JPS5947270A - Resin composition for matte electrodeposition coating - Google Patents
Resin composition for matte electrodeposition coatingInfo
- Publication number
- JPS5947270A JPS5947270A JP15666882A JP15666882A JPS5947270A JP S5947270 A JPS5947270 A JP S5947270A JP 15666882 A JP15666882 A JP 15666882A JP 15666882 A JP15666882 A JP 15666882A JP S5947270 A JPS5947270 A JP S5947270A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- resin composition
- electrodeposition coating
- resin
- mixing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 67
- 239000011248 coating agent Substances 0.000 title claims abstract description 64
- 238000004070 electrodeposition Methods 0.000 title claims abstract description 47
- 239000011342 resin composition Substances 0.000 title claims description 35
- 239000002253 acid Substances 0.000 claims abstract description 51
- 229920005989 resin Polymers 0.000 claims abstract description 26
- 239000011347 resin Substances 0.000 claims abstract description 26
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 10
- 230000007704 transition Effects 0.000 claims abstract description 10
- 238000002156 mixing Methods 0.000 claims description 16
- 239000000203 mixture Substances 0.000 claims description 12
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 10
- 150000007522 mineralic acids Chemical class 0.000 claims description 10
- 150000007524 organic acids Chemical class 0.000 claims description 10
- -1 methylol groups Chemical group 0.000 claims description 9
- 230000003472 neutralizing effect Effects 0.000 claims description 6
- 229910021529 ammonia Inorganic materials 0.000 claims description 5
- 150000003839 salts Chemical class 0.000 claims description 5
- 150000001412 amines Chemical class 0.000 claims description 4
- 150000007523 nucleic acids Chemical class 0.000 claims 1
- 102000039446 nucleic acids Human genes 0.000 claims 1
- 108020004707 nucleic acids Proteins 0.000 claims 1
- MBHRHUJRKGNOKX-UHFFFAOYSA-N [(4,6-diamino-1,3,5-triazin-2-yl)amino]methanol Chemical compound NC1=NC(N)=NC(NCO)=N1 MBHRHUJRKGNOKX-UHFFFAOYSA-N 0.000 abstract description 9
- 238000003756 stirring Methods 0.000 abstract description 7
- 239000000126 substance Substances 0.000 abstract description 6
- 150000001732 carboxylic acid derivatives Chemical class 0.000 abstract description 5
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 abstract description 3
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 abstract description 3
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 abstract description 2
- 229920006243 acrylic copolymer Polymers 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 description 26
- 239000003973 paint Substances 0.000 description 12
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical group CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical group OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 7
- 150000001735 carboxylic acids Chemical class 0.000 description 7
- 235000019441 ethanol Nutrition 0.000 description 7
- 239000006224 matting agent Substances 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 239000002585 base Substances 0.000 description 6
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 150000007513 acids Chemical class 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 125000001477 organic nitrogen group Chemical group 0.000 description 3
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine group Chemical class C(CCC)N(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 3
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- KYQCOXFCLRTKLS-UHFFFAOYSA-N Pyrazine Chemical compound C1=CN=CC=N1 KYQCOXFCLRTKLS-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 2
- 229940043279 diisopropylamine Drugs 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- CJMZLCRLBNZJQR-UHFFFAOYSA-N ethyl 2-amino-4-(4-fluorophenyl)thiophene-3-carboxylate Chemical compound CCOC(=O)C1=C(N)SC=C1C1=CC=C(F)C=C1 CJMZLCRLBNZJQR-UHFFFAOYSA-N 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 235000005985 organic acids Nutrition 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 150000003460 sulfonic acids Chemical class 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 1
- GIVMKUUIXYEXLH-UHFFFAOYSA-N 1,2-didecylnaphthalene Chemical compound C1=CC=CC2=C(CCCCCCCCCC)C(CCCCCCCCCC)=CC=C21 GIVMKUUIXYEXLH-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- OLQFXOWPTQTLDP-UHFFFAOYSA-N 2-(2-hydroxyethoxy)ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCO OLQFXOWPTQTLDP-UHFFFAOYSA-N 0.000 description 1
- RWXMAAYKJDQVTF-UHFFFAOYSA-N 2-(2-hydroxyethoxy)ethyl prop-2-enoate Chemical compound OCCOCCOC(=O)C=C RWXMAAYKJDQVTF-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- OZDGMOYKSFPLSE-UHFFFAOYSA-N 2-Methylaziridine Chemical compound CC1CN1 OZDGMOYKSFPLSE-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- SZTBMYHIYNGYIA-UHFFFAOYSA-N 2-chloroacrylic acid Chemical compound OC(=O)C(Cl)=C SZTBMYHIYNGYIA-UHFFFAOYSA-N 0.000 description 1
- WDQMWEYDKDCEHT-UHFFFAOYSA-N 2-ethylhexyl 2-methylprop-2-enoate Chemical compound CCCCC(CC)COC(=O)C(C)=C WDQMWEYDKDCEHT-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- VHSHLMUCYSAUQU-UHFFFAOYSA-N 2-hydroxypropyl methacrylate Chemical compound CC(O)COC(=O)C(C)=C VHSHLMUCYSAUQU-UHFFFAOYSA-N 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- CYPLQIZHAYEBNY-UHFFFAOYSA-N 3,4-dioctylnaphthalene-1,2-disulfonic acid Chemical compound C1=CC=C2C(S(O)(=O)=O)=C(S(O)(=O)=O)C(CCCCCCCC)=C(CCCCCCCC)C2=C1 CYPLQIZHAYEBNY-UHFFFAOYSA-N 0.000 description 1
- QZPSOSOOLFHYRR-UHFFFAOYSA-N 3-hydroxypropyl prop-2-enoate Chemical compound OCCCOC(=O)C=C QZPSOSOOLFHYRR-UHFFFAOYSA-N 0.000 description 1
