JPS61129881U - - Google Patents

Info

Publication number
JPS61129881U
JPS61129881U JP953585U JP953585U JPS61129881U JP S61129881 U JPS61129881 U JP S61129881U JP 953585 U JP953585 U JP 953585U JP 953585 U JP953585 U JP 953585U JP S61129881 U JPS61129881 U JP S61129881U
Authority
JP
Japan
Prior art keywords
wafers
chamber
cassette
stocker
implantation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP953585U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP953585U priority Critical patent/JPS61129881U/ja
Priority to US06/819,253 priority patent/US4759681A/en
Publication of JPS61129881U publication Critical patent/JPS61129881U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、この考案の一実施例に係るエンドス
テーシヨンの概略図である。第2図は、第1図の
線―に沿う概略断面図である。第3図は、第
1図及び第2図のエンドステーシヨンの動作の一
例を示すタイムチヤートである。第4図は、この
考案の背景となるエンドステーシヨンを2台用い
たデユアルエンドステーシヨンの概略図である。
第5図は、第4図のデユアルエンドステーシヨン
の片側の動作の一例を示すタイムチヤートである
。 1……注入室、4……ウエハ、10A,10B
……カセツト室(予備室)、11A,11B……
カセツト、12A,12B……ストツカー、50
……この考案のエンドステーシヨン。
FIG. 1 is a schematic diagram of an end station according to an embodiment of this invention. FIG. 2 is a schematic sectional view taken along the line - in FIG. 1. FIG. 3 is a time chart showing an example of the operation of the end station shown in FIGS. 1 and 2. FIG. FIG. 4 is a schematic diagram of a dual end station using two end stations, which is the background of this invention.
FIG. 5 is a time chart showing an example of the operation of one side of the dual-end station of FIG. 1... Injection chamber, 4... Wafer, 10A, 10B
...Cassette room (preliminary room), 11A, 11B...
Cassette, 12A, 12B...Stocker, 50
...The end station of this idea.

補正 昭61.1.24 考案の名称を次のように補正する。 考案の名称 イオン注入装置用エンドステー
シヨン 実用新案登録請求の範囲、図面の簡単な説明を
次のように補正する。
Amendment January 24, 1981 The name of the invention is amended as follows. Title of the invention: End station for ion implantation device The scope of the utility model registration claims and the brief description of the drawings are amended as follows.

【実用新案登録請求の範囲】 ウエハにイオンを注入するため真空に排気さ
れる注入室と、注入室にウエハを出し入れするた
真空に排気される予備室とを有するイオン注
入装置用エンドステーシヨンにおいて、予備室内
に、複数枚のウエハを収納可能なカセツトを設け
、注入室内に、カセツトへの収納枚数以上のウエ
ハを収納可能なストツカーを設け、更に予備室か
ら注入室にかけて、カセツトに収納されていたウ
エハをストツカーに全て移し替え、当該ストツカ
ーからウエハを注入室内のイオン注入場所へ供給
し、イオン注入後のウエハを元のカセツトに回収
するための機構を設けたことを特徴とするイオン
注入装置用エンドステーシヨン。
[Claims for Utility Model Registration] An end for an ion implanter having an evacuated implantation chamber for implanting ions into a wafer, and a vacuum evacuated preliminary chamber for loading and unloading the wafer into the implantation chamber. In the station, a cassette capable of storing multiple wafers is provided in the preliminary chamber, a stocker capable of storing more wafers than can be stored in the cassette is provided in the injection chamber, and a stocker capable of storing wafers in excess of the number of wafers stored in the cassette is installed from the preliminary chamber to the injection chamber. The ion implantation apparatus is characterized in that a mechanism is provided for transferring all the wafers that have been ion-implanted to a stocker, supplying the wafers from the stocker to an ion implantation location in an implantation chamber, and recovering the wafers after ion implantation to the original cassette. End station for injection equipment.

【図面の簡単な説明】 第1図は、この考案の一実施例に係るエンドス
テーシヨンの概略図である。第2図は、第1図の
線―に沿う概略断面図である。第3図は、第
1図及び第2図のエンドステーシヨンの動作の一
例を示すタイムチヤートである。第4図は、この
考案の背景となるエンドステーシヨンを2台用い
たデユアルステーシヨンの概略図である。第5図
は、第4図のデユアルエンドステーシヨンの片側
の動作の一例を示すタイムチヤートである。 1……注入室、4……ウエハ、10A,10B
……カセツト室(予備室)、11A,11B……
カセツト、12A,12B……ストツカー、50
……この考案のエンドステーシヨン。
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic diagram of an end station according to an embodiment of this invention. FIG. 2 is a schematic sectional view taken along the line - in FIG. 1. FIG. 3 is a time chart showing an example of the operation of the end station shown in FIGS. 1 and 2. FIG. FIG. 4 is a schematic diagram of a dual station using two end stations, which is the background of this invention. FIG. 5 is a time chart showing an example of the operation of one side of the dual-end station of FIG. 1... Injection chamber, 4... Wafer, 10A, 10B
...Cassette room (preliminary room), 11A, 11B...
Cassette, 12A, 12B...Stocker, 50
...The end station of this idea.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] ウエハにイオン注入するために相対的に高真空
に排気される注入室と、注入室にウエハを出し入
れするために相対的に低真空に予備排気される予
備室とを有するイオン注入装置用エンドステーシ
ヨンにおいて、予備室内に、複数枚のウエハを収
納可能なカセツトを設け、注入室内に、カセツト
への収納枚数以上のウエハを収納可能なストツカ
ーを設け、更に予備室から注入室にかけて、カセ
ツトに収納されていたウエハをストツカーに全て
移し替え、当該ストツカーからウエハを注入室内
のイオン注入場所へ供給し、イオン注入後のウエ
ハを元のカセツトに回収するための機構を設けた
ことを特徴とするイオン注入装置用エンドステー
シヨン。
An end station for an ion implanter that has an implantation chamber that is evacuated to a relatively high vacuum for implanting ions into a wafer, and a preliminary chamber that is pre-evacuated to a relatively low vacuum for loading and unloading wafers into the implantation chamber. A cassette capable of storing a plurality of wafers is provided in the preliminary chamber, a stocker capable of storing a number of wafers larger than the number of wafers stored in the cassette is provided in the injection chamber, and furthermore, a cassette capable of storing a plurality of wafers is provided in the preliminary chamber and the wafers stored in the cassette are placed in the injection chamber. The ion implantation method is characterized in that a mechanism is provided for transferring all the wafers that have been stored in the stocker to a stocker, supplying the wafers from the stocker to the ion implantation location in the implantation chamber, and recovering the wafers after ion implantation to the original cassette. End station for equipment.
JP953585U 1985-01-22 1985-01-26 Pending JPS61129881U (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP953585U JPS61129881U (en) 1985-01-26 1985-01-26
US06/819,253 US4759681A (en) 1985-01-22 1986-01-16 End station for an ion implantation apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP953585U JPS61129881U (en) 1985-01-26 1985-01-26

Publications (1)

Publication Number Publication Date
JPS61129881U true JPS61129881U (en) 1986-08-14

Family

ID=30489847

Family Applications (1)

Application Number Title Priority Date Filing Date
JP953585U Pending JPS61129881U (en) 1985-01-22 1985-01-26

Country Status (1)

Country Link
JP (1) JPS61129881U (en)

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