JPS60211916A - Forming method of pattern - Google Patents

Abstract

PURPOSE:To enable the control of two-dimentional arrangement of a monomolecular film or a monomolecular accumulated film, by scanning the surface of a substrate by means of ion beams without the presence of an ambient gas so as to form a pattern of the monomolecular film or the monomolecular accumulated film, and by applying thereto ultrasonic vibrations thereafter. CONSTITUTION:A glass plate 1-1 being used as a substrate, for instance, the surface of the substrate is scanned by using Si ion beams, and thereby a layer 1-2 of depth 50Angstrom in which Si ions are injected is formed in the shape of a pattern. Next, a monomolecular accumulated film of arachidic acid is formed according to the LB method by using a chloroform solution of the arachidic acid. More concretely, first the substrate is sunk in the water, a film is developed, the substrate is then drawn up, and thereby said film is formed. When ultrasonic vibrations are applied thereto in water thereafter, the monomolecular film 1-2 is exfoliated, and a monomolecular film 1-4 remains only in the part of a layer 1-3 in which no ions are injected, in accordance with the pattern.

Description

DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to a novel pattern forming method. More specifically, the present invention relates to a method of forming a pattern of a monomolecular film or a monomolecular cumulative film on a substrate.

[Background Art] Conventionally, the use of materials in the semiconductor technology field and the optical technology field has mainly focused on inorganic materials that are relatively easy to handle. One reason for this is that technological progress in the field of organic chemistry has lagged significantly behind that in the field of inorganic materials.

However, recent technological advances in the field of organic chemistry have been remarkable, and it is said that the development of materials for inorganic substances has almost reached its limit. Therefore, there is a demand for the development of functional organic materials as new functional materials that surpass inorganic materials. The advantages of organic materials are that they are inexpensive, easy to manufacture, and highly functional. On the other hand, organic materials that have overcome heat resistance and mechanical strength, which have been thought to be inferior, have recently been created one after another. Under this technical background, integrated circuit devices such as logic elements, memory elements, photoelectric conversion elements, microlens arrays,
By replacing part or all of the functional parts (mainly thin film parts) of optical devices such as optical waveguides with conventional inorganic thin films,
The proposal to construct a structure using an organic thin film led to the creation of molecular electronic devices in which a single organic molecule has functions such as a logic element or memory element, and logic elements made of biologically related materials (e.g. bio-≠LAPS). Several research institutes have recently announced proposals to reduce the risk of cancer.

Thin films used to create the above various devices/heights using such organic materials are prepared using the known single molecule accumulation method, namely the Langmuir-Prodgett method (LB method) (New Experimental Chemistry Course 1).
Volume 8, pages 498 to 507 (round neck).

In the LB method, for example, in a molecule with a structure that has a parent wood group and a hydrophobic group in the molecule, when the balance between the two (balance of amphiphilicity) is maintained appropriately, the molecule is placed with the parent wood group below at the water surface. This is a method of creating a monomolecular film or a cumulative film of monomolecular layers by utilizing the fact that the film becomes a monomolecular layer.

By the way, in order to provide various functions such as photoconductivity to such a monomolecular film or a monomolecular cumulative film and to create various devices as described above, it is necessary to It is necessary to control the physical placement. However, in the above method, a monomolecular film or a monomolecular cumulative film is formed on the entire surface of the substrate, so two-dimensional patterning of a monomolecular film or a monomolecular cumulative film requires the use of special light and marking properties. There is a drawback that it cannot be controlled except in the case of photoresists applied to phosphorography, that is, except in cases where the molecules constituting the monomolecular film or the monomolecular cumulative film have properties as a photoresist.

[Disclosure of the Invention] An object of the present invention is to provide a novel pattern forming method that can control the two-dimensional arrangement of a monomolecular film or a monomolecular cumulative film.

The object of the present invention is achieved by the following pattern forming method.

That is, it is achieved by a pattern forming method characterized by scanning an ion dome over at least the base surface in the absence of atmospheric gas to form a pattern of a monomolecular film or a monomolecular cumulative film, and then applying ultrasonic vibration. Ru.

