JPS6084816A - Spinner - Google Patents

Spinner

Info

Publication number
JPS6084816A
JPS6084816A JP19167483A JP19167483A JPS6084816A JP S6084816 A JPS6084816 A JP S6084816A JP 19167483 A JP19167483 A JP 19167483A JP 19167483 A JP19167483 A JP 19167483A JP S6084816 A JPS6084816 A JP S6084816A
Authority
JP
Grant status
Application
Patent type
Prior art keywords
substrate
wing
resist
resistance
air
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19167483A
Inventor
Nobuhiro Dobashi
Yosuke Fujita
Hideo Koseki
Nobuo Nakayama
Takao Toda
Yuuko Toyonaga
Mayumi Yoshida
Original Assignee
Matsushita Electric Ind Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • G03F7/162Coating on a rotating support, e.g. using a whirler or a spinner

Abstract

PURPOSE:To realize uniform coating of resist by providing a wing having the function to reduce the influence of air resistance applied on the photo resist on a substrate during rotation of substrate to a vacuum chuck for fixing the substrate. CONSTITUTION:A vacuum chuck 10 is provided with a wing 21 having the surface placed in the same plane as the surface of a substrate 1 while the substrate is loaded. In this case, the same plane of substrate is extended by the wing 21 and direct influence of air resistance on the substrate is reduced. Thereby, inuniformity of resist film thickness on the substrate can be prevented. In other way, flowing on the substrate can be rejected with the wind wall of the wing 22 for the flow disturbed by air resistance.
JP19167483A 1983-10-15 1983-10-15 Spinner Pending JPS6084816A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19167483A JPS6084816A (en) 1983-10-15 1983-10-15 Spinner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19167483A JPS6084816A (en) 1983-10-15 1983-10-15 Spinner

Publications (1)

Publication Number Publication Date
JPS6084816A true true JPS6084816A (en) 1985-05-14

Family

ID=16278565

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19167483A Pending JPS6084816A (en) 1983-10-15 1983-10-15 Spinner

Country Status (1)

Country Link
JP (1) JPS6084816A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2636546A1 (en) * 1988-09-15 1990-03-23 Sulzer Electro Tech Method and apparatus for uniformly regular application of a layer of resin on a substrate

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2636546A1 (en) * 1988-09-15 1990-03-23 Sulzer Electro Tech Method and apparatus for uniformly regular application of a layer of resin on a substrate
EP0363235A1 (en) * 1988-09-15 1990-04-11 Karl Suss Technique Process and apparatus for the uniform application of a resist layer to a substrate

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