JPS5919669A - High speed fluid dry polishing method - Google Patents

High speed fluid dry polishing method

Info

Publication number
JPS5919669A
JPS5919669A JP12820282A JP12820282A JPS5919669A JP S5919669 A JPS5919669 A JP S5919669A JP 12820282 A JP12820282 A JP 12820282A JP 12820282 A JP12820282 A JP 12820282A JP S5919669 A JPS5919669 A JP S5919669A
Authority
JP
Japan
Prior art keywords
polishing
workpiece
spindle
media
spindles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12820282A
Other languages
Japanese (ja)
Other versions
JPH0229472B2 (en
Inventor
Hiroshi Matsumoto
弘 松本
Mitsuru Fujiki
藤木 満
Tsuyoshi Tamura
田村 堅
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
WAIDOMAN KK
Uemera Kogyo Co Ltd
C Uyemura and Co Ltd
Original Assignee
WAIDOMAN KK
Uemera Kogyo Co Ltd
C Uyemura and Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by WAIDOMAN KK, Uemera Kogyo Co Ltd, C Uyemura and Co Ltd filed Critical WAIDOMAN KK
Priority to JP12820282A priority Critical patent/JPH0229472B2/en
Publication of JPS5919669A publication Critical patent/JPS5919669A/en
Publication of JPH0229472B2 publication Critical patent/JPH0229472B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B31/00Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
    • B24B31/003Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor whereby the workpieces are mounted on a holder and are immersed in the abrasive material

Abstract

PURPOSE:To enable a work to be uniformly satisfactorily polished by locating the work beneath a spindle in fluid polishing by which the work mounting spindle is revolved and rotated on its own axis in a polishing tank which is filled with a medium. CONSTITUTION:Works 15, 15' are mounted in jigs 14, 14' of spindles 13, 13' at a lowered position of a polishing tank 1. The polishing tank filled with abrasives consisting of grease and grains and added to wooden system medium to be stirred and mixed therewith is lifted. When a pulley 6 is rotated at the upper limit position of the polishing tank, the spindles 13, 13' revolve and rotate on their own axes to alternate forward and backward rotation of a drive motor every predetermined time for polishing. Since the works 15, 15' are located beneath the spindles 13, 13', the medium 2 contacts the whole surface of the works with sufficient pressure to polish the works wholly uniformly and satisfactorily without needing any repolishing operation and manual repair of defectively polished surface after polishing.

Description

【発明の詳細な説明】 本発明は乾式高速流動研摩方法に関し、更に詳述すれば
一回の研摩操作でワーク全体を均一に研摩し得る乾式高
速流動研摩方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a dry high-speed fluid polishing method, and more specifically to a dry high-speed fluid polishing method that can uniformly polish the entire workpiece in one polishing operation.

従来より、スピンドルに取シ付けたワーク(被研摩物)
を研摩砥粒及び油脂を付着させたメディアを充填した研
摩槽内に入れ、前記スピンドルを正逆I/C公転及び自
転させることによシワークをメディア中で高速11+I
fi動させ、これによりワークを?i7F摩する仁とが
知られている(特公昭37−17645号公報)。
Conventionally, the workpiece (object to be polished) attached to the spindle
is placed in a polishing tank filled with media to which abrasive grains and oil are adhered, and the spindle is rotated in forward and reverse I/C revolutions and rotated on its axis to perform high-speed 11+I polishing in the media.
fi to move the workpiece? It is known that the i7F masurujin (Japanese Patent Publication No. 37-17645).

この場合、従来装置においては、3〜4本のスピンドル
を用い、その側方に第3図に示したようにワークの研摩
を必要とする面を外9111に向けて(研H槽に向けて
)取シ付け、D m ruF N面を研摩した後、ワー
クのスピンドルに対する取υ付は姿勢を変えて再度研摩
を行なうという方法を採用しておシ、このため従来の方
法は研摩操作工程が多く、能率の点で問題を有していた
。また、ワークの姿勢変更を行なう場合、必ずしも簡単
ではなく、lタッチで行なうには困難な場合が多い上、
生産性を上げるKはスピンドルにワークをできるだけ多
く取シ付けることが必要であるが、ワークの形状によっ
ては数多く取力付けられないものもあった。しかし、最
も大きな問題はワークの取り付は姿勢変更を行なっても
ワーク全体が均一に研摩されない場合がしばしば生じる
ことであシ、このため研摩終了後に熟練者がワークの不
完全研摩面を手直しすることが必要であった。
In this case, in the conventional device, three to four spindles are used, and the side of the workpiece that requires polishing is directed outward 9111 (toward the polishing tank) as shown in Fig. 3. ) Attachment, D m ruF After polishing the N side, the workpiece is attached to the spindle by changing the position and polishing again.For this reason, the conventional method requires less polishing operation process. Many of them had problems in terms of efficiency. Additionally, changing the posture of a workpiece is not always easy, and is often difficult to do with just a touch.
In order to increase productivity, it is necessary to attach as many workpieces as possible to the spindle, but depending on the shape of the workpieces, it is not possible to attach many of them. However, the biggest problem is that even when the workpiece is mounted, the entire workpiece is often not polished evenly even if the posture is changed, and for this reason, after polishing is completed, an experienced worker has to touch up the incompletely polished surface of the workpiece. It was necessary.

木兄ψJは上記事情を改善するためになされたもノテ、
ワークをスピンドルの下方に位置すせて研摩を行なりこ
とにより、ワークの取り付は姿勢変更を行なうことなく
一回の研摩操作でワーク全体を均一に研摩し得、研摩終
了後手直し修正の必要のない能率的な乾式高速流動研摩
方法を提供することを目的とする。
Ki-ni ψJ also notes that it was done to improve the above situation.
By positioning the workpiece below the spindle and polishing it, the entire workpiece can be polished uniformly in one polishing operation without changing the mounting position of the workpiece, and no rework is required after polishing is complete. The purpose of the present invention is to provide an efficient dry high-speed fluid polishing method that is free from friction.

