JPS61166939A - Aluminum wire rod for semiconductor device bonding - Google Patents

Aluminum wire rod for semiconductor device bonding

Info

Publication number
JPS61166939A
JPS61166939A JP60005528A JP552885A JPS61166939A JP S61166939 A JPS61166939 A JP S61166939A JP 60005528 A JP60005528 A JP 60005528A JP 552885 A JP552885 A JP 552885A JP S61166939 A JPS61166939 A JP S61166939A
Authority
JP
Japan
Prior art keywords
bonding
wire
less
wire rod
ball
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP60005528A
Other languages
Japanese (ja)
Inventor
Tokuo Uejima
上島 徳夫
Tokuhiro Hamazaki
浜崎 徳広
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FURUKAWA TOKUSHU KINZOKU KOGYO KK
Furukawa Electric Co Ltd
Original Assignee
FURUKAWA TOKUSHU KINZOKU KOGYO KK
Furukawa Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by FURUKAWA TOKUSHU KINZOKU KOGYO KK, Furukawa Electric Co Ltd filed Critical FURUKAWA TOKUSHU KINZOKU KOGYO KK
Priority to JP60005528A priority Critical patent/JPS61166939A/en
Publication of JPS61166939A publication Critical patent/JPS61166939A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/495Lead-frames or other flat leads
    • H01L23/49579Lead-frames or other flat leads characterised by the materials of the lead frames or layers thereon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45117Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950°C
    • H01L2224/45124Aluminium (Al) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/4845Details of ball bonds
    • H01L2224/48451Shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01005Boron [B]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01012Magnesium [Mg]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01013Aluminum [Al]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01014Silicon [Si]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01022Titanium [Ti]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01025Manganese [Mn]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01028Nickel [Ni]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01029Copper [Cu]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/0104Zirconium [Zr]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01079Gold [Au]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/011Groups of the periodic table
    • H01L2924/01105Rare earth metals

Abstract

PURPOSE:To obtain the titled Al wire rod satisfying the various properties required of a bonding wire rod at low cost by incorporating prescribed amounts of Ni, Mg, Si, Fe, Cu, etc., to Al. CONSTITUTION:The Al wire rod for semiconductor device bonding consists of, by weight, 0.05-2.0% Ni, 0.2-4.0% Mg, <=0.02% Si, <=0.02% Fe, <=0.03% Cu, if necessary <=0.5% Ti and <=0.1% B, further <=1.0% of >=1 kind among Zr, Mn, and rare earth elements, and the balance Al. This wire rod has excellent characteristics as follows: high tensile strength; superior corrosion resistance; a nearly perfectly spherical shape of the ball (in case of ball bonding) and rare occurrence of variance in its size; superior heat resistance; no occurrence of constriction between the wire rod and the ball (in case of ball bonding); high strength after bonding; and such superior wire drawing workability that enables the wire drawing into an extra fine wire.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は半導体チップ電極と外部リード部の接続に用い
るボンディング用アルミニウム線材に関し、特にポール
ボンディング性とボンディング強度を改善し、超音波圧
接によるウエッジボンディングは勿論、熱圧着によるボ
ールボンディングに使用できるアルミニウム線材を提供
するものである。
Detailed Description of the Invention (Field of Industrial Application) The present invention relates to an aluminum wire for bonding used for connecting semiconductor chip electrodes and external lead parts, and in particular improves pole bonding properties and bonding strength, and improves wedge bonding by ultrasonic pressure welding. The present invention provides an aluminum wire material that can be used not only for bonding but also for ball bonding by thermocompression bonding.

