JPS61270225A - Production of high-silica glass - Google Patents

Production of high-silica glass

Info

Publication number
JPS61270225A
JPS61270225A JP11001985A JP11001985A JPS61270225A JP S61270225 A JPS61270225 A JP S61270225A JP 11001985 A JP11001985 A JP 11001985A JP 11001985 A JP11001985 A JP 11001985A JP S61270225 A JPS61270225 A JP S61270225A
Authority
JP
Japan
Prior art keywords
gel
raw material
metal alkoxide
silica glass
drying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11001985A
Other languages
Japanese (ja)
Other versions
JPH0798665B2 (en
Inventor
Akihito Iwai
明仁 岩井
Takao Nakada
中田 孝夫
Masaaki Furukawa
雅章 古川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP60110019A priority Critical patent/JPH0798665B2/en
Publication of JPS61270225A publication Critical patent/JPS61270225A/en
Publication of JPH0798665B2 publication Critical patent/JPH0798665B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/006Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)

Abstract

PURPOSE:To prevent the generation of cracking and cracking during the drying of a gel, by hydrolyzing a raw material containing a specific amount of a metal alkoxide polymer, and gelatinizing, drying and sintering the obtained hydrosol. CONSTITUTION:A raw material containing a metal alkoxide polymer is hydrolyzed under a condition to give a high-silica glass containing >=1wt% SiO2 originated from said metal alkoxide polymer. The obtained hydrosol is gelatinized, dried and sintered. The initial polymerization reaction in the state of sol and gel can be accelerated by the use of the above raw material, and a gel having high polymerization degree can be produced to prevent the cracking and crazing during the drying stage. The metal alkoxide polymer used as a raw material is e.g. polymer of silicon methoxide Si(OCH3)4, i.e. SiXOX-1(OCH3)2X+2.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、光学用等に使用される高シリカガラスの製造
法に関する。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for producing high silica glass used for optical purposes and the like.

(従来の技術) 高シリカガラスは優れた光学的性質、耐熱性。(Conventional technology) High silica glass has excellent optical properties and heat resistance.

耐薬品性等を有し、最近半導体工業等において有用性が
認められておシ、各種の製造法の中でヒドロゾルをゲル
化し、乾燥及び焼結する所謂ゾルゲル法が1例えば8i
 Cla 、 S iH4等を原料として酸水素炎でガ
ラスを堆積させていく方法よシも低温で得られるから省
エネルギーで低コストでアシ、原料が液体であるために
精製が容易であり高純度のものが得られる。液相で混合
するためにAI!zOs 。
Among various manufacturing methods, the so-called sol-gel method, in which hydrosol is gelled, dried and sintered, has recently been recognized as having chemical resistance and is useful in the semiconductor industry.
The method of depositing glass using an oxyhydrogen flame using Cla, SiH4, etc. as a raw material is also energy saving and low cost since it can be obtained at low temperatures, and it is easy to purify and has high purity because the raw material is a liquid. is obtained. AI for mixing in liquid phase! zOs.

Cab、YzOs等のドーピングを均一に行なうことが
でき均質な高シリカガラスが得られる等の利点を有し、
最近特に注目をあびている。
It has the advantage that doping with Cab, YzOs, etc. can be done uniformly and a homogeneous high silica glass can be obtained.
It has been receiving particular attention recently.

(発明が解決・しようとする問題点) しかし、ゾルゲルによる高シリカガラスの製造にはまだ
未解決の問題が残されてお如実用化には至っていない。
(Problems to be Solved by the Invention) However, there are still unresolved problems in the production of high silica glass using sol-gel, and it has not been put into practical use.

特にゲルを乾燥する過程でクランクや割れを生ずること
が最大の難点であった。
In particular, the biggest problem was that the gel would crack or crack during the drying process.

本発明は、乾燥過程で上記した問題を生じない高シリカ
ガラスの製造法を提供することを目的とする。
An object of the present invention is to provide a method for producing high silica glass that does not cause the above-mentioned problems during the drying process.