即ち、本発明者らは、上述した従来の問題点を解決する
ため種々検討を行なった結果、ワークの乾式高速流動研
摩にとっては、メディアの飛散状態の大きい位置よシも
むしろメディアの飛散状態の小さい位置の方が良好な研
摩面を与えることができ、またメディアを飛散させなが
ら研摩を行なうよルもメディアをあまル飛散させずにメ
ディアの重圧によって研摩を行なう方がかえって均一な
研摩を行ない得ること、そしてワークをスピンドルの下
方に位置させて研摩を行なうことにょシ、メディアの飛
散によるよシもメディアの重圧下でワークに対しメディ
アを十分な圧力をもって接触させた状態で?i7F摩す
ることができ、このような状態における研摩が従来の研
摩方法に比較して非常に優れへ均一な研摩面を与え、し
かもワークをスピンドルの下方に位置させることにょカ
ワークに対するスピンドルの影響をなくしてCσ[摩を
行なうこともでき、これがワーク全体を均一に研摩する
上で好適な結果を与えることを知見し、本発明をなすに
至ったものである。
In other words, the present inventors have conducted various studies to solve the above-mentioned conventional problems, and have found that for dry high-speed fluid polishing of a workpiece, it is important to focus on locations where the state of media scattering is large, rather than locations where the state of media scattering is large. A smaller position can provide a better polished surface, and even if you polish while scattering the media, it is better to use the pressure of the media without scattering the media too much, which will result in more uniform polishing. Is it possible to polish the workpiece with the workpiece positioned below the spindle, while keeping the media in contact with the workpiece with sufficient pressure to avoid the risk of media scattering? i7F polishing is possible, and polishing under these conditions provides a very uniform polished surface compared to conventional polishing methods.Moreover, by positioning the workpiece below the spindle, the influence of the spindle on the workpiece is reduced. It is also possible to perform Cσ polishing without Cσ polishing, and it has been found that this gives a preferable result in uniformly polishing the entire workpiece, leading to the present invention.

以下、木兄夕Jにつき図面を参照して説明する。Hereinafter, Kinoiyu J will be explained with reference to the drawings.

第1図は本発明の研摩機の一実施例を示すもので、図中
1は研摩槽であル、この内部にメディア2が充填される
。3は機体(図示せず)K支持された筒状ボックスで、
このボックス3内にギアボックス4が配設されている。
FIG. 1 shows an embodiment of the polishing machine of the present invention. In the figure, 1 is a polishing tank, and media 2 is filled inside this tank. 3 is a cylindrical box supported by the fuselage (not shown);
A gearbox 4 is disposed within this box 3.

このギアボックス4の土壁中央部には円筒状軸体5が突
設されていると共に1この軸体5上喘にはリング状の駆
動グ〜リー6が突設されている。前記円筒状軸体5は前
記筒状sfボックスとその上に載置された架台7とにそ
れぞれ固定された#11]受8,8にょ多回転可能に支
承されておシ、マた前記プーリー6はベルト9.9を介
して図示していないがモータと連結されており、このモ
ータの駆動によシゾーリ−6が回転し、これと一体に前
記円筒状tflr体5及びギアボックス4が回転するよ
うになっている。
A cylindrical shaft body 5 is protruded from the center of the earthen wall of the gearbox 4, and a ring-shaped driving grey 6 is protruded from the top of the shaft body 5. The cylindrical shaft body 5 is rotatably supported by the holders 8 and 8 fixed to the cylindrical SF box and the pedestal 7 placed thereon, respectively. 6 is connected to a motor (not shown) via a belt 9.9, and the drive of this motor rotates the Schisoly 6, and the cylindrical TFLR body 5 and gear box 4 rotate together with it. It is supposed to be done.

前記ギアボックス4には、その上壁及び下壁にそれぞれ
固定された軸受10,10.IO’、10’にそれぞれ
回転可能に支承された2本の回転11+体11 、11
’が配設され、ギアボックス4の下壁をそれぞれ貫通し
て突出されたこれら軸体11 、11’の下端部にソヨ
イン) 12 、12’を介してスピンドル13 、1
3’が着脱可能に固定されている。これらスピンドル1
3 、13’の下端部にはそれぞれ下方延出部14a、
14’aを有する逆り字状の枝骨14b、14’bが突
設された治具14 、14’が着脱可能に取シ付けられ
ていると共に、これらの治具14 、14’の逆り字状
枝骨14b、14’bの下端にワーク(被研摩物) 1
5 、15’が前記スピンドル13 、13’の下方に
位置するように着脱可能に固定され、前記ギアボックス
4の回転と一体に前記回転1tl+体11 、11’、
スピンドル13.13’、ワーク15 、15’が回転
(後述する固定ギア19に沿って公転)するよう例なっ
ている。
The gearbox 4 has bearings 10, 10 . fixed to its upper and lower walls, respectively. Two rotating bodies 11 and 11 rotatably supported on IO' and 10', respectively
The shafts 11, 11' are arranged at the lower ends of the shafts 11, 11', which protrude through the lower wall of the gearbox 4, respectively.
3' is removably fixed. These spindles 1
3 and 13' have downwardly extending portions 14a and 13' respectively.
The jigs 14, 14', each having an inverted ramus 14b, 14'b projecting from the jigs 14, 14'a, are removably attached to the jigs 14, 14'. A workpiece (object to be polished) 1 is placed at the lower end of the R-shaped ramus 14b, 14'b.
5, 15' are removably fixed so as to be located below the spindles 13, 13', and the rotation bodies 11, 11' integrally rotate with the rotation of the gearbox 4.
The spindle 13, 13' and the works 15, 15' are shown to rotate (revolution along a fixed gear 19, which will be described later).

