JPS5954257A - 半導体装置 - Google Patents
半導体装置Info
- Publication number
- JPS5954257A JPS5954257A JP57165350A JP16535082A JPS5954257A JP S5954257 A JPS5954257 A JP S5954257A JP 57165350 A JP57165350 A JP 57165350A JP 16535082 A JP16535082 A JP 16535082A JP S5954257 A JPS5954257 A JP S5954257A
- Authority
- JP
- Japan
- Prior art keywords
- film
- layer
- type
- capacitor
- sio2
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
Landscapes
- Semiconductor Integrated Circuits (AREA)
- Bipolar Integrated Circuits (AREA)
- Bipolar Transistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57165350A JPS5954257A (ja) | 1982-09-22 | 1982-09-22 | 半導体装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57165350A JPS5954257A (ja) | 1982-09-22 | 1982-09-22 | 半導体装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5954257A true JPS5954257A (ja) | 1984-03-29 |
| JPH0366815B2 JPH0366815B2 (en:Method) | 1991-10-18 |
Family
ID=15810684
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57165350A Granted JPS5954257A (ja) | 1982-09-22 | 1982-09-22 | 半導体装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5954257A (en:Method) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61272963A (ja) * | 1985-05-28 | 1986-12-03 | Toshiba Corp | 半導体装置 |
| JPH01183842A (ja) * | 1988-01-19 | 1989-07-21 | Sanyo Electric Co Ltd | 半導体集積回路 |
| JPH01232757A (ja) * | 1988-03-14 | 1989-09-18 | Sony Corp | 半導体装置とその製造方法 |
| JPH01283861A (ja) * | 1988-05-10 | 1989-11-15 | Fuji Electric Co Ltd | 集積回路装置の製造方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5754360A (en) * | 1980-09-18 | 1982-03-31 | Nec Corp | Manufacture of semiconductor device |
-
1982
- 1982-09-22 JP JP57165350A patent/JPS5954257A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5754360A (en) * | 1980-09-18 | 1982-03-31 | Nec Corp | Manufacture of semiconductor device |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61272963A (ja) * | 1985-05-28 | 1986-12-03 | Toshiba Corp | 半導体装置 |
| JPH01183842A (ja) * | 1988-01-19 | 1989-07-21 | Sanyo Electric Co Ltd | 半導体集積回路 |
| JPH01232757A (ja) * | 1988-03-14 | 1989-09-18 | Sony Corp | 半導体装置とその製造方法 |
| JPH01283861A (ja) * | 1988-05-10 | 1989-11-15 | Fuji Electric Co Ltd | 集積回路装置の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0366815B2 (en:Method) | 1991-10-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0123949B2 (en:Method) | ||
| US4343080A (en) | Method of producing a semiconductor device | |
| JPS5915495B2 (ja) | 半導体装置 | |
| JPS5954257A (ja) | 半導体装置 | |
| EP0076147B1 (en) | Method of producing a semiconductor device comprising an isolation region | |
| JPS61172346A (ja) | 半導体集積回路装置 | |
| JPS61135136A (ja) | 半導体装置の製造方法 | |
| JPH0590492A (ja) | 半導体集積回路とその製造方法 | |
| JPH0128507B2 (en:Method) | ||
| JPS6356708B2 (en:Method) | ||
| JP2000232111A (ja) | 半導体装置の製造方法 | |
| JPS6120141B2 (en:Method) | ||
| JPS61218169A (ja) | 半導体装置とその製造法 | |
| JPS6113383B2 (en:Method) | ||
| JPH0258367A (ja) | 半導体装置 | |
| JPH05218306A (ja) | 半導体集積回路およびその製造方法 | |
| JPH0466101B2 (en:Method) | ||
| JPH04298044A (ja) | 半導体装置の製造方法 | |
| JPH05152512A (ja) | 半導体集積回路のキヤパシタの製造方法 | |
| JPS639150A (ja) | 半導体装置の製造方法 | |
| JPS61108162A (ja) | 半導体装置およびその製造方法 | |
| JPS60132373A (ja) | 半導体装置の製造方法 | |
| JPS5931860B2 (ja) | 半導体装置 | |
| JPS6312380B2 (en:Method) | ||
| JPS60182149A (ja) | 半導体集積回路の製造方法 |