JPS60170176A - Connecting structure with transparent conductive film - Google Patents

Connecting structure with transparent conductive film

Info

Publication number
JPS60170176A
JPS60170176A JP59023882A JP2388284A JPS60170176A JP S60170176 A JPS60170176 A JP S60170176A JP 59023882 A JP59023882 A JP 59023882A JP 2388284 A JP2388284 A JP 2388284A JP S60170176 A JPS60170176 A JP S60170176A
Authority
JP
Japan
Prior art keywords
conductive film
conductive
transparent conductive
metal particles
turns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP59023882A
Other languages
Japanese (ja)
Inventor
良夫 藤原
尚武 小林
松原 裕一
尚 安藤
沼尾 秀裕
和明 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP59023882A priority Critical patent/JPS60170176A/en
Priority to AU36909/84A priority patent/AU572615B2/en
Priority to CA000470624A priority patent/CA1227579A/en
Priority to EP84116388A priority patent/EP0147856B1/en
Priority to AT84116388T priority patent/ATE67630T1/en
Priority to DE8484116388T priority patent/DE3485085D1/en
Priority to KR1019850000148A priority patent/KR930004858B1/en
Publication of JPS60170176A publication Critical patent/JPS60170176A/en
Priority to US07/061,608 priority patent/US4735847A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F17/00Digital computing or data processing equipment or methods, specially adapted for specific functions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/28Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L2224/29Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • H01L2224/29001Core members of the layer connector
    • H01L2224/29099Material
    • H01L2224/29198Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
    • H01L2224/29298Fillers
    • H01L2224/29299Base material
    • H01L2224/293Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、例えば液晶表示装置に用いられて好適な透明
導電膜との接続構造体に係わる。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a connection structure with a transparent conductive film suitable for use in, for example, a liquid crystal display device.

背景技術とその問題点 例えば液晶表示装置において、透明基板上に密に配列形
成された酸化錫、或いはインジュウム及び錫の複合酸化
物等の酸化物透明導電膜よりなる多数のストライゾ状の
透明電極ノeターンに対し、夫々対応する外部リードを
接続導出するに当って、これら外部リードを他の基板例
えばフレキシブル基板上に導電膜よりなる導電パターン
として形成し、これら導電ノやターンと透明電極ノやタ
ーンとを互いに電気的に連結して外部リードの導出を行
うことが望まれる。
Background Art and Problems Therein, for example, in a liquid crystal display device, a large number of strizoid transparent electrodes made of a transparent conductive film of an oxide such as tin oxide or a composite oxide of indium and tin are formed in a dense array on a transparent substrate. When connecting and leading out the corresponding external leads to the e-turns, these external leads are formed as a conductive pattern made of a conductive film on another substrate, for example, a flexible substrate, and these conductive holes and turns are connected to transparent electrodes. It is desirable to electrically connect the turns to each other to lead out external leads.

このような透明電標ハターンと他の導電ノ4?ターンと
の接続は、通常一般には例えば金線等によるいわゆるワ
イヤーデンディングやはんだディングを伴うはんだ付は
法によっている。
Transparent electric sign Hatan and other conductive No. 4 like this? Connections with turns are generally made using so-called wire endings using, for example, gold wire, or soldering that involves soldering, according to the law.

しかしながらこのような金線によるワイヤービンディン
グは、ワイヤー自体が高価格であることと、一括した接
続が行えないことによって接続作業が繁雑でコスト高を
招来し、また多数の接続部の狭ピッチ化によってワイヤ
ー相互の接触、或いはボンディング部を幅狭とすること
による接続強度及び接続部相互の短絡等信頼性にも問題
が生じる。
However, with wire binding using gold wire, the wire itself is expensive, the connection work is complicated and costly because it cannot be connected all at once, and the narrow pitch of the many connections makes it difficult to connect. Problems also arise in reliability, such as contact between wires or narrow bonding portions, resulting in connection strength and short circuits between the bonding portions.

またはんだディラグによる場合、接続部♂ツチの狭隘化
によって接続部相互にはんだの流れが生じ短絡等の事故
を招来する等、同様に信頼性に問題が生じる。
In the case of solder dilag, the narrowing of the joints causes solder to flow between the joints, leading to accidents such as short circuits, and similar reliability problems arise.

また他の方法としてはいわゆるゼブラコネクタ−による
接続法もあるが、ゼブラコネクタ−自体に機械的に固定
する機能がなく、所定の幅を一定の加圧力で保持するの
が困難であるという欠点がある。
Another method is to connect using a so-called zebra connector, but the zebra connector itself does not have a mechanical fixing function and has the disadvantage that it is difficult to maintain a specified width with a constant pressure force. be.

