JPS5982727A - 異物検出方法及びその装置 - Google Patents

異物検出方法及びその装置

Info

Publication number
JPS5982727A
JPS5982727A JP57192462A JP19246282A JPS5982727A JP S5982727 A JPS5982727 A JP S5982727A JP 57192462 A JP57192462 A JP 57192462A JP 19246282 A JP19246282 A JP 19246282A JP S5982727 A JPS5982727 A JP S5982727A
Authority
JP
Japan
Prior art keywords
substrate
laser beam
foreign object
degrees
foreign matter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57192462A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6365904B2 (enrdf_load_stackoverflow
Inventor
Yukio Uto
幸雄 宇都
Masataka Shiba
正孝 芝
Mitsuyoshi Koizumi
小泉　光義
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57192462A priority Critical patent/JPS5982727A/ja
Priority to US06/548,516 priority patent/US4669875A/en
Publication of JPS5982727A publication Critical patent/JPS5982727A/ja
Publication of JPS6365904B2 publication Critical patent/JPS6365904B2/ja
Priority to US07/360,971 priority patent/USRE33991E/en
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/02—Investigating particle size or size distribution
    • G01N15/0205—Investigating particle size or size distribution by optical means
    • G01N2015/0238—Single particle scatter
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N2021/4792—Polarisation of scatter light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/10—Scanning
    • G01N2201/105—Purely optical scan
    • G01N2201/1053—System of scan mirrors for composite motion of beam

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP57192462A 1982-11-04 1982-11-04 異物検出方法及びその装置 Granted JPS5982727A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP57192462A JPS5982727A (ja) 1982-11-04 1982-11-04 異物検出方法及びその装置
US06/548,516 US4669875A (en) 1982-11-04 1983-11-03 Foreign particle detecting method and apparatus
US07/360,971 USRE33991E (en) 1982-11-04 1989-06-02 Foreign particle detecting method and apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57192462A JPS5982727A (ja) 1982-11-04 1982-11-04 異物検出方法及びその装置

Related Child Applications (3)

Application Number Title Priority Date Filing Date
JP63135484A Division JPS64453A (en) 1988-06-03 1988-06-03 Foreign matter detector
JP63135483A Division JPS64452A (en) 1988-06-03 1988-06-03 Detection of foreign matter
JP1304601A Division JPH0715441B2 (ja) 1989-11-27 1989-11-27 異物検出方法及びその装置

Publications (2)

Publication Number Publication Date
JPS5982727A true JPS5982727A (ja) 1984-05-12
JPS6365904B2 JPS6365904B2 (enrdf_load_stackoverflow) 1988-12-19

Family

ID=16291695

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57192462A Granted JPS5982727A (ja) 1982-11-04 1982-11-04 異物検出方法及びその装置

Country Status (1)

Country Link
JP (1) JPS5982727A (enrdf_load_stackoverflow)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61100932A (ja) * 1984-10-24 1986-05-19 Hitachi Ltd 露光装置
JPS61260632A (ja) * 1985-05-15 1986-11-18 Hitachi Ltd 異物検査装置
JPS62188945A (ja) * 1986-02-14 1987-08-18 Canon Inc 表面状態測定装置
JPS62261044A (ja) * 1986-05-06 1987-11-13 Hitachi Electronics Eng Co Ltd 異物検査装置
JPS6333834A (ja) * 1986-07-28 1988-02-13 Canon Inc 表面状態検査装置
JPS63118640A (ja) * 1986-11-07 1988-05-23 Nikon Corp 異物検出装置
JPS64452A (en) * 1988-06-03 1989-01-05 Hitachi Ltd Detection of foreign matter
JPH04143640A (ja) * 1990-07-27 1992-05-18 Hitachi Ltd 異物検査装置
JPH08255749A (ja) * 1996-01-26 1996-10-01 Hitachi Ltd 露光方法
JPH08279460A (ja) * 1996-01-26 1996-10-22 Hitachi Ltd 露光装置
US6636827B2 (en) * 1998-04-07 2003-10-21 Ishida Co., Ltd. Foreign-matter detector and foreign-matter detecting system
JP2008268011A (ja) * 2007-04-20 2008-11-06 Canon Inc 異物検査装置
JP2009192541A (ja) * 2009-05-25 2009-08-27 Hitachi Ltd 欠陥検査装置

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52129582A (en) * 1976-04-23 1977-10-31 Hitachi Ltd Flaw detector
JPS5480082A (en) * 1977-12-05 1979-06-26 Ibm Mask for projecting print
JPS55149829A (en) * 1979-05-11 1980-11-21 Hitachi Ltd Detector for foreign matter in wafer
JPS5686340A (en) * 1979-12-17 1981-07-14 Hitachi Ltd Automatic detector for foreign matter
JPS5780546A (en) * 1980-11-07 1982-05-20 Nippon Kogaku Kk <Nikon> Detecting device for foreign substance
JPS57128834A (en) * 1981-02-04 1982-08-10 Nippon Kogaku Kk <Nikon> Inspecting apparatus of foreign substance

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52129582A (en) * 1976-04-23 1977-10-31 Hitachi Ltd Flaw detector
JPS5480082A (en) * 1977-12-05 1979-06-26 Ibm Mask for projecting print
JPS55149829A (en) * 1979-05-11 1980-11-21 Hitachi Ltd Detector for foreign matter in wafer
JPS5686340A (en) * 1979-12-17 1981-07-14 Hitachi Ltd Automatic detector for foreign matter
JPS5780546A (en) * 1980-11-07 1982-05-20 Nippon Kogaku Kk <Nikon> Detecting device for foreign substance
JPS57128834A (en) * 1981-02-04 1982-08-10 Nippon Kogaku Kk <Nikon> Inspecting apparatus of foreign substance

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61100932A (ja) * 1984-10-24 1986-05-19 Hitachi Ltd 露光装置
US4676637A (en) * 1984-10-24 1987-06-30 Hitachi, Ltd. Exposure apparatus with foreign particle detector
JPS61260632A (ja) * 1985-05-15 1986-11-18 Hitachi Ltd 異物検査装置
JPS62188945A (ja) * 1986-02-14 1987-08-18 Canon Inc 表面状態測定装置
JPS62261044A (ja) * 1986-05-06 1987-11-13 Hitachi Electronics Eng Co Ltd 異物検査装置
JPS6333834A (ja) * 1986-07-28 1988-02-13 Canon Inc 表面状態検査装置
JPS63118640A (ja) * 1986-11-07 1988-05-23 Nikon Corp 異物検出装置
JPS64452A (en) * 1988-06-03 1989-01-05 Hitachi Ltd Detection of foreign matter
JPH04143640A (ja) * 1990-07-27 1992-05-18 Hitachi Ltd 異物検査装置
JPH08255749A (ja) * 1996-01-26 1996-10-01 Hitachi Ltd 露光方法
JPH08279460A (ja) * 1996-01-26 1996-10-22 Hitachi Ltd 露光装置
US6636827B2 (en) * 1998-04-07 2003-10-21 Ishida Co., Ltd. Foreign-matter detector and foreign-matter detecting system
JP2008268011A (ja) * 2007-04-20 2008-11-06 Canon Inc 異物検査装置
JP2009192541A (ja) * 2009-05-25 2009-08-27 Hitachi Ltd 欠陥検査装置

Also Published As

Publication number Publication date
JPS6365904B2 (enrdf_load_stackoverflow) 1988-12-19

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