〔従来の技術〕[Conventional technology]

一般にボンディング用線材を用いる半導体チップ電極と
外部リード部の接続には、超音波接続によるウェッジボ
ンディングと熱圧着によるポールボンディングが用いら
れている。ウェッジボンディングはボンディング用線材
の両端部側面を超音波エネルギーにより押潰して半導体
チップ電極と外部リード部に接続するもので、ポールボ
ンディングに比べて接続に要する時間が2〜3倍も長く
、ボンディングに方向性を有し、配線の方向が平面内の
方向に限られ、放射状に配置した半導体素子の接続には
使用し難いものである。一方ポールボンデイングはボン
ディング用線材の一端を電気的又は酸素−水素炎で溶融
し、その際形成されるボールに超音波を付加しながら押
潰して250〜400℃の温度に加熱した半導体チップ
電極に接続し、他端を超音波接続により外部リード部に
接続するものである。
Generally, wedge bonding using ultrasonic bonding and pole bonding using thermocompression bonding are used to connect semiconductor chip electrodes and external lead portions using bonding wires. Wedge bonding is a process in which the sides of both ends of a bonding wire are crushed using ultrasonic energy to connect semiconductor chip electrodes and external leads. Compared to pole bonding, the connection time is two to three times longer and the bonding time is longer. It has directional properties, and the wiring direction is limited to in-plane directions, making it difficult to use for connecting semiconductor elements arranged radially. On the other hand, in pole bonding, one end of the bonding wire is melted electrically or with an oxygen-hydrogen flame, and the ball formed at that time is crushed while applying ultrasonic waves and heated to a temperature of 250 to 400 degrees Celsius to form a semiconductor chip electrode. and the other end is connected to the external lead part by ultrasonic connection.

このようなボンディング用線材には次のような特性が要
求されている。
Such bonding wires are required to have the following characteristics.

(1)引張り強さが大きいこと。(1) High tensile strength.

(2)耐食性が優れていること。(2) Excellent corrosion resistance.

(3)ボール形状が真球(ポールボンディングの場合)
に近く、その大きさにバラツキが少ないこと。
(3) Ball shape is a true sphere (in case of pole bonding)
, with little variation in size.

(4)耐熱性が高く(ポールボンディングの場合)線材
とボールの間にくびれが起らないこと。
(4) It has high heat resistance (in the case of pole bonding) and no constriction occurs between the wire and the ball.

(5)ボンディング後の強度が高いこと。(5) High strength after bonding.

(6)60μm以下の極細線まで伸線加工性が良いこと
(6) Good wire drawability up to ultra-fine wires of 60 μm or less.

従来ボンディング用線材にはAu線、 Au合金線、A
J!−Si合金線、 A、e−Nt合金線。
Conventional bonding wires include Au wire, Au alloy wire, and A
J! -Si alloy wire, A, e-Nt alloy wire.

八λ−M(1合金線等が用いられている。8λ-M (1 alloy wire etc. are used.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

All線やAl1合金線はコストが高く、一方半導体チ
ツブ電極はほとんどA(又はA(合金でつくられている
ため、Al1線やAl1合金線を用いて接続すると、後
工程の加熱により接合面に金属間化合物を生成して脆く
なり、信頼性の面でA!2合金線を用いた場合よりも劣
る欠点がある。またへλ−8;合金線は前記(1)、(
2)。
All wires and Al1 alloy wires are expensive, while most semiconductor chip electrodes are made of A (or A) alloy. It has the disadvantage of forming intermetallic compounds and becoming brittle, making it inferior to the case of using A!2 alloy wire in terms of reliability.
2).

(3)、(4)、(5)の面で劣り、熱圧着には使用で
きないものであった。更にAl−N1合金線は前記(1
)及び(5)の面で劣り、AJ!−M(1合金線は前記
(3)及び(4)の面で劣るものである。
It was inferior in terms of (3), (4), and (5) and could not be used for thermocompression bonding. Furthermore, the Al-N1 alloy wire has the above-mentioned (1
) and (5), AJ! -M(1 alloy wire is inferior in terms of (3) and (4) above.

C問題点を解決するための手段〕 本発明はこれに鑑み種々研究の結果、前記特性を満足し
、超音波接続によるウェッジポンディグは勿論、熱圧着
によるポールボンディングにも使用できる半導体素子ボ
ンディング用アルミニウム線材を開発したもので・ある
Means for Solving Problem C] In view of this, the present invention has been developed as a result of various studies to provide a semiconductor element bonding device that satisfies the above characteristics and can be used not only for wedge bonding by ultrasonic bonding but also for pole bonding by thermocompression bonding. It is a product developed from aluminum wire.

