JPS5938746A - Photosensitive lithographic plate - Google Patents

Photosensitive lithographic plate

Info

Publication number
JPS5938746A
JPS5938746A JP14900582A JP14900582A JPS5938746A JP S5938746 A JPS5938746 A JP S5938746A JP 14900582 A JP14900582 A JP 14900582A JP 14900582 A JP14900582 A JP 14900582A JP S5938746 A JPS5938746 A JP S5938746A
Authority
JP
Japan
Prior art keywords
photosensitive
benzophenone
diazo resin
salt
printing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14900582A
Other languages
Japanese (ja)
Other versions
JPH0432378B2 (en
Inventor
Teruo Ezaka
江坂 照男
Takatoshi Oota
太田 高敏
Masao Nakatsuka
雅郎 中塚
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Okamoto Chemical Industry Co Ltd
Original Assignee
Okamoto Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Okamoto Chemical Industry Co Ltd filed Critical Okamoto Chemical Industry Co Ltd
Priority to JP14900582A priority Critical patent/JPS5938746A/en
Publication of JPS5938746A publication Critical patent/JPS5938746A/en
Publication of JPH0432378B2 publication Critical patent/JPH0432378B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds

Abstract

PURPOSE:To prevent stains on unexposed part, by incorporating benzophenone or its deriv. in a photosensitive compsn. composed of a diazo resin oreg. or inorg. salt and a polymer compd. soluble in an org. solvent. CONSTITUTION:0.1-50wt% benzophenone or its deriv. is incorporated in a photosensitive compsn. consisting of a diazo resin org. or inorg. salt and a polymer compd. soluble in an org. solvent. As said polymer compd., an epoxy, polybutyral, styrene-maleic anhydride copolymer, shellac, a multi-component polymer of acrylic or its deriv. resins, etc. are usable.

Description

【発明の詳細な説明】 本発明は感光性平版印刷版に関す机 一般に、ジアゾ化合物をホルムアルデヒドと縮合重合さ
せたジアゾ樹脂は、光分解によって窒素を放出し、その
水溶性を失う。この性質を利用して、オフセット印刷用
平版の製版用感光物質として広く使用されている。すな
わち、水溶性のジアゾ樹脂を支持体(アルミニウム板な
ど)上に塗布し、ネガチプを通して露光すると、光の当
たった部分は水に不溶となり、こノ1を水で現像すれば
、支持体表面にポジ画像が得られ、この画像は、湿し水
の存在で脂肪性の印刷インキを受着する、代表的なジア
ゾ樹脂として、T)−ジアゾジノエニルアミンのホルム
アルデヒド縮合物などがある、 そこで、ジアゾ樹脂のみを支持体上に塗布1゜たJIJ
版材料もあルpE、’rV 公Ill’(47−116
7、特公昭5G−30859に記載されているように、
ジアゾ樹脂に有機カップリング材または無機カップリン
グ剤を反応させて、有機溶媒に可溶なジアゾ樹脂有機塩
またはジアゾ樹脂無機塩を作り、それと有機溶媒可溶性
樹脂および染料の混合物を支持体上に塗布した製版材料
が知られている。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a photosensitive lithographic printing plate Generally, a diazo resin obtained by condensation polymerization of a diazo compound with formaldehyde releases nitrogen through photolysis and loses its water solubility. Taking advantage of this property, it is widely used as a photosensitive material for making planographic plates for offset printing. In other words, when a water-soluble diazo resin is applied onto a support (aluminum plate, etc.) and exposed to light through a negative chip, the exposed area becomes insoluble in water, and if this resin is developed with water, the surface of the support becomes A positive image is obtained, which accepts fatty printing inks in the presence of fountain solution. Typical diazo resins include formaldehyde condensates of T)-diazodinoenylamine. JIJ with 1° coating of diazo resin only on the support
Plate materials are also available, pE, 'rV Public Ill' (47-116
7. As stated in Special Publication No. 5G-30859,
A diazo resin organic salt or diazo resin inorganic salt is made by reacting a diazo resin with an organic coupling agent or an inorganic coupling agent, and a mixture of this, an organic solvent-soluble resin, and a dye is applied onto a support. There are known plate-making materials.

