JPS60200965A - アモルフアス炭化けい素薄膜の製造方法 - Google Patents

アモルフアス炭化けい素薄膜の製造方法

Info

Publication number
JPS60200965A
JPS60200965A JP59055887A JP5588784A JPS60200965A JP S60200965 A JPS60200965 A JP S60200965A JP 59055887 A JP59055887 A JP 59055887A JP 5588784 A JP5588784 A JP 5588784A JP S60200965 A JPS60200965 A JP S60200965A
Authority
JP
Japan
Prior art keywords
thin film
gas
amorphous silicon
silicon carbide
mercury
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59055887A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6261110B2 (enrdf_load_stackoverflow
Inventor
Kiyoshi Takahashi
清 高橋
Makoto Konagai
誠 小長井
Minoru Takamizawa
高見沢　稔
Tatsuhiko Motomiya
本宮　達彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP59055887A priority Critical patent/JPS60200965A/ja
Publication of JPS60200965A publication Critical patent/JPS60200965A/ja
Publication of JPS6261110B2 publication Critical patent/JPS6261110B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C23C16/325—Silicon carbide

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photovoltaic Devices (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Chemical Vapour Deposition (AREA)
JP59055887A 1984-03-23 1984-03-23 アモルフアス炭化けい素薄膜の製造方法 Granted JPS60200965A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59055887A JPS60200965A (ja) 1984-03-23 1984-03-23 アモルフアス炭化けい素薄膜の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59055887A JPS60200965A (ja) 1984-03-23 1984-03-23 アモルフアス炭化けい素薄膜の製造方法

Publications (2)

Publication Number Publication Date
JPS60200965A true JPS60200965A (ja) 1985-10-11
JPS6261110B2 JPS6261110B2 (enrdf_load_stackoverflow) 1987-12-19

Family

ID=13011612

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59055887A Granted JPS60200965A (ja) 1984-03-23 1984-03-23 アモルフアス炭化けい素薄膜の製造方法

Country Status (1)

Country Link
JP (1) JPS60200965A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62273767A (ja) * 1986-05-21 1987-11-27 Toshiba Corp 固体撮像装置の製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62273767A (ja) * 1986-05-21 1987-11-27 Toshiba Corp 固体撮像装置の製造方法

Also Published As

Publication number Publication date
JPS6261110B2 (enrdf_load_stackoverflow) 1987-12-19

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