JPS61107987A - Method for washing multi-stage flash evaporation apparatus - Google Patents

Method for washing multi-stage flash evaporation apparatus

Info

Publication number
JPS61107987A
JPS61107987A JP59226913A JP22691384A JPS61107987A JP S61107987 A JPS61107987 A JP S61107987A JP 59226913 A JP59226913 A JP 59226913A JP 22691384 A JP22691384 A JP 22691384A JP S61107987 A JPS61107987 A JP S61107987A
Authority
JP
Japan
Prior art keywords
recirculation
washing
cleaning
brine
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59226913A
Other languages
Japanese (ja)
Other versions
JPH0632814B2 (en
Inventor
Kazuhiro Matsumoto
和大 松本
Masahiro Kishi
正弘 岸
Kazuo Hattori
服部 一男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP59226913A priority Critical patent/JPH0632814B2/en
Publication of JPS61107987A publication Critical patent/JPS61107987A/en
Publication of JPH0632814B2 publication Critical patent/JPH0632814B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D3/00Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/06Flash distillation
    • B01D3/065Multiple-effect flash distillation (more than two traps)

Abstract

PURPOSE:To effectively perform washing, by intermittently performing heating in matching relation to the recirculation cycle of a recirculation washing solution and recirculating said recirculation washing solution partially having a high temp. part. CONSTITUTION:Each evaporation chamber 2 is partitioned into 20 several chambers by orifice parts 7. Upper shell/tube type condensers 1, through which brine or washing water is recirculated, are arranged in the evaporation chambers 2 and connected through water chambers to forma recirculation system through a recirculation pump 3 and a brine heater 4. Each evaporation chamber 2 is well balanced by differential pressure between stages corresponding to the flowing resistance of each orifice part 7 and freely moved up and down if the balance of liquid temp. difference is lost and, when the higher temp. liquid enters, the partial pressure thereof is lowered to more reduce the opening degree of the orifice part and gas is blown through to the next state to generate a blow-through phenomenon.

Description

【発明の詳細な説明】 〔本発明の産業分野〕 本発明は、多段フラッシュ蒸発装置(以下MS1PK装
置と略記する)、例えば、MSFE型海水淡水化装置の
運転停止・保管中の腐食防止や装置内部に付着する汚物
、スケール等を除去するMSFX装置の洗浄方法に関す
る。
Detailed Description of the Invention [Industrial Field of the Invention] The present invention is directed to prevention of corrosion during shutdown and storage of multi-stage flash evaporation equipment (hereinafter abbreviated as MS1PK equipment), for example, MSFE type seawater desalination equipment, and equipment. The present invention relates to a method for cleaning an MSFX device to remove dirt, scale, etc. that adhere to the inside.

〔背景技術〕[Background technology]

MSFK型海水淡水化装置の代表的な系統図を第1図に
示す、一般に、 M8FIlf型海水淡水化装置は、第
1図に示すように、上部に個々に凝縮器(を備えた多段
の蒸発室2からなるエバポレータ本体と、蒸発室2と凝
縮器10間にブラインを循環させる循環ポンプ3、循環
ブラインを外部ボイラなどからの蒸気で加熱するブライ
ンヒータ4、補給する海水を脱気する脱気器5、蒸発室
2を真空に引くエジェクター6などからなる。なお、7
はオリフィス部である。
A typical system diagram of the MSFK type seawater desalination equipment is shown in Figure 1.In general, the M8FIlf type seawater desalination equipment has a multi-stage evaporator system equipped with individual condensers (at the top) as shown in Figure 1. An evaporator body consisting of a chamber 2, a circulation pump 3 that circulates brine between the evaporation chamber 2 and a condenser 10, a brine heater 4 that heats the circulation brine with steam from an external boiler, etc., and a deaerator that deaerates the seawater to be replenished. It consists of a container 5, an ejector 6 that vacuums the evaporation chamber 2, etc.
is the orifice part.

エバポレータ本体は一般にステンレス/炭素鋼のクラツ
ド鋼や炭素鋼、凝縮器チューブは、キュープロニッケル
やチタン材等が使用されておシ、運転中は、海水は脱気
器5で脱気して供給され、蒸発室2では循環ブラインは
PH1lL5〜9.0で、真空でフラッシュ蒸発が行わ
れるため、溶存酸素10 PPI)以下になシ、装置の
腐食は殆んど問題ない。
The evaporator body is generally made of stainless steel/carbon steel or carbon steel, and the condenser tube is made of cupronickel or titanium. During operation, seawater is degassed by a deaerator 5 before being supplied. In the evaporation chamber 2, the circulating brine has a pH of 11L5 to 9.0, and flash evaporation is performed in vacuum, so as long as the dissolved oxygen is less than 10 PPI), there is almost no problem with corrosion of the equipment.