また、カーピンファイバー入りの導電性熱溶融、型接着
剤と、絶縁性熱溶融型接着剤を交互に筋塗りした接着剤
層を導電パターンとこれに対する導電体との接続部に介
在させる接続も行った。ところがこの場合筋塗りの幅を
狭くするには限界があ一す、狭ピッチの電極ノ?ターン
に対する接続には適さず、また製造が極めて繁雑となる
欠点がある。
In addition, a connection can be made in which an adhesive layer consisting of a conductive heat-melt type adhesive containing carpin fibers and an insulating heat-melt type adhesive are alternately applied in streaks at the connection between the conductive pattern and the conductor. went. However, in this case, there is a limit to narrowing the width of the streaks, because of narrow pitch electrodes. It has the drawback that it is not suitable for connecting to turns and is extremely complicated to manufacture.

また導電ノ母ターンの相互の他の接続方法としては、特
公昭47−2223号公報に開示された接続方法がある
。これは、熱可塑性の接着剤を介して配線パターンを基
板上に形成し、2枚の基板を加熱圧着することによって
接着剤を溶かして両基板の接合を行うものである。とこ
ろがこの場合、その接着剤を熱によって溶かした時、導
電パターンが移動してしまって隣り合う・やターン間の
短絡を生じる等の信頼性に問題がありA’ターンの微細
稠密化を充分に図ることができないという欠点がある。
Another method for connecting conductive mother turns to each other is disclosed in Japanese Patent Publication No. 47-2223. In this method, a wiring pattern is formed on a substrate via a thermoplastic adhesive, and two substrates are bonded under heat and pressure to melt the adhesive and join the two substrates together. However, in this case, when the adhesive is melted by heat, the conductive pattern moves and short circuits occur between adjacent turns or between turns. The disadvantage is that it cannot be measured.

また互いに接続すべき導電パターンの接続を異方性連結
シートをもって行うことが特願昭55−41330号出
願によって提案された。この異方性連結シートは、絶縁
性接着剤にカービン繊維等の繊維状導電体を配向分散さ
せたシート状体よシなシ、これを例えば透明基板上の透
明電極・ぐターンと、これに接続すべき対応する外部リ
ードとなるフレキシブル基板上の導電・やターンとの互
いの接続部を重ね合せた状態で、これらパターンの延長
方向に繊維状導電体の配向方向を沿わせて内基板間に挾
み込み、加圧加熱することによって接着剤によって両基
板及び互いに重ね合せられた導電ノeターン間の機械的
接合を行うと共に両パターン間が互いに圧着されること
によって両パターンに繊維状導電体が直接的に接触する
ように挟着されて両パターンの電気的接続を行うように
なすものである。
Further, it was proposed in Japanese Patent Application No. 41330/1983 that conductive patterns to be connected to each other be connected using an anisotropic connecting sheet. This anisotropic connection sheet is a sheet-like material in which a fibrous conductor such as carbine fiber is oriented and dispersed in an insulating adhesive, and this is attached to a transparent electrode or a pattern on a transparent substrate. With the connecting parts of the conductive wires and turns on the flexible substrate that will be the corresponding external leads to be connected overlapped, the direction of orientation of the fibrous conductor is aligned with the extension direction of these patterns, and the connection is made between the inner substrates. By pressing and heating the adhesive, the two substrates and the conductive turns stacked on each other are mechanically bonded, and the two patterns are pressed together to form a fibrous conductive layer in both patterns. The two patterns are sandwiched so that their bodies are in direct contact with each other to establish an electrical connection between the two patterns.

この場合、繊維状導電体は、相互に接着剤によって電気
的に絶縁されるので隣り合うツクターン間の間隔より導
電体の径を充分小に選定しておくことによって、またこ
の繊維状導電体の長さを特定しておくことによって隣り
合う接続部間が相互に電気的に連結されることが回避さ
れ、しかも両/4’ターンは、内基板間が接着剤によっ
て機械的に強固に接着されていることによって電気的に
安定に接′続されるものである。このような異方性連結
シートを用いる場合隣り合う電極パターン間に短絡を生
じさせることなく多数配列された電極ノやターンに対し
同時に外部リードとしての導電ノ+ターンの接続を行う
ことができるので量産性に優れた接続構造体を得ること
ができるという利点を有する。
In this case, since the fibrous conductors are electrically insulated from each other by the adhesive, it is possible to By specifying the length, it is possible to avoid mutual electrical connection between adjacent connection parts, and in addition, both 4' turns are mechanically firmly bonded between the inner boards with adhesive. This ensures a stable electrical connection. When using such an anisotropic connection sheet, it is possible to simultaneously connect conductive wires and turns as external leads to a large number of arranged electrodes and turns without causing short circuits between adjacent electrode patterns. It has the advantage that a connected structure with excellent mass productivity can be obtained.

