JPS61164271U - - Google Patents
Info
- Publication number
- JPS61164271U JPS61164271U JP4830285U JP4830285U JPS61164271U JP S61164271 U JPS61164271 U JP S61164271U JP 4830285 U JP4830285 U JP 4830285U JP 4830285 U JP4830285 U JP 4830285U JP S61164271 U JPS61164271 U JP S61164271U
- Authority
- JP
- Japan
- Prior art keywords
- upper electrode
- plasma etching
- etching apparatus
- electrode
- stacking
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4830285U JPS61164271U (cs) | 1985-04-01 | 1985-04-01 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4830285U JPS61164271U (cs) | 1985-04-01 | 1985-04-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61164271U true JPS61164271U (cs) | 1986-10-11 |
Family
ID=30564431
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4830285U Pending JPS61164271U (cs) | 1985-04-01 | 1985-04-01 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61164271U (cs) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008544500A (ja) * | 2005-06-13 | 2008-12-04 | ラム リサーチ コーポレーション | 電極片を独立して移動させることによるエッチ速度の均一性の改善 |
-
1985
- 1985-04-01 JP JP4830285U patent/JPS61164271U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008544500A (ja) * | 2005-06-13 | 2008-12-04 | ラム リサーチ コーポレーション | 電極片を独立して移動させることによるエッチ速度の均一性の改善 |