(問題点を解決するための手段) 発明者らは、得られるガラス中に9分解し生成するSi
O2が1重量%以上含有されるように金属アルコキシド
の重合体を原料として用いることによシ、ゾル及びゲル
の状態での初期の重合反応(・・・0−8i−0−8i
・・・の結合反応)が促進されて重合度の大きいゲルが
得られ、乾燥状態におけるゲルのクラックや割れを防止
できることを見出し本発明を完成するに至った。
(Means for Solving the Problems) The inventors discovered that Si, which is produced by decomposition in the obtained glass,
By using a metal alkoxide polymer as a raw material so that the O2 content is 1% by weight or more, the initial polymerization reaction in the state of sol and gel (...0-8i-0-8i
The present inventors have completed the present invention by discovering that a gel with a high degree of polymerization can be obtained by accelerating the bonding reaction of .

本発明は、金属アルフキシトの重合体中の5iOa分が
得られる高シリカガラス中に1重量%以上含まれるよう
に上記金属アルコキシドの重合体を含む原料を加水分解
し、得られるヒドロゾルをゲル化、乾燥及び焼結する高
シリカガラスの製造法に関する。
The present invention involves hydrolyzing a raw material containing the metal alkoxide polymer so that 5 iOa in the metal alkoxide polymer is contained in the obtained high silica glass at 1% by weight or more, and gelling the obtained hydrosol. This invention relates to a method for producing high silica glass by drying and sintering.

金属アルコキシドの重合体としては9例えばシリコンメ
トキシドS i (OCH3)4の重合体S ix 0
x−1(0CH3)2X+2 t”あげることができる
がこれに限定されるものではない。
Examples of metal alkoxide polymers include 9, for example, silicon methoxide S i (OCH3) 4 polymer S ix 0
x−1(0CH3)2X+2t”, but is not limited thereto.

本発明において原料として用いる金属アルコキシドの重
合体は、単独で又は5i(OCHs)4. Si(0C
2H8)4等の金属アルコキシド、 Ca1)ot 社
のCab −0−Bit )、 Degussa社のA
erosil! 等の微粉末シリカ、シリカゲルなどと
混合して、液状にして(必要に応じてアルコール等の溶
媒を加え)水(必要に応じて酸又はアルカリでpHを調
整する)と混合し加水分解して、ヒドロゾルとされる。
The metal alkoxide polymer used as a raw material in the present invention may be used alone or as 5i(OCHs)4. Si(0C
Metal alkoxides such as 2H8)4, Ca1)ot's Cab-0-Bit), Degussa's A
erosil! Mix with finely powdered silica, silica gel, etc., make it into a liquid (add a solvent such as alcohol as necessary), mix with water (adjust the pH with acid or alkali as necessary), and hydrolyze. , is considered a hydrosol.

高シリカガラスは、前記ヒドロゾルを容器に移し静置し
てゲル化させ1次いで乾燥して水、アルコール等を除去
して乾燥ゲルとし更に焼結して得られる。
High silica glass is obtained by transferring the hydrosol to a container, allowing it to gel, and then drying it to remove water, alcohol, etc. to form a dry gel, and then sintering it.

金属アルコキシドの1合体中のSiO2分が得られる高
シリカガラス中に1111量チ以上含有させる理由は、
前記したようにゾル及びゲル状態での初期の重合反応を
促進してゲルを乾燥する過程でのクランク中割れを防止
するためであシ、1重量−未満ではその効果がない。好
ましくは10重量−以上になるように用いる。
The reason why SiO2 in one combination of metal alkoxide is contained in the high silica glass is 1111 or more.
As mentioned above, the purpose is to promote the initial polymerization reaction in the sol and gel state to prevent cracking in the crank during the process of drying the gel, and if it is less than 1 weight, it has no effect. It is preferably used in an amount of 10-weight or more.

(実施例) 次に実施例を説明する。(Example) Next, an example will be explained.