しかしながらこの場合、両パターンの接続は、例えば比
較的電気抵抗の大きいカー?ン繊維導電体の接触によっ
て行われるために各接続部における導通抵抗が比較的大
きい〇 発明の目的 本発明は、上述した諸欠点を解消し、多数の狭ピッチに
配列された酸化物透明導電膜よりなる透明電極パターン
に対して、例えば外部リードとしての導電膜よりなる導
電ノ4ターンを夫に電気的及び機械的に確実に接続連結
することができるようにした透明導電膜との接続構造体
を提供するものである。
However, in this case, the connection between both patterns is, for example, a car connection with relatively high electrical resistance. The conduction resistance at each connection part is relatively high because the connection is made by contacting the fiber conductors.Object of the InventionThe present invention solves the above-mentioned drawbacks, and provides a method for forming a large number of oxide transparent conductive films arranged at narrow pitches. A connection structure with a transparent conductive film that enables reliable electrical and mechanical connection of four conductive turns made of a conductive film as an external lead to a transparent electrode pattern made of a transparent electrode pattern. It provides:

発明の概要 本発明においては、酸化物透明導電膜と、これに接続さ
れる導電膜との互いの接続部が重ね合せられ、この重ね
合せ部に、Pb−8nを母合金としてこれにZn、希土
類金属のうちの少くとも1種類以上の金属を配合した金
属粒子を分散させた絶縁性接着剤層が介在され、この接
着剤層が酸化物透明導電膜と、導電膜との間において加
圧加熱されて、酸化物透明導電膜とこれに対応する導電
膜とが金属粒子の溶融によって電気的に接続して透明導
電膜との接続構造体を構成するものである。
Summary of the Invention In the present invention, the connection portions of an oxide transparent conductive film and a conductive film connected thereto are overlapped, and in this overlapped portion, Pb-8n is used as a master alloy, and Zn, An insulating adhesive layer in which metal particles containing at least one kind of rare earth metal are dispersed is interposed, and this adhesive layer is pressed between the oxide transparent conductive film and the conductive film. When heated, the oxide transparent conductive film and the corresponding conductive film are electrically connected by melting the metal particles to form a connection structure with the transparent conductive film.

ここK、絶縁性接着剤層に分散させる金属粒子は、比較
的低融点の50℃〜350℃好ましくは800〜260
℃の融点を有し、その粒径は、隣合う透明導電膜間の間
隔に応じてこれより充分小に選定されるが0.5μm〜
2μm程度に選ばれることが望ましい。また、この金属
粒子の配合tけ接着剤(固形分)100重量部に対し、
5〜300重量部とする。
Here, the metal particles dispersed in the insulating adhesive layer have a relatively low melting point of 50 to 350 °C, preferably 800 to 260 °C.
℃, and the particle size is selected to be sufficiently smaller than this depending on the distance between adjacent transparent conductive films, but from 0.5 μm to
It is desirable that the thickness be selected to be about 2 μm. In addition, for 100 parts by weight of the adhesive (solid content) of this metal particle,
The amount is 5 to 300 parts by weight.

また、絶縁性接着剤層の厚さは、透明導電膜とこれに接
続される導電膜とを重ね合せた状態でこれら両導電膜を
有する内幕板間に生じる間隙の体積の10〜300%、
好ましくは5〜200%の体積となるように選定される
In addition, the thickness of the insulating adhesive layer is 10 to 300% of the volume of the gap that occurs between the inner curtain plates having both the conductive films when the transparent conductive film and the conductive film connected thereto are overlapped.
Preferably, the volume is selected to be 5 to 200%.