しかし、運転を停止し、装置内部が一旦大気にさらされ
ると、海水及び海水を濃縮した循環ブラインは腐食性が
大きくなシ、たとえこのブラインを液抜きしても、装置
内壁に付着した海塩粒子が腐食の原因とな)、停止期間
中に装置が腐食し、問題となっている。
However, once operation is stopped and the inside of the equipment is exposed to the atmosphere, seawater and circulating brine made from concentrated seawater become highly corrosive. (particles cause corrosion), equipment corrodes during outage periods, which is a problem.

〔従来の洗滌手段及びその欠点〕[Conventional cleaning means and their drawbacks]

したがって従来、MSF]!:型海水淡水化装置は液抜
きした後、(1)清水で内部をホース洗滌し、モツプ掛
けした夛、(2)或いは清水を張シ込んで循環する操作
を2〜3回繰夛返すなどの対策を行っている。しかし、
上記(1)の方法は現在、中近東で稼動中の大型実装置
では1基の大きさが長さ60m、巾20m、高さ4mで
内部が20数室に分かれてお)、洗滌、モツプ掛けに大
変な労力と費用がかかつている。又、(2)の方法は清
水を張シ込んだ深さの範囲までしか洗滌できず攪拌効果
も不充分で時間がかかシ、2〜5回張シ込みを繰シ返す
ため、大量の清水が必要などの問題がおる。
Therefore, conventionally, MSF]! : After draining the type seawater desalination equipment, (1) rinse the inside with fresh water with a hose and mop it up, (2) or fill it with fresh water and circulate it two or three times, etc. We are taking measures to prevent this. but,
Method (1) above is currently used in large-scale actual equipment currently in operation in the Middle East, where each unit has a length of 60 m, a width of 20 m, a height of 4 m, and is divided into over 20 rooms), cleaning, and motu. It takes a lot of effort and money to hang it. In addition, the method (2) can only clean up to the depth of the water that has been poured in, the stirring effect is insufficient, and it takes time. There are problems such as the need for fresh water.

〔本発明の目的〕 本発明は、 MBFE型海水淡水化装置のプラント動特
性と装置が備える機器を利用して、上記問題点を解決す
る効果的なM8FIC装置の洗滌方法を提供することを
目的とする。
[Object of the present invention] The purpose of the present invention is to provide an effective cleaning method for M8FIC equipment that solves the above problems by utilizing the plant dynamic characteristics of the MBFE type seawater desalination equipment and the equipment included in the equipment. shall be.

〔本発明の構成〕[Configuration of the present invention]

そして、本発明は、上記目的を達成する手段として、循
環洗浄液の循環周期に合せて断続的に加熱し、部分的に
高温部分を有する循環洗浄液を循環する点にある。すな
わち、本発明は、多段フラッシュ蒸発装置でブライン液
抜き後、洗浄水(清水壜ど)を張夛込んで循環し、温度
を上げてフラッシュ蒸発洗浄する方法において、循環洗
浄液の循環周期に合せて断続的に加熱し部分的に高温部
分を有する循環洗浄液を循環することによって装置内部
をフラッシュ蒸発洗浄することを特徴とする多段フラッ
シュ蒸発装置の洗浄方法である。
As a means for achieving the above object, the present invention resides in that the circulating cleaning liquid is heated intermittently in accordance with the circulation cycle of the circulating cleaning liquid and has a partially high temperature portion. That is, the present invention provides a method in which after removing brine liquid in a multi-stage flash evaporator, cleaning water (clean water bottle, etc.) is charged and circulated, the temperature is raised, and flash evaporation cleaning is performed. This method of cleaning a multi-stage flash evaporator is characterized in that the inside of the apparatus is flash evaporated cleaned by circulating a circulating cleaning liquid that is intermittently heated and has partially high-temperature parts.