ジアゾ樹脂、ジアゾ樹脂有機塩、またはジアゾ樹脂無機
塩は、固体状態では比較的安定であるが、溶液状態貫た
は、支持体上に塗布した場合、暗反応が起こるために、
数日で袋化してしまい、未露光部分が容易に現像できな
くなったリ、非画線部に汚れを招く原因となる2、これ
らの保存性の欠点を解消するために、感光層の中へリン
酸、クエン酸、酒石酸等を加えることが試みられてきた
が、いずれも著しい効果は見られていない。
Diazo resins, diazo resin organic salts, or diazo resin inorganic salts are relatively stable in a solid state, but when applied in a solution state or on a support, a dark reaction occurs.
It becomes a bag in a few days, making it impossible to develop unexposed areas easily, and causing stains in non-image areas2. Attempts have been made to add phosphoric acid, citric acid, tartaric acid, etc., but no significant effects have been found in any of them.

本発明は、上記欠点を解決し、数ケ月経過り。The present invention has been solving the above drawbacks for several months.

たのち、あるいは苛酷な条件の下で数日経過したのちも
、未露光部分に汚れを生じない感光性組成物を提供する
もので、その要旨は、ジアゾ樹脂有機塩またはジアゾ樹
脂無機塩と有機溶媒可溶性高分子化合物からなる感光性
組成物に、0.1〜50重量%のベンゾフェノンおよび
/またはベンゾフェノン誘導体を含有させてなる感光層
を有することを特徴とする感光性平版印刷版にある。
The purpose of the present invention is to provide a photosensitive composition that does not cause stains on unexposed areas even after exposure to light or even after several days have passed under harsh conditions. A photosensitive lithographic printing plate characterized by having a photosensitive layer made of a photosensitive composition made of a solvent-soluble polymer compound containing 0.1 to 50% by weight of benzophenone and/or a benzophenone derivative.

本発明に用いられるジアゾ樹脂有機塩寸たはジアゾ樹脂
無機塩は特公昭42−5364、特公昭47−1167
、特公昭39−17602、特開昭54−98613に
に記載のp−ジアゾジフェニルアミンまたは3−メトキ
シジアゾジフェニルアミンおよびその誘導体とポルムア
ルデヒドまたはアセトアルデヒドとの縮合物に、酸性芳
香族化合物(例えば、ベンゼン、トルエンおよびナフタ
リンのホスフィン酸、ポスボン酸スルポン酸、およびカ
ルボン酸化合物、ならびにその誘導体)、捷たは水酸基
を含有する芳香族化合物(例えば、2−ヒドロキシ−4
−メトキシベンゾフェノン、2+2”/ヒドロキシー4
,4′−ジメトキンペンゾフエノン、2−ヒドロキシ−
4−メトキンベンゾフェノン−5−スルボン酸、2−ヒ
ドロキシ−4−メトキシベンゾフェノン−5−スルホン
酸三水和物)または無機化合物(例えば、ヘキザフルオ
ルリン酸、ポウフッ化水素酸、ボウフッ化ホウ素酸、ケ
イフッ化水素酸、ケイ7)化ホウ素酸、チオンアン酸カ
リウム、チオシアン酸ナトIJウム)を反応させて、水
に不溶で有機溶媒に可溶としたものである。
The size of the diazo resin organic salt or diazo resin inorganic salt used in the present invention is Japanese Patent Publication No. 42-5364, Japanese Patent Publication No. 47-1167
, Japanese Patent Publication No. 39-17602 and Japanese Patent Application Publication No. 54-98613, acidic aromatic compounds (e.g., benzene, phosphinic acids, postboxylic sulfonic acids, and carboxylic acid compounds of toluene and naphthalene, and their derivatives), aromatic compounds containing linear or hydroxyl groups (e.g., 2-hydroxy-4
-Methoxybenzophenone, 2+2”/Hydroxy4
, 4'-dimethquine penzophenone, 2-hydroxy-
4-methquine benzophenone-5-sulfonic acid, 2-hydroxy-4-methoxybenzophenone-5-sulfonic acid trihydrate) or inorganic compounds (e.g. hexafluorophosphoric acid, polyhydrofluoric acid, boron fluoride) It is made insoluble in water but soluble in organic solvents by reacting acids, hydrofluorosilicic acid, boronic acid, potassium thionanate, and sodium thiocyanate.