また、絶縁性接着剤の電気的特性は、その比抵抗が10
7Ω(7)以上、好ましくは100m以上のものより選
ばれる。またその流動性は、M、F、I (メルトフロ
ーインデックス)で0.001以−ヒ、好ましくは、0
.005以上のものより選ばれる。尚、ここにM、F、
1とはASTM、 01238 ノA法またはJIS、
 K7210 (7) A法に規定された装置で、所定
の圧着温度において2160gの荷重を印加した時にオ
リフィスrがう10分間に流出する樹脂のグラム数を示
すものである。
In addition, the electrical properties of the insulating adhesive include a specific resistance of 10
It is selected from those with a resistance of 7Ω (7) or more, preferably 100m or more. In addition, its fluidity is 0.001 or more in M, F, I (melt flow index), preferably 0.
.. Selected from 005 or higher. In addition, here M, F,
1 means ASTM, 01238 NoA method or JIS,
K7210 (7) This indicates the number of grams of resin that flows out of the orifice r in 10 minutes when a load of 2160 g is applied at a predetermined compression temperature using a device specified in Method A.

また、接着剤層中の上述した金属粒子は、pb−8nを
母合金としてこれにZn+希土類金属のSc、Y。
The above-mentioned metal particles in the adhesive layer include pb-8n as a mother alloy, Zn+rare earth metals Sc and Y.

La、 Ce、 Pr、 Nd、 Pm、 Sm+ E
u、 Gd+ Tb+ Dy+ Ha。
La, Ce, Pr, Nd, Pm, Sm+E
u, Gd+ Tb+ Dy+ Ha.

Err Tm+ Yb+ Luのうちの少なくとも1種
類以上を配合した金属より存るものであるが、更にこれ
に耐水性向上のためにSbヲ、またスケール防止のため
にAtを、更に曇り防止のためにS l + T l 
+ Seを、更に融点制御のためにBi及びCdを配合
することができる。
It is a metal containing at least one of the following: Err Tm + Yb + Lu, and in addition, Sb is added to improve water resistance, At is added to prevent scaling, and At is added to prevent fogging. S l + T l
+Se, and further Bi and Cd can be added to control the melting point.

上述したように、本発明による接続構造体においてはそ
の互いに接続すべき酸化物透明導電膜とこれに対応する
導電膜との間に金属粒子即ちはんだ材粒子が上述した加
熱、加圧によって両導電膜を融着接合するものであり、
この加圧によって絶絶性接着剤はその一部ないしは大部
分が、互いに重ね合せられた導電膜間から外側方に押し
出されこの絶縁性接着剤が効果的に隣り合う導電膜間に
おいて金属粒子を包み込んで隣り合う透明導電膜及び導
電膜間の絶縁が図られると共に、これら導電膜を有する
基板間が接着剤によって接着保持される。
As described above, in the bonded structure according to the present invention, metal particles, that is, solder particles are placed between the oxide transparent conductive films to be connected to each other and the corresponding conductive films, and the metal particles, that is, the solder material particles are bonded to each other by the heating and pressurization described above. It is used to fusion bond membranes,
Due to this pressure, part or most of the insulating adhesive is pushed outward from between the conductive films stacked on top of each other, and this insulating adhesive effectively binds the metal particles between the adjacent conductive films. Insulation between the transparent conductive film and the conductive film that are wrapped and adjacent to each other is achieved, and the substrates having the conductive film are bonded and held together by an adhesive.

実施例 次に本発明の詳細な説明するも、各側においては、第1
図に示すように透明ガラス基板(1)上に酸化インジュ
ウムと酸化錫の複合酸化物よシ成る酸化物透明導電膜を
、フォトエツチングによって−やターン化してストライ
プ状に平行配列した透明電極・やターンを設け、これの
外部リードとの接続部(2)K対応して、他の厚さ25
μの、j? IJイミドよりなるポリイミドフレキシブ
ル基板(3)上に形成シタ厚さ18μの銅箔をフォトエ
ツチングして形成したストライプ状の導電パターン(4
)全相互に接続する場合である。この場合、透明電極パ
ターン(2)と導電パターン(4)との各ピッチPは0
.4+a+(夫々幅02m5間隔0.2 tm )とし
た場合である。本発明においては、これらノ4ターンに
(2)及び(4)を互いにその接続部が第2図にその平
面図を第3図に第2図のA−A断面を示すように重り合
うようにし、両者間に金属粒子を分散させた接着剤層(
5)を介在させてその接合を行うものである。
EXAMPLE The present invention will now be described in detail.
As shown in the figure, a transparent conductive oxide film made of a composite oxide of indium oxide and tin oxide is formed on a transparent glass substrate (1) by photo-etching and then turned into stripes and arranged in parallel to form transparent electrodes. A turn is provided, and the other thickness is 25 mm corresponding to the connection part (2) K with the external lead.
μ's, j? A striped conductive pattern (4) was formed on a polyimide flexible substrate (3) made of IJ imide by photo-etching a copper foil with a thickness of 18μ.
) are all connected to each other. In this case, each pitch P between the transparent electrode pattern (2) and the conductive pattern (4) is 0.
.. 4+a+ (width: 02 m, interval: 0.2 tm). In the present invention, these four turns (2) and (4) are arranged so that their connecting parts overlap each other as shown in FIG. 2 in a plan view and in FIG. and an adhesive layer with metal particles dispersed between the two (
5) is used to perform the bonding.