In the present invention, the underlying surface is modified by scanning with an ion beam. Here, the base refers to a member on which a monomolecular film or a monomolecular cumulative film is laminated according to a predetermined pattern. Such members include, for example, glass used in the various semiconductor devices mentioned above, 5i
A substrate made of an inorganic material such as 02, a substrate made of an organic material such as polyethylene, polyethylene terephthalate, or polyimide, a substrate made of a metal such as AI, Ta, W, In, Cu, or an alloy thereof, etc. various layers (formed according to predetermined patterns), such as evaporated metal films such as A1, Ta, W, In, Cu, amorphous, polycrystalline or single crystal semiconductor films such as silicon and germanium, 5n02, 'I T.O.
(In2035nO2) conductive oxide glass film,
Examples include molecular amorphous semiconductor films such as. Further, such a substrate, a film, or a portion where a monomolecular film, a monomolecular cumulative film, or the like is further laminated on the substrate on which the film is laminated can also be used.

Particularly preferably, an amorphous, polycrystalline or single crystal semiconductor of glass, polyimide, AI, silicon
, a base coated with M layers of a monomolecular film or a monomolecular accumulation, etc., and the like.

Since the ion beam used in the present invention is focused and has a short wavelength, it is possible to form a pattern at a density of several tens to several tens of OA. In order to modify the surface with an ion beam, energy of 10 joules/cm2 to 5 x 104 joules/0 m2 is required.

Surface modification using an ion beam is performed, for example, as follows. In the case of silicon, monomolecular films, monomolecular cumulative films, etc., when scanned with an ion beam of oxygen, Ga, In, etc., a composition change occurs due to the implanted ions, and the surface changes from hydrophobic to hydrophilic. do. Also, glass,
In the case of quartz, scanning with an ion beam of Si etc.
Some of the 5i-0 pounds are replaced by implanted ions,
The surface changes from hydrophilic to hydrophobic due to the introduction of implanted ions between i and 0 pounds. Or even if the amphiphilicity is not reversed, the parentness becomes stronger,
It becomes more hydrophobic. In addition, the surface can be modified by scraping the surface with ions or by utilizing differences in surface reactivity caused by ions applied to the surface. Patterning is performed by modifying the base surface as described above, and a monomolecular film or a monomolecular cumulative film is formed on the base according to the formed pattern.

Applying ultrasonic vibration after a monomolecular film or a monomolecular cumulative film is formed on a substrate is particularly effective when intermolecular forces are large and the film is close to a solid film or when the film is thin. That is, fine patterning becomes possible by applying ultrasonic vibration.

Further, it becomes possible to form a clear pattern. Applying ultrasonic vibrations has the advantage that it not only takes less time than providing a separate etching process, but also prevents incomplete etching. Furthermore, the range of material selection is hardly restricted.

Note that the molecules constituting the monomolecular film or monomolecular cumulative film in the present invention can be broadly used as long as they have a hydrophobic part and a hydrophilic part in the molecule.

The most typical component of the hydrophobic portion of such molecules is an alkyl group, which has 5 to 30 carbon atoms. Preferably, a linear or branched chain having 10 to 25 carbon atoms can be used. In addition to the above-mentioned alkyl groups, examples of groups constituting the hydrophobic moiety include olefinic hydrocarbon groups such as vinylene, vinylidene, and acetylene, condensed polycyclic phenyl groups such as phenyl, naphthyl, and anthranyl, biphenyl, and terphenyl. Examples include hydrophobic groups such as a chain polycyclic phenyl group. Each of these, alone or in combination, constitutes the hydrophobic portion of the molecule and is located at the end or in the middle of the molecule.

On the other hand, the most typical constituent elements of the wood-philic moiety are, for example, carboxyl groups and their metal salts and amine salts, sulfonic acid groups and their metal salts and amine salts, sulfonamide groups, amide groups, amino groups, imino group, a hydroxyl group, a quaternary amine group, an oxyamino group, an oxyimino group, a diazonium group, a guanidine group, a hydrazine group, a phosphoric acid group, a silicate group, an aluminate group, and the like. These also constitute the woody part of the above molecule either alone or in combination, and are located at the ends or in the middle of the molecule.

