JPS60203939A - Ｘ線感応性レジストを用いる微細加工法 - Google Patents

Ｘ線感応性レジストを用いる微細加工法

Info

Publication number
JPS60203939A
JPS60203939A JP59064352A JP6435284A JPS60203939A JP S60203939 A JPS60203939 A JP S60203939A JP 59064352 A JP59064352 A JP 59064352A JP 6435284 A JP6435284 A JP 6435284A JP S60203939 A JPS60203939 A JP S60203939A
Authority
JP
Japan
Prior art keywords
resist
sensitivity
rays
ray
chlorination rate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59064352A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0310297B2 (https=
Inventor
Nobuyuki Yoshioka
信行 吉岡
Yoshiki Suzuki
鈴木　淑希
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP59064352A priority Critical patent/JPS60203939A/ja
Publication of JPS60203939A publication Critical patent/JPS60203939A/ja
Publication of JPH0310297B2 publication Critical patent/JPH0310297B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59064352A 1984-03-28 1984-03-28 Ｘ線感応性レジストを用いる微細加工法 Granted JPS60203939A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59064352A JPS60203939A (ja) 1984-03-28 1984-03-28 Ｘ線感応性レジストを用いる微細加工法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59064352A JPS60203939A (ja) 1984-03-28 1984-03-28 Ｘ線感応性レジストを用いる微細加工法

Publications (2)

Publication Number Publication Date
JPS60203939A true JPS60203939A (ja) 1985-10-15
JPH0310297B2 JPH0310297B2 (https=) 1991-02-13

Family

ID=13255766

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59064352A Granted JPS60203939A (ja) 1984-03-28 1984-03-28 Ｘ線感応性レジストを用いる微細加工法

Country Status (1)

Country Link
JP (1) JPS60203939A (https=)

Also Published As

Publication number Publication date
JPH0310297B2 (https=) 1991-02-13

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term