JPS61166965A - スパツタリング用タ−ゲツト - Google Patents
スパツタリング用タ−ゲツトInfo
- Publication number
- JPS61166965A JPS61166965A JP706285A JP706285A JPS61166965A JP S61166965 A JPS61166965 A JP S61166965A JP 706285 A JP706285 A JP 706285A JP 706285 A JP706285 A JP 706285A JP S61166965 A JPS61166965 A JP S61166965A
- Authority
- JP
- Japan
- Prior art keywords
- target material
- recess
- backing plate
- target
- fixing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004544 sputter deposition Methods 0.000 title description 15
- 239000013077 target material Substances 0.000 claims abstract description 51
- 125000006850 spacer group Chemical group 0.000 claims abstract description 13
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 11
- 239000011737 fluorine Substances 0.000 claims abstract description 11
- 238000005477 sputtering target Methods 0.000 claims description 12
- 229910000599 Cr alloy Inorganic materials 0.000 claims description 2
- 239000000463 material Substances 0.000 abstract description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 3
- 229910052802 copper Inorganic materials 0.000 abstract description 3
- 239000010949 copper Substances 0.000 abstract description 3
- 238000001816 cooling Methods 0.000 description 16
- 239000000758 substrate Substances 0.000 description 8
- 239000002184 metal Substances 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 238000005476 soldering Methods 0.000 description 5
- 239000000498 cooling water Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 4
- 239000010408 film Substances 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- 230000005684 electric field Effects 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP706285A JPS61166965A (ja) | 1985-01-18 | 1985-01-18 | スパツタリング用タ−ゲツト |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP706285A JPS61166965A (ja) | 1985-01-18 | 1985-01-18 | スパツタリング用タ−ゲツト |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61166965A true JPS61166965A (ja) | 1986-07-28 |
| JPS6354070B2 JPS6354070B2 (enrdf_load_stackoverflow) | 1988-10-26 |
Family
ID=11655579
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP706285A Granted JPS61166965A (ja) | 1985-01-18 | 1985-01-18 | スパツタリング用タ−ゲツト |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61166965A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01172567A (ja) * | 1987-12-26 | 1989-07-07 | Fujitsu Ltd | スパッタターゲットおよびスパッタリング方法 |
| US5474667A (en) * | 1994-02-22 | 1995-12-12 | Materials Research Corporation | Reduced stress sputtering target and method of manufacturing therefor |
| JP2017002355A (ja) * | 2015-06-09 | 2017-01-05 | 株式会社高純度化学研究所 | スパッタリングターゲット組立体 |
-
1985
- 1985-01-18 JP JP706285A patent/JPS61166965A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01172567A (ja) * | 1987-12-26 | 1989-07-07 | Fujitsu Ltd | スパッタターゲットおよびスパッタリング方法 |
| US5474667A (en) * | 1994-02-22 | 1995-12-12 | Materials Research Corporation | Reduced stress sputtering target and method of manufacturing therefor |
| JP2017002355A (ja) * | 2015-06-09 | 2017-01-05 | 株式会社高純度化学研究所 | スパッタリングターゲット組立体 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6354070B2 (enrdf_load_stackoverflow) | 1988-10-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |