JPS60186845A - Aligning device of exposure device - Google Patents

Aligning device of exposure device

Info

Publication number
JPS60186845A
JPS60186845A JP59042472A JP4247284A JPS60186845A JP S60186845 A JPS60186845 A JP S60186845A JP 59042472 A JP59042472 A JP 59042472A JP 4247284 A JP4247284 A JP 4247284A JP S60186845 A JPS60186845 A JP S60186845A
Authority
JP
Japan
Prior art keywords
wafer
reticle
alignment
mark
main body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59042472A
Other languages
Japanese (ja)
Other versions
JPH0616479B2 (en
Inventor
Kyoichi Suwa
Toshio Matsuura
Shoichi Tanimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Priority to JP59042472A priority Critical patent/JPH0616479B2/en
Priority claimed from US06/705,699 external-priority patent/US4699515A/en
Publication of JPS60186845A publication Critical patent/JPS60186845A/en
Publication of JPH0616479B2 publication Critical patent/JPH0616479B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Abstract

PURPOSE:To improve the superposing accuracy of a pattern transferred onto a substrate to be exposed, by correcting both reticle rotation and chip rotation. CONSTITUTION:Two reticle alignment microscopes 16 and 17 are provided to align a reticle R with the main body of an exposure device. Moreover, two laser step alignment systems 18 and 19 are provided to detect a prescribed mark on a wafer W with a laser light by a through-the-lens system and make the alignment between the wafer W and main body of the device. A die-by-die alignment system 20 observes the mark Rs on the reticle R and the mark on the wafer W under a superposed condition. In addition to the above, two wafer alignment microscopes of an off-axis system are provided at prescribed intervals from a projecting lens 1.
JP59042472A 1984-03-06 1984-03-06 Positioning device for exposure equipment Expired - Lifetime JPH0616479B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59042472A JPH0616479B2 (en) 1984-03-06 1984-03-06 Positioning device for exposure equipment

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP59042472A JPH0616479B2 (en) 1984-03-06 1984-03-06 Positioning device for exposure equipment
US06/705,699 US4699515A (en) 1984-02-28 1985-02-26 Process of transfer of mask pattern onto substrate and apparatus for alignment therebetween

Publications (2)

Publication Number Publication Date
JPS60186845A true JPS60186845A (en) 1985-09-24
JPH0616479B2 JPH0616479B2 (en) 1994-03-02

Family

ID=12637005

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59042472A Expired - Lifetime JPH0616479B2 (en) 1984-03-06 1984-03-06 Positioning device for exposure equipment

Country Status (1)

Country Link
JP (1) JPH0616479B2 (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62122126A (en) * 1985-11-21 1987-06-03 Toshiba Corp Exposure method
JPS62277503A (en) * 1986-05-27 1987-12-02 Canon Inc Method and device for positioning
JPS62277504A (en) * 1986-05-27 1987-12-02 Canon Inc Positioning device
JPS62293718A (en) * 1986-06-13 1987-12-21 Canon Inc Exposure device
JPS63132425A (en) * 1986-07-14 1988-06-04 Oki Electric Ind Co Ltd Correction of reduction aligner
US5227838A (en) * 1990-01-18 1993-07-13 Matsushita Electric Industrial Co., Ltd. Exposure system
JPH08195346A (en) * 1995-10-09 1996-07-30 Toshiba Corp Exposure method
JPH08213311A (en) * 1995-10-09 1996-08-20 Toshiba Corp Exposure device
US6341006B1 (en) 1995-04-07 2002-01-22 Nikon Corporation Projection exposure apparatus
JP2012060119A (en) * 2010-09-08 2012-03-22 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and method of applying pattern to substrate

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0685385B2 (en) * 1985-11-21 1994-10-26 株式会社東芝 Exposure method
JPS62122126A (en) * 1985-11-21 1987-06-03 Toshiba Corp Exposure method
JPS62277503A (en) * 1986-05-27 1987-12-02 Canon Inc Method and device for positioning
JPS62277504A (en) * 1986-05-27 1987-12-02 Canon Inc Positioning device
JPS62293718A (en) * 1986-06-13 1987-12-21 Canon Inc Exposure device
JPH0235447B2 (en) * 1986-06-13 1990-08-10 Canon Kk
JPS63132425A (en) * 1986-07-14 1988-06-04 Oki Electric Ind Co Ltd Correction of reduction aligner
US5227838A (en) * 1990-01-18 1993-07-13 Matsushita Electric Industrial Co., Ltd. Exposure system
US6341006B1 (en) 1995-04-07 2002-01-22 Nikon Corporation Projection exposure apparatus
JPH08195346A (en) * 1995-10-09 1996-07-30 Toshiba Corp Exposure method
JPH08213311A (en) * 1995-10-09 1996-08-20 Toshiba Corp Exposure device
JP2012060119A (en) * 2010-09-08 2012-03-22 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and method of applying pattern to substrate
US8570487B2 (en) 2010-09-08 2013-10-29 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrate
US8610898B2 (en) 2010-09-08 2013-12-17 Asml Netherlands B.V. Self-referencing interferometer, alignment system, and lithographic apparatus

Also Published As

Publication number Publication date
JPH0616479B2 (en) 1994-03-02

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term