また、前記円筒状囮j体5内には、固定相1体16が配
設されている。この固定軸体16の突出上端部は機体の
天井板17上に固定された支持体18により固定されて
いると共に、固定軸体16の突出下端部には円盤状の固
定ギア19が固定されている。なお、前記円筒状1tt
lt休5の内壁上下端部にはそれぞれ軸受20.20が
配設されておシ、これによって円筒状軸体5が固定軸体
16に対しスムーズに回転し得るよう構成されている。
Further, within the cylindrical decoy body 5, a stationary phase body 16 is disposed. The protruding upper end of the fixed shaft 16 is fixed by a support 18 fixed on the ceiling plate 17 of the aircraft body, and a disc-shaped fixed gear 19 is fixed to the protruding lower end of the fixed shaft 16. There is. Note that the cylindrical 1tt
Bearings 20 and 20 are disposed at the upper and lower ends of the inner wall of the rotor 5, respectively, so that the cylindrical shaft 5 can smoothly rotate relative to the fixed shaft 16.

前記固定ギア19には、前記回転用1体11 、11’
にそれぞれ固定されたリング状の遊星ギア21゜21’
がそれぞれ噛合されており、前記ギアボックス4の回転
によ多回転軸体11 、11’が回転(公転)する際、
遊星ギア21 、21’が固定ギア19に噛合されつつ
この固定ギア19に沿って回転し、これによシ回転軸体
11 、 i r及びこれらと連結しているスピンドル
13 、13’が回転(自転)し、従ってスピンドル1
3 、 l 3’に取p伺ケラiしたワーク15 、 
] 5’がスピンドル13 、13’の軸線の周υを回
転するようになっている。
The fixed gear 19 includes the rotating bodies 11 and 11'.
Ring-shaped planetary gears 21゜21' each fixed to
are meshed with each other, and when the multi-rotary shaft bodies 11 and 11' rotate (revolution) due to the rotation of the gearbox 4,
The planetary gears 21 and 21' rotate along the fixed gear 19 while meshing with the fixed gear 19, thereby causing the rotating shafts 11 and ir and the spindles 13 and 13' connected thereto to rotate ( ) and therefore spindle 1
3. Workpiece 15 that was damaged in 13'
] 5' rotates around the axis υ of the spindles 13 and 13'.

なお、前記研摩槽1は、図示していないが適宜な機構に
よシ上下方向に移動し得るようになっておシ、第1図に
示した研摩槽1の上列限位置において、スピンドルl 
3 、13’の下部及びワーク15 、15’が研摩槽
1内のメディア2中に埋め込まれるようになると共に、
研摩槽lの下降限位置において、スピンドル13 、1
3’下部及びワーク15 、15’がメディア2中よシ
取シ出され、ワーク15 、15’の着脱が行なわれる
ようになっている。
The polishing tank 1 can be moved vertically by an appropriate mechanism (not shown), and when the polishing tank 1 is at the upper limit position shown in FIG.
3, 13' and the works 15, 15' are embedded in the media 2 in the polishing tank 1,
At the lower limit position of the polishing tank l, the spindles 13, 1
3' lower part and the works 15, 15' are removed from the media 2, and the works 15, 15' are attached and detached.

次に、上記研摩機を用いてワークを乾式高速流動研摩す
る方法につき説明すする。
Next, a method of dry high-speed fluid polishing of a workpiece using the above-mentioned polishing machine will be explained.

まず、研摩槽lを下降限位置に移動させ、研摩槽1内に
生地のメディア2を投入する。この場合、メディアとし
ては有機質メディア、特に木質メディア、例えば木クズ
、小木片、コーン、木の実、皮等の微粉末等が優れてお
り、またメディア投入量は研摩槽容量に対して60〜9
0頭程度が好適である。次いで、油)指と砥粒とを混合
してなるペースト状、液状或いは粉粒状形態の研摩剤を
メディア2にカロえ、スピンドル13 、 l 3’の
治具14゜14′にワークを取り付けない状態のまま研
摩槽1を上昇限位置に移動させ、プーリー6に連結され
たモータを駆動させて該プーリー6を回転させることに
よシスピンドル13 、13’を回転(公転及び自転)
させる。これによってメディア2が流動し、メディア2
と前記研摩剤とが均一に混合されてメディア2表面に研
摩剤が付着する。この場合、研摩剤の添加量は作業の最
初がメディア]、に9に対し約40〜100りとし、そ
の後1回の研摩作業毎にメディア1 krに対し0.2
〜12とすることが好ましく、またメディアと研摩剤と
の混合時間は通常3〜5分で十分である。
First, the polishing tank 1 is moved to the lower limit position, and the fabric media 2 is put into the polishing tank 1. In this case, organic media, especially wood media, such as fine powder of wood chips, small wood chips, corn, nuts, bark, etc., are excellent as media, and the amount of media input is 60 to 90% of the capacity of the polishing tank.
Approximately 0 head is suitable. Next, an abrasive in the form of paste, liquid, or powder made by mixing oil fingers and abrasive grains is applied to the media 2, and the workpiece is not attached to the jig 14°14' of the spindle 13, l3'. The polishing tank 1 is moved to the upper limit position in this state, and the motor connected to the pulley 6 is driven to rotate the pulley 6, thereby rotating the system spindles 13 and 13' (revolution and rotation).
let This causes media 2 to flow, and media 2
and the abrasive are uniformly mixed, and the abrasive is attached to the surface of the media 2. In this case, the amount of abrasive to be added is approximately 40 to 100 kr per kr of media at the beginning of the operation, and then 0.2 to 1 kr of media for each polishing operation.
The mixing time of the media and the abrasive is preferably 3 to 5 minutes.