即ち本発明線材の一つは、N i 0.05〜2.0w
t%(以下wt%を単に%と略記) 、Mg0.2〜4
.0%、3 i 0,02%以下、Fed、02%以下
、Cu 0003%以下を含み、残部A(からなること
を特徴とするものである。
That is, one of the wire rods of the present invention has a N i of 0.05 to 2.0w.
t% (hereinafter wt% is simply abbreviated as %), Mg0.2-4
.. 0%, 3i 0.02% or less, Fed 0.02% or less, Cu 0003% or less, and the balance is A.

また本発明線材の他の一つは、N i 0.05〜2.
0%、Mg0.2〜4.0%、3 i 0.02%以下
、1:eo、02%以下、CIJ 0103%以下、T
i0.5%以下、8001%以下を含み、残部Alから
なることを特徴とするものである。
Moreover, another one of the wire rods of the present invention has a Ni of 0.05 to 2.
0%, Mg0.2-4.0%, 3i 0.02% or less, 1:eo, 02% or less, CIJ 0103% or less, T
It is characterized in that it contains 0.5% or less of i, 8001% or less, and the remainder consists of Al.

また本発明線材の更に他の一つは、Ni0.05〜2,
0%、Mgo、z〜4.0%、Si0.02%以下、1
:eo、02%以下、Cu0.03%以下、7i0.5
%以下、30.1%以下と、更にzr 、 Ml’l 
、希土類元素の何れか1種又は2種以上を含み、残部へ
λからなることを特徴とするものである。
Furthermore, another one of the wire rods of the present invention has Ni0.05 to 2,
0%, Mgo, z ~ 4.0%, Si 0.02% or less, 1
:eo, 02% or less, Cu0.03% or less, 7i0.5
% or less, 30.1% or less, and further zr, Ml'l
, rare earth elements, and the remainder is λ.

〔作 用〕[For production]

本発明においてN1の添加はポールボンディングにおけ
るボール形状を真珠に近くし、耐熱性を高めて線材とボ
ール間のくびれを起りにくくし、ボンディング後の強度
を増大させるためであり、Ni含有量を0.05〜2.
0%と限定したのは、0.05%未満では十分な高温強
度が得られず、線材とボール間にくびれが起り易くなリ
、かつボンディング後の強度が低下し、2.0%を越え
ると線材の耐食性が低下するためである。 Millの
添加は耐食性を低下させることなく引張強さを改善する
ためであり、Mg含有量を 0.2〜4.0%と限定し
たのは、0.2%未満では十分な強度改善効果が得られ
ず、4%を越えると加工硬化が著しく線材の伸縮加工が
不可能となるためである。
In the present invention, the purpose of adding N1 is to make the ball shape in pole bonding similar to a pearl, increase heat resistance, make constriction between the wire rod and ball less likely to occur, and increase strength after bonding. .05~2.
The reason why it is limited to 0% is because if it is less than 0.05%, sufficient high-temperature strength cannot be obtained, and constriction is likely to occur between the wire and the ball, and the strength after bonding will decrease, and if it exceeds 2.0%. This is because the corrosion resistance of the wire decreases. The purpose of adding Mill is to improve tensile strength without reducing corrosion resistance, and the reason why the Mg content is limited to 0.2 to 4.0% is that less than 0.2% does not have a sufficient strength improvement effect. If it exceeds 4%, work hardening will be significant and the wire rod will not be able to be stretched or contracted.

またSi含有量を0.02%以下、Fe含有量を0.0
2%以下、 Cu含有量を0.03%以下と限定したの
は、これらは何れも不可避的に含まれる不純物で強度向
上に有効なるも、耐食性を著しく低下させるところから
、これを越えて含有すると耐食性が不十分となるばかり
か、ボール形状が悪くなるためで、特にこれ等含有量を
何れも0.01%以下に押えることが望ましい。
In addition, the Si content is 0.02% or less, and the Fe content is 0.0%.
The reason why we limited the Cu content to 0.03% or less is that these are impurities that are inevitably included and are effective in improving strength, but they significantly reduce corrosion resistance. This results in not only insufficient corrosion resistance but also poor ball shape, so it is particularly desirable to keep these contents to 0.01% or less.

