JPS61281881A - ドライエツチング装置 - Google Patents

ドライエツチング装置

Info

Publication number
JPS61281881A
JPS61281881A JP12302485A JP12302485A JPS61281881A JP S61281881 A JPS61281881 A JP S61281881A JP 12302485 A JP12302485 A JP 12302485A JP 12302485 A JP12302485 A JP 12302485A JP S61281881 A JPS61281881 A JP S61281881A
Authority
JP
Japan
Prior art keywords
gas introduction
gas
holes
etching
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12302485A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6341986B2 (enrdf_load_stackoverflow
Inventor
Haruo Okano
晴雄 岡野
Yasuhiro Horiike
靖浩 堀池
Haruaki Kaneko
金子　晴明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Tokuda Seisakusho Co Ltd
Original Assignee
Toshiba Corp
Tokuda Seisakusho Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokuda Seisakusho Co Ltd filed Critical Toshiba Corp
Priority to JP12302485A priority Critical patent/JPS61281881A/ja
Publication of JPS61281881A publication Critical patent/JPS61281881A/ja
Publication of JPS6341986B2 publication Critical patent/JPS6341986B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP12302485A 1985-06-06 1985-06-06 ドライエツチング装置 Granted JPS61281881A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12302485A JPS61281881A (ja) 1985-06-06 1985-06-06 ドライエツチング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12302485A JPS61281881A (ja) 1985-06-06 1985-06-06 ドライエツチング装置

Publications (2)

Publication Number Publication Date
JPS61281881A true JPS61281881A (ja) 1986-12-12
JPS6341986B2 JPS6341986B2 (enrdf_load_stackoverflow) 1988-08-19

Family

ID=14850329

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12302485A Granted JPS61281881A (ja) 1985-06-06 1985-06-06 ドライエツチング装置

Country Status (1)

Country Link
JP (1) JPS61281881A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4897171A (en) * 1985-11-26 1990-01-30 Tadahiro Ohmi Wafer susceptor
JP2015037107A (ja) * 2013-08-13 2015-02-23 株式会社ディスコ プラズマエッチング装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5752423A (en) * 1980-09-13 1982-03-27 Yukio Ishikawa High speed steam hot-water heater

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5752423A (en) * 1980-09-13 1982-03-27 Yukio Ishikawa High speed steam hot-water heater

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4897171A (en) * 1985-11-26 1990-01-30 Tadahiro Ohmi Wafer susceptor
JP2015037107A (ja) * 2013-08-13 2015-02-23 株式会社ディスコ プラズマエッチング装置

Also Published As

Publication number Publication date
JPS6341986B2 (enrdf_load_stackoverflow) 1988-08-19

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term