次に、モータの駆動を停止し、研摩槽lを下降限位置ま
で移動した後、スピンドル13 、13’の治具14 
、14’にワーク15.15′を取ルイづけ、研摩槽1
を再度上昇限位置まで移動する(第1図に示した状態)
。この状態でモータを駆動させ、プーリー6を回転させ
ると、この回転と一体に円筒状軸体5及びギアボックス
4が回転し、これによりこのギアボックス4に取り刊け
られた回転軸体11 、 l 1’、スピンドル13 
、13’及びワーク15 、15’がギアボックス4の
中心軸線(固定軸体16の611線)の周シを回転(公
転)すると共に、この回転(公転)に伴なって回転11
111t体11 、11’に取シ付けられた遊星ギア2
1 、21’が固定ギア19に噛合しつつそれに沿って
回転することによシ、回転用1体11 、11’及びス
ピンドル13 、13’が自転し、スピンドル13 、
13’に取り付けられたワーク15 、15’がそのス
ピンドル13 、13’の軸線の周9を回転する。また
、前記モータの駆動は所定時間毎に正逆に切シ換え、こ
れによって上記の回転を所定時間毎に正逆に切シ換える
ものである。
Next, after stopping the driving of the motor and moving the polishing tank l to the lowering limit position, the jig 14 of the spindles 13 and 13'
, attach workpiece 15.15' to 14', and polish tank 1.
Move to the upper limit position again (state shown in Figure 1)
. When the motor is driven in this state and the pulley 6 is rotated, the cylindrical shaft body 5 and the gearbox 4 rotate together with this rotation. l 1', spindle 13
, 13' and the works 15, 15' rotate (revolution) around the central axis of the gearbox 4 (line 611 of the fixed shaft 16), and along with this rotation (revolution), the rotation 11
111t body 11, planetary gear 2 attached to 11'
1 and 21' rotate along the fixed gear 19 while meshing with it, so that the rotating bodies 11 and 11' and the spindles 13 and 13' rotate, and the spindles 13 and 13 rotate.
A workpiece 15 , 15 ′ attached to the spindle 13 , 13 ′ rotates around the axis 9 of its spindle 13 , 13 ′. Further, the driving of the motor is switched between forward and reverse directions at predetermined time intervals, thereby switching the above-mentioned rotation between forward and reverse directions at predetermined time intervals.

従って、ワーク15 、15’は、ギアボックス4の中
心軸線(固定軸体16の軸線)及びスピンドル13 、
13’の軸線の周シを正逆回転し、これらの回転の間に
これらの回転によシ流動状聾に攪拌されたメディアと混
合状態に接触し、メディア表面のω[岸側の作用で表面
が研摩されるものである。
Therefore, the works 15 and 15' are connected to the central axis of the gearbox 4 (the axis of the fixed shaft body 16) and the spindle 13,
The periphery of the axis of 13' is rotated forward and backward, and during these rotations, the rotation brings the media into contact with the fluidly agitated media in a mixed state, and the ω of the media surface [by the action on the shore side] The surface is polished.

酸PP終了後は、モータの駆動を停止し、研摩槽1を下
降眼位@まで移動し、研摩されたワークを取シはずし、
新しい研摩剤をメディアに深加した後、上述し゛た操作
を繰シ返ず。
After completing the acid PP, stop driving the motor, move the polishing tank 1 to the downward position, and remove the polished workpiece.
After adding new abrasive to the media, repeat the above steps.

而して、上述したQ[置方法において、本発明はワーク
15 、15’をスピンドル13 、13’の下方に位
置させていることによシ、ワーク15 、15’の全面
に対しメディア2が十分な圧力をもって接触し、ワーク
15 、15’が全体的に均一かつ良好に研摩されるも
のであシ、−回の研摩操作でワーク15 、15’の全
面共催れた研摩仕上げWjとなる。
In the above-mentioned Q[setting method, the present invention has the workpieces 15 and 15' positioned below the spindles 13 and 13', so that the media 2 is placed over the entire surface of the workpieces 15 and 15'. If the workpieces 15 and 15' are brought into contact with sufficient pressure and the workpieces 15 and 15' are polished uniformly and well as a whole, the entire surface of the workpieces 15 and 15' will be polished to a co-polished finish Wj in - times of polishing operations.

このため、従来のように一回の研摩操作終了後、ワーク
15 、15’の取シ付は姿勢変更を行なって再度研摩
操作を行なう必要がなく、また研摩後年完全研摩面を手
直し修正する必要もないものである。
For this reason, there is no need to change the position of the workpieces 15 and 15' and perform the polishing operation again after completing one polishing operation as in the past, and the polished surface can be completely reworked after polishing. It's not necessary.

この点につき、下記の実施例及び比較例により本発明の
作用効果を更に具体的に説明する。
In this regard, the effects of the present invention will be explained in more detail using the following Examples and Comparative Examples.

〔実施例、比較例〕[Example, comparative example]

第2図に示したような鉄製で50 X 50X120期
の大きさの6而a −fを有する直方体状で、ef面間
中心部に約8Mの貫通ねじ孔gが開板れた試験ワークh
を使用し、その各面a−fをそれぞれエンドレスペルト
ナ240AAで平均あらさ2.62μに研摩した。これ
を下記方法によシ流動ω[摩し、各面a −fの仕上シ
程度を評価した。
The test work h shown in Fig. 2 was made of iron and had a rectangular parallelepiped shape with dimensions 50 x 50 x 120, and had a through screw hole g of about 8M in the center between the ef faces.
Each surface a to f was polished to an average roughness of 2.62μ using Endless Peltona 240AA. This was polished by the following method and the degree of finishing of each surface a to f was evaluated.

実施例 第3図A、Hに示したように、スピンドルiの下端部に
ねじjで取)付けた円筒状の治具にの側部に逆り字状の
枝骨43個をそれぞれほぼ等間隔ずつ離間させて固定し
、これらの枝骨tの下端部に前記試験ワークhをそのe
面が下面に、b面が外側(研摩槽対向面)になるように
それぞれ取力付けた(試験ワークhはスピンドルiの下
方に位置する。)。なお、試験ワークhの取シ付けは、
0面側よシボル)mを貫通孔gに挿通し、該ボルトmの
先端部を枝骨tKd11.合することによシ行なった(
第2図参照)。
Embodiment As shown in FIGS. 3A and 3H, 43 inverted-shaped ramus bones are attached to the sides of a cylindrical jig attached to the lower end of the spindle i with screws j, each approximately equally spaced. The test workpieces h are fixed at intervals of intervals, and the test workpieces h are attached to the lower ends of these ramus bones t.
The test workpiece h was attached so that the surface was on the bottom and the surface b was on the outside (the surface facing the polishing tank) (the test work h was located below the spindle i). In addition, the installation of the test work h is as follows:
0 side, insert the bolt m into the through hole g, and insert the tip of the bolt m into the ramus bone tKd11. It was done by combining (
(See Figure 2).