- KIARZJWXAPZVQI-UHFFFAOYSA-N 3-nonylbenzenesulfonic acid Chemical compound CCCCCCCCCC1=CC=CC(S(O)(=O)=O)=C1 KIARZJWXAPZVQI-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- KWXICGTUELOLSQ-UHFFFAOYSA-N 4-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=C(S(O)(=O)=O)C=C1 KWXICGTUELOLSQ-UHFFFAOYSA-N 0.000 description 1
- UCDCOJNNUVYFKJ-UHFFFAOYSA-N 4-undecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCC1=CC=C(S(O)(=O)=O)C=C1 UCDCOJNNUVYFKJ-UHFFFAOYSA-N 0.000 description 1
- JTHZUSWLNCPZLX-UHFFFAOYSA-N 6-fluoro-3-methyl-2h-indazole Chemical compound FC1=CC=C2C(C)=NNC2=C1 JTHZUSWLNCPZLX-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical compound C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 description 1
- IEPRKVQEAMIZSS-UHFFFAOYSA-N Di-Et ester-Fumaric acid Natural products CCOC(=O)C=CC(=O)OCC IEPRKVQEAMIZSS-UHFFFAOYSA-N 0.000 description 1
- IEPRKVQEAMIZSS-WAYWQWQTSA-N Diethyl maleate Chemical compound CCOC(=O)\C=C/C(=O)OCC IEPRKVQEAMIZSS-WAYWQWQTSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 235000011054 acetic acid Nutrition 0.000 description 1
- 239000004480 active ingredient Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 125000004183 alkoxy alkyl group Chemical group 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical class CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 1
- 229940018557 citraconic acid Drugs 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 1
- JBSLOWBPDRZSMB-FPLPWBNLSA-N dibutyl (z)-but-2-enedioate Chemical compound CCCCOC(=O)\C=C/C(=O)OCCCC JBSLOWBPDRZSMB-FPLPWBNLSA-N 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- GMSCBRSQMRDRCD-UHFFFAOYSA-N dodecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCOC(=O)C(C)=C GMSCBRSQMRDRCD-UHFFFAOYSA-N 0.000 description 1
- 238000009503 electrostatic coating Methods 0.000 description 1
- CCIVGXIOQKPBKL-UHFFFAOYSA-M ethanesulfonate Chemical compound CCS([O-])(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-M 0.000 description 1
- 125000002573 ethenylidene group Chemical group [*]=C=C([H])[H] 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- MDNFYIAABKQDML-UHFFFAOYSA-N heptyl 2-methylprop-2-enoate Chemical compound CCCCCCCOC(=O)C(C)=C MDNFYIAABKQDML-UHFFFAOYSA-N 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 150000007529 inorganic bases Chemical class 0.000 description 1
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- OMNKZBIFPJNNIO-UHFFFAOYSA-N n-(2-methyl-4-oxopentan-2-yl)prop-2-enamide Chemical compound CC(=O)CC(C)(C)NC(=O)C=C OMNKZBIFPJNNIO-UHFFFAOYSA-N 0.000 description 1
- ZTUGCJNAJJDKDC-UHFFFAOYSA-N n-(3-hydroxypropyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCCCO ZTUGCJNAJJDKDC-UHFFFAOYSA-N 0.000 description 1
- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- HMZGPNHSPWNGEP-UHFFFAOYSA-N octadecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C(C)=C HMZGPNHSPWNGEP-UHFFFAOYSA-N 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 125000005429 oxyalkyl group Chemical group 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 239000002954 polymerization reaction product Substances 0.000 description 1
- BOQSSGDQNWEFSX-UHFFFAOYSA-N propan-2-yl 2-methylprop-2-enoate Chemical compound CC(C)OC(=O)C(C)=C BOQSSGDQNWEFSX-UHFFFAOYSA-N 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- AOHJOMMDDJHIJH-UHFFFAOYSA-N propylenediamine Chemical compound CC(N)CN AOHJOMMDDJHIJH-UHFFFAOYSA-N 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 229960001124 trientine Drugs 0.000 description 1
- RKBCYCFRFCNLTO-UHFFFAOYSA-N triisopropylamine Chemical compound CC(C)N(C(C)C)C(C)C RKBCYCFRFCNLTO-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Paints Or Removers (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、電着塗装によシ均一な艶消電着塗膜を形成す
る艶消電着塗装用樹脂組成物に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a resin composition for matte electrodeposition coating that forms a uniform matte electrodeposition coating film by electrodeposition coating.
従来、艶消状態の電着塗膜を得る方法としては、多くの
方法が提案されている。例えば、(1)電着塗膜をアル
コール溶液あるいはアルコール含有水溶液で処理する方
法(特公昭46−22351号公報参照)、(2)焼付
前の電着塗膜を酸を含有するかあるいはしない熱湯又は
加熱水蒸気で処理する方法(特公昭47−51927号
公報参照) 、(3)電着塗膜をカチオン系界面活性剤
で洗浄処理する方法(特公昭48−4447号公報参照
)、(4)焼付前の電着塗膜を有機酸又は無機酸の水溶
液で処理する方法(%開昭52(3)
一1!+7444〜157446号公報参照)、(5)
電着塗膜を洗浄後、塩の水溶液で処理する方法(特開昭
56−9592号公報参照)等、電着塗膜を形成した後
、薬品類で塗膜を処理する方法、あるいは、(6)艶消
剤を電着塗料中に分散させ電着塗装する方法(特開昭5
6−16569号公報参照)等が知られている。Conventionally, many methods have been proposed for obtaining a matte electrodeposited coating film. For example, (1) a method of treating the electrodeposition coating with an alcohol solution or an alcohol-containing aqueous solution (see Japanese Patent Publication No. 46-22351); (2) a method of treating the electrodeposition coating with hot water containing or without acid before baking; or a method of treating with heated steam (see Japanese Patent Publication No. 47-51927), (3) a method of cleaning the electrodeposited coating with a cationic surfactant (see Japanese Patent Publication No. 48-4447), (4) A method of treating the electrodeposited coating before baking with an aqueous solution of an organic or inorganic acid (see Publication Nos. 1973-11!+7444-157446), (5)
A method in which the electrodeposition coating film is washed and then treated with an aqueous salt solution (see Japanese Patent Application Laid-Open No. 56-9592), a method in which the electrodeposition coating film is formed and then treated with chemicals, or ( 6) A method of electrodeposition coating by dispersing a matting agent in the electrodeposition paint (Japanese Patent Laid-Open No. 5
6-16569) etc. are known.
