JPS61186351A - ２−ヒドロキシエチル−モノ及び／又はポリ（オキシエチル）　トリアルキル　アンモニウムハイドロオキサイドの製造方法 - Google Patents

２−ヒドロキシエチル−モノ及び／又はポリ（オキシエチル）　トリアルキル　アンモニウムハイドロオキサイドの製造方法

Info

Publication number
JPS61186351A
JPS61186351A JP60024975A JP2497585A JPS61186351A JP S61186351 A JPS61186351 A JP S61186351A JP 60024975 A JP60024975 A JP 60024975A JP 2497585 A JP2497585 A JP 2497585A JP S61186351 A JPS61186351 A JP S61186351A
Authority
JP
Japan
Prior art keywords
poly
mono
oxyethyl
hydroxyethyl
solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60024975A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0521101B2 (https=
Inventor
Kimio Watabe
渡部　喜美男
Masahiro Shiosaki
潮崎　昌弘
Kunio Ito
伊藤　邦男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nisso Petrochemical Ind Co Ltd
Original Assignee
Nisso Petrochemical Ind Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nisso Petrochemical Ind Co Ltd filed Critical Nisso Petrochemical Ind Co Ltd
Priority to JP60024975A priority Critical patent/JPS61186351A/ja
Priority to DE8585112572T priority patent/DE3580827D1/de
Priority to AT85112572T priority patent/ATE58972T1/de
Priority to EP85112572A priority patent/EP0177905B1/de
Priority to CA000492431A priority patent/CA1257610A/en
Priority to KR1019850007406A priority patent/KR930010775B1/ko
Priority to US06/785,518 priority patent/US4729941A/en
Publication of JPS61186351A publication Critical patent/JPS61186351A/ja
Publication of JPH0521101B2 publication Critical patent/JPH0521101B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Paints Or Removers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP60024975A 1984-10-09 1985-02-12 ２−ヒドロキシエチル−モノ及び／又はポリ（オキシエチル）　トリアルキル　アンモニウムハイドロオキサイドの製造方法 Granted JPS61186351A (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP60024975A JPS61186351A (ja) 1985-02-12 1985-02-12 ２−ヒドロキシエチル−モノ及び／又はポリ（オキシエチル）　トリアルキル　アンモニウムハイドロオキサイドの製造方法
DE8585112572T DE3580827D1 (de) 1984-10-09 1985-10-04 Verfahren zum entwickeln und zum entschichten von photoresistschichten mit quaternaeren ammomiumverbindungen.
AT85112572T ATE58972T1 (de) 1984-10-09 1985-10-04 Verfahren zum entwickeln und zum entschichten von photoresistschichten mit quaternaeren ammomiumverbindungen.
EP85112572A EP0177905B1 (de) 1984-10-09 1985-10-04 Verfahren zum Entwickeln und zum Entschichten von Photoresistschichten mit quaternären Ammomiumverbindungen
CA000492431A CA1257610A (en) 1984-10-09 1985-10-08 Photoresist processing solution
KR1019850007406A KR930010775B1 (ko) 1984-10-09 1985-10-08 감광성내식막 처리액
US06/785,518 US4729941A (en) 1984-10-09 1985-10-08 Photoresist processing solution with quaternary ammonium hydroxide

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60024975A JPS61186351A (ja) 1985-02-12 1985-02-12 ２−ヒドロキシエチル−モノ及び／又はポリ（オキシエチル）　トリアルキル　アンモニウムハイドロオキサイドの製造方法

Publications (2)

Publication Number Publication Date
JPS61186351A true JPS61186351A (ja) 1986-08-20
JPH0521101B2 JPH0521101B2 (https=) 1993-03-23

Family

ID=12152974

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60024975A Granted JPS61186351A (ja) 1984-10-09 1985-02-12 ２−ヒドロキシエチル−モノ及び／又はポリ（オキシエチル）　トリアルキル　アンモニウムハイドロオキサイドの製造方法

Country Status (1)

Country Link
JP (1) JPS61186351A (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10524501B2 (en) 2015-02-18 2020-01-07 Jt International S.A. Filters for smoking articles having high additive(s) loadings

Also Published As

Publication number Publication date
JPH0521101B2 (https=) 1993-03-23

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