JPS60143869A - 樹脂膜形成装置 - Google Patents

樹脂膜形成装置

Info

Publication number
JPS60143869A
JPS60143869A JP22473383A JP22473383A JPS60143869A JP S60143869 A JPS60143869 A JP S60143869A JP 22473383 A JP22473383 A JP 22473383A JP 22473383 A JP22473383 A JP 22473383A JP S60143869 A JPS60143869 A JP S60143869A
Authority
JP
Japan
Prior art keywords
substrate
resin film
plate
shaped substrate
rotation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22473383A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0470953B2 (enrdf_load_stackoverflow
Inventor
Yoshiteru Namoto
名本　吉輝
Kiyoharu Yamashita
清春 山下
Keizaburo Kuramasu
敬三郎 倉増
Masaji Arai
荒井　正自
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP22473383A priority Critical patent/JPS60143869A/ja
Publication of JPS60143869A publication Critical patent/JPS60143869A/ja
Publication of JPH0470953B2 publication Critical patent/JPH0470953B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP22473383A 1983-11-29 1983-11-29 樹脂膜形成装置 Granted JPS60143869A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22473383A JPS60143869A (ja) 1983-11-29 1983-11-29 樹脂膜形成装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22473383A JPS60143869A (ja) 1983-11-29 1983-11-29 樹脂膜形成装置

Publications (2)

Publication Number Publication Date
JPS60143869A true JPS60143869A (ja) 1985-07-30
JPH0470953B2 JPH0470953B2 (enrdf_load_stackoverflow) 1992-11-12

Family

ID=16818385

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22473383A Granted JPS60143869A (ja) 1983-11-29 1983-11-29 樹脂膜形成装置

Country Status (1)

Country Link
JP (1) JPS60143869A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH0470953B2 (enrdf_load_stackoverflow) 1992-11-12

Similar Documents

Publication Publication Date Title
KR100307852B1 (ko) 평탄한기판의박막코팅방법및장치
JPS60143869A (ja) 樹脂膜形成装置
JP3134925B2 (ja) 回路基板等の板状体の固着方法及び装置
EP0769725A2 (en) Photoresist development method and apparatus
US5786878A (en) Method of manufacturing a liquid crystal display having randomly distributed bidirectional surface orientations
JPH0222624A (ja) 液晶表示装置の製造方法
JP3362069B2 (ja) スピン処理装置
JP3056150B2 (ja) レジストの塗布装置
JP3609230B2 (ja) 半導体装置の製造装置
JPS60248259A (ja) 樹脂膜形成方法
KR950010635Y1 (ko) 회전 도포장치
JPH10123551A (ja) 液晶表示装置
JPH04151667A (ja) レジスト膜形成方法
TW423033B (en) Method and device of die bond for LED chip
JP3197025B2 (ja) 圧電振動素子の製造方法
JPS58178358A (ja) 感光性材料塗布装置
JPS58177181A (ja) 回転式塗布装置
JPS59104650A (ja) レジスト膜形成装置
JPH04126566A (ja) 回転塗布方法および回転塗布装置
JPH0353518Y2 (enrdf_load_stackoverflow)
JPH0636899B2 (ja) 電子部品端部のペースト塗布方法
JPH0735845B2 (ja) 回転体用バランサ−及び回転バランスを得る方法
JPH0551505U (ja) 面取り用超硬合金製チップ
JPS63137166A (ja) スパツタ装置
JPH07302983A (ja) シールドケースの取付け構造