本発明に用いられる有機溶媒可溶性の高分子化合物とし
ては、エポキシ樹脂、ポリブチラール樹脂、スチレン−
無水マレイン酸共重合体樹脂、ジエンツク樹脂、多元重
合アクリル樹脂およびこれらの誘導体で、特に、米国特
許4282301に記載されているアクリル樹脂が好ま
しい。また、上記高分子化合物を単独、あるいは、2種
以上紹合わせて使用することもできる。
Examples of organic solvent-soluble polymer compounds used in the present invention include epoxy resin, polybutyral resin, and styrene resin.
Among maleic anhydride copolymer resins, dieck resins, multi-component acrylic resins, and derivatives thereof, acrylic resins described in US Pat. No. 4,282,301 are particularly preferred. Moreover, the above-mentioned polymer compounds can be used alone or in combination of two or more.

さらに本発明において、必要に応じて、可塑剤や染料を
加えることもできる。
Furthermore, in the present invention, a plasticizer and a dye can be added as necessary.

染料は、現像したのち、支持体と画像部が明?1iに識
別できるようにするために加えるもので、現像によって
、画線部が色抜けを起こしたり、ジアゾ感光物や有機高
分子化合物と反応するものは好ましくない。従って、好
ましいものとして、例えば、オイルブルー$603(オ
リエント化学工業(株)製)、ビクトリアブルーBα1
(保土谷化学工業C株)製)、クリスタルバイオレット
、クリスタルブルー、メチレンブルー、マラカイトグリ
ーン等を用いることができる。
Does the dye make the support and image area bright after development? 1i to make it distinguishable, and it is not preferable to use a material that causes color loss in the image area during development or reacts with the diazo photosensitive material or organic polymer compound. Therefore, preferred examples include Oil Blue $603 (manufactured by Orient Chemical Industry Co., Ltd.) and Victoria Blue Bα1.
(manufactured by Hodogaya Chemical Industry C Co., Ltd.), crystal violet, crystal blue, methylene blue, malachite green, etc. can be used.

本発明に用いられるベンゾフェノンおよびその誘導体と
して、ベンゾフェノン、メチルベンゾフェノン、2.4
−ジヒドロキシベンゾフェノベンゾフェノン、2.2’
、4.4’−テトラヒドロキシベンゾフェノン、2−ヒ
ドロキシ−4−メトキシベンゾフェノン−5−スルポン
酸およびそのアミン塩、4−メチル−ベンゾフェノン−
2−カルボン酸、3−ニトロ−4−クロロベンゾフェノ
ン−2−カルボン酸、2−ヒドロキシ−4−メトキシベ
ンゾフェノン−5−スルホン酸とp−ジアゾジフェニル
アミンとの塩、または類似化合物とし9てベンジル等を
挙けることができる。
Benzophenone and its derivatives used in the present invention include benzophenone, methylbenzophenone, 2.4
-dihydroxybenzophenobenzophenone, 2.2'
, 4,4'-tetrahydroxybenzophenone, 2-hydroxy-4-methoxybenzophenone-5-sulfonic acid and its amine salt, 4-methyl-benzophenone-
Salts of 2-carboxylic acid, 3-nitro-4-chlorobenzophenone-2-carboxylic acid, 2-hydroxy-4-methoxybenzophenone-5-sulfonic acid and p-diazodiphenylamine, or similar compounds such as benzyl can be mentioned.

本発明の感光性組成物を塗布する支持体として、紙、プ
ラスチックフィルム、亜鉛、銅、アルミニウム、ステン
レス、または、これらの2種以上を組合わせた複合材料
が用いられる。表面を陽極酸化したアルミニウム板を好
適に用いることができる。
Paper, plastic film, zinc, copper, aluminum, stainless steel, or a composite material made of a combination of two or more of these can be used as a support to which the photosensitive composition of the present invention is applied. An aluminum plate whose surface is anodized can be suitably used.

有機溶媒、例えば、メチルセロソルブ、エチルセロンル
プ、ジメチルホルムアミド、ジメチルスルホキシド、メ
タノール、塩化メチレン、メチルセロソルブアセテート
、エチルセロソルブアセデート 、合した混合液を用いて、上記感光性組成物を溶解し、
その溶液を支持体に塗布して乾燥する。
Dissolving the photosensitive composition using an organic solvent, for example, a mixture of methyl cellosolve, ethyl cellonolp, dimethyl formamide, dimethyl sulfoxide, methanol, methylene chloride, methyl cellosolve acetate, ethyl cellosolve acetate,
The solution is applied to a support and dried.

現像には、無機または有機アルカリ、例えば、ケイ酸ソ
ーダ、ケイ酸カリウム、苛性ソーダ、苛性カリウム、モ
ノエタノールアミン、ジェタノールアミン、トリエタノ
ールアミン等の水溶液を現像液として用いることができ
、さらにアニオン界面界性剤と有機溶剤を含有させると
好ましい。
For development, an aqueous solution of an inorganic or organic alkali, such as sodium silicate, potassium silicate, caustic soda, potassium hydroxide, monoethanolamine, jetanolamine, triethanolamine, etc., can be used as a developer, and an anionic interface. It is preferable to contain a surfactant and an organic solvent.

以下に実施例を示す。Examples are shown below.

実施例 1 窒素気流下で、ジオキサン150yにアゾビスイソブチ
ロニトリル0.3yを加え、80〜85℃に加熱し、そ
の中へ、2−ヒドロキシ−3−フェノキシプロビルアク
リレート50 y 、  メチルメタクリレート25y
1 アクリロニトリル10P1 メタクリル酸2yの混
合液を攪拌しながら滴下した。滴下終了後、3時間攪拌
を続け、ジメーキサン150yを加えたのち、水中に投
入して共重合体を沈殿させた。その沈殿を濾過し、40
℃で乾燥させて、共重合体(1)を得た。
Example 1 Under a nitrogen stream, 0.3 y of azobisisobutyronitrile was added to 150 y of dioxane and heated to 80 to 85°C, into which 50 y of 2-hydroxy-3-phenoxypropylacrylate and methyl methacrylate were added. 25y
A mixed solution of 1 acrylonitrile 10P1 and methacrylic acid 2y was added dropwise while stirring. After the dropwise addition was completed, stirring was continued for 3 hours, and 150 y of dimexane was added, followed by pouring into water to precipitate the copolymer. The precipitate was filtered and
It was dried at ℃ to obtain a copolymer (1).

次に、厚さ0.25 勝のIS(1種特殊級)アルミニ
ウム板ヲ、70℃の10係苛性ソーダ溶液に10秒間浸
漬して脱脂する。次いで、ナイロンフ゛ラシを用いて砂
目立てしたのち、5qbカセイソーダ、20%IJン酸
ソーダの混合液で、70℃、10秒間エツチングして水
洗した。そののち、10%硫酸溶液中、電流密度2A/
drr?で2分間陽極液化し、水洗したのち、5%ケイ
酸ソーダ溶液で70℃で30秒間皮膜処理1−、陽極酸
化アルミニウム板(1)を作製した8 上記アルミニウム板(1)に、次の組成をもつ感光液(
5)、(B)を塗布し、乾燥した。
Next, an IS (class 1 special grade) aluminum plate having a thickness of 0.25 mm was degreased by immersing it in a 10% caustic soda solution at 70° C. for 10 seconds. Next, it was grained using a nylon brush, etched with a mixed solution of 5 qb caustic soda and 20% IJ sodium phosphate at 70° C. for 10 seconds, and washed with water. After that, in a 10% sulfuric acid solution, the current density was 2A/
drrr? After anodic liquefaction for 2 minutes and washing with water, a film treatment was carried out at 70°C for 30 seconds with a 5% sodium silicate solution 1- An anodized aluminum plate (1) was prepared. A photosensitive liquid with (
5) and (B) were applied and dried.

感光液(4)の組成 メチルセロソルブ              60y
共重合体(1)15y p−ジアゾジフェニルアミンとバラホルムアルテヒドと
の縮合物のドデシルベンゼンスルホン酸塩      
             1.5yビクトリアブルー
BOH             0.4y上記感光液
(5)に、ベンゾフェノン1.01を加えたものを感光
液(B)とする。感光液囚,[F]n塗布したアルミニ
ウム板(1)を、それぞれ印刷版(5)−(1)、ff
3>−1とした。印刷版(A−1、(B)−1それぞれ
を45℃、湿度75%の恒温恒湿槽中に5日間放置した
のち、ネガフィルムを通して、2y。
Composition of photosensitive liquid (4) Methyl cellosolve 60y
Copolymer (1) 15y Dodecylbenzenesulfonate of condensate of p-diazodiphenylamine and paraformaltehyde
1.5y Victoria Blue BOH 0.4y A photosensitive solution (B) was prepared by adding 1.01 ml of benzophenone to the above photosensitive solution (5). The aluminum plate (1) coated with photosensitive liquid, [F]n, was printed as a printing plate (5)-(1), ff, respectively.
3>-1. Each of the printing plates (A-1 and (B)-1) was left in a constant temperature and humidity chamber at 45°C and 75% humidity for 5 days, and then passed through a negative film for 2y.

