JPS60257519A - 焼付装置 - Google Patents

焼付装置

Info

Publication number
JPS60257519A
JPS60257519A JP59113051A JP11305184A JPS60257519A JP S60257519 A JPS60257519 A JP S60257519A JP 59113051 A JP59113051 A JP 59113051A JP 11305184 A JP11305184 A JP 11305184A JP S60257519 A JPS60257519 A JP S60257519A
Authority
JP
Japan
Prior art keywords
wafer
wavelength
image forming
focus
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59113051A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0510813B2 (enEXAMPLES
Inventor
Haruna Kawashima
春名 川島
Akiyoshi Suzuki
章義 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59113051A priority Critical patent/JPS60257519A/ja
Publication of JPS60257519A publication Critical patent/JPS60257519A/ja
Publication of JPH0510813B2 publication Critical patent/JPH0510813B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59113051A 1984-06-04 1984-06-04 焼付装置 Granted JPS60257519A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59113051A JPS60257519A (ja) 1984-06-04 1984-06-04 焼付装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59113051A JPS60257519A (ja) 1984-06-04 1984-06-04 焼付装置

Publications (2)

Publication Number Publication Date
JPS60257519A true JPS60257519A (ja) 1985-12-19
JPH0510813B2 JPH0510813B2 (enEXAMPLES) 1993-02-10

Family

ID=14602249

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59113051A Granted JPS60257519A (ja) 1984-06-04 1984-06-04 焼付装置

Country Status (1)

Country Link
JP (1) JPS60257519A (enEXAMPLES)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6477123A (en) * 1987-06-17 1989-03-23 Hitachi Ltd Reduction stepper and exposure process
JPH0194618A (ja) * 1987-10-07 1989-04-13 Hitachi Ltd 縮小投影露光装置
US5095190A (en) * 1987-03-03 1992-03-10 Canon Kabushiki Kaisha Exposure apparatus

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5979527A (ja) * 1982-10-29 1984-05-08 Hitachi Ltd パタ−ン検出装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5979527A (ja) * 1982-10-29 1984-05-08 Hitachi Ltd パタ−ン検出装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5095190A (en) * 1987-03-03 1992-03-10 Canon Kabushiki Kaisha Exposure apparatus
JPS6477123A (en) * 1987-06-17 1989-03-23 Hitachi Ltd Reduction stepper and exposure process
JPH0194618A (ja) * 1987-10-07 1989-04-13 Hitachi Ltd 縮小投影露光装置

Also Published As

Publication number Publication date
JPH0510813B2 (enEXAMPLES) 1993-02-10

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term