次に上記A、e−Ni−Mg−8i −Fe −Cu合
金に更にTi及びBの添加は、同時に添加することによ
り鋳塊の結晶粒を微細化し、線材の品質を安定化させる
ためであり、T1含有量を0.5%以下、B含有go、
1%以下と限定したのは、これを越えて含有すると粗大
な第2相が晶出し、伸縮加工により極細線とすることが
不可能となるためである。
Next, the addition of Ti and B to the above A, e-Ni-Mg-8i-Fe-Cu alloy is to refine the crystal grains of the ingot and stabilize the quality of the wire rod by adding them at the same time. , T1 content 0.5% or less, B content go,
The reason why the content is limited to 1% or less is because if the content exceeds this, a coarse second phase will crystallize, making it impossible to form ultra-fine wires by stretching.

更に上記A、e−Ni −M!] −8t −Fe −
Cu −Ti−8合金に、Zr 、 Mn 、希土類元
素の何れか1種又は2種以上を添加するのは、Niとの
相剰効果により耐熱性を改善し、ボンディング後の強度
を一層高めるためであり、これ等元素の1種又は2種以
上の合計含有量を1.0%以下と限定したのは、これを
越えて含有すると第2相が晶出し、伸線加工により極細
線とすることが困難となるためである。尚希土類元素と
してはセリウム族(La、C0.Pr。
Furthermore, the above A, e-Ni-M! ] −8t −Fe −
The reason for adding one or more of Zr, Mn, and rare earth elements to the Cu-Ti-8 alloy is to improve the heat resistance due to the mutual effect with Ni and further increase the strength after bonding. The reason why the total content of one or more of these elements is limited to 1.0% or less is that if the content exceeds this, a second phase will crystallize and the wire will be drawn into an ultra-fine wire. This is because it becomes difficult. The rare earth elements include cerium group (La, C0.Pr.

Nd 、 Pm 、 Sm )及びイツトリウム族(S
C。
Nd, Pm, Sm) and yttrium group (S
C.

Y、En、Gd、Tb、 Dy、Ho、Er。Y, En, Gd, Tb, Dy, Ho, Er.

Tm、Yb、Lu)であり、一般にはla。Tm, Yb, Lu) and generally la.

C,e 、 Sn 、 Gd又はミツシュメタル(希土
類元素の混合物、以下MMと略記)を用いるとよい。
It is preferable to use C, e, Sn, Gd, or mitsch metal (a mixture of rare earth elements, hereinafter abbreviated as MM).

本発明線材は上記合金組成からなり、何れもA(地金中
に含まれる上記元素以外の不純物元素は何れも耐食性及
びボール形状を悪くするため、できるだけ少量に押える
必要があり、これ等不純物元素の合計含有量を0.01
%以下、更には0.005%以下に押えることが望まし
い。このため使用するAl地金には純度99.95%以
上で合金元素以外の不純物元素の少ないものを選択使用
するか、又は純度99.99%以上、望ましくは純度9
9.995%以上の高純度Al地金を用いるとよい。
The wire rod of the present invention has the above-mentioned alloy composition, and all impurity elements other than the above-mentioned elements contained in the base metal deteriorate corrosion resistance and ball shape, so it is necessary to suppress them to a small amount as much as possible. The total content of 0.01
% or less, preferably 0.005% or less. For this reason, the Al ingot used should be one with a purity of 99.95% or higher and a low amount of impurity elements other than alloying elements, or one with a purity of 99.99% or higher, preferably a purity of 9.
It is preferable to use a high purity Al metal of 9.995% or higher.