しかしながら、電着塗膜を形成後、薬品等で塗膜を処理
する方法では十分な艶消効果が得られず、また処理液の
状態の変化に伴い艶消程度が変化し、均一な艶消塗膜が
安定して得られないという問題がある。更に、該方法で
は、従来の電着塗装工程に一工程付加されるため、作業
能率が低下するという問題も生じ、これらの理由によシ
、実用的規模での稼動は、いまだなされていないのが現
状である。However, the method of treating the coating film with chemicals etc. after forming the electrodeposited coating film does not produce a sufficient matting effect, and the degree of matting changes with changes in the condition of the treatment solution, resulting in uniform matting. There is a problem that a stable coating film cannot be obtained. Furthermore, since this method adds one step to the conventional electrodeposition coating process, there is the problem of reduced work efficiency, and for these reasons, it has not yet been implemented on a practical scale. is the current situation.
しかして、塗料中に艶消剤を配合し、塗膜を艶消しにす
る方法は電着塗装以外の塗装方法では多年にわたル実施
されている。However, the method of blending a matting agent into the paint to make the coating film matte has been practiced for many years in coating methods other than electrodeposition coating.
しかし、電着塗装においてはこの方法をその(4)
ま1利用することは困難である。例えば、艶消剤として
シリカ微粉末を分散させた電着塗料を使用した場合、シ
リカ微粉末は沈降する傾向を示し、このため被塗物の上
面と下面の艶消程度が大幅に異なり、又、塗料を不安定
にするという問題があった。However, it is difficult to utilize this method (4) in electrodeposition coating. For example, when using an electrodeposition paint in which fine silica powder is dispersed as a matting agent, the fine silica powder tends to settle, resulting in a significant difference in the degree of matting between the top and bottom surfaces of the object being coated. , there was a problem of making the paint unstable.
一方、艶消剤として溶剤不溶性の粒子状重合反応生成物
を塗料に添加することが前記(6)よシ公知である。こ
の方法によれば、従来の艶消剤を粉砕又は分散等の機械
的微細化工程が不要になるという利点があるが、前記の
艶消側添加の場合と同様に塗料中においては粒子状重合
反応生成物が沈降する傾向は避けられず、このため、均
一な艶消塗膜が得られないという問題が依然として残さ
れている。On the other hand, it is known from the above (6) to add a solvent-insoluble particulate polymerization reaction product to a paint as a matting agent. This method has the advantage of eliminating the need for conventional mechanical pulverization processes such as crushing or dispersing the matting agent. The tendency of the reaction products to settle is unavoidable, so that the problem still remains that uniform matte coatings cannot be obtained.
本発明者等は、これらの公知技術とは異なシ、艶消剤を
分散させることなく、又、電着塗膜の薬品等の処理を行
うことなく、通常の電着塗装を行うだけで艶消電着塗膜
が形成できる艶消電着塗装用樹脂組成物につき研究した
結果、本発(5)
明を完成したものである。The present inventors have developed a technique that differs from these known techniques, in that they can achieve a glossy finish by simply performing ordinary electrodeposition coating without dispersing a matting agent or treating the electrodeposition coating with chemicals. As a result of research into a resin composition for matte electrocoating that can form an electrostatic coating, the present invention (5) was completed.
すなわち、本発明の目的は、電着塗料として使用すると
均一かつ独特の風合いを有する艶消状態の電着塗膜を形
成する艶消電着塗装用樹脂組成物を提供することである
。That is, an object of the present invention is to provide a resin composition for matte electrodeposition coating, which forms a matte electrodeposition coating film having a uniform and unique texture when used as an electrodeposition coating.
本発明を概説すると、本発明は、樹脂組成物が、(a)
二次転移点が50℃以上のα、β−エチレン性不飽和ポ
リカルボン酸樹脂及び(b)メチロール基の少なくとも
一部が低級アルコールでアルコキクル化されたアルコキ
シル化メチロールメラミンを塗膜形成成分とし、@)成
分及び(tl)成分を混合して得られる生成物を有効成
分として含有する組成物であることを特徴とする艶消電
着塗装用樹脂組成物に関する。To summarize the present invention, the present invention provides that the resin composition comprises (a)
α,β-ethylenically unsaturated polycarboxylic acid resin having a secondary transition point of 50° C. or higher; and (b) an alkoxylated methylolmelamine in which at least a portion of the methylol group is alkoxylated with a lower alcohol as a coating film-forming component; The present invention relates to a resin composition for matte electrodeposition coating, which is a composition containing as an active ingredient a product obtained by mixing component @) and component (tl).
本発明の特異な点を詳細に説明する。本発明で使用する
α、β−エチレン性不飽和ポリカルボン酸樹脂は、α、
β−エチレン性不飽和カルボン酸と、これと共重合可能
力単量体とを反応させることにより得られ、かつその二
次転移点が50℃以上を有することを要件とする。The unique features of the present invention will be explained in detail. The α,β-ethylenically unsaturated polycarboxylic acid resin used in the present invention includes α,
It is required that it be obtained by reacting a β-ethylenically unsaturated carboxylic acid with a copolymerizable monomer, and that its secondary transition point is 50° C. or higher.
(g)
本発明において、α、β−エチレン性不飽和ポリカルボ
ン酸樹脂の二次転移点を50℃以上と規定した・理由は
、電着塗装した場合、析出した樹脂塗膜を加熱乾燥する
際、樹脂が熱溶融して塗膜表面が平たんになるのを抑制
し、電着塗装時の塗膜の凹凸をそのまま保持し艶消し状
態の外観が得られるためである。(g) In the present invention, the secondary transition point of α,β-ethylenically unsaturated polycarboxylic acid resin is specified as 50°C or higher.The reason is that when electrodeposition coating is applied, the deposited resin coating film is heated and dried. This is because the coating film surface is prevented from becoming flat due to thermal melting of the resin, and the unevenness of the coating film during electrodeposition is maintained as it is, resulting in a matte appearance.
従来の電着塗装においては、優れた塗膜光沢を得ること
を目的としていたため、電着塗料に使用するα、β−エ
チレン性不飽和ポリカルボン酸樹脂の二次転移点は、通
常10〜35℃の範囲のものが使用されている。したが
って、二次転移点が50℃未満の場合、電着塗膜の光沢
が良くなる傾向が認められ、本発明の艶消電着塗膜形成
を目的とする樹脂組成物としては望ましくない。In conventional electrodeposition coating, the aim was to obtain excellent coating film gloss, so the secondary transition point of α,β-ethylenically unsaturated polycarboxylic acid resin used in electrodeposition paint is usually 10 to 10. A temperature range of 35°C is used. Therefore, if the secondary transition point is less than 50° C., the gloss of the electrodeposition coating film tends to improve, which is not desirable as a resin composition intended for forming a matte electrodeposition coating film of the present invention.
α、β−エチレン性不飽和ポリカルボン酸樹脂は、酸価
約10〜200を有するものが適している。酸価が10
未満のものは十分に水に分散できず、又、塗料として使
用する場合に不安定(7)
であり、一方、酸価が200を越えると電着塗膜の再溶
解現象が生じ、又、塗膜のつき回シ性が劣って望ましく
ない。Suitable α,β-ethylenically unsaturated polycarboxylic acid resins have an acid value of about 10 to 200. acid value is 10
If the acid value is less than 200, the acid value cannot be sufficiently dispersed in water and is unstable when used as a paint (7). Undesirable because the coating film has poor rolling properties.
適当なα、β−エチレン性不飽和カルボン酸の例として
は、アクリル酸、α−クロロアクリル酸、メタクリル酸
、イタコン酸、無水マレイン酸、マレイン酸、フマル酸
、クロトン酸、シトラコン酸及びメザコン酸等の単独又
は混合物あるいは少なくとも1個のカルボキシル基を有
するそれらの官能性誘導体例えば、不飽和の重合性のジ
ー又はポリ−カルボン酸の部分的エステル又はアミドが
ある。Examples of suitable α,β-ethylenically unsaturated carboxylic acids include acrylic acid, α-chloroacrylic acid, methacrylic acid, itaconic acid, maleic anhydride, maleic acid, fumaric acid, crotonic acid, citraconic acid and mezaconic acid. alone or in mixtures or their functional derivatives having at least one carboxyl group, such as partial esters or amides of unsaturated polymerizable di- or poly-carboxylic acids.
偽β−エチレン性不飽和カルボン酸と共重合可能な単量
体の例としては、α、β−エチレン性不飽和カルボン酸
のエステル例えばアルキル及びオキシアルキルエステル
、又、アミド等の誘導体、並びに不飽和ジー又はポリ−
カルボン酸の遊離のカルボキシル基を含有していない誘
導体、例えば、ジエチルマレエート及びジブチルマレエ
ート等がある。Examples of monomers copolymerizable with pseudo-β-ethylenically unsaturated carboxylic acids include esters of α,β-ethylenically unsaturated carboxylic acids, such as alkyl and oxyalkyl esters, and derivatives such as amides; Saturated polyester or polyester
There are derivatives of carboxylic acids that do not contain free carboxyl groups, such as diethyl maleate and dibutyl maleate.
(8)
他の重合性のビニル又はビニリデン化合物例えばスチレ
ン、アルキルスチレン及びアクリロニトリル等も使用す
ることができる。(8) Other polymerizable vinyl or vinylidene compounds such as styrene, alkylstyrenes and acrylonitrile can also be used.
α、β−エチレン性不飽和カルボン酸のアルキルエステ
ルの例としては、メチルアクリレート、メチルメタクリ
レート、エチルアクリレート、エチルメタクリレート、
n−プロピルアクリレ−)、n−プロピルメタクリレー
ト、インプロピルアクリレート、イソプロピルメタクリ
レート、ブチルアクリレート、ブチルメタクリレート、
アクリルアミド、ジエチレングリコールモノアクリレー
ト、ジエチレングリコールメタクリレート、メタクリル
アミド、メチロールアクリルアミド、メチロールメタク
リルアミド、ジアセトンアクリルアミド、ジアセトンメ
タクリレート、ラウリルアクリレート、ラウリルメタク
リレート、ステアリルアクリレート、ステアリルメタク
リレート、ヘキシルアクリレート、2−エチルへキシル
メタクリレート、ヘプチルアクリレート及びヘプチルメ
タクリレート等が(9)
ある。又、α、β−エチレン性不飽和カルボン酸のヒド
ロキシアルキル又はアルコキシアルキルエステル及びα
、β−エチレン性不飽和カルボン酸アミド又はα、β−
エチレン性不飽和カルボン酸アミドの誘導体として、例
えば2−ヒドロキシエチルアクリレート、2−ヒドロキ
シエチルメタクリレート、2−ヒドロキシプロピルアク
リレート、2−ヒドロキシプロピルメタクリレート、3
−ヒドロキシプロピルアクリレート及び3−ヒドロキシ
プロピルメタクリルアミド等がある。Examples of alkyl esters of α,β-ethylenically unsaturated carboxylic acids include methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate,
n-propyl acrylate), n-propyl methacrylate, inpropyl acrylate, isopropyl methacrylate, butyl acrylate, butyl methacrylate,
Acrylamide, diethylene glycol monoacrylate, diethylene glycol methacrylate, methacrylamide, methylol acrylamide, methylol methacrylamide, diacetone acrylamide, diacetone methacrylate, lauryl acrylate, lauryl methacrylate, stearyl acrylate, stearyl methacrylate, hexyl acrylate, 2-ethylhexyl methacrylate, heptyl These include acrylate and heptyl methacrylate (9). Also, hydroxyalkyl or alkoxyalkyl esters of α,β-ethylenically unsaturated carboxylic acids and α
, β-ethylenically unsaturated carboxylic acid amide or α, β-
Examples of derivatives of ethylenically unsaturated carboxylic acid amide include 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 3
-hydroxypropyl acrylate and 3-hydroxypropyl methacrylamide.
他方、アルコキシル化メチロールメラミンは、メチロー
ル基の少なくとも一部を低級アルコールでアルコキシル
化したものであればよい。低ll 7 /l/ :l−
ルトシテハ、メチルアルコール、エチルアルコール、フ
ロビルアルコール、イソプロピルアルコール及ヒフチル
アルニール等ノ一種又は二種以上を使用する。On the other hand, the alkoxylated methylol melamine may be one in which at least a portion of the methylol group is alkoxylated with a lower alcohol. Low 7 /l/ :l-
One or more of the following are used: alcohol, methyl alcohol, ethyl alcohol, flobyl alcohol, isopropyl alcohol, and hyphthylalnyl.