先ず、プラント特性として、(a)MSF!!+型装置
は第1図に示すように、各蒸発室2はオリフィス部7で
仕切られ、20数室に分かれておシ、ブラインや洗滌水
が循環する上部の凝縮器1も各蒸発室2毎にシェル/チ
ューブ式の凝縮器1が設置され、それぞれ氷室を通して
連結され、循環ポンプ3とブラインヒータ4を介して循
環系を形成している。すなわち、この循環系は上下共、
非常に多室に区分されているため、循環系はピストンフ
ローに近い流動を示し、全体としての混合特性は悪い。
First, as a plant characteristic, (a) MSF! ! As shown in Figure 1, in the + type device, each evaporation chamber 2 is partitioned by an orifice section 7, and is divided into 20 or so chambers. A shell/tube type condenser 1 is installed in each, and each is connected through an ice chamber, forming a circulation system via a circulation pump 3 and a brine heater 4. In other words, this circulatory system has both upper and lower
Because it is divided into many chambers, the circulation system exhibits a flow similar to that of a piston, and the mixing characteristics as a whole are poor.

(b)次に各蒸発室2は、オリフィス部7の流動抵抗に
相当する段間差圧(=液レベル差+液温度相当分圧差、
すなわち各蒸発室2の液レベルを一様に保っている時は
股間差圧に相当する液温度差)でバランスしている。各
蒸発量2の液レベルは自由表面を形成しているため、上
記液温度差のバランスがくづれると自由に上下し、よシ
高い温度の液が入って来るとその分圧で押し下げられ、
オリフィスの開度より小さくなシ、ガスが次段に吹き抜
ける吹抜は現象を起す。
(b) Next, each evaporation chamber 2 has a pressure difference between stages corresponding to the flow resistance of the orifice portion 7 (=liquid level difference + partial pressure difference equivalent to liquid temperature,
That is, when the liquid level in each evaporation chamber 2 is kept uniform, the liquid temperature difference (corresponding to the crotch pressure difference) is balanced. The liquid level of each evaporation amount 2 forms a free surface, so if the balance of the liquid temperature difference is disrupted, it will rise and fall freely, and when a higher temperature liquid comes in, it will be pushed down by its partial pressure,
This phenomenon occurs when the opening of the orifice is smaller than that of the orifice, and the gas blows through to the next stage.

(C)次に蒸発室2での液のスプラッシュ状態は、単に
清水を張シ込んで循環洗滌する場合は、液のスプラッシ
ュは殆んど起きず液レベルよシ上部壁の洗滌は殆んど期
待できない。液温度が各段とも等しいのでオリフィス抵
抗分だけ前段の液位が順次高くな)、後段の上部は殆ん
ど洗滌できない。
(C) Next, regarding the liquid splash state in the evaporation chamber 2, if fresh water is simply poured in and circulated for cleaning, there will be almost no liquid splash, and the liquid level will be low, and the upper wall will hardly be washed. I can't wait. Since the liquid temperature is the same in each stage, the liquid level in the earlier stages is higher by the orifice resistance (the upper part of the latter stage can hardly be washed).

次に液温度を上げ真空フラッシュ蒸発を行うと各室一様
の液位を保つことができ、オリアイス上部で沸騰状態で
スズラッシュが飛散し、上部壁も一応洗滌できる。この
スプラッシュの飛散状態を第2図に基づいて説明すると
、第2図は凝縮器−蒸発室の一部拡大横断面図であ)、
オリフィス部7から沸騰状態で蒸発室2内にスズラッシ
ュが飛散することとなシ、凝縮器1の底外壁も一応洗浄
できるようになる。
Next, by raising the liquid temperature and performing vacuum flash evaporation, it is possible to maintain a uniform liquid level in each chamber, and the tin lash is scattered in a boiling state at the top of the oriice, making it possible to wash the upper wall as well. The scattering state of this splash will be explained based on Fig. 2. Fig. 2 is a partially enlarged cross-sectional view of the condenser-evaporation chamber).
The tin lash is not scattered in the boiling state from the orifice portion 7 into the evaporation chamber 2, and the bottom outer wall of the condenser 1 can also be cleaned.