次に、3本のスピンドルを有する第1図に示した如きω
F摩機を用い、上述したように各スピンドルに各3個の
試験ワークを取シ付け、従って全体で9個の試験ワーク
を取υ付けた状態で」:述した方法で流動研摩を行なっ
た。
Next, ω as shown in FIG. 1 with three spindles
Fluid polishing was carried out using a F grinding machine, with three test workpieces attached to each spindle as described above, thus a total of nine test workpieces. .

なお、研摩槽は80t、メディア量は601であp、研
摩剤としては油脂と砥粒を混合したもの’t2.5kp
用いた。また、スピンドルの回転数は150 r、p、
m、固定ギアと遊星ギアのギア比ば1:1であシ、研摩
時間は正転4分波逆転4分の言18分間行なった。
The polishing tank was 80t, the amount of media was 601p, and the abrasive was a mixture of oil and abrasive grains of 2.5kp.
Using. Also, the rotation speed of the spindle is 150 r, p,
The gear ratio between the fixed gear and the planetary gear was 1:1, and the polishing time was 18 minutes with 4 minutes of forward rotation and 4 minutes of reverse rotation.

比較例 第4図A、Hに示したように、スピンドルiの下部にね
じjで取ル付けた円筒状の治具にの側部に水平方向に延
びる枝骨t’ 3個をそれぞれほぼ等間隔ずつ離間させ
て固定し、これらの枝骨t′の先端部に試験ワークhを
そのe面が外側(研摩槽対向面)Ic、a面が上面にな
るように、かつ第4図A中スピンドルiの[IIII線
に対し300右に傾斜させて取シ付けた(試験ワークh
はスピンドルiの側方に位置する。)。
Comparative Example As shown in FIGS. 4A and 4H, three ramus bones t' extending horizontally on the sides of a cylindrical jig attached to the lower part of spindle i with screws j are approximately equally spaced. The test workpieces h were fixed at intervals apart from each other, and the test workpieces h were placed on the tips of these ramus t' so that the e side was the outer side (the surface facing the polishing tank) Ic, and the a side was the upper side, and as shown in Fig. 4A. The spindle i was installed with an inclination of 300 degrees to the right with respect to line III (test workpiece h
is located on the side of spindle i. ).

次に、3本のスピンドルに上述した姿勢でそれぞれ試験
ワークを取シ付けた状暢において、前記実施例と同様に
して流動研摩を行なった。但し、研摩時間は正転2会談
逆転2分の計4分間とした。
Next, with test workpieces attached to the three spindles in the above-described postures, fluid polishing was performed in the same manner as in the previous example. However, the polishing time was 4 minutes in total: 2 forward rotations and 2 reverse rotations.

次いで、試験ワークを第4図Cに示したようにスピンド
ルiの軸線に対し30°左に傾斜させて取シ付ける姿勢
変更を行なった後(なお、姿勢変更には約2分30秒の
時間を要した〕、同様に正転2分波逆転2分の計4分間
の流動研摩を行なった(従って、総計研電時間は8分で
ある)。
Next, as shown in Fig. 4C, the test workpiece was mounted at an angle of 30° to the left with respect to the axis of spindle i. Similarly, fluid polishing was performed for a total of 4 minutes, 2 minutes in forward rotation and 2 minutes in reverse (therefore, the total polishing time was 8 minutes).

以上の流動研摩によシ得られた研摩面を目視観察及び小
板研究所製表面アラサ計(MODEL−3E3C)によ
る表面アラサ測定した結果を下記に示す。
The results of visual observation of the polished surface obtained by the above fluid polishing and surface roughness measurement using a surface roughness meter (MODEL-3E3C) manufactured by Koita Research Institute are shown below.

目視観察 +240ベルトの研削跡除去程度を目視観察した結果、
比較例のものはe面が全体的に除去程度が劣シ、次にa
、b、a面がほぼ回等の除去程度であシ、c、f面が比
較的良好な除去程度であった。
As a result of visual observation + visual observation of the degree of removal of grinding marks on the 240 belt,
In the comparison example, the removal degree was poor overall on the e side, followed by the a
The , b, and a planes were removed at a roughly equivalent level, and the a, c, and f planes were removed at a relatively good level.

これに対し、実施例のものはe面が最も良く、ar b
 + C+ d Hf mjも良好に研摩されていた。
On the other hand, in the example, the e plane is the best, and the ar b
+ C+ d Hf mj was also well polished.

なお、研摩前後共各面3箇所のアラサを測定し、研摩前
のアラサは試験ワーク18個の全体の平均アラサを示し
、研摩後のアラサは試験ワーク9個の各面3箇所の平均
値を示す。
In addition, the roughness was measured at three places on each side before and after polishing, and the roughness before polishing shows the average roughness of the entire 18 test workpieces, and the roughness after polishing is the average value of three places on each side of the nine test workpieces. show.

以上の結果よシ、メディアをあまシ飛散させない面の研
摩仕上シが良好であることが認められる。
From the above results, it is confirmed that the polished finish of the surface that does not allow the media to scatter is good.

即ち、比較例a、C1e面はメディアを比較的飛散させ
る面であるが、このようなメディアを飛散させる面の研
摩仕上ルの程度は、メディアをあまシ飛散させない他の
而よシ劣ることが認められる。
That is, the surfaces of Comparative Examples a and C1e are surfaces that relatively scatter the media, but the degree of polishing of these surfaces that scatter the media may be inferior to other surfaces that do not scatter the media. Is recognized.