本発明の艶消電着塗装用樹脂組成物における前記α、β
−不飽和ポリカルボン酸樹脂と、アルコキシル化メチロ
ールメラミンとの組成割合は、(10)
α、β−エチレン性不飽和ポリカルボン酸樹脂5〜95
重量部、アルコキシル化メチロールメラミン95〜5重
量部の範囲で使用できる。The above α and β in the resin composition for matte electrodeposition coating of the present invention
- The composition ratio of unsaturated polycarboxylic acid resin and alkoxylated methylol melamine is (10) α,β-ethylenically unsaturated polycarboxylic acid resin 5 to 95
It can be used in a range of 95 to 5 parts by weight of the alkoxylated methylolmelamine.
本発明の樹脂組成物は、例えげ、次のような方法で製造
することができる。The resin composition of the present invention can be produced, for example, by the following method.
かくはん板温度計を備えた容器に、a)二次転移点が5
0℃以上のα、β−エチレン性不飽和ポリカルボン酸樹
脂、b)アルコキシル化メチロールメラミン及び有機溶
剤を入れた後、かくはんを行い十分に混合して終了する
。In a container equipped with a stirring plate thermometer, a) a secondary transition point of 5
After adding the α,β-ethylenically unsaturated polycarboxylic acid resin at 0° C. or higher, b) alkoxylated methylolmelamine, and an organic solvent, the mixture is stirred and thoroughly mixed.
有機溶剤としては、例えばメタノール、エタノール、n
−7’ロバノール、イソプロピルアルコール、n−ブタ
ノール、イソブタノール、8ele−ブタノール、t−
ブタノール、ペンタノール等のようなアルコール類、ブ
チルセロソルブ、エチルセロソルブ、イソプロビルセロ
ソルフ、ブチルセロソルブ、8eC−ブチルセロソルブ
等のようなセロソルブ等を使用する。Examples of organic solvents include methanol, ethanol, n
-7' lovanol, isopropyl alcohol, n-butanol, isobutanol, 8ele-butanol, t-
Alcohols such as butanol, pentanol, etc., cellosolves such as butyl cellosolve, ethyl cellosolve, isoprobyl cellosolve, butyl cellosolve, 8eC-butyl cellosolve, etc. are used.
本発明の樹脂組成物においては、酸を配合すると望まし
い結果が得らnる。これは酸が電着(11)
塗膜の加熱焼付時に架橋触媒として働くためであると推
定される。In the resin composition of the present invention, desirable results can be obtained when an acid is blended. This is presumed to be because the acid acts as a crosslinking catalyst during heating and baking of the electrodeposited (11) coating.
本発明で樹脂組成物に配合可能な酸としては有機酸及び
/又は無機酸がある。有機酸としては、ギ酸、酢酸、シ
ュウ酸及びスルホン酸化合物等があシ、一方、無機酸と
しては、硫酸、塩酸、硝酸及びリン酸等が挙げられる。Acids that can be blended into the resin composition in the present invention include organic acids and/or inorganic acids. Examples of organic acids include formic acid, acetic acid, oxalic acid, and sulfonic acid compounds, while examples of inorganic acids include sulfuric acid, hydrochloric acid, nitric acid, and phosphoric acid.
本発明では、有機酸又は無機酸の少なくとも1種以上あ
るいは有機酸と無機酸との混合いずれも使用できる。In the present invention, at least one type of organic acid or inorganic acid, or a mixture of an organic acid and an inorganic acid can be used.
本発明では、スルホン酸化合物の使用が、特に優れた効
果を発揮するため望ましい。スルホン酸化合物としては
、脂肪族スルホン酸あるいは芳香族スルホン酸がある。In the present invention, it is desirable to use a sulfonic acid compound because it exhibits particularly excellent effects. Sulfonic acid compounds include aliphatic sulfonic acids and aromatic sulfonic acids.
脂肪族スルホン酸としては、メタンスルホン酸及びエタ
ンスルホン酸等のアルカンスルホン酸、芳香族スルホン
酸トしては、m−ノニルベンゼンスルホン酸、p−fシ
ルベンゼンスルホン酸、p−ウンデシルベンゼンスルホ
ン酸、p−ドデシルベンゼンスルホン酸及びp−)ルエ
ンスルホン酸等のア(12)
ルキルベンゼンスルホン酸、ジノニルナフタレンスルホ
ン酸、ジノニルナフタレンジスルホン酸、ジアキルナフ
タレンスルホン酸、ジアルキルナフタレンスルホン酸、
ジオクチルナフタレンジスルホン酸及びジデシルナフタ
レンジスルホン酸等のジアルキルナフタレンスルホン酸
又はジスルホン酸等を使用する。Examples of aliphatic sulfonic acids include alkanesulfonic acids such as methanesulfonic acid and ethanesulfonic acid; examples of aromatic sulfonic acids include m-nonylbenzenesulfonic acid, p-f sylbenzenesulfonic acid, and p-undecylbenzenesulfonic acid. A(12) alkylbenzenesulfonic acid, dinonylnaphthalenesulfonic acid, dinonylnaphthalenesulfonic acid, diakylnaphthalenesulfonic acid, dialkylnaphthalenesulfonic acid, such as p-dodecylbenzenesulfonic acid and p-)luenesulfonic acid;
Dialkylnaphthalenesulfonic acids or disulfonic acids such as dioctylnaphthalene disulfonic acid and didecylnaphthalene disulfonic acid are used.
酸の配合は、樹脂組成混合時が望ましいが、混合後に添
加することも可能である。The acid is preferably added at the time of mixing the resin composition, but it can also be added after mixing.
又、本発明では、塩基を、酸と共に、又は混合後に配合
して、酸を中和することもできる。Further, in the present invention, a base can be added together with the acid or after mixing to neutralize the acid.
更に、あらかじめ酸を塩基で中和して得られる酸の塩を
配合することもできる。Furthermore, an acid salt obtained by neutralizing the acid with a base in advance can also be blended.
