JPS61110761A - High vacuum ion plating method - Google Patents

Abstract

PURPOSE:To form a high purity coated film having high adhesion by ion plating with only metallic vapor by heating an ionization accelerating cavity made of ceramics to a temp. above the m.p. of a coating metal. CONSTITUTION:An ionization accelerating cavity 1 in a vacuum vessel A is made of ceramics. The cavity 1 is heated to a temp. 1.2-1.5 times the m.p. of a metal in a crucible 4 with a heater 3 to apply 10<-5>-10<-2>Torr vapor pressure to the small space in the cavity 1, and glow discharge plasma of only metallic vapor is generated in the space with a high frequency coil 2. Thus, a coated film having controlled crystallizability is obtd. by ion plating without using a gas such as Ar.

Description

DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to improvements in high vacuum ion plating methods.

<Conventional technology> The conventional ion plating method for metal coatings involves introducing a gas such as gas in addition to the deposited metal, generating plasma by direct current or high frequency gas discharge, and ionizing the metal vapor and gas. By colliding the ions with the coating substrate, high adhesion and crystallinity of the coating were controlled.

<Problems to be solved by the invention> However, in the above method, by introducing a gas such as Ar gas, the advantages of the film obtained by the vapor deposition method,
There was a drawback that high purity and fine texture were lost.

(For the second reason, coating is required using only metal vapor ions without using gas such as K, but DC discharge is 10'Torr or more, and high frequency discharge is 10'Torr or more.
Glow discharge will not occur unless the temperature is Torr or higher, so
It was not possible to sufficiently ionize metal vapor without using a foreign gas such as gas.

Furthermore, it is said that it is difficult to control the ionization rate of metal vapor because vapor pressure, Ar gas pressure, and discharge power are intricately intertwined and cannot be controlled independently.

Means for Solving the Problems In view of the above points, this invention was developed as a result of studies to enable ionization blating of only metal vapor without using gas such as Ar gas. It is something.

Namely, as shown in the drawings, the present invention has an ionization promoting cavity 1 in a vacuum chamber A made of ceramic, and a heater 3 coating the cavity 1 with a melting point of 1. By heating 2 to 1.5 times, 1616'r
orr vapor pressure is generated, and a high-frequency coil 2 is used in that part to realize a glow discharge plasma using only metal vapor, and to perform ionization as much as possible to achieve high adhesion to the substrate 5 and control of crystallinity of the film. This is a characteristic feature.

6 in the figure is an electron gun.

In this invention, the ionization-promoting cavity is made of ceramic, and the cavity is made of ceramic with a melting point of 1.2 to 1.5 of the melting point of the coating metal.
Since it can be heated twice as much, it is possible to generate glow discharge plasma without using a different gas such as At, resulting in a coating with high purity, fine texture, high adhesion, and controlled crystallinity. This has the advantage that a film can be obtained.

The ion plating method of the present invention can be applied to products obtained by metal vapor deposition and ion plating.

In addition, in the case where the ionization promotion cavity is made of ceramic in the present invention, the ceramic material is preferably a sintered body, a polycrystalline body, a single crystalline body, or an amorphous body, such as sapphire,
Quartz glass, glass, etc. are used.

EXAMPLES The results of applying the method of the present invention to aluminum ion plating will be described below.

The ionization promoting cavity is made of ceramic made of sapphire polycrystal, heated to 900°C, the M vapor pressure inside the cavity is set to about I Morr, stable high frequency glow discharge is realized, and a 5 μm thick film is applied to the F@NL alloy of the substrate. Ion plating method was performed.

When compared with simple vapor deposition, it was found that the pressure Kutzker test showed that it had about 10 times the lifespan and had the same Knoop hardness.

[Brief explanation of the drawing]

The drawing is a schematic diagram of an apparatus implementing the method of the invention. 1... Ionization promotion cavity 2... High frequency coil 3... Heater 4... Crucible 5... Substrate 6...
・・・Electron gun A・・・・・・Vacuum chamber

Claims (1)

[Claims] The ionization promoting cavity in the vacuum chamber is made of ceramic, and by heating the cavity to 1.2 to 1.5 times the melting point of the coated metal, the melting point of the coated metal is 10^-^5 to 10%.
A high vacuum ion plating method characterized in that the vapor pressure is set to 2 Torr and the vapor pressure is coated on a substrate by high frequency discharge.