実施例1 原料がシリコンメトキシドの5量体5isO4(OCH
x)1*を中心にもつ重合体(原料Aとする)単独とし
、 SiO*換算で1モルの原料Aに対してメタノール
を4モル加えて攪拌した溶液に、pHが’10.6とな
るように調整したアンモニア水15モルを加えて充分混
合して均一なシリカゾルを得た。
Example 1 The raw material is silicon methoxide pentamer 5isO4 (OCH
x) A polymer with 1* in the center (referred to as raw material A) alone, 4 moles of methanol is added to 1 mole of raw material A in terms of SiO*, and the solution is stirred until the pH becomes 10.6. 15 mol of ammonia water prepared as above was added and thoroughly mixed to obtain a uniform silica sol.

このシリカゾルをテフロンのコーティングをした90■
φのシャーレにIOn!Iの厚さとなるよう充填し9両
面テープを用いてアルミ箔で蓋をし室温で約2時間静置
してゲル化させ、室温で1日二一ジングした後、蓋にピ
ンホールを2個あけて50℃の恒温槽中で7日間乾燥し
2次いで120℃の恒温槽に移して一昼夜乾燥して乾燥
ゲルを得た。
90■ This silica sol is coated with Teflon.
IOn in a petri dish of φ! Fill it to the thickness of I, cover it with aluminum foil using double-sided tape, leave it at room temperature for about 2 hours to gel, and leave it at room temperature for 1 day, then make 2 pinholes in the lid. The gel was opened and dried for 7 days in a constant temperature bath at 50°C, and then transferred to a constant temperature bath at 120°C and dried all day and night to obtain a dry gel.

得られた乾燥ゲルのかさ密度は0.80 g / cm
”、比表面積は約850cmシ9であり、クラック、割
れ等は全くなかった。この乾燥ゲルを毎分1℃の昇温速
度で1050℃まで加熱焼結し、直径45M1及び厚さ
5WIの割れのない透明な高シリカガラスを得た。この
高シリカガラスは分析の結果、市販の石英ガラスと熱膨
張係数等の特性が一致した。
The bulk density of the obtained dry gel is 0.80 g/cm
”, the specific surface area was approximately 850 cm x 9, and there were no cracks or cracks at all. This dry gel was heated and sintered at a heating rate of 1° C./min to 1050° C., and a crack with a diameter of 45 M1 and a thickness of 5 WI was formed. A transparent high silica glass without any silica was obtained.As a result of analysis, this high silica glass had the same characteristics as commercially available quartz glass, such as the coefficient of thermal expansion.

実施例2 実施例1における原料At−8i(h換算で0.5モル
、シリコンメトキシド0.5モル及びメタノール4.5
モルを混合攪拌した溶液に、pHが10.6となるよう
に調整したアンモニア水を4モル加えて充分に混合し均
一なシリカゾルを得た。このシリカゾルを実施例1と同
様にしてシャーレに入れ、アルミ箔で蓋をして室温°で
静置したところ約40分でゲル化した。このゲルを実施
例1と同様にしてエージング及び乾燥して乾燥ゲルを得
た。この乾燥ゲルは9体積がゲル化直後の約30%に収
縮し。
Example 2 Raw materials At-8i in Example 1 (0.5 mol in terms of h, 0.5 mol of silicon methoxide, and 4.5 mol of methanol)
To the mixed and stirred solution were added 4 moles of ammonia water whose pH was adjusted to 10.6, and the mixture was sufficiently mixed to obtain a uniform silica sol. This silica sol was placed in a petri dish in the same manner as in Example 1, covered with aluminum foil, and allowed to stand at room temperature, where it gelled in about 40 minutes. This gel was aged and dried in the same manner as in Example 1 to obtain a dry gel. The volume of this dried gel shrank to approximately 30% of that immediately after gelation.