〔実施例〕〔Example〕

純度99.999%の高純度Ai地金をを溶解し、これ
に純度99.999%の八λと純度99,999%のN
i、純度99.99%のfvH+、純度99,999の
Si。
High-purity Ai ingot with a purity of 99.999% is melted, and into this is 8λ with a purity of 99.999% and N with a purity of 99,999%.
i, fvH+ with a purity of 99.99%, Si with a purity of 99,999.

純度99.999%のCLI、純度99.9%のTi、
純度99%のB、純度99.6%のZ r 、 99.
99%のMn。
CLI with a purity of 99.999%, Ti with a purity of 99.9%,
B with a purity of 99%, Z r with a purity of 99.6%, 99.
99% Mn.

MM(Ce40%以上)、純度99.9%のC0.純度
99.9%のLa、純度99.9%のNdを用いて作成
した各母合金を添加して、第1表に示す組成の合金を溶
製し、これを25s角、長さ 150rRの鋳型に鋳造
した。
MM (Ce 40% or more), C0. with a purity of 99.9%. Each master alloy made using La with a purity of 99.9% and Nd with a purity of 99.9% was added to produce an alloy having the composition shown in Table 1. Cast in a mold.

この鋳塊を550℃の温度で48時間ソーキングした後
、熱間溝ロール圧延により直径5Siの線材とし、これ
に冷間伸線加工と360℃、  29H15の中間焼鈍
を・繰返して直径30μ風のFi細線とし、100〜3
60℃の温度で2時間の最終焼鈍を施してボンディング
用アルミニウム線材とした。
After soaking this ingot at a temperature of 550°C for 48 hours, it was hot groove rolled into a wire rod with a diameter of 5Si, which was then subjected to cold wire drawing and intermediate annealing at 360°C at 29H15 repeatedly. Fi thin wire, 100~3
Final annealing was performed at a temperature of 60° C. for 2 hours to obtain an aluminum wire for bonding.

これ等線材について伸線加工性を比較すると共に引張強
ざ及び伸びを測定し、更に通常の手動式ボールボンディ
ング装置を用いて線材の一端にA「ガスを吹き付けなが
らアークにより溶解し、第1図に示すように線材(1)
の一端にボール(2)を形成し、これについて真空度H
/D及びくびれ率do/d  (ただしHはボール縦方
向の直径、Dはボール横方向の直径、dは線材の直径、
 doはくびれ部の直径)を測定し、続いてボールを半
導体チップ電極、に熱圧着し、線材の他端を外部リード
部に超音波圧接し、ボ ・ンディング後の線材の強度を
測定した。また上2冷間伸線加工中、直径1,0.の線
材より試料を採取し、これについてJIS2371に基
づき4日間塩水噴霧を行なって耐食性を調べた。これ等
の結果を第2表に示す。
The drawability of these wire rods was compared, the tensile strength and elongation were measured, and one end of the wire was melted using an arc while blowing gas using an ordinary manual ball bonding device. Wire rod (1) as shown in
A ball (2) is formed at one end, and the vacuum degree H is applied to this ball (2).
/D and constriction rate do/d (where H is the diameter of the ball in the longitudinal direction, D is the diameter of the ball in the lateral direction, d is the diameter of the wire,
The ball was then thermocompression bonded to a semiconductor chip electrode, the other end of the wire was ultrasonically welded to the external lead, and the strength of the wire after bonding was measured. Also, during the upper 2 cold wire drawing process, diameter 1.0. A sample was taken from the wire rod, and the sample was subjected to salt water spraying for 4 days based on JIS2371 to examine its corrosion resistance. These results are shown in Table 2.

第1表及び第2表から明らかなように従来線材NQ54
は耐食性が劣るばかりか、ポールが形成されず、熱圧着
が不可能であり、従来線材Na55は良好な耐食性を示
すも真球度が低く、くびれ率も高く、ポールディング性
が悪いばかりか、ボンディング後の強度が低く、従来線
材NQ56はポールボンディング性が良好なるも引張強
さが低く、ボンディング侵の強度が低い。
As is clear from Tables 1 and 2, conventional wire NQ54
Not only does it have poor corrosion resistance, but poles are not formed and thermocompression bonding is impossible. Conventional wire material Na55 shows good corrosion resistance, but has low sphericity, high constriction rate, and poor poleability. The strength after bonding is low, and although the conventional wire NQ56 has good pole bonding properties, its tensile strength is low and its strength against bonding corrosion is low.

