JPS59193083A - Semiconductor laser device for fiber loading - Google Patents

Semiconductor laser device for fiber loading

Info

Publication number
JPS59193083A
JPS59193083A JP58065529A JP6552983A JPS59193083A JP S59193083 A JPS59193083 A JP S59193083A JP 58065529 A JP58065529 A JP 58065529A JP 6552983 A JP6552983 A JP 6552983A JP S59193083 A JPS59193083 A JP S59193083A
Authority
JP
Japan
Prior art keywords
layer
type
substrate
type semiconductor
light guide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP58065529A
Other languages
Japanese (ja)
Inventor
Hisanori Yamashita
山下 寿則
Satoru Todoroki
轟 悟
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58065529A priority Critical patent/JPS59193083A/en
Publication of JPS59193083A publication Critical patent/JPS59193083A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24Coupling light guides
    • G02B6/42Coupling light guides with opto-electronic elements
    • G02B6/4292Coupling light guides with opto-electronic elements the light guide being disconnectable from the opto-electronic element, e.g. mutually self aligning arrangements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24Coupling light guides
    • G02B6/26Optical coupling means
    • G02B6/30Optical coupling means for use between fibre and thin-film device
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24Coupling light guides
    • G02B6/42Coupling light guides with opto-electronic elements
    • G02B6/4201Packages, e.g. shape, construction, internal or external details
    • G02B6/4202Packages, e.g. shape, construction, internal or external details for coupling an active element with fibres without intermediate optical elements, e.g. fibres with plane ends, fibres with shaped ends, bundles
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/0201Separation of the wafer into individual elements, e.g. by dicing, cleaving, etching or directly during growth
    • H01S5/0203Etching
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/0206Substrates, e.g. growth, shape, material, removal or bonding
    • H01S5/0207Substrates having a special shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/022Mountings; Housings
    • H01S5/0225Out-coupling of light
    • H01S5/02251Out-coupling of light using optical fibres
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/022Mountings; Housings
    • H01S5/023Mount members, e.g. sub-mount members
    • H01S5/02325Mechanically integrated components on mount members or optical micro-benches
    • H01S5/02326Arrangements for relative positioning of laser diodes and optical components, e.g. grooves in the mount to fix optical fibres or lenses

Abstract

PURPOSE:To enable to easily realize the good coupling of the light emitting part with the fiber loading part by a method wherein a part of a stripe recess groove provided on a substrate is used as the guide for an optical fiber. CONSTITUTION:On the N type substrate 1, an N type guide layer 2 having a forbidden band width larger than that of the substrate 1, an N type or P type active layer 3 having a forbidden band width smaller than that of the layer 2 and larger than that of the substrate 1, a P type optical guide layer 4 having the same forbidden band width as that of the layer 2, and an N type cap layer made of the same material as that of the layer 3 are successively formed. Next, a P<+> diffused layer 6 having a fixed width and a depth reaching a part of the layer 4 in accordance with said groove of the substrate 1 is formed. Then, after selective etching to the layer 2 by using a protection film rectangularly intersecting with said groove of the substrate 1 and having a fixed length, an insulation protection film is formed at the etched part. Electrodes 7 and 8 are provided on the front surface of the layer 5 and the back surface of the substrate 1. Thereby, the position of the light emitting part and the center of the optical fiber can be provided on the same optical axis.

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は半導体レーザ装置と光ファイノくとの位置合わ
せに係り、特に良好な半導体レーザ装置と光ファイバと
の結合が容易に得られるファイバ装着用半導体レーザ装
置に関するものであ一般に光フアイバ通信装置に用いら
れる光源。
[Detailed Description of the Invention] [Field of Application of the Invention] The present invention relates to the alignment of a semiconductor laser device and an optical fiber, and in particular to a fiber attachment device that can easily achieve good coupling between a semiconductor laser device and an optical fiber. A light source related to semiconductor laser devices and generally used in optical fiber communication devices.