の高圧水銀灯を用いて、1mの距離で45秒間露光した
。次いで、下記の組成の現像液に、5℃で1分間浸漬し
たのち水洗した。
Using a high-pressure mercury lamp, exposure was performed for 45 seconds at a distance of 1 m. Next, it was immersed in a developer having the composition shown below at 5° C. for 1 minute, and then washed with water.

現像液の組成 ケイ酸ソーダ 40%水溶液          5y
イソプロピルナフタレンスルホン酸ソーダ   2y亜
硫酸カリウム                1yフ
エニルグリコール             5y水 
                     2371
現像された印刷版(A) − 1 、(B) − 1を
版として、印刷したところ、印刷版囚−1においては、
その印刷面の非画線部に汚れが生じたが、印刷版(B)
−1では、汚れのない良好な印刷が得られた。
Composition of developer Sodium silicate 40% aqueous solution 5y
Sodium isopropyl naphthalene sulfonate 2y Potassium sulfite 1y Phenyl glycol 5y Water
2371
When printing was carried out using the developed printing plates (A)-1 and (B)-1 as plates, in the printing plate-1,
Although stains occurred on the non-printing area of the printing surface, printing plate (B)
-1, good printing without stains was obtained.

実施例 2 厚さ0.25戸、幅1000iaのアルミニウム板(利
’J’t 110(+ )をアルカリ脱脂し、水洗した
のtハ ストンパウダーの20%水溶液からなる(jl
磨剤を使用してブラシ研磨した。次に、10%の苛性ソ
ーダ浴で研磨残渣をよく除去し、水洗1〜たのち、塩酸
2.5%、塩化す) IJウム0,1係を含む電解液(
20℃)中で、電流密度10A/(Irr+’で10秒
間、交解 流0[磨した。そののち、水洗し、10優硫酸浴(30
℃)中、電流密度2A/山イで、60秒間陽極酸化し、
水洗したのち、5%ケイ酸カリウム浴(40℃)中で、
1[流密度2A/d,イとして、15秒間、再度、交流
陽極酸化処理を施こし、水洗、乾燥して陽極酸化された
アルミニウム板(2)を得た。
Example 2 An aluminum plate (110(+)) with a thickness of 0.25 mm and a width of 1000 ia was degreased with alkali and washed with water.
Brush polished using polish. Next, thoroughly remove the polishing residue in a 10% caustic soda bath, wash with water for 1 to 2 hours, and then chlorinate with 2.5% hydrochloric acid).
20°C) for 10 seconds at a current density of 10A/(Irr+') with an alternating current of 0[.
℃) at a current density of 2A/Ya for 60 seconds,
After washing with water, in a 5% potassium silicate bath (40°C),
1 [AC anodizing treatment was performed again for 15 seconds at a flow density of 2 A/d, A, and an anodized aluminum plate (2) was obtained by washing with water and drying.

このアルミニウム板(2)に次の感光液を塗布し、乾燥
した。
The following photosensitive solution was applied to this aluminum plate (2) and dried.

感光液(C)の組成 メチルセロソルブ               50
yジメチルホルムアミド            JO
y共重合体 (1)                
 ]!5Pp−ジアゾジフェニルアミンとパラホルムア
ルデヒドとの縮合物のチオシアン酸カリウム塩    
                 1.5”オイルブ
ルー#603             o、sp感光
液(0に2−ヒドロキシ−4−メトキシベンゾフェノン
−5−スルホン酸アミ゛/塩1.5 F を加えたもの
を感光液(D)とする。感光液(C) 、 (r))を
塗布1−たアルミニウム板(2)f:、それぞれ印刷版
(C) −2、(D) −2とした。
Composition of photosensitive liquid (C) Methyl cellosolve 50
ydimethylformamide JO
y copolymer (1)
]! Potassium thiocyanate salt of condensate of 5Pp-diazodiphenylamine and paraformaldehyde
A photosensitive solution (D) is prepared by adding 1.5 F of 2-hydroxy-4-methoxybenzophenone-5-sulfonic acid amide/salt to 1.5" Oil Blue #603 O, SP photosensitive solution. Aluminum plates (2)f: coated with photosensitive solutions (C) and (r)) were used as printing plates (C)-2 and (D)-2, respectively.