実施例I Tb 30重量部、Sn 45重量部、Cd 20重量
部、Zn 3重量部、Sb 2重量部の配合よりなる合
金金属はんだ粒子(融点145℃)でその粒子径20μ
mの金属粒子110重量部を、下記組成の塗料に均一に
分散した。
Example I Alloy metal solder particles (melting point: 145° C.) consisting of 30 parts by weight of Tb, 45 parts by weight of Sn, 20 parts by weight of Cd, 3 parts by weight of Zn, and 2 parts by weight of Sb, with a particle size of 20 μm.
110 parts by weight of metal particles of m were uniformly dispersed in a paint having the following composition.

上述した金属粒子が混合された塗料を乾燥後の厚みが3
0μmになるように剥離紙上に塗布してシート状の接着
剤層を得た。これを第1図〜第3図で説明した透明電極
ノやターン(2)と導電パターン(4)との互いの重ね
合せ部間に挾み込むように内幕板(1)及び(3)の間
に挾み込み金属粒子の融点より高い180℃で、40 
kg/crn”、30秒の加圧加熱条件で圧着した。こ
のようにして両・臂ターン(2)及び(4)の電気的及
び機棹的接続がなされた接続構造体は良好な電気的接続
がなされた。
The thickness of the paint mixed with the metal particles mentioned above after drying is 3.
A sheet-like adhesive layer was obtained by coating on a release paper so that the thickness was 0 μm. The inner curtain plates (1) and (3) are sandwiched between the overlapped portions of the transparent electrodes and turns (2) and the conductive patterns (4) explained in FIGS. 1 to 3. At 180°C, which is higher than the melting point of the metal particles sandwiched between them, 40°C
kg/crn", 30 seconds of pressure and heating conditions.The connected structure in which both the arm turns (2) and (4) are electrically and mechanically connected in this way has good electrical properties. A connection has been made.

実施例2 ガラスセラミック接着用はんだ(旭硝子社製セラソルザ
#143(融点、143℃))の粒子径20μmの金属
粉末110重量部を下記組成の塗料に分散混合した。
Example 2 110 parts by weight of metal powder with a particle size of 20 μm of solder for bonding glass ceramics (Cerasolza #143 (melting point, 143° C., manufactured by Asahi Glass Co., Ltd.)) was dispersed and mixed in a paint having the following composition.

この金属粉末が分散された塗料を、剥離紙上に乾燥後の
厚みが30μmになるように塗布してシート状の金属粒
子が分散された絶縁性接着剤層を得た。これを剥離紙か
ら剥離し、この絶縁性接着剤層を第1図〜第3図で説明
した互いに重ね合せられるパターン(2)及び(4)間
に挾み込むように基板(1)及び(3)間に介在させて
180℃+ 40 kg7cm” 、20秒間の条件で
加熱加圧してその圧着をしたところ各パターン間の導通
抵抗は100以下となり隣り合うパターン間の絶縁抵抗
は10100以上となった。そして100℃、1週間の
強制老化を行った後においてもその導通抵抗は100以
下、絶縁抵抗は10 0以上であった。
The paint in which this metal powder was dispersed was applied onto a release paper so that the thickness after drying was 30 μm to obtain an insulating adhesive layer in which sheet-like metal particles were dispersed. This is peeled off from the release paper, and this insulating adhesive layer is sandwiched between the patterns (2) and (4) which are overlapped with each other as described in FIGS. 1 to 3. 3) When crimping was performed by heating and pressing at 180°C + 40 kg 7 cm for 20 seconds, the conduction resistance between each pattern was less than 100, and the insulation resistance between adjacent patterns was more than 10,100. Even after forced aging at 100°C for one week, the conduction resistance was 100 or less and the insulation resistance was 100 or more.

