JPS60247936A - Method for heat treatment - Google Patents

Method for heat treatment

Info

Publication number
JPS60247936A
JPS60247936A JP10557184A JP10557184A JPS60247936A JP S60247936 A JPS60247936 A JP S60247936A JP 10557184 A JP10557184 A JP 10557184A JP 10557184 A JP10557184 A JP 10557184A JP S60247936 A JPS60247936 A JP S60247936A
Authority
JP
Japan
Prior art keywords
heat
treated
heat treatment
started
brought
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10557184A
Other languages
Japanese (ja)
Other versions
JPH0543174B2 (en
Inventor
Hideyuki Teraoka
Tsutomu Takeuchi
Kenichi Terauchi
Hisao Nishizawa
Masakuni Ito
Kiyobumi Nishii
Atsushi Yasue
Mitsukazu Takahashi
Yasuyuki Wada
Original Assignee
Dainippon Screen Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Mfg Co Ltd filed Critical Dainippon Screen Mfg Co Ltd
Priority to JP10557184A priority Critical patent/JPH0543174B2/ja
Publication of JPS60247936A publication Critical patent/JPS60247936A/en
Publication of JPH0543174B2 publication Critical patent/JPH0543174B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE: To uniformly perform a heat treatment on each material to be heat- treated by a method wherein the inside of a furnace is preheated before the material to be heat-treated is brought in it, and the carrying-in of the material to be heat-treated is performed in the prescribed temperature range.
CONSTITUTION: Pertaining to the heat treatment device wherein the material to be heat-treated 11 is brought in a heating furnace 14 and said material 11 is heated up by a light source 15, the heating furnace 14 is preheated before the material to be heat-treated 11 is brought in the heating furnace 14. When the temperature in the furnace is raised to the prescribed temperature range, the carrying-in of the material to be heat-treated is started. A heat treatment is started based on the output program with which the input of the light source 15 is ontrolled when the furnance is heated up to the starting temperature of annealing or when the temperature is a little lower than the above. As a result, the non-uniformity of a heat treatment, which is performed when the material to be heat-treated is heat-treated continuously one by one or when the heat treatment is started again after it is once stopped, can be prevented.
COPYRIGHT: (C)1985,JPO&Japio
JP10557184A 1984-05-23 1984-05-23 Expired - Lifetime JPH0543174B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10557184A JPH0543174B2 (en) 1984-05-23 1984-05-23

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10557184A JPH0543174B2 (en) 1984-05-23 1984-05-23

Publications (2)

Publication Number Publication Date
JPS60247936A true JPS60247936A (en) 1985-12-07
JPH0543174B2 JPH0543174B2 (en) 1993-06-30

Family

ID=14411206

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10557184A Expired - Lifetime JPH0543174B2 (en) 1984-05-23 1984-05-23

Country Status (1)

Country Link
JP (1) JPH0543174B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE112011102676T5 (en) 2010-08-09 2013-06-27 Canon Anelva Corporation Substrate heat treatment apparatus, temperature control method for substrate heat treatment apparatus, semiconductor device manufacturing method, temperature control program for substrate heat treatment apparatus, and recording medium
CN106340451A (en) * 2015-07-06 2017-01-18 株式会社思可林集团 Heat treatment method and heat treatment apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE112011102676T5 (en) 2010-08-09 2013-06-27 Canon Anelva Corporation Substrate heat treatment apparatus, temperature control method for substrate heat treatment apparatus, semiconductor device manufacturing method, temperature control program for substrate heat treatment apparatus, and recording medium
US8691676B2 (en) 2010-08-09 2014-04-08 Canon Anelva Corporation Substrate heat treating apparatus, temperature control method of substrate heat treating apparatus, manufacturing method of semiconductor device, temperature control program of substrate heat treating apparatus, and recording medium
CN106340451A (en) * 2015-07-06 2017-01-18 株式会社思可林集团 Heat treatment method and heat treatment apparatus
JP2017017275A (en) * 2015-07-06 2017-01-19 株式会社Screenホールディングス Heat treatment method and heat treatment device
US10347512B2 (en) 2015-07-06 2019-07-09 SCREEN Holdings Co., Ltd. Method and apparatus for light-irradiation heat treatment

Also Published As

Publication number Publication date
JPH0543174B2 (en) 1993-06-30

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