また、実施例のf+e+’)面はそれぞれ比較例のa、
c、e面に対応するものであるが、実施例の結果ではこ
れらの面を含めた各面a −fが互にほぼ均一に研摩さ
れていることが認められる。本発すJ渚らの検討の結果
では、ワークをスピンドルの下方、研摩槽内下部に位置
させることにより、これら実施例のf、e、凹面がメデ
ィアを飛散させることが殆んどなく、これらの面を含め
た全面がメディアの重圧によって研摩されておシ、この
ようにワークをスピンドルの下方に配置させることによ
って、メディアを攪乱させた状態ではなくメディアの流
動の少ないメディアの軍部による圧力下でワークを研摩
した場合に、ワークの全面を一回の研摩操作で均一にか
つ良好に仕上げ得ることを知見したものである。
In addition, the f+e+') plane of the example is the a and a plane of the comparative example, respectively.
This corresponds to surfaces c and e, but the results of the examples show that surfaces a to f, including these surfaces, are polished almost uniformly. According to the results of the study by J. Nagisa et al., the f, e, and concave surfaces of these examples hardly scatter the media by placing the workpiece below the spindle and at the bottom of the polishing tank. The entire surface including the surface is polished by the heavy pressure of the media, and by placing the workpiece below the spindle in this way, the workpiece is not in a state where the media is disturbed, but under pressure from the media with little media flow. It has been discovered that when a workpiece is polished, the entire surface of the workpiece can be finished uniformly and satisfactorily with a single polishing operation.

更に、上記の結果よシ、スピンドルがワークに対し影に
なるという如き不都合もなく、ワークに゛ 対してスピ
ンドルの影響なく良好に研摩し得ることも認められる。
Furthermore, from the above results, it is recognized that there is no inconvenience such as the spindle casting a shadow on the workpiece, and that the workpiece can be well polished without being affected by the spindle.

なおまた、従来法(比較例)は、治具にワークを固定し
、研摩槽を上昇させ、スピンドルを回転させてblを動
研摩を行なった後、O[摩槽を下降させ、ワークの姿勢
変更を行ない、次いで研M槽を上昇させ、スピンドルを
回転させて再度流動研摩を行なうという多数の工程を必
要とし、また総研摩時間も長すものであり、しかも必ず
しも各面が良好な柱上シとならず、?1lIT摩後任上
9の劣る面を手直しする必要があるものであるが、ワー
クラスピンドルの下方に位置さ□せることにより、研摩
途中でu1摩動作を一時的に停止してワークの姿勢変更
を行なうことなく研摩し得るため、工程数も減少し、l
17F摩時間も短縮するものであシ、しかも各面が均一
かつ良好に研摩されるものである。
Furthermore, in the conventional method (comparative example), the workpiece is fixed to a jig, the polishing tank is raised, the spindle is rotated to dynamically polish the BL, and then the polishing tank is lowered and the workpiece is It requires a number of steps, such as changing the polishing tank, then raising the polishing tank, rotating the spindle, and performing fluid polishing again, and the total polishing time is also long. Isn't it? Although it is necessary to correct the inferior aspects of 1l IT polishing successor 9, by positioning it below the workpiece spindle, the u1 polishing operation can be temporarily stopped during polishing, and the posture of the workpiece can be changed. Since polishing can be performed without polishing, the number of steps is reduced, and l
The 17F polishing time is also shortened, and each surface is polished uniformly and well.

なお、ワークの数句けB様は上記のものに制限されず、
スピンドルの下方にワークを位置させればいずれの態様
で電よく、例えば第5図の如きワークの取付り態様を採
用することもでき、この第5図のワーク取伺は態様でも
第2図の場合と同様の効果を示すものである。
Please note that Mr. B is not limited to the above,
As long as the workpiece is positioned below the spindle, it is possible to install the workpiece in any manner, for example, the workpiece mounting manner shown in FIG. 5 can be adopted. This shows the same effect as in the case.

本発明方法は、従来からこの種の流動研摩が採用されて
いたワーク、それにクラブヘッド、水洗金具、自動車部
品の研摩、及び機械部品や電気部、品のパリ取りのほか
、比較的形状の大きなステンレススチール製の器物(ミ
ルフカラフ0、ポット類等)などに好適に適用し得るも
のである。
The method of the present invention can be used for polishing workpieces for which this type of fluid polishing has been conventionally applied, as well as for polishing club heads, water wash fittings, automobile parts, mechanical parts, electrical parts, and items with relatively large shapes. It can be suitably applied to stainless steel utensils (milf carafe 0, pots, etc.).

なお、本発明において使用する研摩機は図示のものに限
定されるものではない。例えば、研IP槽として(ll
l1部中央部が側部上下部より外方に膨出している側部
町「面形状が略円弧状のものを使用し得、これtてよシ
メディア2のワーク15 、15’に対する接触圧力を
高めてよジ良好な研摩を行なうことができる。
Note that the polishing machine used in the present invention is not limited to the one shown in the drawings. For example, as a research IP tank (ll
A side section whose center part bulges outward from the upper and lower sides of the section 1 may have a substantially arcuate surface shape, and the contact pressure of the media 2 against the workpieces 15 and 15' can be used. It is possible to perform good polishing by increasing the

なおまた、研M機として、第1図中一点鎖線で示したよ
うに、水平部22と垂直部23を有する断面三角型のリ
ング状カバ一体24を筒状ボックス3の内周壁下端部に
ボルト等により着脱可能に突設することもでき、これに
より更にメディア2のワーク15 、15’に対する接
触圧力を増加させることができる。この場合、傾斜部2
3を設けることにより、飛散されたメディアが容易に自
然落下するものであるが、カバ一体24の形状はこれに
限定されることなく種々変更可能であり、研摩槽1周辺
部のメチ′イアの上昇を抑圧し得るものであればよい。
Furthermore, as a grinding machine, as shown by the dashed line in FIG. The contact pressure of the media 2 against the works 15 and 15' can be further increased. In this case, the inclined part 2
3 allows the scattered media to fall easily by itself, but the shape of the cover unit 24 is not limited to this and can be changed in various ways. It is sufficient as long as it can suppress the increase.