Here, having a woody group and a hydrophobic group in a molecule means, for example, that a molecule has both one woody group and a hydrophobic group as described above, or one in a molecule. When the above lignophilic groups and hydrophobic groups are present, one part in the overall structure of the molecule is hydrophilic in relation to other parts, and the latter part is hydrophobic in relation to the former part. It means having a sexual relationship.

The molecules constituting the monomolecular film or monomolecular cumulative film in the present invention are desired to have the following functionality.

■ Parts that carry the desired functionality, i.e., functional parts (for example, π
Molecules that have strong xylemophilicity (or strong hydrophobicity) at the same time (electronic system), or molecules in which the functional moiety does not have particular hydrophilicity or hydrophobicity, such as xylemophilic groups, hydrophobic groups, etc. By introducing a molecule that has a lignophilic part and a hydrophobic part in the molecule, for example, a molecule in which the functional part is on the side of the hydrophilic part, for example,
Those in which the functional moiety is on the side of the hydrophobic moiety, such as long-chain alkyl-substituted merocyanine dyes with photoconductivity, for example,
Products with a long-chain alkyl carboxylic acid bonded to pyrene, etc. Products with a 9-functional part located near the center, that is, between a hydrophobic part and a hydrophilic part, such as anthracene derivatives, derivatives of diazo dyes, etc. 20-functional products Specific examples include those that do not have a sexual moiety and are made only of a hydrophobic moiety and a woody moiety, such as long-chain saturated fatty acids such as stearic acid and alaxic acid.

Particularly preferred are long-chain alkyl-substituted merocyanine dyes, anthracene derivatives, stearic acid, and the like.

EXAMPLES In order to explain the present invention more specifically, Examples are shown below.

Example 1 A pattern was formed by the method shown in FIG.

The base is a glass substrate 1-1, and the surface is exposed to a Si ion beam (concentration I x 1015/cm, acceleration voltage 50
keV) to form a patterned layer 1-2 into which Si ions were implanted to a depth of 50 Å.

Next, a solution of araxic acid in chloroform 5 x 10-
A monomolecular cumulative film of araxic acid was formed by the LB method using 3mol I/l. For a monomolecular film of araxic acid, the base is first submerged in water, and after the film is expanded,
Surface pressure 45 dyne/cm, pulling speed I C
It was formed at 11/min. Next, output 100W underwater
1 in about 3 minutes by applying ultrasonic vibration using an ultrasonic device.
The monomolecular film of -2 is peeled off, and only the non-ion-implanted layer 1-3 is covered with monomolecular It! according to the pattern as shown in FIG. 1(c). 1-4 remained.

As described above, by modifying the base with an ion beam, it is possible to form a monomolecular film or a monomolecular cumulative film in a pattern on the surface of the base.

Fine patterns can be formed by focusing the ion beam. Therefore, application to S1 integrated circuits is also possible. In addition, by changing the intensity of the ion beam, the adhesion force of the monomolecular film or monomolecular cumulative film to the underlying surface can be changed, and at the same time, the parent part and hydrophobic part can be used as constituent molecules of the monomolecular film or monomolecular cumulative film. By using molecules with different strengths,
A two-dimensional arrangement of various molecules is also possible. Moreover, by combining these, it is also possible to manufacture devices with complicated three-dimensional structures.

[Brief explanation of the drawing]

Figure $1 shows an embodiment of the pattern forming method of the present invention. 1-1...Glass substrate 1-2...Si ion implantation layer 1-3...S1 ion non-implantation layer

Claims (1)

[Claims] 1. A pattern forming method comprising scanning at least a base surface with an ion beam in the absence of an atmospheric gas to form a pattern of a monomolecular film or a monomolecular cumulative film, and then applying ultrasonic vibration.