これに対し、本発明線材Nα1〜40は何れもボンディ
ング後の強度が高く、真球に近いポールが形成され、く
びれが少なく、ポールボンディングが可能であることが
判る。また耐食性は不純物の合計含有量が多い本発明線
材NQ11〜14でやや劣るも、その他は良好な耐食性
を有してることが判る。特にT1及びBを添加した本発
明線材NQ15〜24は引張強さ、伸び及びボンディン
グ後の強度に改善が見られ、更にZr 、 Mn 。
On the other hand, it can be seen that the wire rods Nα1 to Nα40 of the present invention all have high strength after bonding, form a pole close to a perfect sphere, have little constriction, and can be pole bonded. It is also seen that although the corrosion resistance is slightly inferior in the wire rods NQ11 to 14 of the present invention, which have a large total content of impurities, the others have good corrosion resistance. In particular, wire rods NQ15 to 24 of the present invention to which T1 and B were added showed improvements in tensile strength, elongation, and strength after bonding, and furthermore, Zr and Mn.

希土類元素の何れか1種又は2種以上を添加した本発明
線材NQ25〜40では引張強さ及びボンディング後の
強度に一層の改善が認められる。
In the wire rods NQ25 to 40 of the present invention to which one or more rare earth elements were added, further improvement was observed in the tensile strength and the strength after bonding.

これに対し本発明線材の組成範囲により外れる比較合金
No、 41〜53では耐食性、ボンディング後の強度
、伸線加工性の何れかが劣ることが判る。即ち、本発明
線材の組成範囲よりN1゜Si、F0.Cu及び不純物
の合計含有量が多い比較線材Na42. No45〜4
7及びNQ53では耐食性が劣り、Ni及びMillが
少ない比較線材NQ41゜43はボンディング後の強度
が低く、特にNi含有最の少ない比較線材NQ41では
くびれが大きい。
On the other hand, it can be seen that comparative alloys Nos. 41 to 53, which fall outside the composition range of the wire of the present invention, are inferior in corrosion resistance, strength after bonding, and wire drawability. That is, from the composition range of the wire of the present invention, N1°Si, F0. Comparative wire material Na42. has a higher total content of Cu and impurities. No45~4
7 and NQ53 have poor corrosion resistance, and the comparative wire material NQ41°43, which contains less Ni and Mill, has low strength after bonding, and especially the comparative wire material NQ41, which contains the least amount of Ni, has a large constriction.

またMa、T+、s、zr、vn、希土類元素が多い、
比較線材Nα44.No、48〜54では冷間伸線加工
において断線が多く、30μmの極細線に加工すること
ができなかった。
It also contains a lot of Ma, T+, s, zr, vn, and rare earth elements.
Comparison wire Nα44. In Nos. 48 to 54, there were many wire breaks during the cold wire drawing process, and it was not possible to process the wires into ultrafine wires of 30 μm.

〔発明の効果〕〔Effect of the invention〕

このように本発明線材はボンディング線材に要求される
前記特性を満足し、ウェッジボンディングは勿論、ポー
ルボンディングに使用することができるもので、高価な
AIJ又はAL+合金線に代り、コストが安く、同等の
性能を示し、しかも接合面における金属間化合物の生成
の恐れもないなど顕著な効果を奏するものである。
As described above, the wire rod of the present invention satisfies the above-mentioned characteristics required for bonding wire rods, and can be used not only for wedge bonding but also for pole bonding, and can replace expensive AIJ or AL+alloy wires at a lower cost and at the same level. It exhibits remarkable effects such as exhibiting high performance and no fear of the formation of intermetallic compounds at the bonding surface.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はポールボンディングにおけるボール真球度とく
びれ率の説明図である。
FIG. 1 is an explanatory diagram of ball sphericity and constriction rate in pole bonding.