また、カバ一体24をWfN槽内周壁上部に設けるよう
にしてもよいが、仙摩槽を上下に移動させる場合などに
、スピンドルに取υ(t Itたワークがカバ一体24
に当ってワークの出し入れが邪魔されることは避けるべ
きである。なお、カバ一体24の幅(水平部の突出長さ
)は必ずしもi1i!I限されないが、メディアの破損
物や研摩くずなどをl171摩槽1の底部に配設される
エア吹出し管(図示せず)から導入されるエアによυ飛
散させ、筒状ボックス3上壁に配設される収塵管(図示
せず)から排出させる際K、エアの流通を保障するクリ
アランスが形成されるようにすることが好ましい。
Furthermore, the cover unit 24 may be provided on the upper part of the inner circumferential wall of the WfN tank, but when moving the Senma tank up and down, the workpiece attached to the spindle may be attached to the cover unit 24.
It should be avoided that the loading and unloading of workpieces is obstructed by this. Note that the width of the cover unit 24 (the protruding length of the horizontal part) is not necessarily i1i! Although not limited to I, damaged media, polishing debris, etc. are scattered by air introduced from an air blowing pipe (not shown) installed at the bottom of the polishing tank 1, and the upper wall of the cylindrical box 3 is It is preferable that a clearance be formed to ensure air circulation when discharging the dust from a dust collecting pipe (not shown) disposed in the dust collecting pipe (not shown).

また、上述した研摩機において、固定ギア19と遊星ギ
ア21 、21’とのギア比は必ずしも制限されないが
、通常10:1〜1:3の範囲で種々変更することがで
き、特に比較的深い凹面、例えば10〜40mの凹面を
有するようなワークに対しては固定ギアのギア数よシも
遊星ギアのギア数を多くし、公転速度よシも自転速度を
遅くすることが好適であり、これによシ凹面を含めた全
面を均一に研ぴすることができる。この場合、固定ギア
と遊星ギアのギア比はl: 1.2〜l:3、特に1=
1.5〜1 : 2.5とすることが最適である。なお
、遊星ギア、スピンドル数や筒状ボックスの形状などに
ついても上記実施例に限定されず、種々変更して差支え
ない。
Further, in the above-mentioned polishing machine, the gear ratio between the fixed gear 19 and the planetary gears 21, 21' is not necessarily limited, but can be varied in the range of usually 10:1 to 1:3, and especially relatively deep. For a workpiece that has a concave surface, for example, a concave surface of 10 to 40 m, it is preferable to increase the number of gears of the planetary gear than the number of fixed gears, and to slow down the rotation speed as well as the rotation speed. This allows the entire surface including the concave surface to be polished uniformly. In this case, the gear ratio between the fixed gear and the planetary gear is l: 1.2 to l: 3, especially 1 =
1.5-1:2.5 is optimal. Note that the planetary gears, the number of spindles, the shape of the cylindrical box, etc. are not limited to the above embodiments, and may be modified in various ways.

更に、上述した研摩方法においては、生地のメディアに
油脂と砥粒を混合してなる研摩剤を加え、予備混合して
メディア表面を該研摩剤で被覆した後、研摩操作を行な
っておシ、これにより操作が簡単となシ、シかもランニ
ングコストを激減させることができるものであるが、勿
論従来法のように予め油脂と砥粒を被覆したメディアを
用いるようにしてもよい。
Furthermore, in the above-mentioned polishing method, an abrasive agent made of a mixture of oil and abrasive grains is added to the fabric media, premixed to coat the surface of the media with the abrasive agent, and then the polishing operation is performed. This simplifies the operation and can drastically reduce running costs, but of course it is also possible to use media coated with oil and abrasive grains in advance as in the conventional method.

なお、最初に投入するメディアとしては予め油脂と砥粒
を被覆したものを用い、以後研摩剤を投入する方式でも
よい。また、研摩剤を構成する油脂としては動植鉱物油
、各種脂肪酸、ワックス、金属石けん等が用いられ、ま
た砥粒としてはアルミナ、砂石、酸化鉄、酸化クロム、
アランダム、WA、炭酸カルシウム等が使用し得る1、
この場合、油ノ指、と(a′#lとはmat比t3oニ
アo 〜70:30であることが好ましい。
Note that it is also possible to use a media coated with oil and abrasive grains in advance as the media to be introduced first, and then to introduce the abrasive agent. In addition, animal and plant mineral oils, various fatty acids, waxes, metal soaps, etc. are used as the oils and fats that make up the abrasive, and alumina, sandstone, iron oxide, chromium oxide, etc. are used as the abrasive grains.
Alundum, WA, calcium carbonate, etc. can be used 1.
In this case, it is preferable that Aburonashi and (a'#l) have a mat ratio of t3o nearo to 70:30.

なおまた、本発明のその他の構成も本発明の要旨を逸脱
しない範囲で種々変更することができる。
Furthermore, other configurations of the present invention can be variously modified without departing from the gist of the present invention.

以上詳述したように、本発明は固定ギアに噛合する遊星
ギアをこの固定ギアに?日って公転させつつ自転させる
ことにより前記遊星ギアと連結したスピンドルを公転か
つ自転させ、前記スピンドルに取り付けられたワークを
回転せしめて研摩槽内に充填したメディアにて流動研摩
する乾式高速流動研摩方法において、ワークをスピンド
ルの下方に位置せしめて研摩を行なうことにより一回の
研摩操作でワークを均一かつ良好に流動りF早しイη、
非常に能率的な研摩が行ない得るものである。
As described in detail above, the present invention provides a method for attaching a planetary gear that meshes with a fixed gear to this fixed gear. Dry high-speed fluid polishing in which the spindle connected to the planetary gear is revolved and rotated on its own axis, and the workpiece attached to the spindle is rotated and fluidized with media filled in a polishing tank. In this method, by positioning the workpiece under the spindle and performing polishing, the workpiece can be flowed uniformly and well in one polishing operation, and the workpiece can be quickly flowed.
Very efficient polishing can be achieved.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明法の実施に用いる研摩機の一例を示す縦
断面図、第2図は本発明法及び従来法の研摩の良否を判
定する実験に用いたワークの斜視ll¥1、第3図は本
発明法に係るワークの取シ付は聾様の一例を説明するも
ので、Aば0111而図、Bは■B−nlB線に沿った
断面図、第4図は従来法に係るワークの取り付は樫様を
説明するもので、Aは0III面図、BはIVB−IV
IIK沿ツタ断It図、Cは姿勢変更後の側面図、第5
図は本発明法に係るワークの取り付は態様の他の例を示
す斜視図である。 1・・・研摩槽、2・・・メディア、13 + 13’
 + 1・・・スピンドル、15.15’、h・・・ワ
ーク、19・・・固定ギア、21.21’・・・遊星ギ
ア。 出願人  上村工業株式会社(ほか1名)代理人  弁
理土手 島 隆 司 第1図 第2図
Fig. 1 is a vertical cross-sectional view showing an example of a polishing machine used in carrying out the method of the present invention, and Fig. 2 is a perspective view of a workpiece used in an experiment to determine the quality of polishing by the method of the present invention and the conventional method. Figure 3 illustrates an example of how the workpiece is mounted using the method of the present invention for a deaf person. The installation of the workpiece is explained as follows: A is 0III surface view, B is IVB-IV
IIK is a cross-sectional view, C is a side view after changing the posture, No. 5
The figure is a perspective view showing another example of the aspect of mounting a workpiece according to the method of the present invention. 1... Polishing tank, 2... Media, 13 + 13'
+ 1... Spindle, 15.15', h... Work, 19... Fixed gear, 21.21'... Planetary gear. Applicant: Uemura Kogyo Co., Ltd. (and 1 other person) Attorney: Takashi Shima Figure 1 Figure 2