前記酸を中和する塩基としては、アンモニア、無機塩基
及び有機窒素塩基のような通常の中和剤を使用できるが
、特に有機窒素塩基が望ましい。又、有機窒素塩基のう
ちでも、水難溶性又は、水不溶性のものが、特に望まし
い。その例としては、長鎖アルキルアミン又はアラルキ
ル基含有アミンがある。As the base for neutralizing the acid, conventional neutralizing agents such as ammonia, inorganic bases and organic nitrogen bases can be used, and organic nitrogen bases are particularly preferred. Furthermore, among the organic nitrogen bases, those that are sparingly soluble or insoluble in water are particularly desirable. Examples are long-chain alkyl amines or amines containing aralkyl groups.
(13)
本発明の樹脂組成物を電着塗装用−料とする場合、有機
アミン及び/又はアンモニアを添加し、α、β−エチレ
ン性不飽和ポリカルボン酸樹脂を水分散可能とした後、
適当な樹脂固形分濃度に希釈して使用する。その場合に
、電着塗装で常用の着色剤その他の添加剤を混合して使
用してもよい。(13) When using the resin composition of the present invention as a material for electrodeposition coating, after adding an organic amine and/or ammonia to make the α,β-ethylenically unsaturated polycarboxylic acid resin water-dispersible,
Dilute to an appropriate resin solids concentration before use. In that case, colorants and other additives commonly used in electrodeposition coating may be mixed and used.
こうして、調製した塗料中で電導性物品を電着塗装する
と物品の形状、大きさにかかわらず均一な艶消塗膜が得
られる。When a conductive article is electrodeposited in the paint thus prepared, a uniform matte coating can be obtained regardless of the shape or size of the article.
前記α、β−エチレン性不飽和ポリカルボン酸樹脂を水
分散可能とするために使用するアンモニア又は有機アミ
ンとしては、アンモニア、モノメチルアミン、ジメチル
アミン、トリメチルアミン、モノエチルアミン、ジエチ
ルアミン、トリエチルアミン、モノイソプロピルアミン
、ジイソプロピルアミン、トリイソプロピルアミン、モ
ノブチルアミン類、ジプチルアミン類及びトリブチルア
ミン類等のようなアルキルアミン、モノエタノールアミ
ン、ジェタノールアミ(14)
ン、トリエタノールアミン、モノイソプロパツールアミ
ン、ジイソプロパツールアミン、トリイソプロパツール
アミン、ジメチルアミノエタノール及びジエチルアミノ
エタノール等のようカアルカノールアミン、エチレンジ
アミン、プロピレンジアミン、ジエチレントリアミン及
びトリエチレンテトラミン等のようなアルキレンポリア
ミン、エチレンイミン及びプロピレンイミン等のような
アルキレンイミン、ピペラジン、モルホリン、ピラジン
及びピリジン等がある。The ammonia or organic amine used to make the α,β-ethylenically unsaturated polycarboxylic acid resin water-dispersible includes ammonia, monomethylamine, dimethylamine, trimethylamine, monoethylamine, diethylamine, triethylamine, monoisopropylamine. , diisopropylamine, triisopropylamine, monobutylamines, diptylamines and tributylamines, etc., monoethanolamine, jetanolamine (14), triethanolamine, monoisopropylamine, diisopropylamine, etc. alkylene polyamines such as ethylene diamine, propylene diamine, diethylene triamine and triethylene tetramine, alkylene imines such as ethylene imine and propylene imine etc. , piperazine, morpholine, pyrazine and pyridine.
本発明の樹脂組成物は、従来の電着塗装のラインでその
まま同じ方法によって塗装すればよく、艶消剤配合電着
塗料を使用する方法及び電着塗膜を化学薬品で後処理す
る方法では不可能な常に安定で均一な艶消塗膜が得られ
るという利点を有する。(特に最適の配合によれば、光
沢値が非常に小さくなる。)更に、本発明の樹脂組成物
を電着して得られる塗膜は、被塗物との密着性に優れ、
又耐酸性、耐アルカリ性及び耐沸水性等の塗膜性能にも
優れたものがある。The resin composition of the present invention can be applied directly on a conventional electrodeposition coating line using the same method, and there is no need to use a method using an electrodeposition paint containing a matting agent or a method in which the electrodeposition coating film is post-treated with chemicals. It has the advantage that a stable and uniform matte coating film, which is impossible to achieve, can be obtained at all times. (Particularly when the optimum formulation is used, the gloss value becomes very small.) Furthermore, the coating film obtained by electrodepositing the resin composition of the present invention has excellent adhesion to the object to be coated,
Some also have excellent coating properties such as acid resistance, alkali resistance, and boiling water resistance.
(15)
以下、本発明をよシ詳細に説明するために実施例を示す
。しかし、本発明は、これらに限定されるものではない
。(15) Examples will be shown below to explain the present invention in more detail. However, the present invention is not limited thereto.
なお、各側における部は重量部を意味する。In addition, parts on each side mean parts by weight.
製造例1[(a)成分の合成〕
かくはん機、温度計及び還流冷却器を備えた反応容器に
、メタクリル酸8部、2−エチルへキシルアクリレート
10部、メチルメタクリレ−)62部、2−ヒドロキシ
エチルメタクリレート10部、ブチルセロソルブ34部
、イソプロピルアルコール30部及びアゾビスインブチ
ロニ) IJル1,5部を仕込み、還流温度下で6時間
かくはんした。得られたα、β−エチレン性不飽和ポリ
カルボン酸樹脂の二次転移点は60℃で酸価は52であ
った。Production Example 1 [Synthesis of component (a)] In a reaction vessel equipped with a stirrer, a thermometer, and a reflux condenser, 8 parts of methacrylic acid, 10 parts of 2-ethylhexyl acrylate, 62 parts of methyl methacrylate, 2 -10 parts of hydroxyethyl methacrylate, 34 parts of butyl cellosolve, 30 parts of isopropyl alcohol, and 1.5 parts of azobisin butylonitrile were added and stirred at reflux temperature for 6 hours. The obtained α,β-ethylenically unsaturated polycarboxylic acid resin had a secondary transition point of 60° C. and an acid value of 52.