印刷版(C)−2、■)−2それぞれ1に45℃、湿度
75eIbの恒温恒湿槽に5日間放置lまたのち、実施
full 1と同じ方法で、露光・現像を行なった。現
像された印刷版(0−2、(DI−2を版として、印刷
したところ、印刷版(C)−2においては、非画線部に
汚れが生じたが印刷版Q))−2では、汚れのない良好
な印刷が得られた。
Printing plates (C)-2 and 2)-2 were left in a constant temperature and humidity chamber at 45° C. and humidity 75 eIb for 5 days, and then exposed and developed in the same manner as in Full 1. The developed printing plate (0-2, (DI-2) was used as the plate for printing, and in the printing plate (C)-2, stains occurred in the non-printing area, but in the printing plate Q))-2, stains appeared. , a good print with no stains was obtained.

以上の実施例より明らかなように、本発明の感光層を有
する印刷用平版は、良好な印刷特性を持つものである。
As is clear from the above examples, the printing plate having the photosensitive layer of the present invention has good printing characteristics.

手続補正書(自発) 昭和57年11月19日 ユlV5’。7゜ 6ゎオ。えい   ′1、事件の表
示 昭和57年 特許願 第 149005   υ。
Procedural amendment (voluntary) November 19, 1981 YulV5'. 7゜ 6ゎo. Ei '1, Indication of the Case 1982 Patent Application No. 149005 υ.

2、発明の名称 感光性平版印刷版 3、補正をする者 事件との関係  特許出願人 住所 4、代 理 人〒107 ほか 2 名 補正の内容 (11明イ111書第2頁第11行の「有機カップリン
グ口」を[有機カップリング剤−1と訂正するっ(2)
  同書同日下から第2行の「袋化−1を1劣化」と訂
正する。
2. Name of the invention Photosensitive lithographic printing plate 3. Person making the amendment Relationship with the case Address of the patent applicant 4 Agent address: 107 and 2 others Contents of the amendment (11 Mei 111, page 2, line 11) Correct "organic coupling port" to "organic coupling agent-1" (2)
On the same day, the second line from the bottom of the same book is corrected to read ``Bagification - 1 is 1 deterioration''.

(3) 1trJ 1.I’ ?t44 N 第4 行
の「ボスホン酸スルホン酸」を1ポスポン酸、スルホン
酸」と訂正する。
(3) 1trJ 1. I'? t44 N Correct "bosphonic acid, sulfonic acid" in the 4th line to "1posonic acid, sulfonic acid".

(4)  同ν[第10区第3行ないしv、4行の1−
ストンパウタ−」を「カーボランダム」と訂正する。
(4) Same ν [10th ward, 3rd line to v, 4th line 1-
"Stonpowter" is corrected to "Carborundum".

Claims (1)

【特許請求の範囲】[Claims] ジアゾ樹脂有機塩またはジアゾ樹脂無機塩と有機溶媒可
溶性高分子化合物からなる感光性組成物に、0.1〜5
0重量係のベンゾフェノンおよび/またはベンゾフェノ
/誘導体を含有させてなる感光層を有することを特徴と
する感光性平版印刷版。
A photosensitive composition consisting of a diazo resin organic salt or a diazo resin inorganic salt and an organic solvent-soluble polymer compound is
1. A photosensitive lithographic printing plate comprising a photosensitive layer containing 0% by weight of benzophenone and/or benzophenone/derivative.
JP14900582A 1982-08-27 1982-08-27 Photosensitive lithographic plate Granted JPS5938746A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14900582A JPS5938746A (en) 1982-08-27 1982-08-27 Photosensitive lithographic plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14900582A JPS5938746A (en) 1982-08-27 1982-08-27 Photosensitive lithographic plate

Publications (2)

Publication Number Publication Date
JPS5938746A true JPS5938746A (en) 1984-03-02
JPH0432378B2 JPH0432378B2 (en) 1992-05-29

Family

ID=15465576

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14900582A Granted JPS5938746A (en) 1982-08-27 1982-08-27 Photosensitive lithographic plate

Country Status (1)

Country Link
JP (1) JPS5938746A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5324449A (en) * 1976-08-18 1978-03-07 Iro Ab Thread supplying device for textile machine
JPS5525093A (en) * 1978-08-10 1980-02-22 Polychrome Corp Storageestable lithography print plate

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5324449A (en) * 1976-08-18 1978-03-07 Iro Ab Thread supplying device for textile machine
JPS5525093A (en) * 1978-08-10 1980-02-22 Polychrome Corp Storageestable lithography print plate

Also Published As

Publication number Publication date
JPH0432378B2 (en) 1992-05-29

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