JPS59170881A - Formation of electrode for liquid crystal panel - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for forming electrodes in a liquid crystal panel, and more particularly, to a method for forming electrodes in a double-layer IJ sock crystal panel.

IJ sock crystal panels, especially double matrix liquid crystal panels, have been attracting attention in recent years, with applications proposed for pocket TVs.

FIG. 1 shows a portion of the electrode pattern of a conventionally proposed dual matrix liquid crystal panel. In order to use such a liquid crystal panel in a pocket TV, the aperture ratio (
In other words, it is important that the ratio (the ratio of the total area of pixel electrodes to the effective screen area) be large. In other words, the larger the aperture ratio, the better the contrast, which improves the image quality and makes it easier to see.

Therefore, the width of the lead electrode (for example, 7) is as narrow as possible, the gap between the lead electrode and the pixel electrode (for example, the gap between 7 and 2) is as narrow as possible, and the gap between the pixel electrodes (for example, the gap between 1 and 2) is as narrow as possible. It is also necessary to make the gap between the lead electrodes (for example, the armpits of 8 and 9) as narrow as possible. However, as the width of the electrode is made narrower or the gap is narrower, the risk of electrode shorting and disconnection increases. According to the experiments of the present inventors, in order to form electrodes of such a double matrix liquid crystal panel with a high yield, it is necessary to set the electrode width t and i+ so that the electrode gap is 4 μm or more. From this K, when the lead electrode width was set to 40/J m, the electrode gap was set to 40 μm, and one pixel electrode was set to 30,011 m, the aperture ratio was 588%, and an image quality insufficient for use in television was obtained.

The present invention eliminates these drawbacks and provides a method for forming electrodes for a double matrix liquid crystal panel with a high yield and a large aperture ratio.

FIG. 2 is an explanatory view showing an embodiment of the method for forming electrodes for a double IJ sock crystal panel according to the present invention. The effectiveness of the present invention will be explained in detail below based on the drawings.

First, as shown in Figure 2-(α), the glass substrate 1'
5, a transparent conductive film 14. Or film i5. Au film 16. Form in this order.

Next, as shown in FIG. 2-(h), patterning is performed using an electrode substrate photoresist and a photomask to form the Au film, leaving portions that will become lead electrodes (for example, 17) and pixel electrodes (for example, 20).

The Cr film and the transparent conductive film are etched in this order. A mixed aqueous solution of iodine, potassium iodide, and methanol was used as the Au etching solution. In addition, a mixed aqueous solution of ferrician and potassium hydroxide was used as the etching solution for (jr). Furthermore, hydrochloric acid was used as the etching solution for the transparent conductive film. The width of the lead electrode (for example, 17) is usually 40 μm. , the electrode gap (for example, the gap between 2o and 21) is 10 μm.According to the inventor's experiments, when patterning is performed in an environment with a dust level of class 100, defects as shown in 23 occur at a rate of about 1 per unit area. 23 is a part where the photoresist was not removed due to dust etc. and the underlying electrode film remained.The size of 23 is 20 to 50 pm or less.In this state, the lead electrode 17 and 18 are in the initial state.

Next, as shown in Fig. 2-(c), the same patterning as in Fig. 2-Cb) was performed again using photoresist and a photomask, and then the Au film was formed again.

The Cr film and the transparent conductive film are etched in this order. As a result,
Since the probability of defects occurring at the same position is ~0, Figure 2-(5
) can be removed. On the other hand, as a new defect, pinballs 24 still occur at a rate of approximately one location per unit area. However, the size of the pinhole is 20~
Since the amount of rinsing is less than 30μ, the lead electrode 19 will not be disconnected.

Next, as shown in FIG. 2-(d), patterning is performed using a photoresist and a photomask, and the Au film and Cr film on the pixel electrode (for example, 20) are etched. Since the transparent conductive film is not etched with Au and Or etching solutions, the pixel electrode formed of the transparent conductive film (for example, 20
) can be obtained. A metal film is used for the lead electrode to reduce resistance, but a width of 10 μm is sufficient, so the width of the lead electrode in the part in contact with the pixel electrode in the figure is reduced to 10 μm, so that the pixel The area of the electrode can be expanded.

The aperture ratio of the dual matrix liquid crystal panel constructed in this manner is 798%, which is a significant improvement over the conventional panel, and the appearance can be significantly improved even when used for television.

As described above, if the present invention is used, it is possible to provide a method for forming a double matrix liquid crystal panel with a high yield and a large aperture ratio.

[Brief explanation of the drawing]

FIG. 1 shows a portion of the electrode pattern of a conventionally proposed double IJ sock crystal panel. FIGS. 2a, b, c, and d are explanatory diagrams showing one embodiment of the method for forming electrodes for a double matrix liquid crystal panel according to the present invention. 1.2, 3, 4, 5.6...Pixel electrode 7.8,
9, 10...Lead electrode 11.12...
・External connection terminal 16...Glass substrate 14...Transparent conductive film 15...Or film 16...Au film 17, 18, 19...・・Lead 11
Pole 2'(], 21, 22... Pixel electrode 23, 24... Defects or more Applicant Daini Seikosha Co., Ltd. 5 representatives Benkosha Tsutomu Mogami-, Ko ). 1,000 figures

Claims (1)

[Claims] (1) Etching the first electrode layer and the second electrode layer with the first mask, and then etching the first electrode layer and the second electrode layer with the second mask. . A method for forming electrodes for a liquid crystal panel, characterized in that the first electrode layer is then etched using a third mask. (2) Formation of an electrode for a liquid crystal panel according to claim 1, characterized in that a second electrode layer is formed on a glass substrate, and a first monopole layer is formed thereon. Method. (8) The electrode for a liquid crystal panel according to claim 1, wherein the first electrode layer is formed of an Au film and a CJR film, and the second electrode layer is formed of a transparent conductive film. Formation method. (4) The method for forming electrodes for a liquid crystal panel according to claim 1, wherein the first electrode layer is used as a lead electrode, and the second electrode layer is used as a pixel electrode. (5) The method for forming an electrode for a liquid crystal panel according to claim 1, wherein the width of the lead electrode is 40 μm or more. (6) The method for forming an electrode for a liquid crystal panel according to claim 1, wherein the width of the first electrode layer of the lead electrode portion connected to the pixel electrode is 10 μm or more and 40 μm or less. (7) The method for forming electrodes for a liquid crystal panel according to claim 1, wherein the electrode gap is 1011 m or more and 40 μm or less.