JPS5964769A - プラズマｃｖｄ装置 - Google Patents

プラズマｃｖｄ装置

Info

Publication number
JPS5964769A
JPS5964769A JP57172826A JP17282682A JPS5964769A JP S5964769 A JPS5964769 A JP S5964769A JP 57172826 A JP57172826 A JP 57172826A JP 17282682 A JP17282682 A JP 17282682A JP S5964769 A JPS5964769 A JP S5964769A
Authority
JP
Japan
Prior art keywords
electrode
plasma
substrate
raw material
material gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57172826A
Other languages
English (en)
Japanese (ja)
Other versions
JPS643950B2 (enrdf_load_stackoverflow
Inventor
Tomitaro Koyama
小山　富太郎
Saburo Shimoi
下井　三郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Shimazu Seisakusho KK
Original Assignee
Shimadzu Corp
Shimazu Seisakusho KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp, Shimazu Seisakusho KK filed Critical Shimadzu Corp
Priority to JP57172826A priority Critical patent/JPS5964769A/ja
Publication of JPS5964769A publication Critical patent/JPS5964769A/ja
Publication of JPS643950B2 publication Critical patent/JPS643950B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/517—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Light Receiving Elements (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Chemical Vapour Deposition (AREA)
JP57172826A 1982-09-30 1982-09-30 プラズマｃｖｄ装置 Granted JPS5964769A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57172826A JPS5964769A (ja) 1982-09-30 1982-09-30 プラズマｃｖｄ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57172826A JPS5964769A (ja) 1982-09-30 1982-09-30 プラズマｃｖｄ装置

Publications (2)

Publication Number Publication Date
JPS5964769A true JPS5964769A (ja) 1984-04-12
JPS643950B2 JPS643950B2 (enrdf_load_stackoverflow) 1989-01-24

Family

ID=15949075

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57172826A Granted JPS5964769A (ja) 1982-09-30 1982-09-30 プラズマｃｖｄ装置

Country Status (1)

Country Link
JP (1) JPS5964769A (enrdf_load_stackoverflow)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5745339A (en) * 1980-09-01 1982-03-15 Canon Inc Production of deposited film
JPS58193361A (ja) * 1982-04-30 1983-11-11 Shimadzu Corp プラズマｃｖｄ装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5745339A (en) * 1980-09-01 1982-03-15 Canon Inc Production of deposited film
JPS58193361A (ja) * 1982-04-30 1983-11-11 Shimadzu Corp プラズマｃｖｄ装置

Also Published As

Publication number Publication date
JPS643950B2 (enrdf_load_stackoverflow) 1989-01-24

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