は半導体レーザ装置と金属または半導体のサブマウント
と金属製のヒートシンクから構成されている。この半導
体レーザ装置の発光部は約5μmX1μm程度で非常に
小さく、また、その出力光の強度がガラス分布であるた
めに、特に小さなコア径をもつファイバとの位置合わせ
が極めて困難であり、モニタしながら組立なければなら
ないという生産性に欠ける面があった。
consists of a semiconductor laser device, a metal or semiconductor submount, and a metal heat sink. The light emitting part of this semiconductor laser device is extremely small, measuring approximately 5 μm x 1 μm, and the intensity of its output light has a glass distribution, making it extremely difficult to align it with a fiber that has a particularly small core diameter, making it difficult to monitor. However, there was a lack of productivity as it required assembly.

従来、前記の問題を解決すべく、ザプマウ/ト上に光フ
アイバ位置決定用のV溝または凹溝を形成し、半導体レ
ーザ装置と光ファイバとの位置決めの簡略化を図ってい
た。
Conventionally, in order to solve the above-mentioned problem, a V-groove or a concave groove for positioning the optical fiber was formed on the mount to simplify the positioning of the semiconductor laser device and the optical fiber.

しかしながら、この従来技術を用いてもサフマウント上
に形成されたV溝または凹溝と半導体レーザ装置との高
精度の位置合わせが必要で・あり、特に半導体レーザ装
置とサブマウン)゛の接続にソルダ(In、Au8n)
を用いているため、矛の厚さを一様に制御することが難
し2く、高い位置精度(±05μm稈度)の確保は不可
能であった。更に、モニタ光を用いてファイバとの位置
合わせを確認しながら接続してもソルダが固まった時点
では動いてしまう危険性が有り、また経時的なソルダ劣
化に洋5位置変動を生じる可能性があるという欠点を有
していた。
However, even if this conventional technology is used, highly accurate alignment between the V-groove or concave groove formed on the submount and the semiconductor laser device is required, and in particular, the connection between the semiconductor laser device and the submount requires solder ( In, Au8n)
Because of this, it was difficult to control the thickness of the spear uniformly2, and it was impossible to ensure high positional accuracy (±05 μm culm degree). Furthermore, even if you connect while checking the alignment with the fiber using a monitor light, there is a risk that the solder will move once it hardens, and there is a possibility that the position will change due to solder deterioration over time. It had some drawbacks.

〔発明の目的〕[Purpose of the invention]

本発明の目的は従来技術の欠点をなくし、半導体レーザ
装置の発光部とファイバ装着部とを一体化することによ
り、良好な結合を容易に実現ならしめた構造の半導体レ
ーザ装置を提供することにある。
An object of the present invention is to eliminate the drawbacks of the prior art and to provide a semiconductor laser device having a structure in which a light emitting section and a fiber mounting section of the semiconductor laser device are integrated, thereby easily achieving good coupling. be.

〔発明の概要〕[Summary of the invention]

所定の幅のストライプ状凹溝を有する0形半導体基板に
、該口形半導体基板より大さい禁制帯幅を有するn形半
導体光ガイド層と、該0形半導体光ガイド層より小さく
、かつ、前記口形半導体基板より大きな禁制帯幅を有す
るp形またはp形半導体活性層と、前記月形半導体光ガ
イド層と同じ禁制帯幅な有するp形半導体光カイト層と
、前記0形またはp形半導体活性層と同一物質から成る
n形半導体キャンプ層を順次連続的に形成したのち、所
定の幅を有し、前記n形半導体基板のストライプ状凹溝
と対応し、かつ、前記p形半導体光ガイド層の一部に達
する深さのp+拡散層を設け、前記n形半導体基板上の
凹溝と直交し、かつ、所定の長さの保護膜を用いて前記
n形半導体光ガイド一層までを選択的に食刻したのち、
該食刻された部分に絶縁性保護膜を形成し、前記p+拡
散層を含み・、前記n形半導体キャンプ層表面と前記n
形半導体基板の裏面にそれぞれ電極を設けたことを特徴
とするファイバ装着用半導体レーザ装置である。
A 0-type semiconductor light guide layer having a striped groove of a predetermined width; a p-type or p-type semiconductor active layer having a larger bandgap than the semiconductor substrate; a p-type semiconductor optical kite layer having the same bandgap as the moon-shaped semiconductor optical guide layer; and the 0-type or p-type semiconductor active layer. After successively forming an n-type semiconductor camp layer made of the same material as , the n-type semiconductor camp layer has a predetermined width, corresponds to the striped groove of the n-type semiconductor substrate, and has a layer of the p-type semiconductor optical guide layer. A p+ diffusion layer having a depth reaching a part of the substrate is provided, and a protective film having a predetermined length and perpendicular to the groove on the n-type semiconductor substrate is provided to selectively cover up to the first layer of the n-type semiconductor light guide. After engraving,
An insulating protective film is formed on the etched portion, including the p+ diffusion layer, the surface of the n-type semiconductor camp layer, and the n-type semiconductor camp layer.
This is a semiconductor laser device for attaching a fiber, characterized in that electrodes are provided on the back surface of a shaped semiconductor substrate.