かさ密度は0.706 / am”でクランク、割れな
どは全くなかった。この乾燥ゲルを毎分1℃で昇温し1
150”cまで加熱焼結した結果、直径40mm及び厚
さ4.5 mmの割れのない透明な高シリカガラスが得
られ、その特性は市販の石英ガラスと一致した。
The bulk density was 0.706/am'' and there were no cracks or cracks.The dried gel was heated at a rate of 1°C per minute.
As a result of heating and sintering to 150''c, a crack-free, transparent high silica glass with a diameter of 40 mm and a thickness of 4.5 mm was obtained, and its properties matched those of commercially available quartz glass.

比較例 シリコンメトキシドの単量体S i (0CHs )4
の1モル、メタノール4.5モル及びアンモニア水(p
H10,6)4モルを充分に混合し、以下実施例1と同
一の方法で乾燥ゲルを作成したが、ゲルは乾燥途中でク
ラック及び割れが発生した。
Comparative example Silicon methoxide monomer S i (0CHs)4
1 mol of methanol, 4.5 mol of methanol and aqueous ammonia (p
4 moles of H10,6) were thoroughly mixed and a dried gel was prepared in the same manner as in Example 1, but the gel developed cracks and cracks during drying.

(発明の効果) 本発明によれば、ゲルの乾燥過程におけるクランクや割
れの発生を防止できるので、高シリカガラスを従来よシ
安価に製造できる。又本発明の方法は、従来の石英ガラ
スを使用していた分野はかシでなく、他のガラス分野に
も応用を拡げることができる。
(Effects of the Invention) According to the present invention, it is possible to prevent the occurrence of cracks and cracks during the gel drying process, so that high silica glass can be manufactured at a lower cost than in the past. Furthermore, the method of the present invention can be applied not only to quartz glass but also to other glass fields.

Claims (1)

【特許請求の範囲】[Claims] 1、金属アルコキシドの重合体中のSiO_2分が得ら
れる高シリカガラス中に1重量%以上含まれるように上
記金属アルコキシドの重合体を含む原料を加水分解し、
得られるヒドロゾルをゲル化、乾燥及び焼結することを
特徴とする高シリカガラスの製造法。
1. Hydrolyze the raw material containing the metal alkoxide polymer so that SiO_2 in the metal alkoxide polymer is contained at 1% by weight or more in the obtained high silica glass,
A method for producing high silica glass, which comprises gelling, drying and sintering the resulting hydrosol.
JP60110019A 1985-05-22 1985-05-22 Silica glass manufacturing method Expired - Lifetime JPH0798665B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60110019A JPH0798665B2 (en) 1985-05-22 1985-05-22 Silica glass manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60110019A JPH0798665B2 (en) 1985-05-22 1985-05-22 Silica glass manufacturing method

Publications (2)

Publication Number Publication Date
JPS61270225A true JPS61270225A (en) 1986-11-29
JPH0798665B2 JPH0798665B2 (en) 1995-10-25

Family

ID=14525059

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60110019A Expired - Lifetime JPH0798665B2 (en) 1985-05-22 1985-05-22 Silica glass manufacturing method

Country Status (1)

Country Link
JP (1) JPH0798665B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5009688A (en) * 1988-09-28 1991-04-23 Asahi Glass Company, Ltd. Process for producing porous glass
US5123940A (en) * 1990-02-23 1992-06-23 At&T Bell Laboratories Sol-gel doping of optical fiber preform
US5871558A (en) * 1994-08-04 1999-02-16 Hitachi Chemical Company, Ltd. Process for producing silica glass

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4839398A (en) * 1971-04-08 1973-06-09

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4839398A (en) * 1971-04-08 1973-06-09

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5009688A (en) * 1988-09-28 1991-04-23 Asahi Glass Company, Ltd. Process for producing porous glass
US5123940A (en) * 1990-02-23 1992-06-23 At&T Bell Laboratories Sol-gel doping of optical fiber preform
US5871558A (en) * 1994-08-04 1999-02-16 Hitachi Chemical Company, Ltd. Process for producing silica glass

Also Published As

Publication number Publication date
JPH0798665B2 (en) 1995-10-25

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