更に前記吹き抜は現象を起すと、吹き抜けるガスが液を
同伴して吹き上げ蒸発室内に烈しいスプラッシュ状態を
生じ、上部壁の効果的な洗滌効果が期待できる。これを
第3図に基づいて説明すると、N3図は第2図と同様凝
縮器−蒸発室の一部拡大横断面図である。この第3図に
示すように、前記吹き抜はガスが液を同伴してオリアイ
ス部7から吹き上げ、蒸発室2内に烈しいスプラッシュ
状態が生ずるものである。
Furthermore, when the above-mentioned atrium causes a phenomenon, the gas blowing through blows up with the liquid and creates a violent splash condition inside the evaporation chamber, and an effective cleaning effect of the upper wall can be expected. This will be explained based on FIG. 3. FIG. N3 is a partially enlarged cross-sectional view of the condenser-evaporation chamber similar to FIG. 2. As shown in FIG. 3, the gas blows up from the orifice portion 7 along with the liquid, creating a severe splash condition in the evaporation chamber 2. As shown in FIG.

本発明は上記プラント特性を利用し、ブライン液抜き後
、清水を張シ込んで循環し、ブライン・ヒータに蒸気を
供給して循環液温度を上げ、真空フラッシュ蒸発が起る
状態にした後、ブライン・ヒータに供給する蒸気量を断
続的に多くし、−循環液の液温度が部分的に高い部分を
作る。
The present invention makes use of the above-mentioned plant characteristics, and after draining the brine, fresh water is pumped in and circulated, steam is supplied to the brine heater to raise the temperature of the circulating liquid, and after vacuum flash evaporation occurs, The amount of steam supplied to the brine heater is increased intermittently to create areas where the temperature of the circulating fluid is partially high.

一般にこの部分的高温部は液の循環によって、前後の液
と混合し、一様になる傾向があるが、MSIPy!、型
装置は上記プラント特性(a)で述べたようにピストン
フローであるため一様になシにくい特性があシ、更に液
循環の周期に合せて高温部に断続的に加熱を繰シ返すこ
とによって部分的高温部を保持することができる。この
高温部が流入する蒸発室は順次上記プラント特性(′b
)で述べた吹き抜は現象を起し、特性(d)の烈しいス
プラッシュで効果的な洗滌を行うことができる。
Generally, this partially high temperature area tends to mix with the liquid before and after it due to liquid circulation and become uniform, but MSIPy! As mentioned in the above plant characteristics (a), the mold device uses piston flow, so it has characteristics that are difficult to break uniformly.Furthermore, the high-temperature part is repeatedly heated intermittently in accordance with the cycle of liquid circulation. By this, it is possible to maintain a partially high temperature area. The evaporation chamber into which this high temperature part flows sequentially has the above plant characteristics ('b
) The atrium described in (d) causes the phenomenon, and the strong splash of characteristic (d) can perform effective cleaning.

なお、通常のフラッシュ蒸発状態で全体の液位を下げ、
吹き抜は現象を起すことはできるが、吹き抜は現象は不
安定で全体を一様に吹き抜は現象を起すのは難かしく、
上記のように上段から下段に向って順次吹き抜けを起す
方法が確実で効果的である。
In addition, lowering the overall liquid level under normal flash evaporation conditions,
It is possible to cause phenomena in an atrium, but the phenomena in an atrium are unstable, and it is difficult to cause a phenomenon in an atrium uniformly throughout the entire atrium.
As mentioned above, the method of creating the atrium sequentially from the upper tier to the lower tier is reliable and effective.

〔参考例−従来例〕[Reference example - conventional example]

この参考例で使用した装置は次のものである。 The equipment used in this reference example is as follows.

短管式M13IF11:型海水淡水化装置蒸発能カニ 
2 S、 OOOton / day装置寸法: 65
mLX 20mwX 4m1lI段  数:22段 上記装置を使用しての洗浄方法(従来法)は次のとおシ
である。
Short tube type M13IF11: type seawater desalination equipment evaporation capacity crab
2 S, OOOton/day Equipment dimensions: 65
mLX 20mwX 4mlI stages Number of stages: 22 The cleaning method (conventional method) using the above apparatus is as follows.

ブライン液抜き後、清水を張シ込み循環洗滌(第1回目
洗浄)し、この洗滌液を液抜きし、−再度清水を張シ込
みし循環洗滌(第2回目洗浄)した。この2回の循環洗
滌時の蒸発室初段入口の循環液の電導度を追跡した。
After draining the brine solution, clean water was poured in for circulation washing (first wash), this washing solution was drained, and fresh water was poured in again for circulation washing (second wash). The electrical conductivity of the circulating fluid at the first stage inlet of the evaporation chamber during these two cycles of cleaning was tracked.

