JPS60114914A - Positioning device - Google Patents

Positioning device

Info

Publication number
JPS60114914A
JPS60114914A JP22292683A JP22292683A JPS60114914A JP S60114914 A JPS60114914 A JP S60114914A JP 22292683 A JP22292683 A JP 22292683A JP 22292683 A JP22292683 A JP 22292683A JP S60114914 A JPS60114914 A JP S60114914A
Authority
JP
Japan
Prior art keywords
patterns
pattern
signal
wafer
seeking
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22292683A
Other languages
Japanese (ja)
Other versions
JP2530587B2 (en
Inventor
Toshio Matsuura
Satoshi Yomo
Original Assignee
Nippon Kogaku Kk <Nikon>
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku Kk <Nikon> filed Critical Nippon Kogaku Kk <Nikon>
Priority to JP58222926A priority Critical patent/JP2530587B2/en
Publication of JPS60114914A publication Critical patent/JPS60114914A/en
Application granted granted Critical
Publication of JP2530587B2 publication Critical patent/JP2530587B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Abstract

PURPOSE: To position accurately a wafer by selecting an edge signal satisfying a condition such as area without pattern of circumference of mark so as to distinguish it from a signal from other patterns.
CONSTITUTION: A wafer 3 having reference patterns (alignment marks) YM1W YM3, θM1WθM3 for positioning and other patterns (circuit patterns or the like) C1WC3 is aligned to an exposure for patterning of a large scale integrated circuit. A photoelectric microscope for alignment obtaining an edge signal L0 in response to a pattern distribution with a spot light YS from a seeking region including the reference pattern is provided in a seeking direction Y' in crossing with an angle of, e.g., 90° to the reference pattern. A signal satisfying the condition that no circuit pattern or the like exists with respect to the seeking direction Y' and the interval of the reference marks is concident when the reference patterns consist of plural marks is discriminated from the signal L0. The discriminated signal controls the drive of a turntable aligning the wafer 3.
COPYRIGHT: (C)1985,JPO&Japio
JP58222926A 1983-11-26 1983-11-26 Positioning device Expired - Lifetime JP2530587B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58222926A JP2530587B2 (en) 1983-11-26 1983-11-26 Positioning device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP58222926A JP2530587B2 (en) 1983-11-26 1983-11-26 Positioning device
US07/059,193 US4723221A (en) 1983-11-26 1987-06-05 Method for manufacturing semiconductor device and apparatus therefor

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP20794193A Division JP2679940B2 (en) 1993-08-23 1993-08-23 Positioning device

Publications (2)

Publication Number Publication Date
JPS60114914A true JPS60114914A (en) 1985-06-21
JP2530587B2 JP2530587B2 (en) 1996-09-04

Family

ID=16790023

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58222926A Expired - Lifetime JP2530587B2 (en) 1983-11-26 1983-11-26 Positioning device

Country Status (2)

Country Link
US (1) US4723221A (en)
JP (1) JP2530587B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6421307A (en) * 1987-07-16 1989-01-24 Hitachi Electr Eng Pattern detection system
JPH01207604A (en) * 1988-02-15 1989-08-21 Canon Inc Mark position detecting method

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4843563A (en) * 1985-03-25 1989-06-27 Canon Kabushiki Kaisha Step-and-repeat alignment and exposure method and apparatus
DE3613229C2 (en) * 1985-04-20 1992-11-19 Fuji Photo Film Co., Ltd., Minami-Ashigara, Kanagawa, Jp
JP2543505B2 (en) * 1986-07-22 1996-10-16 安川商事 株式会社 Signal processing device and measuring device using space-time differential method
US4835704A (en) * 1986-12-29 1989-05-30 General Electric Company Adaptive lithography system to provide high density interconnect
JPS63199421A (en) * 1987-02-16 1988-08-17 Toshiba Corp Charged-beam lithography method
US4876656A (en) * 1987-08-28 1989-10-24 Motorola Inc. Circuit location sensor for component placement apparatus
CA1314085C (en) * 1988-05-25 1993-03-02 Andras G. Fule Linear interpolation for a component placement robot
JP2897355B2 (en) * 1990-07-05 1999-05-31 株式会社ニコン Alignment method, exposure apparatus, and position detection method and apparatus
US6141107A (en) * 1991-02-28 2000-10-31 Nikon Corporation Apparatus for detecting a position of an optical mark
US5561606A (en) * 1991-08-30 1996-10-01 Nikon Corporation Method for aligning shot areas on a substrate
US5621813A (en) * 1993-01-14 1997-04-15 Ultratech Stepper, Inc. Pattern recognition alignment system
JP3235078B2 (en) * 1993-02-24 2001-12-04 株式会社ニコン Scanning exposure method, exposure control device, scanning type exposure device, and device manufacturing method
KR100381629B1 (en) * 1994-08-16 2003-08-21 가부시키가이샤 니콘 Exposure device
WO1996036921A1 (en) * 1995-05-19 1996-11-21 3Com Corporation Method and apparatus for linking computer aided design databases with a numerical control machine database
US5702567A (en) * 1995-06-01 1997-12-30 Kabushiki Kaisha Toshiba Plurality of photolithographic alignment marks with shape, size and spacing based on circuit pattern features
DE19533061C2 (en) * 1995-09-07 1997-07-03 Leica Ag Photoelectric semiconductor light detection device with programmable offset current and image sensor with such a device
US5734594A (en) * 1996-09-25 1998-03-31 Chartered Semiconductor Manufacturing Pte Ltd. Method and system for enhancement of wafer alignment accuracy
JPH10177245A (en) * 1996-12-18 1998-06-30 Fujitsu Ltd Reticle, semiconductor substrate and semiconductor chip
US6507944B1 (en) * 1999-07-30 2003-01-14 Fujitsu Limited Data processing method and apparatus, reticle mask, exposing method and apparatus, and recording medium
DE10102540B4 (en) * 2001-01-19 2013-03-21 Vistec Semiconductor Systems Jena Gmbh Arrangement and method for identifying substrates
JP2005156865A (en) * 2003-11-25 2005-06-16 Fujitsu Ltd Reticle, method for inspecting reticle, and inspection apparatus

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5719726A (en) * 1980-07-10 1982-02-02 Nippon Kogaku Kk <Nikon> Positioning device
JPS58142484A (en) * 1982-02-19 1983-08-24 Hitachi Ltd Stop position control system

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4233625A (en) * 1978-11-03 1980-11-11 Teledyne, Inc. Television monitoring system for automatically aligning semiconductor devices during manufacture
US4325077A (en) * 1980-05-19 1982-04-13 Gca Corporation Automatic wafer alignment system
JPS5874038A (en) * 1981-10-28 1983-05-04 Canon Inc Mask and wafer aligning method
JPS6352322B2 (en) * 1982-10-02 1988-10-18 Canon Kk

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5719726A (en) * 1980-07-10 1982-02-02 Nippon Kogaku Kk <Nikon> Positioning device
JPS58142484A (en) * 1982-02-19 1983-08-24 Hitachi Ltd Stop position control system

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6421307A (en) * 1987-07-16 1989-01-24 Hitachi Electr Eng Pattern detection system
JPH0658685B2 (en) * 1987-07-16 1994-08-03 日立電子エンジニアリング株式会社 Pattern detection method
JPH01207604A (en) * 1988-02-15 1989-08-21 Canon Inc Mark position detecting method

Also Published As

Publication number Publication date
JP2530587B2 (en) 1996-09-04
US4723221A (en) 1988-02-02

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