimio Yoshimi
Original Assignee
Mitsubishi Mining & Cement Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Mining & Cement Co Ltd filed Critical Mitsubishi Mining & Cement Co Ltd
Priority to JP14904984A priority Critical patent/JPS6128573A/en
Publication of JPS6128573A publication Critical patent/JPS6128573A/en
Application status is Pending legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0075Cleaning of glass

Abstract

PURPOSE: To obtain an abrasive pad which has proper elasticity and can remove siliceous stains deposited on the surface of glass without adversely affecting the glass, by mixing abrasive particles with raw materials for an expandable resin, and expanding it.
CONSTITUTION: A brasive particles (e.g. zirconium oxide or cerium oxide abrasive particles) are uniformly mixed with raw materials (e.g. polyol and isocyanate) for an expandable resin, and the mixture is expanded in a mold the obtain the desired abrasive pad composed of a porous resin article which is highly viscoelastic, has proper hardness and contains the abrasive particles dispersed in the resin phase. Since the porous resin article has proper elasticity and hardness, the abrawive material in the resin phase is contacted with a material to be abraded under appropriate pushing pressure and hence, the material to be abraded can be prevented from being marred and can be satisfactorily abraded.
COPYRIGHT: (C)1986,JPO&Japio
JP14904984A 1984-07-18 1984-07-18 Abrasive pad and production thereof Pending JPS6128573A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14904984A JPS6128573A (en) 1984-07-18 1984-07-18 Abrasive pad and production thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14904984A JPS6128573A (en) 1984-07-18 1984-07-18 Abrasive pad and production thereof

Publications (1)

Publication Number Publication Date
JPS6128573A true JPS6128573A (en) 1986-02-08

Family

ID=15466528

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14904984A Pending JPS6128573A (en) 1984-07-18 1984-07-18 Abrasive pad and production thereof

Country Status (1)

Country Link
JP (1) JPS6128573A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6397562A (en) * 1986-10-09 1988-04-28 Mitsubishi Paper Mills Ltd Frame replacing method for web
EP0367322A1 (en) * 1988-10-24 1990-05-09 GABI S.r.l. Composition suitable for being transformed into shaped articles by means of a moulding process, in order to obtain products suitable for polishing hard materials, such as glass, ceramic, hard stones; moulding process; so obtained articles and polishing method using them
EP0635334A2 (en) * 1993-07-22 1995-01-25 TESSITURA LANDINI S.r.l. Textile disc or wheel impregnated with resin containing abrasive particles, process of preparation thereof and lapping/buffing process
JP2004238628A (en) * 2003-02-06 2004-08-26 Basf Ag Use of aqueous dispersion as binder for producing abrasive, abrasive containing the dispersion as binder, abrasive paper, abrasive cloth and grinding and polishing pad
JP2010144351A (en) * 2008-12-16 2010-07-01 Aibii:Kk Method for applying regeneration treatment to polluted glass surface in bathroom, and method for maintaining regenerated glass surface
JP2014078723A (en) * 2000-05-27 2014-05-01 Rohm & Haas Electronic Materials Cmp Holdings Inc Polishing pads for chemical mechanical planarization

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS495719A (en) * 1972-05-10 1974-01-18

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS495719A (en) * 1972-05-10 1974-01-18

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6397562A (en) * 1986-10-09 1988-04-28 Mitsubishi Paper Mills Ltd Frame replacing method for web
EP0367322A1 (en) * 1988-10-24 1990-05-09 GABI S.r.l. Composition suitable for being transformed into shaped articles by means of a moulding process, in order to obtain products suitable for polishing hard materials, such as glass, ceramic, hard stones; moulding process; so obtained articles and polishing method using them
EP0635334A2 (en) * 1993-07-22 1995-01-25 TESSITURA LANDINI S.r.l. Textile disc or wheel impregnated with resin containing abrasive particles, process of preparation thereof and lapping/buffing process
EP0635334A3 (en) * 1993-07-22 1995-05-24 Tessitura Landini S R L Textile disc or wheel impregnated with resin containing abrasive particles, process of preparation thereof and lapping/buffing process.
JP2014078723A (en) * 2000-05-27 2014-05-01 Rohm & Haas Electronic Materials Cmp Holdings Inc Polishing pads for chemical mechanical planarization
JP2017063211A (en) * 2000-05-27 2017-03-30 ローム アンド ハース エレクトロニック マテリアルズ シーエムピー ホウルディングス インコーポレイテッド Polishing pads for chemical mechanical planarization
JP2004238628A (en) * 2003-02-06 2004-08-26 Basf Ag Use of aqueous dispersion as binder for producing abrasive, abrasive containing the dispersion as binder, abrasive paper, abrasive cloth and grinding and polishing pad
JP4593938B2 (en) * 2003-02-06 2010-12-08 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se Use of aqueous dispersions as binders for the production of abrasives and abrasives, abrasive papers, polishing cloths and scouring pads containing such dispersions as binders
JP2010144351A (en) * 2008-12-16 2010-07-01 Aibii:Kk Method for applying regeneration treatment to polluted glass surface in bathroom, and method for maintaining regenerated glass surface

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