この第1回目洗浄及び第2回目洗浄の電導度追跡結果を
第4図及び第5図に示す。この第4〜5図から明らかな
ように、ブライン液抜き後、装置内の液抜き困難なデッ
ドスペースに残ったブラインが洗滌水の循環と共に周期
的に高い電導度を示し、2〜3時間(3〜5回)の循環
で簡単に一様にはならない(即ち、洗滌できない)こと
を示している。これはまた、前述したように循環系がピ
ストン・フローに近い流動をしていることを示している
。また、装置内壁に付着していたCZ濃度は1ooc1
1当シ洗滌前5(111vに対し、上記2回目洗滌後は
1.219であった。
The conductivity tracking results of this first cleaning and second cleaning are shown in FIGS. 4 and 5. As is clear from FIGS. 4 and 5, after the brine solution is drained, the brine remaining in the dead space in the device from which it is difficult to drain shows high conductivity periodically as the washing water circulates, and for 2 to 3 hours ( This shows that even after 3 to 5 cycles of circulation, it cannot be easily uniformized (that is, it cannot be washed). This also indicates that the circulation system has a flow similar to that of a piston, as described above. In addition, the CZ concentration attached to the inner wall of the device was 10oc1.
5 (111v) before the 1st wash, and 1.219 after the 2nd washing.

洗滌液に浸されていない上部壁は45■で洗滌前と略同
じであった。
The upper wall, which was not immersed in the washing solution, had a thickness of 45 cm, which was approximately the same as before washing.

〔実施例一本発明の具体例〕 との実施例で使用する装置は、上記参考例で使用した装
置と同一であるが、洗浄方法としては、ブライン液抜き
後、清水を張シ込み、常温で2時間循環洗滌し、この洗
滌液を液抜きし、再度清水を張シ込み、循環・し、初段
液温度が70℃の真空フラッシュ蒸発状態まで昇温した
後、5〜8分間パルス加熱洗滌を行った。
[Example 1 Specific example of the present invention] The equipment used in this example is the same as the equipment used in the above-mentioned reference example, but the cleaning method was as follows: After draining the brine solution, clean water was poured in, and the equipment was left at room temperature. After circulating and washing for 2 hours, draining this washing solution, filling with clean water again, circulating, and raising the temperature of the first stage liquid to 70℃, a vacuum flash evaporation state, pulse heat washing for 5 to 8 minutes. I did it.

このパルス・フラッシュ洗滌時の電導度変化を第6図に
示す。第6図から明らかなように、電導度の経時変化は
従来法と大差はない。しかし装置内壁に付着していた洗
滌後のat濃度は液レベルの下部、上部共に100ad
当シ1w9以下で非常によく洗滌されていた。
FIG. 6 shows the change in conductivity during this pulse flash cleaning. As is clear from FIG. 6, the change in electrical conductivity over time is not much different from that of the conventional method. However, the concentration of AT after cleaning that had adhered to the inner wall of the device was 100 ad at both the lower and upper part of the liquid level.
This fish was under 1w9 and had been washed very well.

〔本発明の効果〕[Effects of the present invention]

本発明は、以上詳記したように、循環洗滌液の循環周期
に合せて断続的に加熱し、部分的に高温部分を有する循
環洗滌液を循環させる方法でア〕、このようにパルス・
フラッシュによシ装置内に烈しいスプラッシュ状態が生
じ、その結果、装置内部を十分に洗滌できる効果が生ず
るものである。このように本発明では、M8IFllX
装置の運転停止中及び保管中の腐食が完全に防止でき、
装置内部に付着する汚物、スケールなどを完全に除去で
きる顕著な効果が生ずるものである。
As described in detail above, the present invention is a method of heating the circulating cleaning solution intermittently in accordance with the circulation cycle of the circulating cleaning solution and circulating the circulating cleaning solution that partially has high temperature parts.
The flash creates a strong splash condition within the device, resulting in the effect of thoroughly cleaning the inside of the device. In this way, in the present invention, M8IFllX
Corrosion can be completely prevented while equipment is stopped and stored.
This has the remarkable effect of completely removing dirt, scale, etc. adhering to the inside of the device.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はMS11F1!i型造水装置の代表的な系統図
である。第2図及び第3図は凝縮器−蒸発室の一部拡大
横断面図であって、蒸発室内でのスプラッシュ状態を説
明するための図である。第4図及び第5図は従来法によ
る第1回目洗浄及び第2回目洗浄の電導度追跡結果を示
し、第6図は本発明によるパルス・フラッシュ洗浄時の
電導度変化を示す。 1・・・・・・・・・、凝  縮  器2・−・・・・
・・・蒸発室 3・・・・・・・・・循環ポンプ 4・・・・・・−・・ ブラインヒータ5−・・・・・
・・脱気器 6・・・・・・・・・ エジェクター 7・・・・・・・・・オリフィス部 復代理人   内 1)  明 復代理人   萩 原 亮 −
Figure 1 is MS11F1! It is a typical system diagram of an i-type freshwater generator. FIGS. 2 and 3 are partially enlarged cross-sectional views of the condenser-evaporation chamber, and are diagrams for explaining the splash state within the evaporation chamber. 4 and 5 show the conductivity tracking results of the first and second cleanings according to the conventional method, and FIG. 6 shows the conductivity changes during pulse flash cleaning according to the present invention. 1......, condenser 2...
...Evaporation chamber 3...Circulation pump 4...Brine heater 5...
... Deaerator 6 ... Ejector 7 ... ... Orifice Department Deputy Agent 1) Meifuku Agent Ryo Hagihara -

