JPS5921020A - 荷電ビ−ム露光装置用成形絞り - Google Patents
荷電ビ−ム露光装置用成形絞りInfo
- Publication number
- JPS5921020A JPS5921020A JP13061682A JP13061682A JPS5921020A JP S5921020 A JPS5921020 A JP S5921020A JP 13061682 A JP13061682 A JP 13061682A JP 13061682 A JP13061682 A JP 13061682A JP S5921020 A JPS5921020 A JP S5921020A
- Authority
- JP
- Japan
- Prior art keywords
- wires
- forming
- fine
- gold wire
- thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000465 moulding Methods 0.000 title abstract description 3
- 238000007493 shaping process Methods 0.000 claims description 28
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 claims 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 abstract description 87
- 229910052737 gold Inorganic materials 0.000 abstract description 30
- 239000010931 gold Substances 0.000 abstract description 30
- 238000003466 welding Methods 0.000 abstract description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052709 silver Inorganic materials 0.000 abstract description 2
- 239000004332 silver Substances 0.000 abstract description 2
- 230000001788 irregular Effects 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 description 18
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 17
- 229910052750 molybdenum Inorganic materials 0.000 description 17
- 239000011733 molybdenum Substances 0.000 description 17
- 238000010894 electron beam technology Methods 0.000 description 15
- 238000000034 method Methods 0.000 description 10
- 230000009467 reduction Effects 0.000 description 7
- 238000005096 rolling process Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000003780 insertion Methods 0.000 description 3
- 230000037431 insertion Effects 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000003365 glass fiber Substances 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 241000254158 Lampyridae Species 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- WDQNIWFZKXZFAY-UHFFFAOYSA-M fentin acetate Chemical compound CC([O-])=O.C1=CC=CC=C1[Sn+](C=1C=CC=CC=1)C1=CC=CC=C1 WDQNIWFZKXZFAY-UHFFFAOYSA-M 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 230000008685 targeting Effects 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13061682A JPS5921020A (ja) | 1982-07-27 | 1982-07-27 | 荷電ビ−ム露光装置用成形絞り |
| US06/515,304 US4550258A (en) | 1982-07-27 | 1983-07-19 | Aperture structure for charged beam exposure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13061682A JPS5921020A (ja) | 1982-07-27 | 1982-07-27 | 荷電ビ−ム露光装置用成形絞り |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5921020A true JPS5921020A (ja) | 1984-02-02 |
| JPS637023B2 JPS637023B2 (enrdf_load_stackoverflow) | 1988-02-15 |
Family
ID=15038476
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13061682A Granted JPS5921020A (ja) | 1982-07-27 | 1982-07-27 | 荷電ビ−ム露光装置用成形絞り |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5921020A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61125043U (enrdf_load_stackoverflow) * | 1985-01-25 | 1986-08-06 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54122978A (en) * | 1978-03-16 | 1979-09-22 | Jeol Ltd | Detecting method and its apparatus for electron ray information in electron ray exposure unit |
| JPS5556628A (en) * | 1978-10-23 | 1980-04-25 | Jeol Ltd | Electron beam exposure device |
-
1982
- 1982-07-27 JP JP13061682A patent/JPS5921020A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54122978A (en) * | 1978-03-16 | 1979-09-22 | Jeol Ltd | Detecting method and its apparatus for electron ray information in electron ray exposure unit |
| JPS5556628A (en) * | 1978-10-23 | 1980-04-25 | Jeol Ltd | Electron beam exposure device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61125043U (enrdf_load_stackoverflow) * | 1985-01-25 | 1986-08-06 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS637023B2 (enrdf_load_stackoverflow) | 1988-02-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4550258A (en) | Aperture structure for charged beam exposure | |
| DE2926168C2 (de) | Vorrichtung zur Messung der Umfangsausbildung eines Gegenstandes | |
| DE69028168T2 (de) | Rasterelektronenmikroskop und Verfahren zur Darstellung von Schnittprofilen unter Anwendung desselben | |
| DE3507778A1 (de) | Vorrichtung und verfahren zur eichung eines mikroskopischen bearbeitungssystems mit hilfe einer justierplatte | |
| KR20160102966A (ko) | 프레임을 갖는 증착 마스크의 제조 방법, 인장 장치, 유기 반도체 소자의 제조 장치 및 유기 반도체 소자의 제조 방법 | |
| DE2942388A1 (de) | Halbleiterplaettchen-positioniervorrichtung | |
| DE4021115A1 (de) | Optischer kopf | |
| JPH01213948A (ja) | 電子ビーム投射装置 | |
| JP2003068454A (ja) | 有機ｅｌ素子製造に用いる真空蒸着用多面付けマスク装置 | |
| WO2012042738A1 (ja) | 走査電子顕微鏡 | |
| JP4951960B2 (ja) | メタルマスク、メタルマスク位置アラインメント方法及び装置 | |
| JPS5921020A (ja) | 荷電ビ−ム露光装置用成形絞り | |
| US20020003626A1 (en) | Apparatus for detecting optical positional deviation | |
| JP3480829B2 (ja) | ダイナミック・フォーカス・コイルを有する粒子ビーム・システム | |
| DE19853588A1 (de) | Halteeinrichtung für ein Substrat | |
| KR960008603B1 (ko) | 음극관 편향기의 권선 방법 및 그에 따라 제조된 편향기 | |
| JPH09295175A (ja) | レーザ加工機 | |
| DE69416941T2 (de) | Gerät zur Musteraufzeichnung mittels Elektronenstrahl und Mustersaufzeichnungsverfahren unter Verwendung eines solchen Geräts | |
| US7060175B2 (en) | Producing method for optical element molding die and producing method for optical element | |
| US2679018A (en) | Magnetic electron lens pole piece | |
| JPH0145737B2 (enrdf_load_stackoverflow) | ||
| JP2006265712A (ja) | 基準位置指示装置及びメタルマスク位置アラインメント装置 | |
| EP1156497A1 (en) | Method and device for manufacturing of saddle coils | |
| TW472298B (en) | Electron beam exposure apparatus, adjusting method, and block mask for adjustment | |
| JPH02163601A (ja) | 走査型トンネル顕微鏡 |