JPS60159747A - レチクルマスクの製造方法 - Google Patents

レチクルマスクの製造方法

Info

Publication number
JPS60159747A
JPS60159747A JP59014941A JP1494184A JPS60159747A JP S60159747 A JPS60159747 A JP S60159747A JP 59014941 A JP59014941 A JP 59014941A JP 1494184 A JP1494184 A JP 1494184A JP S60159747 A JPS60159747 A JP S60159747A
Authority
JP
Japan
Prior art keywords
reticle
pattern
reticle mask
mask
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59014941A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6345091B2 (enrdf_load_stackoverflow
Inventor
Hiromichi Okami
岡見　宏道
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP59014941A priority Critical patent/JPS60159747A/ja
Publication of JPS60159747A publication Critical patent/JPS60159747A/ja
Publication of JPS6345091B2 publication Critical patent/JPS6345091B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59014941A 1984-01-30 1984-01-30 レチクルマスクの製造方法 Granted JPS60159747A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59014941A JPS60159747A (ja) 1984-01-30 1984-01-30 レチクルマスクの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59014941A JPS60159747A (ja) 1984-01-30 1984-01-30 レチクルマスクの製造方法

Publications (2)

Publication Number Publication Date
JPS60159747A true JPS60159747A (ja) 1985-08-21
JPS6345091B2 JPS6345091B2 (enrdf_load_stackoverflow) 1988-09-08

Family

ID=11874980

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59014941A Granted JPS60159747A (ja) 1984-01-30 1984-01-30 レチクルマスクの製造方法

Country Status (1)

Country Link
JP (1) JPS60159747A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02242251A (ja) * 1989-03-15 1990-09-26 Fujitsu Ltd レチクルの製造方法
JP2010534601A (ja) * 2007-07-28 2010-11-11 ヴィンクラー ウント デュンネビアー アクチエンゲゼルシャフト フラット材料片を供給し、かつフラット材料片を見当正しく搬送するための装置及び方法
JP2014195099A (ja) * 2010-12-14 2014-10-09 Nikon Corp 露光装置及びデバイス製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02242251A (ja) * 1989-03-15 1990-09-26 Fujitsu Ltd レチクルの製造方法
JP2010534601A (ja) * 2007-07-28 2010-11-11 ヴィンクラー ウント デュンネビアー アクチエンゲゼルシャフト フラット材料片を供給し、かつフラット材料片を見当正しく搬送するための装置及び方法
JP2014195099A (ja) * 2010-12-14 2014-10-09 Nikon Corp 露光装置及びデバイス製造方法

Also Published As

Publication number Publication date
JPS6345091B2 (enrdf_load_stackoverflow) 1988-09-08

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