実施例3 ガラスセラミック接着用はんだ(旭硝子社製セルソルザ
#123(融点123℃))の粒子径10μmの金属粉
末580重量部を均一に分散混合し剥離紙上に乾燥後の
厚さが20μmになるように塗布して金属粒子が分散さ
れた絶縁性接着剤層を得た。このシート状の絶縁性接着
剤層を剥離紙から剥離し、第1図〜第3図で説明した透
明電極パターン(2)と導電パターン(4)との間に介
在させ150℃、 40kg、 20秒間の加熱加圧を
行った。尚、この実施例においては透明電極・母ターン
(2)及導電パターンの各ピッチPを0.3悶(幅0.
15叫1間隔0.15団)とした場合である。この場合
80℃で相対湿度95チの1週間の強制老化処理を行っ
た後においても電気的導通抵抗及び絶縁抵抗に変化がみ
られなかった。
Example 3 580 parts by weight of metal powder with a particle size of 10 μm of solder for bonding glass ceramics (Cell Solza #123 (manufactured by Asahi Glass Co., Ltd., melting point: 123°C)) was uniformly dispersed and mixed, and spread on release paper so that the thickness after drying was 20 μm. An insulating adhesive layer in which metal particles were dispersed was obtained. This sheet-like insulating adhesive layer was peeled off from the release paper, interposed between the transparent electrode pattern (2) and the conductive pattern (4) explained in FIGS. 1 to 3, and heated at 150°C, 40 kg, and Heat and pressure were applied for seconds. In this embodiment, each pitch P of the transparent electrode/main turn (2) and conductive pattern is 0.3 mm (width 0.3 mm).
This is a case where the interval is 0.15 groups). In this case, no change was observed in electrical conduction resistance and insulation resistance even after one week of forced aging treatment at 80° C. and 95° relative humidity.

実施例4 この例においては、実施例2と同様の方法によって接続
構造体を得たものであるが、その塗料の組成を下記に選
定した。
Example 4 In this example, a connected structure was obtained by the same method as in Example 2, but the composition of the paint was selected as follows.

このようにして得たシート状の金属粒子を分散させた絶
縁性接着剤層を、第1図〜第3図で説明した・やターン
(2)及び(4)の互いに重ね合せ部間に介在させ30
0℃、 60 kHz 、 30 kg/6n、 30
秒間の条件で超音波はんだ付は装置(旭硝子社製ザン?
ングー)により接着したところ各パターン(2)及び(
4)間の導通抵抗は50以下、隣接するパターン間の絶
縁抵抗は10100以上であった・ 上述したように本発明による接続構造体にょれは良好な
・母ターン間の接続を行うことができるものである。
The insulating adhesive layer in which the sheet-shaped metal particles obtained in this manner are dispersed is interposed between the mutually overlapping parts of the turns (2) and (4) explained in FIGS. 1 to 3. let 30
0℃, 60kHz, 30kg/6n, 30
Ultrasonic soldering is performed using a device (Asahi Glass Co., Ltd. ZAN?) under conditions of seconds.
Each pattern (2) and (
4) The conduction resistance between the patterns was 50 or less, and the insulation resistance between adjacent patterns was 10,100 or more. As mentioned above, the connection structure according to the present invention has good sag. Connections between the main turns can be made. It is something.

尚、上述した各側においてはシート状の金属粒子が分散
された絶縁性接着剤層を得、これを互いに接合すべき両
糸板間に挾み込んで圧着した場合であるが、成る場合は
同様の接着剤層を直接的に基板(1)或いは(3)の所
定部上に塗布してその電気的及び機械的接着を行うよう
にすることもできる。
In addition, on each side described above, an insulating adhesive layer in which sheet-shaped metal particles are dispersed is obtained, and this is inserted between the two thread plates to be bonded to each other and crimped. A similar adhesive layer can also be applied directly onto predetermined portions of the substrate (1) or (3) to provide electrical and mechanical bonding thereof.