〔発明の実施例〕[Embodiments of the invention]

以下、G a A sの場合を例にとり、一実施例を図
面を用いて説明する。
Hereinafter, one embodiment will be described using the drawings, taking the case of GaAs as an example.

第1図において、所定の幅のストライプ状凹溝を有する
n形G a A s基板1上に、該口形GaAs基板よ
り太さい禁制帯幅を有するn形GaAlAs光ガイ’r
”N2と、該0形G a A I A s光ガイド層2
より小さく、かつ、前記0形G a A s基板1より
大きな禁制帯幅を有する0形またはp形のGaAlAs
活性層3と、前記n形光ガイド層2と同じ禁制帯幅を有
するp形光ガイド層4と、前記p形またはp形のGaA
lAs活性層5と同一物質からなるn形GaAlAsキ
ャッグ層を通常のエピタキシャル成長法を用いて順次連
続的に形成したのち、所定の幅(5〜10μm)を有し
、前記n形GaA3基板1のストライプ状凹溝と対応し
て、前記p形GaAlAs光ガイド層4の一部に達する
深さのp+拡散層6を通常の熱拡散法を用いてZuを拡
散し、形成する。
In FIG. 1, an n-type GaAlAs optical guide having a wider forbidden band width than the gap-shaped GaAs substrate is placed on an n-type GaAs substrate 1 having striped grooves of a predetermined width.
"N2 and the 0 type G a AI A s light guide layer 2
0-type or p-type GaAlAs which is smaller and has a larger forbidden band width than the 0-type GaAs substrate 1;
an active layer 3; a p-type light guide layer 4 having the same forbidden band width as the n-type light guide layer 2; and the p-type or p-type GaA layer.
After sequentially and continuously forming an n-type GaAlAs cap layer made of the same material as the lAs active layer 5 using a normal epitaxial growth method, a stripe of the n-type GaAlAs substrate 1 having a predetermined width (5 to 10 μm) is formed. A p+ diffusion layer 6 having a depth that reaches a part of the p-type GaAlAs optical guide layer 4 is formed by diffusing Zu using a normal thermal diffusion method, corresponding to the shaped groove.

次に第2図に示した如く、前記0形GaAS基板1リス
トライプ状凹溝と直交し、かつ、所定の長さく500μ
m程度)を有する保護膜(例えばフォトレジスト膜)を
用いて前記n 形GaA、lAs層2までをAlを含ん
だG a A S層を選択的に食刻するエツチング液(
例えば、HP : H2O2: H20=2:1:20
)を用いて食刻したのち、該食刻された部分に絶縁性保
護膜(例えばSin、膜)を形成し、前記フォトレジス
ト膜を除失したのぢ前記p拡散層6を含み、前記n形G
aAlAsキャップ層50表面と、前記口形GaAs基
板1の裏面にそれぞれAu系電極7と電極8を設ける。
Next, as shown in FIG.
Using an etching solution (for example, a photoresist film) that selectively etches the GaAs layer containing Al up to the n-type GaA, lAs layer 2, using a protective film (for example, a photoresist film) having a
For example, HP: H2O2: H20=2:1:20
), an insulating protective film (for example, a Sin film) is formed on the etched portion, and the photoresist film is removed. Shape G
An Au-based electrode 7 and an electrode 8 are provided on the surface of the aAlAs cap layer 50 and the back surface of the mouth-shaped GaAs substrate 1, respectively.