Claims (6)

【特許請求の範囲】[Claims] (1)Ni0.05〜2.0wt%、Mg0.2〜4.
0wt%、Si0.02wt%以下、Fe0.02wt
%以下、Cu0.03wt%以下を含み、残部Alから
なる半導体素子ボンディング用アルミニウム線材。
(1) Ni0.05-2.0wt%, Mg0.2-4.
0wt%, Si0.02wt% or less, Fe0.02wt
% or less, including Cu0.03wt% or less, and the balance being Al.
(2)Ni、Mg、Si、Fe、Cu以外の不純物元素
の合計含有量が0.01wt%以下である特許請求の範
囲第1項記載の半導体素子ボンディング用アルミニウム
線材。
(2) The aluminum wire for semiconductor element bonding according to claim 1, wherein the total content of impurity elements other than Ni, Mg, Si, Fe, and Cu is 0.01 wt% or less.
(3)Ni0.05〜2.0wt%、Mg0.2〜4.
0wt%、Si0.02wt%以下、Fe0.02wt
%以下、Cu0.03wt%以下、Ti0.5wt%以
下、B0.1wt%以下を含み、残部Alからなる半導
体素子ボンディング用アルミニウム線材。
(3) Ni0.05-2.0wt%, Mg0.2-4.
0wt%, Si0.02wt% or less, Fe0.02wt
% or less, Cu 0.03 wt % or less, Ti 0.5 wt % or less, B 0.1 wt % or less, and the balance is Al.
(4)Ni、Mg、Si、Fe、Cu、Ti、B以外の
不純物元素の合計含有量が0.01wt%以下である特
許請求の範囲第3項記載の半導体素子ボンディング用ア
ルミニウム線材。
(4) The aluminum wire for semiconductor device bonding according to claim 3, wherein the total content of impurity elements other than Ni, Mg, Si, Fe, Cu, Ti, and B is 0.01 wt% or less.
(5)Ni0.05〜2.0wt%、Mg0.2〜4.
0wt%、Si0.02wt%以下、Fe0.02wt
%以下、Cu0.03wt%以下、Ti0.5wt%以
下、B0.1wt%以下と、更にZr、Mn、希土類元
素の何れか1種又は2種以上を合計1.0wt%以下を
含み、残部Alからなる半導体素子ボンディング用アル
ミニウム線材。
(5) Ni0.05-2.0wt%, Mg0.2-4.
0wt%, Si0.02wt% or less, Fe0.02wt
% or less, Cu 0.03 wt % or less, Ti 0.5 wt % or less, B 0.1 wt % or less, and a total of 1.0 wt % or less of any one or more of Zr, Mn, and rare earth elements, and the balance is Al. Aluminum wire material for bonding semiconductor devices.
(6)Ni、Mg、Si、Fe、Cu、Ti、B、Zr
、Mn、希土類元素以外の不純物元素の合計含有量が0
.01wt%以下である特許請求の範囲第5項記載の半
導体素子ボンディング用アルミニウム線材。
(6) Ni, Mg, Si, Fe, Cu, Ti, B, Zr
, Mn, and the total content of impurity elements other than rare earth elements is 0.
.. The aluminum wire for bonding semiconductor elements according to claim 5, wherein the aluminum wire has a content of 0.01 wt% or less.
JP60005528A 1985-01-16 1985-01-16 Aluminum wire rod for semiconductor device bonding Pending JPS61166939A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60005528A JPS61166939A (en) 1985-01-16 1985-01-16 Aluminum wire rod for semiconductor device bonding

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60005528A JPS61166939A (en) 1985-01-16 1985-01-16 Aluminum wire rod for semiconductor device bonding

Publications (1)

Publication Number Publication Date
JPS61166939A true JPS61166939A (en) 1986-07-28

Family

ID=11613688

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60005528A Pending JPS61166939A (en) 1985-01-16 1985-01-16 Aluminum wire rod for semiconductor device bonding