発明の効果 上述したように本発明においては酸化物透明電極パター
ンとこれに対応する導電ノeターンとの間に金属粒子即
ち特殊な組成によるはんだ金属粒子を分散させた絶縁性
接着剤層を介在させて加熱加圧したことによって金属粒
子によって透明電極パターンとこれに対応する導電パタ
ーンの電気的接続全はんだ融着によって行い、絶縁性接
着剤によって隣り合う導電ツヤターン間に存在する金属
粒子を包み込んで隣シ合うパターン間の絶縁を行うもの
である。したがって導電・母ターン間の導通抵抗は充分
小さく、しかも隣り合う導電パターン間の電気的絶縁は
良好に行うことができ、一般にその電気的及び機械的接
続を行いにくい酸化物透明導電膜に対する導電膜の接続
であるにも拘らず、電気的及び機械的に優れた接続を行
うことができノ9ターンの狭ピッチ化をより促進し、量
産性を図ることができるものである。
Effects of the Invention As described above, in the present invention, an insulating adhesive layer in which metal particles, that is, solder metal particles having a special composition are dispersed, is interposed between the oxide transparent electrode pattern and the corresponding conductive e-turn. Electrical connection between the transparent electrode pattern and the corresponding conductive pattern is made by full solder fusion using metal particles by heating and pressurizing the metal particles, and the metal particles existing between adjacent conductive glossy turns are wrapped with an insulating adhesive. This provides insulation between adjacent patterns. Therefore, the conduction resistance between the conductive and main turns is sufficiently small, and the electrical insulation between adjacent conductive patterns can be well achieved. Despite the connection, it is possible to make an electrically and mechanically excellent connection, further promoting the narrowing of the pitch of the nine turns, and making it possible to achieve mass production.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明による透明導電膜との接続構造体の説明
に供する分解平面図、第2図は本発明による透明導電膜
との接続構造体の拡大平面図、第3図はそのA−A線上
の断面図。 (1)は透明基板、(2)はこれの上の導電膜よりなる
透明電種・クターン、(3)はフレキシブル基板、(4
)鉱これの上に形成された外部リードとなる導電膜より
なる導電ノeターンである。 同 松 隈 秀 盛6(戸、iBi::第1− 第2図 第3図 第1頁の続き [相]発明者沼尾 秀裕 @発明者鈴木 和明 鹿沼市さつき町1幡地 ソニーケミカル株式会社鹿沼工
場内
FIG. 1 is an exploded plan view for explaining a connection structure with a transparent conductive film according to the present invention, FIG. 2 is an enlarged plan view of the connection structure with a transparent conductive film according to the present invention, and FIG. 3 is an A- A sectional view on line A. (1) is a transparent substrate, (2) is a transparent electrode/cutane made of a conductive film on this, (3) is a flexible substrate, (4)
) It is a conductive turn made of a conductive film which is formed on top of the conductive film and serves as an external lead. Same as Hidehiro Matsukuma 6 (Do, iBi:: 1-2 Figure 3 Figure 3 Continued from page 1 [Phase] Inventor Hidehiro Numao @ Inventor Suzuki Kazuaki Kanuma-shi Satsuki-cho 1 Hata Sony Chemical Corporation Inside Kanuma factory

Claims (1)

【特許請求の範囲】[Claims] 酸化物透明導電膜と、これに接続される導電膜との互い
の接続部空車ね合せられ、この重ね合せ部に、Pb−8
nを母合金としてこれにZn、希土類金属のうちの少く
とも1種類以上の金属を配合した金属粒子を分散させた
絶縁性接着剤層が介在され、該接着剤層が上記酸化物透
明導電膜と上記導電膜との間において加圧加熱されて、
上記酸化物透明゛導電膜と上記導電膜とが上記金属粒子
の溶融によって電気的に接続された透明導電膜との接続
構造体。
The oxide transparent conductive film and the conductive film connected thereto are mated together, and Pb-8 is applied to this overlapped part.
An insulating adhesive layer is interposed in which metal particles containing Zn and at least one metal selected from rare earth metals are dispersed, using n as a mother alloy, and the adhesive layer is connected to the oxide transparent conductive film. and the conductive film are heated under pressure,
A connection structure in which the oxide transparent conductive film and the conductive film are electrically connected to each other by melting the metal particles.
JP59023882A 1983-12-27 1984-02-10 Connecting structure with transparent conductive film Pending JPS60170176A (en)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP59023882A JPS60170176A (en) 1984-02-10 1984-02-10 Connecting structure with transparent conductive film
AU36909/84A AU572615B2 (en) 1983-12-27 1984-12-19 Electrically conductive adhesive sheet circuit board and electrical connection structure
CA000470624A CA1227579A (en) 1983-12-27 1984-12-20 Electrically conductive adhesive sheet, circuit board and electrical connection structure using the same
EP84116388A EP0147856B1 (en) 1983-12-27 1984-12-27 Electrically conductive adhesive sheet
AT84116388T ATE67630T1 (en) 1983-12-27 1984-12-27 ELECTRICALLY CONDUCTIVE ADHESIVE FOIL.
DE8484116388T DE3485085D1 (en) 1983-12-27 1984-12-27 ELECTRICALLY CONDUCTIVE ADHESIVE FILM.
KR1019850000148A KR930004858B1 (en) 1984-02-10 1985-01-11 Electrically conductive adhesive sheet circuit board and electrical connection structure
US07/061,608 US4735847A (en) 1983-12-27 1987-06-22 Electrically conductive adhesive sheet, circuit board and electrical connection structure using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59023882A JPS60170176A (en) 1984-02-10 1984-02-10 Connecting structure with transparent conductive film