製造例2(対照例)
製造例1の方法において、2−エチルへキシルアクリレ
ート42部、メチルメタクリレート40部とその使用量
を変えた以外はすべて同じ方法を行い、α、β−エチレ
ン性不飽和ポリカル(16)
ボン酸樹脂を得た。これは、二次転移点20.6℃で酸
価は52であった。Production Example 2 (Comparative Example) The same method as in Production Example 1 was repeated except that the amounts used were changed to 42 parts of 2-ethylhexyl acrylate and 40 parts of methyl methacrylate, and α,β-ethylenically unsaturated Polycal (16) Bonic acid resin was obtained. This had a secondary transition point of 20.6°C and an acid value of 52.
実施例1
かくはん機及び温度計を備えた容器に、製造例1で得た
α、β−エチレン性不飽和ポリカルボ/酸樹脂溶液10
0部及びメトキシ・ブトキシ混合メチロールメラミン(
商品名、M!−40、玉料ケミカル社製)26部を仕込
みかくはんを行った。12時間かくはんを続けた後混合
を終了し、樹脂組成物を得た。Example 1 In a container equipped with a stirrer and a thermometer, 10 of the α,β-ethylenically unsaturated polycarbo/acid resin solution obtained in Production Example 1 was placed.
0 parts and methoxy/butoxy mixed methylolmelamine (
Product name: M! -40, manufactured by Tamayo Chemical Co., Ltd.) and stirred. After stirring for 12 hours, the mixing was completed to obtain a resin composition.
実施例2
実施例10方法において、パラトルエンスルホン酸0.
2部を配合して1時間かくはんして混合を行った以外は
、すべて同じ方法で樹脂組成物を得た。Example 2 In the method of Example 10, para-toluenesulfonic acid 0.
A resin composition was obtained in the same manner except that 2 parts were mixed and stirred for 1 hour.
実施例3
実施例1の方法において、パラドデシルベンゼンスルホ
ン酸CLS部及びトリーn−ブチルアミンa2部を配合
して1時間かくはんして混合を行った以外は、すべて同
じ方法で樹脂組成物(17)
を得た。Example 3 A resin composition (17) was prepared in the same manner as in Example 1, except that part of paradodecylbenzenesulfonic acid CLS and 2 parts of tri-n-butylamine a were blended and mixed by stirring for 1 hour. I got it.
実施例4
実施例1の方法において、バラドデシルベンゼンスルホ
ン酸をトリーn−ブチルアミンで中和して得た塩05部
を配合して1時間かくはんして混合を行った以外は、す
べて同じ方法で樹脂組成物を得た。Example 4 The same method as in Example 1 was repeated except that 05 parts of a salt obtained by neutralizing varadodecylbenzenesulfonic acid with tri-n-butylamine was added and mixed by stirring for 1 hour. A resin composition was obtained.
実施例5
実施例1の方法において、バラドデシルベンゼンスルホ
ン酸0.3部を配合し、1時間かくはんを行った後、)
ジ−n−ブチルアミンα2部を添加し2時間かくはんし
て混合した以外は、すべて同じ方法で樹脂組成物を得た
。Example 5 In the method of Example 1, 0.3 part of varadodecylbenzenesulfonic acid was blended, and after stirring for 1 hour,
A resin composition was obtained in the same manner except that 2 parts of di-n-butylamine α was added and mixed by stirring for 2 hours.
比較例1 実施例1の方法において、製造例2で得たα。Comparative example 1 In the method of Example 1, α obtained in Production Example 2.
β−エチレン性不飽和ポリカルボン酸樹脂溶液を使用し
た以外は、すべて同じ方法で樹脂組成物を得た。Resin compositions were obtained in the same manner except that a β-ethylenically unsaturated polycarboxylic acid resin solution was used.
応用例(電着塗装実験例〕
実施例1〜5及び比較例1で得られたそれぞ(18)
れの樹脂組成物を、トリエチルアミンで中和し、脱イオ
ン水で希釈して樹脂固形分10重量%の電着塗料を調製
した。Application example (electrodeposition coating experiment example) Each of the resin compositions (18) obtained in Examples 1 to 5 and Comparative Example 1 was neutralized with triethylamine and diluted with deionized water to reduce the resin solid content. A 10% by weight electrodeposition paint was prepared.
各電着塗料に無機電解着色(アンバー色)を施した未封
孔陽極酸化アルミニウム押出形材を陽極として浸漬し、
ステンレス板を対極として設け、電圧180ボルトで2
分間直流通電を行った。次いで、水洗の後、180℃で
30分間加熱乾燥を行った。この結果、得られた電着塗
膜の光沢、塗膜の物理的及び化学的性能は、下記第1表
に示すとおシであった。An unsealed anodized aluminum extruded shape with inorganic electrolytic coloring (amber color) applied to each electrodeposition paint was immersed as an anode.
A stainless steel plate is provided as a counter electrode, and the voltage is 180 volts.
Direct current was applied for one minute. Next, after washing with water, it was heated and dried at 180° C. for 30 minutes. As a result, the gloss of the electrodeposited coating film obtained and the physical and chemical properties of the coating film were as shown in Table 1 below.
なお、塗膜光沢は、60°鏡面反射率(J工5Z−87
41)によシ、塗膜硬度は、鉛筆引っかき試験(JIE
I H−8602) Kよ)、塗膜の耐アルカリ性は、
1%NaOH,40時間スポット試験(J工8 H−8
6f!2 )によ)、塗膜の耐酸性は、5% H2F3
04.24時間スポット試験によシ、塗膜の耐沸水性は
、100℃、5時間浸漬(J工5H−8602)により
、又、塗膜の密着性試験(、T工5H−8602)によ
った。In addition, the coating film gloss is determined by 60° specular reflectance (J-K5Z-87
41) The hardness of the coating film was determined by the pencil scratch test (JIE
I H-8602) K), the alkali resistance of the coating film is
1% NaOH, 40 hour spot test (J Engineering 8 H-8
6f! According to 2), the acid resistance of the coating film is 5% H2F3
04. The boiling water resistance of the coating film was determined by a 24-hour spot test, by immersion at 100°C for 5 hours (J Engineering 5H-8602), and by a coating film adhesion test (T Engineering 5H-8602). Yes.
(19)
(20)
以上の各側の結果(第1表)から明らかなように、本発
明による艶消電着塗装用樹脂組成物は、これを電着塗料
として使用すると均一かつ独特の風合いを有する艶消状
態の塗膜を形成することができる。(19) (20) As is clear from the above results (Table 1), the resin composition for matte electrodeposition coating according to the present invention has a uniform and unique texture when used as an electrodeposition paint. A matte coating film can be formed.
