JPS61173242A - Photopolymerizable composition - Google Patents

Photopolymerizable composition

Info

Publication number
JPS61173242A
JPS61173242A JP1411285A JP1411285A JPS61173242A JP S61173242 A JPS61173242 A JP S61173242A JP 1411285 A JP1411285 A JP 1411285A JP 1411285 A JP1411285 A JP 1411285A JP S61173242 A JPS61173242 A JP S61173242A
Authority
JP
Japan
Prior art keywords
compd
component
benzophenone
compsn
photopolymerizable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1411285A
Other languages
Japanese (ja)
Other versions
JPH0427541B2 (en
Inventor
Hajime Kakumaru
Kazutaka Masaoka
Yoshitaka Minami
Yoji Tanaka
Original Assignee
Hitachi Chem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chem Co Ltd filed Critical Hitachi Chem Co Ltd
Priority to JP1411285A priority Critical patent/JPH0427541B2/ja
Publication of JPS61173242A publication Critical patent/JPS61173242A/en
Publication of JPH0427541B2 publication Critical patent/JPH0427541B2/ja
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029

Abstract

PURPOSE:To form a photopolymerizable compsn. increased in photosensitivity by adding a combination of benzophenone, a specified aminophenyl ketone, and a specified amino compd. as a photopolymn. initiator to a compsn. contg. a compd. having an ethylenically unsatd. group. CONSTITUTION:The photopolymerizable compsn. contains 10-90wt% compd. (component 1) having >=100 deg.C b.p. at normal pressure, and at least one kind of ethylenically unsatd. group, 2-15wt% benzophenone (component 2), 0.01-5.0wt% compd. represented by formula I, 0.01-1.0wt% compd. (component 4) represented by formula II, and 0-80wt% thermoplastic org. polymer (component 5). Benzophenone (2) in combination with components (3), (4) is essential component, and they can obtain extremely increased photosensitivity, while the storage stability of the photopolymerizable compsn. is retained. As the compd. of component (3), e.g., p,p'-dimethylaminobenzophenone, etc., are used, and as the compd. of component (4), e.g., N-phenylglycine, etc., are used.
JP1411285A 1985-01-28 1985-01-28 Expired JPH0427541B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1411285A JPH0427541B2 (en) 1985-01-28 1985-01-28

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1411285A JPH0427541B2 (en) 1985-01-28 1985-01-28

Publications (2)

Publication Number Publication Date
JPS61173242A true JPS61173242A (en) 1986-08-04
JPH0427541B2 JPH0427541B2 (en) 1992-05-12

Family

ID=11852030

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1411285A Expired JPH0427541B2 (en) 1985-01-28 1985-01-28

Country Status (1)

Country Link
JP (1) JPH0427541B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62123450A (en) * 1985-07-09 1987-06-04 Hitachi Chem Co Ltd Photopolymerizable composition
JPH06148881A (en) * 1992-10-30 1994-05-27 Nippon Synthetic Chem Ind Co Ltd:The Photosensitive resin composition
WO1999064471A1 (en) * 1998-06-08 1999-12-16 Nippon Steel Chemical Co., Ltd. Photopolymerizable resin composition and use thereof

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62123450A (en) * 1985-07-09 1987-06-04 Hitachi Chem Co Ltd Photopolymerizable composition
JPH0466503B2 (en) * 1985-07-09 1992-10-23 Hitachi Chemical Co Ltd
JPH06148881A (en) * 1992-10-30 1994-05-27 Nippon Synthetic Chem Ind Co Ltd:The Photosensitive resin composition
WO1999064471A1 (en) * 1998-06-08 1999-12-16 Nippon Steel Chemical Co., Ltd. Photopolymerizable resin composition and use thereof

Also Published As

Publication number Publication date
JPH0427541B2 (en) 1992-05-12

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term