Publications (1)

Publication Number Publication Date
JPS60170176A true JPS60170176A (en) 1985-09-03

Family

ID=12122815

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59023882A Pending JPS60170176A (en) 1983-12-27 1984-02-10 Connecting structure with transparent conductive film

Country Status (2)

Country Link
JP (1) JPS60170176A (en)
KR (1) KR930004858B1 (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6144494A (en) * 1984-08-09 1986-03-04 ソニー株式会社 Electric connector
JPS61228490A (en) * 1985-04-02 1986-10-11 株式会社日立製作所 Display unit connecting construction
JPS63184781A (en) * 1986-09-11 1988-07-30 株式会社東芝 Liquid crystal display device
JPS6447084U (en) * 1987-09-16 1989-03-23
JPH01232735A (en) * 1988-03-11 1989-09-18 Matsushita Electric Ind Co Ltd Semiconductor device
JPH05183247A (en) * 1992-06-18 1993-07-23 Seiko Epson Corp Flexible printed board and liquid crystal display
JPH07169522A (en) * 1994-09-05 1995-07-04 Hitachi Ltd Flat panel display device
JPH08213721A (en) * 1995-12-04 1996-08-20 Seiko Epson Corp Liquid crystal device
JP2016207842A (en) * 2015-04-23 2016-12-08 パナソニックIpマネジメント株式会社 Connection structure of circuit member, connection method and connection material
JP2017171919A (en) * 2017-03-29 2017-09-28 パナソニックIpマネジメント株式会社 Connection material
JP2018200779A (en) * 2017-05-26 2018-12-20 レノボ・シンガポール・プライベート・リミテッド Cable connection structure and cable connection method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60120772A (en) * 1983-12-06 1985-06-28 Matsushita Electric Ind Co Ltd Anisotropically conductive adhesive

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60120772A (en) * 1983-12-06 1985-06-28 Matsushita Electric Ind Co Ltd Anisotropically conductive adhesive

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6144494A (en) * 1984-08-09 1986-03-04 ソニー株式会社 Electric connector
JPH0576797B2 (en) * 1984-08-09 1993-10-25 Sony Corp
JPH0574826B2 (en) * 1985-04-02 1993-10-19 Hitachi Ltd
JPS61228490A (en) * 1985-04-02 1986-10-11 株式会社日立製作所 Display unit connecting construction
JPS63184781A (en) * 1986-09-11 1988-07-30 株式会社東芝 Liquid crystal display device
JPS6447084U (en) * 1987-09-16 1989-03-23
JPH01232735A (en) * 1988-03-11 1989-09-18 Matsushita Electric Ind Co Ltd Semiconductor device
JPH05183247A (en) * 1992-06-18 1993-07-23 Seiko Epson Corp Flexible printed board and liquid crystal display
JPH07169522A (en) * 1994-09-05 1995-07-04 Hitachi Ltd Flat panel display device
JPH08213721A (en) * 1995-12-04 1996-08-20 Seiko Epson Corp Liquid crystal device
JP2016207842A (en) * 2015-04-23 2016-12-08 パナソニックIpマネジメント株式会社 Connection structure of circuit member, connection method and connection material
US9999123B2 (en) 2015-04-23 2018-06-12 Panasonic Intellectual Property Management Co., Ltd. Connection structure of circuit member, connection method, and connection material
JP2017171919A (en) * 2017-03-29 2017-09-28 パナソニックIpマネジメント株式会社 Connection material
JP2018200779A (en) * 2017-05-26 2018-12-20 レノボ・シンガポール・プライベート・リミテッド Cable connection structure and cable connection method
US10181662B2 (en) 2017-05-26 2019-01-15 Lenovo (Singapore) Pte Ltd Switching device having a push button

Also Published As

Publication number Publication date
KR930004858B1 (en) 1993-06-09
KR850006265A (en) 1985-10-02

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