Claims (1)

【特許請求の範囲】[Claims] 多段フラッシュ蒸発装置でブライン液抜き後、洗浄水(
清水など)を張り込んで循環し、温度を上げてフラッシ
ュ蒸発洗浄する方法において、循環洗浄液の循環周期に
合せて断続的に加熱し、部分的に高温部分を有する循環
洗浄液を循環することによつて装置内部をフラッシュ蒸
発洗浄することを特徴とする多段フラッシュ蒸発装置の
洗浄方法。
After removing the brine solution using a multi-stage flash evaporator, wash water (
In the method of flash evaporation cleaning by filling and circulating fresh water (such as fresh water) and raising the temperature, the method is to heat the circulating cleaning solution intermittently in accordance with the circulation cycle of the circulating cleaning solution, and to circulate the circulating cleaning solution that has some high temperature parts. A method for cleaning a multi-stage flash evaporation device, characterized in that the inside of the device is cleaned by flash evaporation.
JP59226913A 1984-10-30 1984-10-30 Cleaning method for multi-stage flash evaporator Expired - Lifetime JPH0632814B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59226913A JPH0632814B2 (en) 1984-10-30 1984-10-30 Cleaning method for multi-stage flash evaporator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59226913A JPH0632814B2 (en) 1984-10-30 1984-10-30 Cleaning method for multi-stage flash evaporator

Publications (2)

Publication Number Publication Date
JPS61107987A true JPS61107987A (en) 1986-05-26
JPH0632814B2 JPH0632814B2 (en) 1994-05-02

Family

ID=16852561

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59226913A Expired - Lifetime JPH0632814B2 (en) 1984-10-30 1984-10-30 Cleaning method for multi-stage flash evaporator

Country Status (1)

Country Link
JP (1) JPH0632814B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5503683A (en) * 1994-06-27 1996-04-02 Ad/Vantage Inc. Fuel system cleaning apparatus
WO1997026093A1 (en) * 1994-06-27 1997-07-24 Ad/Vantage, Inc. Fuel system cleaning apparatus
US6498410B1 (en) 2000-03-28 2002-12-24 Ibiden Co., Ltd. Motor and pressure generating apparatus incorporating the motor
WO2006095397A1 (en) * 2005-03-07 2006-09-14 Hitachi Zosen Corporation Multi-stage flush type desalination system
WO2011135589A2 (en) * 2010-04-29 2011-11-03 Shree Renuka Sugars Limited Evaporation system

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5503683A (en) * 1994-06-27 1996-04-02 Ad/Vantage Inc. Fuel system cleaning apparatus
WO1997026093A1 (en) * 1994-06-27 1997-07-24 Ad/Vantage, Inc. Fuel system cleaning apparatus
US6498410B1 (en) 2000-03-28 2002-12-24 Ibiden Co., Ltd. Motor and pressure generating apparatus incorporating the motor
WO2006095397A1 (en) * 2005-03-07 2006-09-14 Hitachi Zosen Corporation Multi-stage flush type desalination system
WO2011135589A2 (en) * 2010-04-29 2011-11-03 Shree Renuka Sugars Limited Evaporation system
WO2011135589A3 (en) * 2010-04-29 2011-12-22 Shree Renuka Sugars Limited Evaporation system

Also Published As

Publication number Publication date
JPH0632814B2 (en) 1994-05-02

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