特許出願人 ハニー化成株式会社 代理人 中 本 宏 同 上 井 上 昭(21)Patent applicant Honey Kasei Co., Ltd. Agent Hiroshi Nakamoto Same as above, Akira Ii (21)
Claims (1)
α、β−エチレン性不飽和ポリカルボン酸樹脂及び…)
メチロール基の少なくとも一部が低級アルコールでアル
コキシル化されたアルコキシル化メチロールメラξンを
塗膜形成成分とし、(a)成分及び(kl)成分を混合
して得られる生成物を有効成分として含有する組成物で
あることを特徴とする艶消電着塗装用樹脂組成物。 2 該樹脂組成物が、(a)成分及び(1))成分の混
合時又は混合後に無機酸及び/又は有機酸を添加し、そ
れらを混合して得られる生成物を含有する組成物である
特許請求の範囲第1項に記載の艶消電着塗装用樹脂組成
物。 五 該樹脂組成物が、(a)成分及び(1))成分の混
合時又は混合後に無機酸及び/又は有機酸と、塩基とを
添加し、それらを混合して得られる(1°) 生成物を含有する組成物である特許請求の範囲第1項に
記載の艶消電着塗装用樹脂組成物。 屯 該樹脂組成物が、(a)成分及び(b)成分の混合
時又は混合後に無機酸及び/又は有機酸の塩を添加し、
それらを混合して得られる生成物を含有する組成物であ
る特許請求の範囲第1項に記載の艶消電着塗装用樹脂組
成物。 5 該樹脂組成物が、(a)成分及び(1))成分の混
合時又は混合後に無機酸及び/又は有機酸を添加し、そ
れらを混合し、次いで核酸を塩基で中和して得られる無
機酸の塩及び/又は有機酸の塩を包含する生成物を含有
する組成物である特許請求の範囲第4項に記載の艶消電
着塗装用樹脂組成物。 & 該樹脂組成物が、(a)成分及び(b)成分を混合
した後、有機アミン及び/又はアンモニアを添加し、α
、β−エチレン性不飽和ポリカルボン酸樹脂を中和して
得られる生成物を含有する組成物である特許請求の範囲
第1項〜第5項のいずれかに記載の艶消電着塗装用樹脂
組(2) 放物。 Z 該ra)成分が酸価10〜200を持つα、β−エ
チレン性不飽和ポリカルボン酸樹脂である特許請求の範
囲第1項〜第6項のいずれかに記載の艶消電着塗装用樹
脂組成物。[Scope of Claims] 1. The resin composition comprises (a) an α,β-ethylenically unsaturated polycarboxylic acid resin having a secondary transition point of 50°C or higher; and...)
The film-forming component is alkoxylated methylolmelane, in which at least a portion of the methylol groups are alkoxylated with a lower alcohol, and the product obtained by mixing components (a) and (kl) is contained as an active component. A resin composition for matte electrodeposition coating, characterized in that it is a composition. 2. The resin composition is a composition containing a product obtained by adding an inorganic acid and/or an organic acid during or after mixing components (a) and (1)) and mixing them. A resin composition for matte electrodeposition coating according to claim 1. (5) The resin composition is obtained by adding an inorganic acid and/or an organic acid and a base during or after mixing components (a) and (1)) and mixing them (1°). The resin composition for matte electrodeposition coating according to claim 1, which is a composition containing the following: tun The resin composition is prepared by adding a salt of an inorganic acid and/or an organic acid during or after mixing the components (a) and (b),
The resin composition for matte electrodeposition coating according to claim 1, which is a composition containing a product obtained by mixing them. 5. The resin composition is obtained by adding an inorganic acid and/or an organic acid during or after mixing components (a) and (1)), mixing them, and then neutralizing the nucleic acid with a base. The resin composition for matte electrodeposition coating according to claim 4, which is a composition containing a product including a salt of an inorganic acid and/or a salt of an organic acid. & The resin composition is prepared by adding organic amine and/or ammonia after mixing component (a) and component (b), and
, for matte electrodeposition coating according to any one of claims 1 to 5, which is a composition containing a product obtained by neutralizing a β-ethylenically unsaturated polycarboxylic acid resin. Resin set (2) Paraboloid. Z The matte electrodeposition coating according to any one of claims 1 to 6, wherein the ra) component is an α,β-ethylenically unsaturated polycarboxylic acid resin having an acid value of 10 to 200. Resin composition.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15666882A JPS5947270A (en) | 1982-09-10 | 1982-09-10 | Resin composition for matte electrodeposition coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15666882A JPS5947270A (en) | 1982-09-10 | 1982-09-10 | Resin composition for matte electrodeposition coating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5947270A true JPS5947270A (en) | 1984-03-16 |
| JPS6336357B2 JPS6336357B2 (en) | 1988-07-20 |
Family
ID=15632687
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15666882A Granted JPS5947270A (en) | 1982-09-10 | 1982-09-10 | Resin composition for matte electrodeposition coating |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5947270A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61188474A (en) * | 1985-02-14 | 1986-08-22 | Daihatsu Motor Co Ltd | Mat coating of trim parts for automobile |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5411939A (en) * | 1977-06-29 | 1979-01-29 | Kansai Paint Co Ltd | Electrodeposition coating composition of aluminum and electrodeposition coating |
| JPS5616569A (en) * | 1979-07-18 | 1981-02-17 | Shinto Paint Co Ltd | Preparation of matting agent composition for coating material |
-
1982
- 1982-09-10 JP JP15666882A patent/JPS5947270A/en active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5411939A (en) * | 1977-06-29 | 1979-01-29 | Kansai Paint Co Ltd | Electrodeposition coating composition of aluminum and electrodeposition coating |
| JPS5616569A (en) * | 1979-07-18 | 1981-02-17 | Shinto Paint Co Ltd | Preparation of matting agent composition for coating material |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61188474A (en) * | 1985-02-14 | 1986-08-22 | Daihatsu Motor Co Ltd | Mat coating of trim parts for automobile |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6336357B2 (en) | 1988-07-20 |
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