次に上記構造の半導体レーザ装置に光ファイバを装着し
た場合について説明する。前記p形G a A s基板
1上のストライプ状凹溝の幅4〜8μm・光ファイバの
コア径2μm、光ファイバのクランド径5〜10μm(
最も一般的なシングルファイバ)の場合、前記n形Ga
AIA、s光ガイド層2の厚さを15〜3μIn程度に
すれば前記n形またはp形G a A I A s層3
の中心発光部と光ファイバのコアの中心とを同一光軸上
に設置することができる。
Next, a case will be described in which an optical fiber is attached to the semiconductor laser device having the above structure. The width of the striped groove on the p-type GaAs substrate 1 is 4 to 8 μm, the core diameter of the optical fiber is 2 μm, and the clad diameter of the optical fiber is 5 to 10 μm (
In the case of the most common single fiber), the n-type Ga
If the thickness of the AIA, s optical guide layer 2 is set to about 15 to 3 μIn, the n-type or p-type GaAIAs layer 3
The center light emitting part of the optical fiber and the center of the core of the optical fiber can be placed on the same optical axis.

〔発明の効果〕〔Effect of the invention〕

従来、半導体レーザ装置と光ファイバとの位置合わせが
困難であり、また、経時的なソルダ劣化に竿5半導体レ
ーザ装置の位置変動が生じることがあったのを、本発明
では半導体レーザ装置の基板上に設けたストライプ状凹
溝の一部を光ファイバのガイドとして用いることにより
、発光部位置と光ファイバの中心とを同一光軸上に設け
ることができる。これにより極めて容易に高い結合効率
が得られ、また、経時的にも変動部分が存在しないため
、安定な結合効率を維持することができる。
Conventionally, it was difficult to align the semiconductor laser device and the optical fiber, and the position of the pole 5 semiconductor laser device sometimes changed due to solder deterioration over time, but in the present invention, the substrate of the semiconductor laser device By using a part of the striped groove provided above as a guide for the optical fiber, the light emitting part position and the center of the optical fiber can be provided on the same optical axis. As a result, high binding efficiency can be obtained very easily, and since there is no part that fluctuates over time, stable binding efficiency can be maintained.

【図面の簡単な説明】[Brief explanation of drawings]

第1図および第2図は本発明の一実施例のファイバ装着
用半導体レーザ装置の製造過程の説明図である。 1・・・n形半導体基板、  2・・・0形半導体光ガ
イド層、3・・・n形またはp形半導体活性層、4・・
・p形半導体光ガイド層、 5・・・n形半導体キャップ層、 6・・・耐拡散層、    7・・Au系電極、8・・
・Au系電極。 第1図 オ′l藺
FIGS. 1 and 2 are explanatory views of the manufacturing process of a semiconductor laser device for attaching a fiber according to an embodiment of the present invention. DESCRIPTION OF SYMBOLS 1... N-type semiconductor substrate, 2... 0-type semiconductor optical guide layer, 3... N-type or p-type semiconductor active layer, 4...
- P-type semiconductor light guide layer, 5... N-type semiconductor cap layer, 6... Anti-diffusion layer, 7... Au-based electrode, 8...
・Au-based electrode. Figure 1

Claims (1)

