JPS60247936A - Method for heat treatment - Google Patents
Method for heat treatmentInfo
- Publication number
- JPS60247936A JPS60247936A JP10557184A JP10557184A JPS60247936A JP S60247936 A JPS60247936 A JP S60247936A JP 10557184 A JP10557184 A JP 10557184A JP 10557184 A JP10557184 A JP 10557184A JP S60247936 A JPS60247936 A JP S60247936A
- Authority
- JP
- Japan
- Prior art keywords
- heat
- treated
- heat treatment
- started
- brought
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010438 heat treatment Methods 0.000 title abstract 9
- 238000000137 annealing Methods 0.000 abstract 1
Abstract
PURPOSE: To uniformly perform a heat treatment on each material to be heat- treated by a method wherein the inside of a furnace is preheated before the material to be heat-treated is brought in it, and the carrying-in of the material to be heat-treated is performed in the prescribed temperature range.
CONSTITUTION: Pertaining to the heat treatment device wherein the material to be heat-treated 11 is brought in a heating furnace 14 and said material 11 is heated up by a light source 15, the heating furnace 14 is preheated before the material to be heat-treated 11 is brought in the heating furnace 14. When the temperature in the furnace is raised to the prescribed temperature range, the carrying-in of the material to be heat-treated is started. A heat treatment is started based on the output program with which the input of the light source 15 is ontrolled when the furnance is heated up to the starting temperature of annealing or when the temperature is a little lower than the above. As a result, the non-uniformity of a heat treatment, which is performed when the material to be heat-treated is heat-treated continuously one by one or when the heat treatment is started again after it is once stopped, can be prevented.
COPYRIGHT: (C)1985,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10557184A JPH0543174B2 (en) | 1984-05-23 | 1984-05-23 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10557184A JPH0543174B2 (en) | 1984-05-23 | 1984-05-23 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60247936A true JPS60247936A (en) | 1985-12-07 |
JPH0543174B2 JPH0543174B2 (en) | 1993-06-30 |
Family
ID=14411206
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10557184A Expired - Lifetime JPH0543174B2 (en) | 1984-05-23 | 1984-05-23 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0543174B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE112011102676T5 (en) | 2010-08-09 | 2013-06-27 | Canon Anelva Corporation | Substrate heat treatment apparatus, temperature control method for substrate heat treatment apparatus, semiconductor device manufacturing method, temperature control program for substrate heat treatment apparatus, and recording medium |
CN106340451A (en) * | 2015-07-06 | 2017-01-18 | 株式会社思可林集团 | Heat treatment method and heat treatment apparatus |
-
1984
- 1984-05-23 JP JP10557184A patent/JPH0543174B2/ja not_active Expired - Lifetime
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE112011102676T5 (en) | 2010-08-09 | 2013-06-27 | Canon Anelva Corporation | Substrate heat treatment apparatus, temperature control method for substrate heat treatment apparatus, semiconductor device manufacturing method, temperature control program for substrate heat treatment apparatus, and recording medium |
US8691676B2 (en) | 2010-08-09 | 2014-04-08 | Canon Anelva Corporation | Substrate heat treating apparatus, temperature control method of substrate heat treating apparatus, manufacturing method of semiconductor device, temperature control program of substrate heat treating apparatus, and recording medium |
CN106340451A (en) * | 2015-07-06 | 2017-01-18 | 株式会社思可林集团 | Heat treatment method and heat treatment apparatus |
JP2017017275A (en) * | 2015-07-06 | 2017-01-19 | 株式会社Screenホールディングス | Heat treatment method and heat treatment device |
US10347512B2 (en) | 2015-07-06 | 2019-07-09 | SCREEN Holdings Co., Ltd. | Method and apparatus for light-irradiation heat treatment |
Also Published As
Publication number | Publication date |
---|---|
JPH0543174B2 (en) | 1993-06-30 |
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