JPS61278143A - Laser beam lithography - Google Patents

Laser beam lithography

Info

Publication number
JPS61278143A
JPS61278143A JP60120762A JP12076285A JPS61278143A JP S61278143 A JPS61278143 A JP S61278143A JP 60120762 A JP60120762 A JP 60120762A JP 12076285 A JP12076285 A JP 12076285A JP S61278143 A JPS61278143 A JP S61278143A
Authority
JP
Japan
Prior art keywords
laser beams
deflecting system
optical switch
laser beam
beam lithography
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60120762A
Other languages
Japanese (ja)
Inventor
Mitsuo Nagata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP60120762A priority Critical patent/JPS61278143A/en
Publication of JPS61278143A publication Critical patent/JPS61278143A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To conduct drawing to a photo-resist layer by irradiating an arbitrary position by laser beams.
CONSTITUTION: A laser light source 1 oscillates laser beams, and an optical switch 2 makes laser beams to pass or prevents their passage. An X deflecting system 3 deflects laser beams passing through the optical switch 2 in the X direction, and a Y deflecting system 4 similarly deflects laser beams in the Y direction. A photo-resist layer on a substrate 5 is irradiated by laser beams passing through the optical switch 2, the X deflecting system 3 and the Y deflecting system 4. Laser beams are deflected by the X deflecting system 3 and the Y deflecting system 4, and can be projected to an arbitrary position on the substrate.
COPYRIGHT: (C)1986,JPO&Japio
JP60120762A 1985-06-04 1985-06-04 Laser beam lithography Pending JPS61278143A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60120762A JPS61278143A (en) 1985-06-04 1985-06-04 Laser beam lithography

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60120762A JPS61278143A (en) 1985-06-04 1985-06-04 Laser beam lithography

Publications (1)

Publication Number Publication Date
JPS61278143A true JPS61278143A (en) 1986-12-09

Family

ID=14794361

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60120762A Pending JPS61278143A (en) 1985-06-04 1985-06-04 Laser beam lithography

Country Status (1)

Country Link
JP (1) JPS61278143A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2690641A1 (en) * 1992-04-30 1993-11-05 Lectra Systemes Sa Safety device for machines using a laser beam and method of implementation.

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2690641A1 (en) * 1992-04-30 1993-11-05 Lectra Systemes Sa Safety device for machines using a laser beam and method of implementation.

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