Claims (1)

【特許請求の範囲】[Claims] 固定ギア(1,9]C噛合する遊星ギア(21,21’
)をこの固定ギア(19)に沿って公転させつつ自転さ
せることによシ前記遊星ギア(21、21’ )  と
連結したスピンドル(13,13’)を公転かつ自転さ
せ、前記スピンドル(13、13’ )に取シ付けられ
たワーク(15、15’ )を回転せしめて研摩槽(1
)内に充填したメディア(2)にて流動研摩する乾式高
速流動研摩方法において、ワーク(15,15’)をス
ピンドル(13113’ )の下方に6を置せしめて研
摩を行なうことを特徴とする乾式高速流動研摩方法。
Fixed gears (1, 9) C-meshing planetary gears (21, 21'
) is caused to revolve and rotate along the fixed gear (19), thereby causing the spindle (13, 13') connected to the planetary gear (21, 21') to revolve and rotate, and the spindle (13, The workpiece (15, 15') attached to the polishing tank (13') is rotated and
) A dry high-speed fluid polishing method in which fluid polishing is carried out using the media (2) filled in the workpiece (15, 15') is characterized by placing the workpiece (15, 15') under the spindle (13113') and performing the polishing. Dry high speed fluid polishing method.
JP12820282A 1982-07-22 1982-07-22 KANSHIKIKOSOKURYUDOKENMAHOHO Expired - Lifetime JPH0229472B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12820282A JPH0229472B2 (en) 1982-07-22 1982-07-22 KANSHIKIKOSOKURYUDOKENMAHOHO

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12820282A JPH0229472B2 (en) 1982-07-22 1982-07-22 KANSHIKIKOSOKURYUDOKENMAHOHO

Publications (2)

Publication Number Publication Date
JPS5919669A true JPS5919669A (en) 1984-02-01
JPH0229472B2 JPH0229472B2 (en) 1990-06-29

Family

ID=14978988

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12820282A Expired - Lifetime JPH0229472B2 (en) 1982-07-22 1982-07-22 KANSHIKIKOSOKURYUDOKENMAHOHO

Country Status (1)

Country Link
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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4730417A (en) * 1986-08-29 1988-03-15 The Grav-I-Flo Corporation Finishing method and apparatus
JPH0588370U (en) * 1992-04-30 1993-12-03 中川 克子 Retail payment counter equipment
JPH06211U (en) * 1992-06-23 1994-01-11 輝陽工業株式会社 checkout counter
JP5225497B1 (en) * 2012-10-29 2013-07-03 河本デンチャー歯研株式会社 Dental prosthesis polishing equipment
AT518663A4 (en) * 2016-08-17 2017-12-15 Forschungsgesellschaft für Verbrennungskraftmaschinen und Thermodynamik mbH Device for determining the injection rate variance of gas valves, in particular for internal combustion engines operable with gaseous fuels
CN107650007A (en) * 2016-07-25 2018-02-02 魏金卿 Woodwork processing method, device for deburring and its woodwork
CN107717709A (en) * 2017-09-21 2018-02-23 孙丽君 It is a kind of to be used for the high sealing performance device that drill bit polishes of digging up mine
CN109759940A (en) * 2019-01-21 2019-05-17 安徽皖精模具科技有限公司 A kind of adjustable polissoir of plastic mould production

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4730417A (en) * 1986-08-29 1988-03-15 The Grav-I-Flo Corporation Finishing method and apparatus
JPH0588370U (en) * 1992-04-30 1993-12-03 中川 克子 Retail payment counter equipment
JPH06211U (en) * 1992-06-23 1994-01-11 輝陽工業株式会社 checkout counter
JP5225497B1 (en) * 2012-10-29 2013-07-03 河本デンチャー歯研株式会社 Dental prosthesis polishing equipment
CN107650007A (en) * 2016-07-25 2018-02-02 魏金卿 Woodwork processing method, device for deburring and its woodwork
AT518663A4 (en) * 2016-08-17 2017-12-15 Forschungsgesellschaft für Verbrennungskraftmaschinen und Thermodynamik mbH Device for determining the injection rate variance of gas valves, in particular for internal combustion engines operable with gaseous fuels
AT518663B1 (en) * 2016-08-17 2017-12-15 Forschungsgesellschaft für Verbrennungskraftmaschinen und Thermodynamik mbH Device for determining the injection rate variance of gas valves, in particular for internal combustion engines operable with gaseous fuels
CN107717709A (en) * 2017-09-21 2018-02-23 孙丽君 It is a kind of to be used for the high sealing performance device that drill bit polishes of digging up mine
CN109759940A (en) * 2019-01-21 2019-05-17 安徽皖精模具科技有限公司 A kind of adjustable polissoir of plastic mould production

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