JPS5919267A - 自動選曲プレ−ヤの曲間検出回路 - Google Patents
自動選曲プレ−ヤの曲間検出回路Info
- Publication number
- JPS5919267A JPS5919267A JP57126955A JP12695582A JPS5919267A JP S5919267 A JPS5919267 A JP S5919267A JP 57126955 A JP57126955 A JP 57126955A JP 12695582 A JP12695582 A JP 12695582A JP S5919267 A JPS5919267 A JP S5919267A
- Authority
- JP
- Japan
- Prior art keywords
- output
- interval
- comparator
- song
- songs
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B3/00—Recording by mechanical cutting, deforming or pressing, e.g. of grooves or pits; Reproducing by mechanical sensing; Record carriers therefor
- G11B3/02—Arrangements of heads
- G11B3/08—Raising, lowering, traversing otherwise than for transducing, arresting, or holding-up heads against record carriers
- G11B3/095—Raising, lowering, traversing otherwise than for transducing, arresting, or holding-up heads against record carriers for repeating a part of the record; for beginning or stopping at a desired point of the record
- G11B3/0952—Raising, lowering, traversing otherwise than for transducing, arresting, or holding-up heads against record carriers for repeating a part of the record; for beginning or stopping at a desired point of the record using automatic means
- G11B3/0957—Raising, lowering, traversing otherwise than for transducing, arresting, or holding-up heads against record carriers for repeating a part of the record; for beginning or stopping at a desired point of the record using automatic means using optical means for detecting the end of the recording or the desired point thereof
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57126955A JPS5919267A (ja) | 1982-07-20 | 1982-07-20 | 自動選曲プレ−ヤの曲間検出回路 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57126955A JPS5919267A (ja) | 1982-07-20 | 1982-07-20 | 自動選曲プレ−ヤの曲間検出回路 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5919267A true JPS5919267A (ja) | 1984-01-31 |
| JPH0145131B2 JPH0145131B2 (forum.php) | 1989-10-02 |
Family
ID=14948028
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57126955A Granted JPS5919267A (ja) | 1982-07-20 | 1982-07-20 | 自動選曲プレ−ヤの曲間検出回路 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5919267A (forum.php) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1277233A2 (en) | 2000-04-25 | 2003-01-22 | Tokyo Electron Corporation | Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module |
| US6921456B2 (en) | 2000-07-26 | 2005-07-26 | Tokyo Electron Limited | High pressure processing chamber for semiconductor substrate |
| US6924086B1 (en) | 2002-02-15 | 2005-08-02 | Tokyo Electron Limited | Developing photoresist with supercritical fluid and developer |
| JP2006508521A (ja) | 2002-02-15 | 2006-03-09 | 東京エレクトロン株式会社 | 溶剤浴と超臨界co2を用いたレジストの乾燥 |
| US7387868B2 (en) | 2002-03-04 | 2008-06-17 | Tokyo Electron Limited | Treatment of a dielectric layer using supercritical CO2 |
| EP1481284A4 (en) | 2002-03-04 | 2006-10-25 | Tokyo Electron Ltd | PROCESS FOR PASSIVATION OF MATERIALS WITH LOW DIELECTRIC CONSTANT IN THE PROCESSING OF WAFERS |
| US7169540B2 (en) | 2002-04-12 | 2007-01-30 | Tokyo Electron Limited | Method of treatment of porous dielectric films to reduce damage during cleaning |
| US7163380B2 (en) | 2003-07-29 | 2007-01-16 | Tokyo Electron Limited | Control of fluid flow in the processing of an object with a fluid |
| US7307019B2 (en) | 2004-09-29 | 2007-12-11 | Tokyo Electron Limited | Method for supercritical carbon dioxide processing of fluoro-carbon films |
| US7491036B2 (en) | 2004-11-12 | 2009-02-17 | Tokyo Electron Limited | Method and system for cooling a pump |
| US7434590B2 (en) | 2004-12-22 | 2008-10-14 | Tokyo Electron Limited | Method and apparatus for clamping a substrate in a high pressure processing system |
| US7550075B2 (en) | 2005-03-23 | 2009-06-23 | Tokyo Electron Ltd. | Removal of contaminants from a fluid |
| US7399708B2 (en) | 2005-03-30 | 2008-07-15 | Tokyo Electron Limited | Method of treating a composite spin-on glass/anti-reflective material prior to cleaning |
| US7442636B2 (en) | 2005-03-30 | 2008-10-28 | Tokyo Electron Limited | Method of inhibiting copper corrosion during supercritical CO2 cleaning |
| US7524383B2 (en) | 2005-05-25 | 2009-04-28 | Tokyo Electron Limited | Method and system for passivating a processing chamber |
-
1982
- 1982-07-20 JP JP57126955A patent/JPS5919267A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0145131B2 (forum.php) | 1989-10-02 |
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