Country Status (1)

Country Link
JP (1) JPS61166939A (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6396237A (en) * 1986-10-09 1988-04-27 Sky Alum Co Ltd Material for electrically conductive parts of electronic and electrical appliance
JPS6396239A (en) * 1986-10-09 1988-04-27 Sky Alum Co Ltd Material for electrically conductive parts of electronic and electrical appliance
JPS63278254A (en) * 1987-05-08 1988-11-15 Koujiyundo Kagaku Kenkyusho:Kk Wiring material of aluminum alloy
US5302342A (en) * 1989-11-17 1994-04-12 Honda Giken Kogyo Kabushiki Kaisha Aluminum alloy for heat exchangers
KR100755128B1 (en) 2006-01-31 2007-09-04 엘에스전선 주식회사 Method of manufacturing aluminum alloy having high electro-conductivity and heat resistance, Aluminum alloy wire and Overhead transmission line manufactured using the same
CN102560297A (en) * 2012-02-16 2012-07-11 上海电缆研究所 Method for preparing aluminium magnesium silicon alloy rod base and preparing high-strength aluminium magnesium silicon alloy conductor
JP2014131010A (en) * 2012-11-30 2014-07-10 Nippon Piston Ring Co Ltd Bonding wire, connection structure, semiconductor device and method of manufacturing the same
CN104384748A (en) * 2014-09-18 2015-03-04 兰州威特焊材炉料有限公司 TIG/MIG aluminum welding wire and preparation method thereof
JP2016511529A (en) * 2012-11-22 2016-04-14 ヘレウス ドイチェラント ゲーエムベーハー ウント カンパニー カーゲー Aluminum alloy wire for bonding applications
CN112002457A (en) * 2020-08-20 2020-11-27 湖南科技学院 High-conductivity copper-clad rare earth aluminum alloy clad wire and preparation process thereof
CN114574719A (en) * 2022-02-23 2022-06-03 海安宏宇合金材料有限公司 High-strength die-casting aluminum alloy and processing technology thereof

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6396237A (en) * 1986-10-09 1988-04-27 Sky Alum Co Ltd Material for electrically conductive parts of electronic and electrical appliance
JPS6396239A (en) * 1986-10-09 1988-04-27 Sky Alum Co Ltd Material for electrically conductive parts of electronic and electrical appliance
JPS63278254A (en) * 1987-05-08 1988-11-15 Koujiyundo Kagaku Kenkyusho:Kk Wiring material of aluminum alloy
US5302342A (en) * 1989-11-17 1994-04-12 Honda Giken Kogyo Kabushiki Kaisha Aluminum alloy for heat exchangers
KR100755128B1 (en) 2006-01-31 2007-09-04 엘에스전선 주식회사 Method of manufacturing aluminum alloy having high electro-conductivity and heat resistance, Aluminum alloy wire and Overhead transmission line manufactured using the same
CN102560297A (en) * 2012-02-16 2012-07-11 上海电缆研究所 Method for preparing aluminium magnesium silicon alloy rod base and preparing high-strength aluminium magnesium silicon alloy conductor
JP2016511529A (en) * 2012-11-22 2016-04-14 ヘレウス ドイチェラント ゲーエムベーハー ウント カンパニー カーゲー Aluminum alloy wire for bonding applications
JP2014131010A (en) * 2012-11-30 2014-07-10 Nippon Piston Ring Co Ltd Bonding wire, connection structure, semiconductor device and method of manufacturing the same
CN104384748A (en) * 2014-09-18 2015-03-04 兰州威特焊材炉料有限公司 TIG/MIG aluminum welding wire and preparation method thereof
CN112002457A (en) * 2020-08-20 2020-11-27 湖南科技学院 High-conductivity copper-clad rare earth aluminum alloy clad wire and preparation process thereof
CN114574719A (en) * 2022-02-23 2022-06-03 海安宏宇合金材料有限公司 High-strength die-casting aluminum alloy and processing technology thereof

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