JPS60120520A - Transporting device for manufacture of semiconductor - Google Patents

Transporting device for manufacture of semiconductor

Info

Publication number
JPS60120520A
JPS60120520A JP22868383A JP22868383A JPS60120520A JP S60120520 A JPS60120520 A JP S60120520A JP 22868383 A JP22868383 A JP 22868383A JP 22868383 A JP22868383 A JP 22868383A JP S60120520 A JPS60120520 A JP S60120520A
Authority
JP
Grant status
Application
Patent type
Prior art keywords
wafer
rotation
exposure
station
exposure station
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22868383A
Inventor
Yoshiharu Nakamura
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date

Links

Classifications

    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Abstract

PURPOSE:To give the freedom of layout design of a device for treatment such as exposure and to contrive miniaturization of the whole device by providing a means for rotating a substance held with being interlocked with rotation of an arm. CONSTITUTION:An adsorption plate 6 is lowered above the wafer after completion of prealignment in a station P and adsorbs the wafer by operation of adsorption pads 7a, 7b..., after which a housing 3 is raised to be rotated in a direction of an exposure station E. Then a follower pooley 9 is pulled by a belt 12 and rotates by interlocking. This rotation is inverse to the counterclockwise rotation of a rotating arm 1 and a rotation angle is equal so that a direction of the wafer is retained even when it reaches the exposure station E. At that time, if the rotating arm 1 is lowered to cut the vacuum exhausion to the adsorption pads 7a, 7b..., the wafer is set in the exposure station E as predetermined.
JP22868383A 1983-12-02 1983-12-02 Transporting device for manufacture of semiconductor Pending JPS60120520A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22868383A JPS60120520A (en) 1983-12-02 1983-12-02 Transporting device for manufacture of semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22868383A JPS60120520A (en) 1983-12-02 1983-12-02 Transporting device for manufacture of semiconductor

Publications (1)

Publication Number Publication Date
JPS60120520A true true JPS60120520A (en) 1985-06-28

Family

ID=16880169

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22868383A Pending JPS60120520A (en) 1983-12-02 1983-12-02 Transporting device for manufacture of semiconductor

Country Status (1)

Country Link
JP (1) JPS60120520A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5178638A (en) * 1990-07-20 1993-01-12 Tokyo Electron Limited Pressure-reduced chamber system having a filter means
US5271788A (en) * 1991-07-23 1993-12-21 Tokyo Electron Limited Plasma processing apparatus
JP2846957B2 (en) * 1993-03-29 1999-01-13 イェノプティック ゲーエムベーハー Apparatus for manipulating disk-like object in the operating surface of the local clean room

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5485679A (en) * 1977-12-20 1979-07-07 Canon Inc Wafer aligning unit
JPS5853149B2 (en) * 1980-08-29 1983-11-28 Marui Sangyo Kk

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5485679A (en) * 1977-12-20 1979-07-07 Canon Inc Wafer aligning unit
JPS5853149B2 (en) * 1980-08-29 1983-11-28 Marui Sangyo Kk

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5178638A (en) * 1990-07-20 1993-01-12 Tokyo Electron Limited Pressure-reduced chamber system having a filter means
US5271788A (en) * 1991-07-23 1993-12-21 Tokyo Electron Limited Plasma processing apparatus
JP2846957B2 (en) * 1993-03-29 1999-01-13 イェノプティック ゲーエムベーハー Apparatus for manipulating disk-like object in the operating surface of the local clean room

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