【特許請求の範囲】[Claims] 1 所定の幅のストライプ状凹溝を有するn形半導体基
板に、該n形半導体基板より大きい禁制帯幅を有するn
形半導体光ガイド層と、該n形半導体光ガイド層より小
さく、かつ、前記n形半導体基板よりも大きな禁制帯幅
を有するn形またはp形半導体活性層と、前記In形半
導体光ガイド層と同じ禁制帯幅を有する口形半導体光ガ
イド層と、前記n形またはp形半導体活性層と同一物質
からなるn形半導体キャップ層を順次連続的に形成した
のち9、所定の幅を有し、前記0形半導体基板のストラ
イプ状凹溝と対応し、かつ、前記口形半導体光ガイド層
の一部に達する深さのp+拡散層を設け、前記n形半導
体基板上の凹溝と直交し、かつ、所定の長さの保護膜を
用いて前記口形半導体光ガイド層までを選択的に食刻し
たのも、該食刻された部分に絶縁性保護膜を形成し、前
記ダ拡散層を含み、前記n形キャップ層表面と、前記n
形半導体基板の裏面にそれぞれ電極を設けたことを特徴
とするファイバ装着用半導体レーザ装置0
1 An n-type semiconductor substrate having striped grooves of a predetermined width is provided with an n-type semiconductor substrate having a forbidden band width larger than that of the n-type semiconductor substrate.
an n-type semiconductor light guide layer, an n-type or p-type semiconductor active layer having a bandgap smaller than the n-type semiconductor light guide layer and larger than the n-type semiconductor substrate, and the in-type semiconductor light guide layer; After sequentially and continuously forming a mouth-shaped semiconductor light guide layer having the same forbidden band width and an n-type semiconductor cap layer made of the same material as the n-type or p-type semiconductor active layer, A p+ diffusion layer is provided that corresponds to the striped grooves of the 0-type semiconductor substrate and has a depth that reaches a part of the opening-shaped semiconductor light guide layer, and is perpendicular to the grooves on the n-type semiconductor substrate, and The reason for selectively etching up to the mouth-shaped semiconductor light guide layer using a protective film of a predetermined length is to form an insulating protective film on the etched portion, including the da diffusion layer, the n-type cap layer surface and the n-type cap layer surface;
Semiconductor laser device 0 for fiber attachment, characterized in that electrodes are provided on the back side of a shaped semiconductor substrate.
JP58065529A 1983-04-15 1983-04-15 Semiconductor laser device for fiber loading Pending JPS59193083A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58065529A JPS59193083A (en) 1983-04-15 1983-04-15 Semiconductor laser device for fiber loading

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58065529A JPS59193083A (en) 1983-04-15 1983-04-15 Semiconductor laser device for fiber loading

Publications (1)

Publication Number Publication Date
JPS59193083A true JPS59193083A (en) 1984-11-01

Family

ID=13289627

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58065529A Pending JPS59193083A (en) 1983-04-15 1983-04-15 Semiconductor laser device for fiber loading

Country Status (1)

Country Link
JP (1) JPS59193083A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0361153A2 (en) * 1988-09-29 1990-04-04 Siemens Aktiengesellschaft Arrangement for coupling an optical fibre with a coupling window of a planar integrated optical device, and method for making such an arrangement
JPH06224521A (en) * 1992-10-29 1994-08-12 Internatl Business Mach Corp <Ibm> Integrated short-cavity laser
WO2013130580A3 (en) * 2012-03-02 2013-11-14 Excelitas Canada, Inc. Semiconductor laser chip package with encapsulated recess molded on substrate and method for forming same
US8791492B2 (en) 2009-10-01 2014-07-29 Excelitas Canada, Inc. Semiconductor laser chip package with encapsulated recess molded on substrate and method for forming same
US9018074B2 (en) 2009-10-01 2015-04-28 Excelitas Canada, Inc. Photonic semiconductor devices in LLC assembly with controlled molding boundary and method for forming same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0361153A2 (en) * 1988-09-29 1990-04-04 Siemens Aktiengesellschaft Arrangement for coupling an optical fibre with a coupling window of a planar integrated optical device, and method for making such an arrangement
JPH06224521A (en) * 1992-10-29 1994-08-12 Internatl Business Mach Corp <Ibm> Integrated short-cavity laser
US8791492B2 (en) 2009-10-01 2014-07-29 Excelitas Canada, Inc. Semiconductor laser chip package with encapsulated recess molded on substrate and method for forming same
US9018074B2 (en) 2009-10-01 2015-04-28 Excelitas Canada, Inc. Photonic semiconductor devices in LLC assembly with controlled molding boundary and method for forming same
WO2013130580A3 (en) * 2012-03-02 2013-11-14 Excelitas Canada, Inc. Semiconductor laser chip package with encapsulated recess molded on substrate and method for forming same

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